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1. 发明公开

EP1475671A1 Method of preparing components for a lithographic apparatus 有权
标题翻译： Verfahren zur Herstellung eines lithographischen Apparats
公开(公告)号：EP1475671A1
公开(公告)日：2004-11-10
申请号：EP04252674.9
申请日：2004-05-07
申请人： ASML Netherlands B.V.
发明人： Dams, Johannes Adrianus Antonius Theodorus , Kroon, Mark , Voorma, Harm-Jan , Spee, Carolus Ida Maria Antonius
IPC分类号： G03F7/20
CPC分类号： G03F7/70983 , G03F7/70916
摘要： A method of preparing components for use in the vacuum chamber of a lithographic apparatus is disclosed. The method comprises firstly coating the component with a non-metallic, non-plastics material then treating the coating so as to harden it. The preferred coating material is a Hydrogen Silsesquioxane (HSQ) which can be applied using a variety of methods (spraying, brushing, spinning) and can be treated by either heating or by irradiation with an electron beam. The resulting components strongly reduce outgassing of either water or hydrocarbons when subjected to a vacuum environment.
摘要翻译：公开了一种制备用于光刻设备的真空室中的组件的方法。该方法包括首先用非金属的非塑性材料涂覆该部件，然后处理涂层以使其硬化。优选的涂层材料是可以使用各种方法（喷涂，刷涂，纺丝）施加的氢倍半硅氧烷（HSQ），并且可以通过加热或通过用电子束照射进行处理。所产生的组分在经受真空环境时，强烈地减少了水或烃的除气。

2. 发明授权

EP1580603B1 Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：一种光刻设备和方法，用于制造器件
公开(公告)号：EP1580603B1
公开(公告)日：2010-08-18
申请号：EP05102250.7
申请日：2005-03-21
申请人： ASML Netherlands B.V.
发明人： Voorma, Harm-Jan , Van Dijsseldonk, Antonius, Johannes, Josephus , Mickan, Uwe
IPC分类号： G03F7/20
CPC分类号： G03F7/70558

3. 发明授权

EP1475671B1 Method of making a lithographic apparatus 有权
标题翻译：一种用于制造光刻设备处理
公开(公告)号：EP1475671B1
公开(公告)日：2009-03-18
申请号：EP04252674.9
申请日：2004-05-07
申请人： ASML Netherlands B.V.
发明人： Dams, Johannes Adrianus Antonius Theodorus , Kroon, Mark , Voorma, Harm-Jan , Spee, Carolus Ida Maria Antonius
IPC分类号： G03F7/20
CPC分类号： G03F7/70983 , G03F7/70916

4. 发明授权

EP1544678B1 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：EP1544678B1
公开(公告)日：2009-12-02
申请号：EP04078416.7
申请日：2004-12-16
申请人： ASML Netherlands B.V.
发明人： Van Dijsseldonk, Antonius Johannes Josephus , Dierichs, Marcel Mathijs Theodore Marie , Voorma, Harm-Jan
IPC分类号： G03F7/20
CPC分类号： G03F7/70216 , G03F7/70275 , G03F7/70308

5. 发明公开

EP1580603A3 Lithographic Apparatus, Device Manufacturing Method and Variable Attenuator 有权
标题翻译：石版画家Apparat，Methode zur Herstellung einer Vorrichtung und variablerAbschwächer
公开(公告)号：EP1580603A3
公开(公告)日：2006-02-01
申请号：EP05102250.7
申请日：2005-03-21
申请人： ASML Netherlands B.V.
发明人： Voorma, Harm-Jan , Van Dijsseldonk, Antonius, Johannes, Josephus , Mickan, Uwe
IPC分类号： G03F7/20
CPC分类号： G03F7/70558
摘要： A lithographic apparatus includes an illumination system for providing a projection beam of radiation, a support structure for supporting patterning structure for imparting a pattern to the projection beam, a substrate table for holding a wafer and a projection system for projecting the patterned beam onto a target portion of the wafer. In order to permit control of the radiation dose at the wafer so that the throughput of wafers can be optimised, a variable attenuator A is provided to vary the intensity of the projection beam while not changing the position of the beam. The variable attenuator A comprises two parallel mirrors 21 and 22 positioned such that an input beam of radiation is incident on a first of the mirrors 21 by which it is reflected towards a second of the mirrors 22 by which the beam is reflected to produce an output beam of radiation of required intensity for input to the illumination system, and a tilting mechanism for tilting the mirrors 21 and 22 such that the mirrors 21 and 22 remain parallel to one another and the angles of incidence of the beams on the mirrors 21 and 22 are changed so as to vary the intensity of the output beam. This allows the intensity of the projection beam to be varied continuously without changing the position of the beam, whether the input beam is converging, diverging or parallel.
摘要翻译：光刻设备包括用于提供投影辐射束的照明系统，用于支撑用于将投影光束赋予图案的图形结构的支撑结构，用于保持晶片的基板台和用于将图案化光束投影到目标上的投影系统晶片的一部分。为了允许控制晶片上的辐射剂量，从而可以优化晶片的生产量，可以提供可变衰减器A以改变投射光束的强度，同时不改变光束的位置。可变衰减器A包括两个平行的反射镜21和22，两个平行的反射镜21和22被定位成使得输入的辐射光束入射在第一个反射镜21上，通过该反射镜21被反射到第二个反射镜22，由此反射光束以产生输出用于输入到照明系统的所需强度的辐射束，以及用于使反射镜21和22倾斜的倾斜机构，使得反射镜21和22保持彼此平行，并且反射镜21和22上的光束的入射角被改变以便改变输出光束的强度。无论输入光束是会聚，发散还是平行，都能够使投影光束的强度连续变化而不改变光束的位置。

6. 发明公开

EP1580603A2 Lithographic Apparatus, Device Manufacturing Method and Variable Attenuator 有权
标题翻译：石版画家和法国赫尔斯特朗·埃纳弗·弗里里
公开(公告)号：EP1580603A2
公开(公告)日：2005-09-28
申请号：EP05102250.7
申请日：2005-03-21
申请人： ASML Netherlands B.V.
发明人： Voorma, Harm-Jan , Van Dijsseldonk, Antonius, Johannes, Josephus , Mickan, Uwe
IPC分类号： G03F7/20
CPC分类号： G03F7/70558
摘要： A lithographic apparatus includes an illumination system for providing a projection beam of radiation, a support structure for supporting patterning structure for imparting a pattern to the projection beam, a substrate table for holding a wafer and a projection system for projecting the patterned beam onto a target portion of the wafer. In order to permit control of the radiation dose at the wafer so that the throughput of wafers can be optimised, a variable attenuator A is provided to vary the intensity of the projection beam while not changing the position of the beam. The variable attenuator A comprises two parallel mirrors 21 and 22 positioned such that an input beam of radiation is incident on a first of the mirrors 21 by which it is reflected towards a second of the mirrors 22 by which the beam is reflected to produce an output beam of radiation of required intensity for input to the illumination system, and a tilting mechanism for tilting the mirrors 21 and 22 such that the mirrors 21 and 22 remain parallel to one another and the angles of incidence of the beams on the mirrors 21 and 22 are changed so as to vary the intensity of the output beam. This allows the intensity of the projection beam to be varied continuously without changing the position of the beam, whether the input beam is converging, diverging or parallel.
摘要翻译：光刻设备包括用于提供投影辐射束的照明系统，用于支撑用于将投影光束赋予图案的图形结构的支撑结构，用于保持晶片的基板台和用于将图案化光束投影到目标上的投影系统晶片的一部分。为了允许控制晶片上的辐射剂量，从而可以优化晶片的生产量，可以提供可变衰减器A以改变投射光束的强度，同时不改变光束的位置。可变衰减器A包括两个平行的反射镜21和22，两个平行的反射镜21和22被定位成使得输入的辐射光束入射在第一个反射镜21上，通过该反射镜21被反射到第二个反射镜22，由此反射光束以产生输出用于输入到照明系统的所需强度的辐射束，以及用于使反射镜21和22倾斜的倾斜机构，使得反射镜21和22保持彼此平行，并且反射镜21和22上的光束的入射角被改变以便改变输出光束的强度。无论输入光束是会聚，发散还是平行，都能够使投影光束的强度连续变化而不改变光束的位置。

7. 发明公开

EP1555575A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：EP1555575A1
公开(公告)日：2005-07-20
申请号：EP05075105.6
申请日：2005-01-14
申请人： ASML Netherlands B.V.
发明人： Moors, J.H.J. , Franken, J.C.L. , Mickan, Uwe , Voorma, Harm-Jan
IPC分类号： G03F7/20
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70175 , G03F7/70891
摘要： A lithographic apparatus comprising an illumination system (IL) for providing a projection beam of radiation (PB), a support structure (MT) for supporting patterning means (MA), the patterning means (MA) serving to impart the projection beam (PB) with a pattern in its cross-section. The apparatus further comprises a substrate table (WT) for holding a substrate (W), a projection system (PL) for projecting the patterned beam onto a target portion of the substrate (W), and a collector (1; 101; 201) which is arranged for transmitting radiation (R), received from a first radiation source (SO), to the illumination system (IL). The apparatus comprises at least a heater (2; 102; 202) for heating the collector (1; 101; 201) when the collector receives substantially no radiation from the first radiation source (SO).
The invention further provides a device manufacturing method as well as a device manufactured thereby.
摘要翻译：一种光刻设备，包括用于提供投影辐射束（PB）的照明系统（IL），用于支撑图案形成装置（MA）的支撑结构（MT），图案形成装置（MA）用于赋予投影束（PB）在横截面上有一个图案。该设备还包括用于保持衬底（W）的衬底台（WT），用于将图案化的束投影到衬底（W）的目标部分上的投影系统（PL），以及集电器（1; 101; 201）其被设置用于将从第一辐射源（SO）接收的辐射（R）传输至照明系统（IL）。该设备包括至少一个加热器（2; 102; 202），用于当收集器基本上不接收来自第一辐射源（SO）的辐射时加热收集器（1; 101; 201）。本发明还提供了一种器件制造方法以及由此制造的器件。

8. 发明授权

EP1555575B1 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：EP1555575B1
公开(公告)日：2017-09-13
申请号：EP05075105.6
申请日：2005-01-14
申请人： ASML Netherlands B.V.
发明人： Moors, J.H.J. , Franken, J.C.L. , Mickan, Uwe , Voorma, Harm-Jan
IPC分类号： G03F7/20
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70175 , G03F7/70891

9. 发明公开

EP1544678A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：EP1544678A1
公开(公告)日：2005-06-22
申请号：EP04078416.7
申请日：2004-12-16
申请人： ASML Netherlands B.V.
发明人： Van Dijsseldonk, Antonius Johannes Josephus , Dierichs, Marcel Mathijs Theodore Marie , Voorma, Harm-Jan
IPC分类号： G03F7/20
CPC分类号： G03F7/70216 , G03F7/70275 , G03F7/70308
摘要： A lithographic apparatus (1) including a radiation attenuator (25) or a variable aperture system, such as masking blades (31,32), arranged in or near an intermediate focus (23) of the projection system (PL). Besides a radiation attenuator or a variable aperture system, a measuring system (61) may be arranged in the intermediate focus. By placing one or more of such systems in the intermediate focus of the projection system, instead of near the reticle (38) in the illumination system (IL), fewer design restrictions occur because of more space available, resulting in a lower design cost.
摘要翻译：包括布置在投影系统（PL）的中间焦点（23）中或附近的包括辐射衰减器（25）或可变光圈系统（诸如掩模叶片（31,32））的光刻设备（1）。除了辐射衰减器或可变光圈系统之外，测量系统（61）可以布置在中间焦点中。通过将一个或多个这样的系统放置在投影系统的中间焦点中，而不是靠近照明系统（IL）中的掩模版（38），由于更多的空间可用而出现更少的设计限制，导致更低的设计成本。

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