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    • 1. 发明公开
    • DIAZORESIN, PHOTORESIST COMPOSITION AND PREPARATION METHOD OF PHOTORESIST COMPOSITION
    • DIAZORESIN,FOTOLACKZUSAMMENSETZUNG UND VERFAHREN ZUR HERSTELLUNG EINER FOTOLACKZUSAMMENSETZUNG
    • EP3081581A1
    • 2016-10-19
    • EP15832938.3
    • 2015-06-16
    • BOE Technology Group Co., Ltd.
    • WANG, Jianguo
    • C08G16/04C07C245/20G03F7/021G03F7/004
    • G03F7/021C07C245/20C08G16/04G03F7/004G03F7/30
    • Diazo-resin-containing photoresist compositions and methods of preparing the same are provided for solving the problem that existing diazo-resins cannot be applied in LCD photoresists because the storage periods of the diazo-resins themselves and the printed boards made thereby are both short due to poor thermal stability of the diazo-resins. The diazo-resins of the present invention have excellent thermal stability and exhibit strong resistance to dry etching when being used in negative photoresists, while high resolution can be achieved. Meanwhile, during exposure, portions of the diazo-resins can crosslink with hydrogen bonds on surface of SiO or SiON film forming a barrier layer or passivation layer, such that the adhesion between the photoresists and the film layer is increased, and the photoresists would not peel during development. Thus, the utilization of tackifiers for enhancing the adhesion between a photoresist and surface of SiO or SiON film before masking can be omitted.
    • 提供含重氮树脂的光致抗蚀剂组合物及其制备方法是为了解决现有重氮树脂不能用于LCD光致抗蚀剂的问题,因为重氮基树脂本身和由此制成的印刷板的储存期均短 对重氮树脂的热稳定性差。 本发明的重氮树脂具有优异的热稳定性,并且当用于负性光致抗蚀剂时表现出对干蚀刻的强耐性,同时可以实现高分辨率。 同时,在曝光期间,部分重氮树脂可以与形成阻挡层或钝化层的SiO或SiON膜的表面上的氢键交联,使得光致抗蚀剂和膜层之间的粘合力增加,光致抗蚀剂不会 在开发期间剥皮。 因此,可以省略用于增强光致抗蚀剂和掩蔽之前的SiO或SiON膜的表面之间的粘合性的增粘剂的利用。