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1. 发明公开

EP1396874A3 Substrate carrier handler that unloads substrate carriers directly from a moving conveyor 审中-公开
标题翻译：对于衬底保持器谁衬底支架直接从移动的传送带放电处理装置
公开(公告)号：EP1396874A3
公开(公告)日：2005-01-12
申请号：EP03255382.8
申请日：2003-08-29
申请人： Applied Materials, Inc.
发明人： Rice, Michael R. , Hudgens, Jeffrey C. , Englhardt, Eric A. , Lowrance, Robert B. , Elliott, Martin R.
IPC分类号： H01L21/00 , H01L21/68 , B65G49/07
CPC分类号： B65G37/02 , B65G47/61 , B65G2201/0297 , H01L21/67769 , H01L21/67775 , H01L21/67778
摘要： In a first aspect, a substrate loading station (201) is served by a conveyor (231) which continuously transports substrate carriers (207). A substrate carrier handler (215) that is part of the substrate loading station (201) operates to exchange substrate carriers with the conveyor while the conveyor is in motion. A carrier exchange procedure may include moving an end effector (225) of the substrate carrier handler at a velocity that substantially matches a velocity of the conveyor. Numerous other aspects are provided.

2. 发明公开

EP0793262A3 Multiple independent robot assembly and apparatus for processing and transferring semiconductor wafers 失效
标题翻译：装置与几个独立的操纵器和生产和传输设备为半导电性的硅酮光盘
公开(公告)号：EP0793262A3
公开(公告)日：2001-08-16
申请号：EP97301360.0
申请日：1997-02-28
申请人： APPLIED MATERIALS, INC.
发明人： McClintock, William , Lowrance, Robert B. , Grunes, Howard
IPC分类号： H01L21/00
CPC分类号： H01L21/67742 , H01L21/68707 , H01L21/68742 , Y10S414/135
摘要： The disclosure relates to a robot assembly (10) including multiple independently operable robot assemblies provided for use in semiconductor wafer processing. The robot assembly includes independent co-axial upper and lower robot assemblies (14,16) adapted to handle multiple objects. The upper robot is stacked above the lower robot and the two robots are mounted concentrically to allow fast wafer transfer. Concentric drive mechanisms (1004, 1006, 1000, 1002) may also be provided for imparting rotary motion to either rotate the robot assembly or extend an extendable arm assembly (21,22) into an adjacent chamber (18a, 18b). Each robot can be either a single blade robot or a dual blade (33,34) robot. Also provided is an apparatus for processing semiconductor wafers (W) comprising a pre/post process transfer chamber (12) housing multiple independent robot assemblies and surrounded by a plurality of pre-process chambers and post process chambers (18a, 18b). A process transfer chamber (12) is connected to the pre/post process transfer chamber by cooling chambers, and is otherwise surrounded by a plurality of process chambers. Multiple independent robot assemblies are also provided within the process transfer chamber. Within each process, pre-process and post-process chamber is an apparatus for holding a plurality of stacked wafers. The apparatus includes a wafer lifting and storing apparatus exhibiting a plurality of vertically movable lift pins (270) surrounding the chamber pedestal (262). The lift pins are configures to receive and hold a plurality of stacked wafers, preferably two therein. Each one of the plurality of lift pins preferably comprises a lower lift pin (270a) segment exhibiting a lower wafer support surface proximal to the upper end thereof, and an upper lift pin segment (270b) hingedly connected to the lower lift pin segment and exhibiting an upper wafer support surface proximal to an upper end thereof.

3. 发明授权

EP1394840B1 System for transporting substrate carriers 有权
标题翻译：一种用于输送和处理衬底
公开(公告)号：EP1394840B1
公开(公告)日：2008-11-19
申请号：EP03255404.0
申请日：2003-08-29
申请人： APPLIED MATERIALS, INC.
发明人： Rice, Michael R. , Hudgens, Jeffrey C. , Englhardt, Eric A. , Lowrance, Robert B. , Elliott, Martin R.
IPC分类号： H01L21/00 , H01L21/68 , B65G49/07
CPC分类号： H01L21/67769 , H01L21/67775 , H01L21/67778

4. 发明公开

EP1750299A3 Methods and apparatus for transporting substrate carriers 有权
标题翻译：用于传输基片支架的方法和装置
公开(公告)号：EP1750299A3
公开(公告)日：2007-06-13
申请号：EP06022299.9
申请日：2004-01-27
申请人： Applied Materials, Inc.
发明人： Rice, Michael R. , Lowrance, Robert B. , Elliott, Martin R. , Hudgens, Jeffrey C. , Englhardt Eric Andrew
IPC分类号： H01L21/00 , H01L21/677
CPC分类号： H01L21/67769 , H01L21/67778
摘要： According to a first aspect, a first conveyor system is provided that is adapted to deliver substrate carriers within a semiconductor device manufacturing facility. The first conveyor system includes a ribbon that forms a closed loop along at least a portion of the semiconductor device manufacturing facility. The ribbon is adapted to (1) be flexible in a horizontal plane and rigid in a vertical plane; and (2) transport a plurality of substrate carriers within at least a portion of the semiconductor device manufacturing facility. Numerous other aspects are provided, as are systems, methods and computer program products in accordance with these and other aspects.

5. 发明公开

EP0793262A2 Multiple independent robot assembly and apparatus for processing and transferring semiconductor wafers 失效
标题翻译：装置与几个独立的操纵器和生产和传输设备为半导电性的硅酮光盘
公开(公告)号：EP0793262A2
公开(公告)日：1997-09-03
申请号：EP97301360.0
申请日：1997-02-28
申请人： APPLIED MATERIALS, INC.
发明人： McClintock, William , Lowrance, Robert B. , Grunes, Howard
IPC分类号： H01L21/00
CPC分类号： H01L21/67742 , H01L21/68707 , H01L21/68742 , Y10S414/135
摘要： The disclosure relates to a robot assembly (10) including multiple independently operable robot assemblies provided for use in semiconductor wafer processing. The robot assembly includes independent co-axial upper and lower robot assemblies (14,16) adapted to handle multiple objects. The upper robot is stacked above the lower robot and the two robots are mounted concentrically to allow fast wafer transfer. Concentric drive mechanisms (1004, 1006, 1000, 1002) may also be provided for imparting rotary motion to either rotate the robot assembly or extend an extendable arm assembly (21,22) into an adjacent chamber (18a, 18b). Each robot can be either a single blade robot or a dual blade (33,34) robot. Also provided is an apparatus for processing semiconductor wafers (W) comprising a pre/post process transfer chamber (12) housing multiple independent robot assemblies and surrounded by a plurality of pre-process chambers and post process chambers (18a, 18b). A process transfer chamber (12) is connected to the pre/post process transfer chamber by cooling chambers, and is otherwise surrounded by a plurality of process chambers. Multiple independent robot assemblies are also provided within the process transfer chamber. Within each process, pre-process and post-process chamber is an apparatus for holding a plurality of stacked wafers. The apparatus includes a wafer lifting and storing apparatus exhibiting a plurality of vertically movable lift pins (270) surrounding the chamber pedestal (262). The lift pins are configures to receive and hold a plurality of stacked wafers, preferably two therein. Each one of the plurality of lift pins preferably comprises a lower lift pin (270a) segment exhibiting a lower wafer support surface proximal to the upper end thereof, and an upper lift pin segment (270b) hingedly connected to the lower lift pin segment and exhibiting an upper wafer support surface proximal to an upper end thereof.
摘要翻译：本发明涉及一种机器人组件（10）包括设置用于在半导体晶片加工使用多个unabhängig可操作机器人组件。机器人组件包括独立同轴上部和下部机械手组件（14,16）angepasst来处理多个对象。上部机械层叠于下机器人的上方和两个机器人同心安装，以允许几乎晶片传送。同心的驱动机构（1004，1006，1000，1002）因此可以提供一种用于赋予旋转运动来旋转无论是机械手组件或延伸到伸展臂总成（21,22）插入在相邻的腔室（18A，18B）。每个机器人可以是单个刀片机器人或双叶片（33,34）的机器人。这样提供了一种用于处理半导体晶片（W），其包括前/后处理传送室（12）容纳多个独立机器人组件和由前处理及后处理室腔室的多个被围绕的装置（18A，18B）。的方法，传送室（12）由冷却室连接到预/后处理传送腔室，并通过处理室的数目为否则包围。因此多个独立的机器人组件在处理腔室传送内。在每个过程中，前处理和后处理室是用于保持堆叠的晶片的一个多元化的装置。该装置包括：晶片升降和存储装置参展的包围室基座（262）可垂直移动的提升销（270）多个。升降销是提供配置为接收和保持堆叠的晶片的复数，优选两个在其中。的升降销，所述多个每一个优选地包括下部升降销（270A）链段表现出较低的晶片支撑表面接近其上端，并且在上部提升销区段（270B）以铰接方式连接到下部升降销段和参展在上晶片支撑表面邻近于上端。

6. 发明公开

EP1750299A2 Methods and apparatus for transporting substrate carriers 有权
标题翻译： Apparat zum Transport von Substrathaltern
公开(公告)号：EP1750299A2
公开(公告)日：2007-02-07
申请号：EP06022299.9
申请日：2004-01-27
申请人： Applied Materials, Inc.
发明人： Rice, Michael R. , Lowrance, Robert B. , Elliott, Martin R. , Hudgens, Jeffrey C. , Englhardt Eric Andrew
IPC分类号： H01L21/677
CPC分类号： H01L21/67769 , H01L21/67778
摘要： According to a first aspect, a first conveyor system is provided that is adapted to deliver substrate carriers within a semiconductor device manufacturing facility. The first conveyor system includes a ribbon that forms a closed loop along at least a portion of the semiconductor device manufacturing facility. The ribbon is adapted to (1) be flexible in a horizontal plane and rigid in a vertical plane; and (2) transport a plurality of substrate carriers within at least a portion of the semiconductor device manufacturing facility. Numerous other aspects are provided, as are systems, methods and computer program products in accordance with these and other aspects.
摘要翻译：根据第一方面，提供了一种适于在半导体器件制造设备内输送衬底载体的第一传送系统。第一输送机系统包括沿半导体器件制造设备的至少一部分形成闭环的带状物。该带适于（1）在水平面上具有柔性并且在垂直平面中是刚性的; 和（2）在半导体器件制造设备的至少一部分内传输多个衬底载体。还提供了许多其他方面，以及根据这些和其他方面的系统，方法和计算机程序产品。

7. 发明公开

EP1394840A3 System for transporting substrate carriers 有权
公开(公告)号：EP1394840A3
公开(公告)日：2004-12-08
申请号：EP03255404.0
申请日：2003-08-29
申请人： Applied Materials, Inc.
发明人： Rice, Michael R , Hudgens, Jeffrey C. , Englhardt, Eric A. , Lowrance, Robert B. , Elliott, Martin R.
IPC分类号： H01L21/00 , H01L21/68 , B65G49/07
CPC分类号： H01L21/67769 , H01L21/67775 , H01L21/67778
摘要： In a semiconductor fabrication facility, a conveyor (12) transports substrates carriers (14). The substrate carriers are unloaded from the conveyor and loaded onto the conveyor without stopping the conveyor. A load and/or unload mechanism (32) lifts the substrate carriers (14) from the conveyor during unloading operations, while matching the horizontal speed of the conveyor. Similarly, during loading operations, the load/unload mechanism lowers a substrate carrier into engagement with the conveyor while matching the horizontal speed of the conveyor. Individual substrates, without carriers, may be similarly loaded and/or unloaded from a conveyor.

8. 发明公开

EP1396874A2 Substrate carrier handler that unloads substrate carriers directly from a moving conveyor 审中-公开
标题翻译：对于衬底保持器谁衬底支架直接从移动的传送带放电处理装置
公开(公告)号：EP1396874A2
公开(公告)日：2004-03-10
申请号：EP03255382.8
申请日：2003-08-29
申请人： Applied Materials, Inc.
发明人： Rice, Michael R. , Hudgens, Jeffrey C. , Englhardt, Eric A. , Lowrance, Robert B. , Elliott, Martin R.
IPC分类号： H01L21/00
CPC分类号： B65G37/02 , B65G47/61 , B65G2201/0297 , H01L21/67769 , H01L21/67775 , H01L21/67778
摘要： In a first aspect, a substrate loading station (201) is served by a conveyor (231) which continuously transports substrate carriers (207). A substrate carrier handler (215) that is part of the substrate loading station (201) operates to exchange substrate carriers with the conveyor while the conveyor is in motion. A carrier exchange procedure may include moving an end effector (225) of the substrate carrier handler at a velocity that substantially matches a velocity of the conveyor. Numerous other aspects are provided.
摘要翻译：在第一方面中，一个基片装载站（201）由传送装置（231），它连续地输送基片的载体（207）提供服务。载体基板处理程序（215）确实是在基板装载站（201）的一部分进行操作，以与输送机交换衬底载波，而在输送机是在运动中。载体交换过程可以包括移动以速度确实基本上输送机的速度相匹配，以结束基板载体处理程序的执行器（225）。还提供了许多其他方面。

9. 发明授权

EP0423608B1 Two-axis magnetically coupled robot 失效转让
标题翻译：双轴机器人与磁耦合
公开(公告)号：EP0423608B1
公开(公告)日：1996-06-05
申请号：EP90119433.2
申请日：1990-10-10
申请人： APPLIED MATERIALS INC.
发明人： Lowrance, Robert B.
IPC分类号： B25J9/12 , B25J9/10 , B25J21/00
CPC分类号： H01L21/67742 , B25J9/107 , B25J9/126 , B25J21/005

10. 发明公开

EP0600851A3 Robot apparatus 失效
标题翻译：机器人装置
公开(公告)号：EP0600851A3
公开(公告)日：1994-08-17
申请号：EP94101717.0
申请日：1990-10-10
申请人： APPLIED MATERIALS, INC.
发明人： Lowrance, Robert B.
IPC分类号： B25J21/00 , H01L21/00
CPC分类号： H01L21/67742 , B25J9/107 , B25J9/126 , B25J21/005
摘要： A robot apparatus comprises a robot vacuum chamber (1003) having an outer wall (1004), a top wall (1001) and a bottom wall (1002); a robot (1008) within said vacuum chamber (1003); and a support (1005, 1006, 1007) within said vacuum chamber (1003) extending from the top wall (1001) to the bottom wall (1002), whereby when a vacuum is produced within said vacuum chamber (1003), said support (1005, 1006, 1007) significantly reduces vertical displacement of said top and bottom walls (1001, 1002) by ambient pressure.

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