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1. 发明公开

EP1348690A1 Cinnamaldehyde compound having an azido group 审中-公开
标题翻译： Zimtaldehyde Derivate mit einer Azido Gruppe
公开(公告)号：EP1348690A1
公开(公告)日：2003-10-01
申请号：EP03006375.4
申请日：2003-03-20
申请人： Toyo Gosei Kogyo Co., Ltd.
发明人： Takeda, Mineko, Toyo Gosei Kogyo Co., Ltd.
IPC分类号： C07C247/16
CPC分类号： C07C247/16
摘要： The invention provides a novel azidocinnamaldehyde compound which, when used as an intermediate for providing a photosensitive moiety of a photoresist, introduces a photosensitive moiety having high sensitivity and attaining high contrast between the exposed portion and the unexposed portion, and which per se can serve as a photosensitive moiety. The azidocinnamaldehyde compound is represented by formula (I) :
wherein R represents a lower alkyl group and Y represents hydrogen or a sulfonate salt group.
摘要翻译：本发明提供了一种新的叠氮肉桂醛化合物，当用作提供光致抗蚀剂的感光部分的中间体时，引入具有高灵敏度并在曝光部分和未曝光部分之间获得高对比度的感光部分，其本身可以用作感光部分。叠氮肉桂醛化合物由式（I）表示：其中R表示低级烷基，Y表示氢或磺酸盐基团。

2. 发明公开

EP0779553A1 Polyvinyl alcohol base photosensitive resin, photosensitive composition, and method for pattern formation using the same 失效
标题翻译：一种感光性树脂基于聚乙烯醇，光敏组合物，及其使用方法，所述组合物形成图案
公开(公告)号：EP0779553A1
公开(公告)日：1997-06-18
申请号：EP96119803.3
申请日：1996-12-10
申请人： Toyo Gosei Kogyo Co., Ltd.
发明人： Kikuchi, Hideo , Tochizawa, Noriaki , Kuniyoshi, Yasuo
IPC分类号： G03F7/038 , G03F7/033 , C08F8/36 , G03F7/032
CPC分类号： G03F7/0388 , C08F8/00 , C08F8/34 , G03F7/033 , C08F16/06
摘要： This invention is aimed at providing a photosensitive resin, a photosensitive resin composition, and a method for pattern-formation by which the excellent properties of water-resistance and heat-resistance, and sufficient water-solubility, and an excellent compatibility to an anionic additive can be attained. According to the invention, a photosensitive resin is provided as a polyvinyl alcohol base polymer compound obtained by suspending a styryl compound (I) having a nitrogen heterocyclic ring with a quaternary aromatic species and a phenyl compound (II) having two sulfone groups, in which the content of (1) is 0.5 to 10 mole % while the content of (II) is 0.1 to 20 mole %.
摘要翻译：本发明是提供一种感光性树脂，感光性树脂组合物，和用于图案形成的方法的目的是通过其耐水性和耐热性，以及足够的水溶解度，和优异的相容性的优异的性能，以在阴离子添加剂可以实现。。根据本发明，光敏树脂被提供为通过悬浮具有与季芳族物质具有两个砜基，其中氮杂环和苯基的化合物（II）苯乙烯基化合物（I）获得的聚乙烯醇基聚合物化合物（1）的含量为0.5〜10摩尔％，而（II）的含量为0.1〜20摩尔％。

3. 发明公开

EP0353666A3 Photosensitive agent,photosensitive resin composition containing same, and method of image formation using the composition 失效
标题翻译：感光剂，含有相同的感光性树脂组合物，以及使用该组合物的图像形成方法
公开(公告)号：EP0353666A3
公开(公告)日：1990-05-23
申请号：EP89114025.3
申请日：1989-07-28
申请人： TOYO GOSEI KOGYO CO., LTD.
发明人： Tochizawa, Noriaki , Kikuchi, Hideo
IPC分类号： G03F7/008
CPC分类号： G03F7/008
摘要： A photosensitive agent which is an aromatic diazide compound of Formula (I), a photosensitive resin composition using the photosensitive agent which undergoes less swelling on developing with water and has good resolution, and an image formation method including coating the photosensitive resin composition on a substrate, exposure, and developing by an aqueous developing solution.
摘要翻译：作为式（I）的芳香族二叠氮化合物的感光性试剂，使用感光性化合物的感光性树脂组合物，其在水中显影时的溶胀少，分辨性好，以及将感光性树脂组合物涂布在基材上的图像形成方法，曝光和显影。 e

4. 发明公开

EP0353666A2 Photosensitive agent,photosensitive resin composition containing same, and method of image formation using the composition 失效
标题翻译：感光剂，其使用该组合物含有本光敏树脂组合物和图像形成方法。
公开(公告)号：EP0353666A2
公开(公告)日：1990-02-07
申请号：EP89114025.3
申请日：1989-07-28
申请人： TOYO GOSEI KOGYO CO., LTD.
发明人： Tochizawa, Noriaki , Kikuchi, Hideo
IPC分类号： G03F7/008
CPC分类号： G03F7/008
摘要： A photosensitive agent which is an aromatic diazide compound of Formula (I), a photosensitive resin composition using the photosensitive agent which undergoes less swelling on developing with water and has good resolution, and an image formation method including coating the photosensitive resin composition on a substrate, exposure, and developing by an aqueous developing solution.
摘要翻译：感光剂的所有其是式（I）的芳族二叠氮化物化合物，使用的是哪个下推移较少肿胀与水显影，并具有良好的分辨率的感光剂的感光性树脂组合物，以及图像形成方法包括在基材涂布感光性树脂组合物，曝光，并在wässrige开发通过开发解决方案。电子

5. 发明授权

EP1128214B1 Photosensitive compound and photosensitive resin 有权
标题翻译：光敏化合物和光敏树脂
公开(公告)号：EP1128214B1
公开(公告)日：2009-11-04
申请号：EP01103264.6
申请日：2001-02-12
申请人： TOYO GOSEI KOGYO CO., LTD.
发明人： Tada, Kentaro, c/o Photosensitive Mater. Research Lab. , Shibuya, Toru, c/o Photosensitive Mater. Research Lab.
IPC分类号： G03F7/012 , G03F7/00 , C08F116/38
CPC分类号： G03F7/012 , G03F7/0007

6. 发明授权

EP0978764B1 Photosensitive resin derived from saponified poly(vinyl acetate), photosensitive resin composition containing the resin, and pattern formation method making use of the composition 有权
标题翻译：使用形成图案皂化聚醋酸乙烯酯，该含树脂的光敏组合物的基础上的光敏树脂，以及方法，所述组合物
公开(公告)号：EP0978764B1
公开(公告)日：2003-07-02
申请号：EP99115407.1
申请日：1999-08-04
申请人： Toyo Gosei Kogyo Co., Ltd.
发明人： Tochizawa, Noriaki, c/o Toyo Gosei Kogyo Co., Ltd. , Miyazaki, Mitsuharu, c/o Toyo Gosei Kogyo Co.,Ltd. , Ito, Takaho, c/o Toyo Gosei Kogyo Co., Ltd.
IPC分类号： G03F7/038 , G03F7/00
CPC分类号： G03F7/0005 , G03F7/0388 , Y10S430/11

7. 发明授权

EP0483693B1 Photosensitive colored resin composition, colored image formation method of color filter, and formation method of black matrix 失效
标题翻译：一种感光性着色树脂，彩色图像，用于生产滤色器的方法和一种制造黑色矩阵的方法
公开(公告)号：EP0483693B1
公开(公告)日：1998-12-30
申请号：EP91118267.3
申请日：1991-10-25
申请人： TOYO GOSEI KOGYO CO., LTD.
发明人： Kurata, Nobuyuki, c/o Photosensitive Mat. Res. Lab , Ishii, Keiji, c/o Photosensitive Mat. Res. Lab , Kikuchi, Hideo, c/o Photosensitive Mat. Res. Lab , Hayashi, Keiichi, c/o Photosensitive Mat. Res. Lab
IPC分类号： G03F7/039 , G03C7/12 , G03F7/00 , G03F7/022 , G02F1/1335
CPC分类号： G03F7/0007 , G02F1/133512 , G02F1/133514 , G02F1/133516 , G03F7/038

9. 发明公开

EP0580121A3 Photosensitive polyfunctional aromatic diazo compounds and photosensitive compositions using the same 失效
标题翻译：重氮芳族多官能化合物和含有它们的组合物。
公开(公告)号：EP0580121A3
公开(公告)日：1995-05-24
申请号：EP93111593.5
申请日：1993-07-20
申请人： TOYO GOSEI KOGYO CO., LTD.
发明人： Iida, Hirotada, c/o Photosensitive M.R. Lab. , Tochizawa, Noriaki, c/o Photosensitive M.R. Lab. , Kuniyoshi, Yasuo, c/o Photosensitive M.R. Lab. , Watanabe, Masaharu, c/o Photosensitive M.R. Lab. , Tokuda, Katsuyo, c/o Photosensitive M.R. Lab. , Hozumi, Ichiro, c/o Photosensitive M.R. Lab.
IPC分类号： G03F7/021 , G03F3/10 , G03F7/016
CPC分类号： G03F3/10 , G03F7/021
摘要： An aromatic diazo compound is composed mainly of a compound of Formula (I) or Formula (II), and a photosensitive composition using the same. The aromatic diazo compound can be handled under a white light, is highly photosensitive, has good shelf life, is highly soluble in organic solvents, adequate as a photosensitive agent for lithographic printing plates, can be easily developed with a developing solution composed mainly of an alkaline aqueous solution, and has an appropriate water solubility as a screen printing plate: Formula (I)
wherein ℓ, m, and n are integers where ℓ = 2 to 10, m = 0 to 5, n = 0 to 5, and ℓ + m + n = 2 to 20.
R 1 and R 2 are independently hydrogen, or alkyl or alkyloxy of 1 to 8 carbon atoms; G 1 is a substituent derived from alcoholic hydroxyl group; G 2 is hydroxyl or the same group as G 1 ; Q is a polyvalent group generated by reacting a compound having a reactivity to at least two oxiranes with carbon of the oxirane ring; Q 1 is a monovalent group generated by reacting a compound having a reactivity to oxirane with carbon of the oxirane ring; R 3 is alkyl or substituted alkyl of 1 to 8 carbon atoms, aralkyl or substituted aralkyl of 7 to 14 carbon atoms, or Q 1 -CH 2 CHG 2 -CH 2 -; X- is an anion based on protonic acid from which a proton is removed. Formula (II)
wherein n 1 to n' are integers from 0 to 10; n 1 + n 2 + n 3 + ... + n i = 2 to 20; R 1 , R 2 , R 3 and X- are respectively the same as those in Formula (I); G 2 is hydroxyl or the same group as G 1 in Formula (I), and the number of hydroxyl groups represented by G 2 in one molecule of a diazo compound of Formula (II) is 0 to 10, and the number of groups same as G 1 is 2 to 20; Q 2 1 to Q 2 i and Q s are the same or two or more different groups, and are divalent groups generated by reacting a compound which one molecule being reactable with two oxirane rings with carbons of two oxirane rings; R 4 is the same as Q 1 or G 2 in Formula (I), or Formula (III). Formula (III)
wherein X-, R 1 , R 2 , and R 3 are the same as in Formula (I).

10. 发明公开

EP0580121A2 Photosensitive polyfunctional aromatic diazo compounds and photosensitive compositions using the same 失效
标题翻译： Diazo-aromatische polyfunktionellen Verbindungen und sie enthaltende Zusammensetzungen。
公开(公告)号：EP0580121A2
公开(公告)日：1994-01-26
申请号：EP93111593.5
申请日：1993-07-20
申请人： TOYO GOSEI KOGYO CO., LTD.
发明人： Iida, Hirotada, c/o Photosensitive M.R. Lab. , Tochizawa, Noriaki, c/o Photosensitive M.R. Lab. , Kuniyoshi, Yasuo, c/o Photosensitive M.R. Lab. , Watanabe, Masaharu, c/o Photosensitive M.R. Lab. , Tokuda, Katsuyo, c/o Photosensitive M.R. Lab. , Hozumi, Ichiro, c/o Photosensitive M.R. Lab.
IPC分类号： G03F7/021 , G03F3/10 , G03F7/016
CPC分类号： G03F3/10 , G03F7/021
摘要： An aromatic diazo compound is composed mainly of a compound of Formula (I) or Formula (II), and a photosensitive composition using the same. The aromatic diazo compound can be handled under a white light, is highly photosensitive, has good shelf life, is highly soluble in organic solvents, adequate as a photosensitive agent for lithographic printing plates, can be easily developed with a developing solution composed mainly of an alkaline aqueous solution, and has an appropriate water solubility as a screen printing plate: Formula (I)

wherein ℓ, m, and n are integers where ℓ = 2 to 10, m = 0 to 5, n = 0 to 5, and ℓ + m + n = 2 to 20.

R 1 and R 2 are independently hydrogen, or alkyl or alkyloxy of 1 to 8 carbon atoms;
G 1 is a substituent derived from alcoholic hydroxyl group;
G 2 is hydroxyl or the same group as G 1 ;
Q is a polyvalent group generated by reacting a compound having a reactivity to at least two oxiranes with carbon of the oxirane ring;
Q 1 is a monovalent group generated by reacting a compound having a reactivity to oxirane with carbon of the oxirane ring;
R 3 is alkyl or substituted alkyl of 1 to 8 carbon atoms, aralkyl or substituted aralkyl of 7 to 14 carbon atoms, or Q 1 -CH 2 CHG 2 -CH 2 -;
X- is an anion based on protonic acid from which a proton is removed. Formula (II)

wherein n 1 to n' are integers from 0 to 10; n 1 + n 2 + n 3 + ... + n i = 2 to 20; R 1 , R 2 , R 3 and X- are respectively the same as those in Formula (I);
G 2 is hydroxyl or the same group as G 1 in Formula (I), and the number of hydroxyl groups represented by G 2 in one molecule of a diazo compound of Formula (II) is 0 to 10, and the number of groups same as G 1 is 2 to 20;
Q 2 1 to Q 2 i and Q s are the same or two or more different groups, and are divalent groups generated by reacting a compound which one molecule being reactable with two oxirane rings with carbons of two oxirane rings;
R 4 is the same as Q 1 or G 2 in Formula (I), or Formula (III). Formula (III)

wherein X-, R 1 , R 2 , and R 3 are the same as in Formula (I).
摘要翻译：芳族重氮化合物主要由式（I）或式（II）的化合物和使用其的光敏组合物组成。芳族重氮化合物可以在白光下处理，具有高光敏性，保质期好，易溶于有机溶剂，作为平版印刷版的光敏剂，可以容易地用主要由碱性水溶液，并且具有适当的水溶性作为丝网印刷版：式（I）其中l，m和n是整数，其中l = 2至10，m = 0至5，n = 0至5 ，且l + m + n = 2至20.R 1和R 2独立地为氢，或1至8个碳原子的烷基或烷氧基; G 1是衍生自醇羟基的取代基; G 2是羟基或与G 1相同的基团; Q是通过使具有至少两个环氧乙烷的反应性的化合物与环氧乙烷环的碳反应而产生的多价基团; Q 1是通过使环氧乙烷具有反应性的化合物与环氧乙烷环的碳反应而生成的一价基团; R 3是具有1至8个碳原子的烷基或取代的烷基，7至14个碳原子的芳烷基或取代的芳烷基，或Q 1 -CH 2 CHG 2 -CH 2 - ; X - 是基于质子被除去的质子酸的阴离子。式（II）其中n 1至n i为0至10的整数; n 1 + n 2 + n 3 + ... + n = 2〜20; R 1，R 2，R 3和X 5分别与式（I）中相同; 式（I）中G 2是羟基或与G 1相同的基团，一分子式（II）的重氮化合物中由G 2表示的羟基数为0〜10，与G 1相同的基团数为2〜20; Q2为Q2，Q为相同或两个或更多个不同的基团，并且是通过使一个分子可与两个环氧乙烷环反应的化合物与两个环氧乙烷环的碳反应而产生的二价基团; R 4与式（I）或式（III）中的Q1或G 2相同。式（III）其中X 1，R 1，R 2和R 3与式（I）中相同。

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