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    • 1. 发明公开
    • METHOD FOR FORMING INTERMEDIATE LAYER FORMED BETWEEN SUBSTRATE AND DLC FILM, METHOD FOR FORMING DLC FILM, AND INTERMEDIATE LAYER FORMED BETWEEN SUBSTRATE AND DLC FILM
    • 用于生产之间的基底和DLC膜的方法的中间层为DLC膜的生产和中间层的基底和DLC膜
    • EP3067438A1
    • 2016-09-14
    • EP14859803.0
    • 2014-11-06
    • Dowa Thermotech Co., Ltd.
    • WATANABE, MotohiroMATSUOKA, HiroyukiSAKAKIBARA, WataruNOGAMI, Soichiro
    • C23C14/34C23C14/06C23C14/14C23C16/27C23C16/50
    • An intermediate layer forming method to form an intermediate layer formed between a base material and a DLC film using a PVD method includes: a Ti layer film-forming step of film-forming a Ti layer on a base material; and a TiC layer film-forming step of film-forming a TiC layer on the Ti layer, in which in the Ti layer film-forming step, an Ar gas is supplied into a chamber into which the base material is carried and a film-forming pressure is set to a pressure in a range of not less than 0.4 Pa and not more than 1 Pa to film-form the Ti layer, and in the TiC layer film-forming step, an Ar gas and a CH 4 gas are supplied into the chamber, a film-forming pressure is set to a pressure in a range of 0.2 Pa or more to less than 0.4 Pa, and a second bias voltage higher in bias voltage than a first bias voltage applied to the base material in the Ti layer film-forming step and higher in bias voltage than -100 V is applied to the base material to film-form the TiC layer.
    • 形成方法的中间层,以形成一基体材料和DLC膜使用PVD方法包括之间形成中间层上:Ti层的膜形成在基材上的Ti层成膜工序; 和的TiC层的膜形成在Ti层成膜步骤在Ti层上形成的TiC层,其中,至Ar气体被供给到到其中的基体材料进行腔室和成膜成膜步 成形压力被设定为压力的范围不小于0.4帕和不超过1 Pa至薄膜状的Ti层,并在TiC层电影形成工序中,以Ar气和CH 4气体供给 到腔室中,膜形成压力设定为在范围0.2 Pa以上至低于0.4 Pa的压力,以及一个第二偏置电压较高的偏置电压比的Ti施加到基础材料的第一偏置电压 层膜形成工序和更高的偏置电压比-100伏施加到基材以薄膜状TiC层。
    • 2. 发明公开
    • Carburizing and quenching facility
    • AUFKOHLUNGS- UND ABSCHRECKUNGSANLAGE
    • EP2915888A1
    • 2015-09-09
    • EP15000648.4
    • 2015-03-05
    • Dowa Thermotech Co., Ltd.
    • HATANAKA, HokutoKOYAMA, Yasuhiro
    • C21D1/773C21D1/78C21D9/00C23C8/20C23C8/22C21D1/62F27B9/02F27B9/04F27D3/00
    • C21D1/62C21D1/773C21D1/78C21D9/0018C21D9/0025C23C8/22C23C8/80F27B17/0016
    • To shorten the time taken for a carburizing and quenching treatment of an object to be treated, a carburizing and quenching facility 1 is provided that includes: a treatment chamber where at least one treatment related to a carburizing and quenching treatment is performed on an object to be treated W; a transfer apparatus to transfer an object to be treated W; a mounting table 30 that is provided in the treatment chamber and on which an object to be treated W transferred into the treatment chamber is mounted; and a lifting and lowering device that lifts and lowers the mounting table 30 and in which a transfer arm 40 to transfer an object to be treated W into the treatment chamber and outside the treatment chamber is provided in the transfer apparatus, the carburizing and quenching facility 1 includes: a turntable 60 that is disposed in the treatment chamber and performs deliveries of an object to be treated W to and from the mounting table 30 and the transfer arm 40; and a turntable drive device that rotates the turntable 60, in which the turntable 60 includes: a first support part 63 that supports an object to be treated W that has already undergone a treatment; and a second support part 64 that supports an object to be treated to undergo a treatment next, and in plan view, the turntable 60 is provided in a positional relationship such that the first support part 63, a support post 62 of the turntable 60, and the second support part 64 are disposed in a linear arrangement so as to sandwich a rotation axis R of the turntable 60 by the first support part 63 and the second support part 64.
    • 为了缩短对待处理物体进行渗碳淬火处理所用的时间,提供了一种渗碳淬火设备1,其包括:处理室,其中至少一个与渗碳和淬火处理有关的处理对象物 待W 用于传送待处理物体W的传送装置; 设置在处理室中的安装台30,其上安装有被处理物体W转移到处理室中; 以及提升和降低安装台30的提升和降低装置,其中传送臂40将待处理物体W转移到处理室和处理室外部的提升和降低装置设置在传送装置中,渗碳和淬火设备 1包括:转台60,其设置在处理室中并且执行待处理物体W向安装台30和传送臂40的传送; 以及使转台60旋转的转盘驱动装置,其中转台60包括:第一支撑部分63,其支撑已经经过处理的被处理物体W; 以及第二支撑部分64,其支撑待处理对象接下来进行处理,并且在平面图中,转台60设置成使得第一支撑部分63,转盘60的支撑柱62, 并且第二支撑部64以线性排列设置,以便通过第一支撑部63和第二支撑部64夹住转盘60的旋转轴线R.