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1. 发明公开

EP3251760A1 DEBRIS REMOVAL FROM HIGH ASPECT STRUCTURES 审中-公开
公开(公告)号：EP3251760A1
公开(公告)日：2017-12-06
申请号：EP17172132.7
申请日：2017-05-22
申请人： Rave LLC
发明人： ROBINSON, Tod Evan , ARRUZA, Bernabe J. , ROESSLER, Kenneth Gilbert , BRINKLEY, David , LECLAIRE, Jeffrey E.
IPC分类号： B08B7/00 , G03F1/82 , G03F1/84 , G03F7/20
CPC分类号： G03F1/82 , B08B7/0028 , B08B7/0035 , G01N23/2252 , G01N23/2273 , G01N2021/95676 , G01N2223/6116 , G01N2223/652 , G01Q20/02 , G01Q60/42 , G01Q70/12 , G01Q80/00
摘要： A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.

2. 发明授权

EP2198451B1 DEBRIS REMOVAL IN HIGH ASPECT STRUCTURES 有权转让
标题翻译：异物取出结构中的具有高长径比
公开(公告)号：EP2198451B1
公开(公告)日：2016-07-13
申请号：EP08832334.0
申请日：2008-09-16
申请人： Rave LLC
发明人： ROBINSON, Tod Evan , ARRUZA, Bernabe J. , ROESSLER, Kenneth Gilbert
IPC分类号： B08B1/00 , B08B7/00 , G03F7/20 , H01L21/304 , B03C7/00
CPC分类号： G03F7/70925 , B03C7/006 , B08B1/00 , B08B7/0028 , G03F1/72 , G03F1/82

3. 发明公开

EP2198451A4 DEBRIS REMOVAL IN HIGH ASPECT STRUCTURES 有权转让
标题翻译：布鲁塞尔麻省理工学院的霍华芬
公开(公告)号：EP2198451A4
公开(公告)日：2014-05-14
申请号：EP08832334
申请日：2008-09-16
申请人： RAVE LLC
发明人： ROBINSON TOD EVAN , ARRUZA BERNABE J , ROESSLER KENNETH GILBERT
IPC分类号： H01L21/304 , B03C7/00 , B08B1/00 , B08B7/00
CPC分类号： G03F7/70925 , B03C7/006 , B08B1/00 , B08B7/0028 , G03F1/72 , G03F1/82

4. 发明公开

EP3467586A1 METHOD AND APPARATUS FOR PELLICLE REMOVAL 有权转让
公开(公告)号：EP3467586A1
公开(公告)日：2019-04-10
申请号：EP18209474.8
申请日：2016-07-27
申请人： Rave LLC
发明人： Grenon, Brian J. , Boyette, James
IPC分类号： G03F1/64
摘要： A method and apparatus (100) for removing a pellicle (170) from a photomask (156, 174, 210) wherein the adhesive (206) between the pellicle frame (158, 172, 204) and photomask (156, 174, 210) is cooled sufficiently to allow the adhesive property of the adhesive (206) to diminish to the point where the adhesive (206) will release from the photomask (156, 174, 210) with little or no mechanical force and leaving minimal adhesive (206) on the photomask (156, 174, 210). The adhesive (206) is cooled by way of manifolds (176, 178, 180, 182) containing coolant being brought in contact with the pellicle frame (158, 172, 204) or by way of a coolant spray nozzles (202) spraying coolant directly onto the pellicle frame (158, 172, 204).

5. 发明授权

EP2178655B1 APPARATUS AND METHOD FOR INDIRECT SURFACE CLEANING 有权转让
公开(公告)号：EP2178655B1
公开(公告)日：2018-09-19
申请号：EP08796835.0
申请日：2008-07-30
申请人： Rave, LLC
发明人： LECLAIRE, Jeffrey E. , ROESSLER, Kenneth Gilber , BRINKLEY, David
IPC分类号： G03C5/00 , H01L21/00 , G03F1/00 , B08B7/00 , G03F1/82
CPC分类号： B08B7/0042 , G03F1/82 , Y10S134/902
摘要： A method for laser surface cleaning of a target surface that has limited or no access to the environment directly above the surface to be cleaned. The method includes the ability to clean the surface with a reduced risk of substrate damage. The method includes direct laser excitation of a contaminated substrate surface and thermal transfer from the substrate to the contaminating particulate or contamination layer. The method also includes producing a thermally based removal and reducing a risk of substrate damage by keeping the temperature required to produce surface cleaning below the thermal damage level of the substrate material. In addition, the method includes reducing the risk of substrate damage by utilizing relatively long pulse-widths, providing for improved removal of small contaminants/particles, and directing the beam through a material disposed relative to the surface that is part of the substrates environmental enclosure.

6. 发明公开

EP3260916A1 METHOD AND APPARATUS FOR PELLICLE REMOVAL 有权转让
标题翻译：用于去除毛细血管的方法和设备
公开(公告)号：EP3260916A1
公开(公告)日：2017-12-27
申请号：EP16181371.2
申请日：2016-07-27
申请人： Rave LLC
发明人： Grenon, Brian J. , Boyette, James
IPC分类号： G03F1/64
CPC分类号： G03F1/64 , G03F7/70983
摘要： A method and apparatus (100) for removing a pellicle (170) from a photomask (156, 174, 210) wherein the adhesive (206) between the pellicle frame (158, 172, 204) and photomask (156, 174, 210) is cooled sufficiently to allow the adhesive property of the adhesive (206) to diminish to the point where the adhesive (206) will release from the photomask (156, 174, 210) with little or no mechanical force and leaving minimal adhesive (206) on the photomask (156, 174, 210). The adhesive (206) is cooled by way of manifolds (176, 178, 180, 182) containing coolant being brought in contact with the pellicle frame (158, 172, 204) or by way of a coolant spray nozzles (202) spraying coolant directly onto the pellicle frame (158, 172,204).
摘要翻译：一种用于从光掩模（156,174,210）去除薄膜（170）的方法和装置（100），其中薄膜框架（158,172,204）和光掩模（156,174,210）之间的粘合剂（206）被充分冷却以允许粘合剂（206）的粘合性降低到粘合剂（206）将从光掩模（156,174,210）释放而几乎没有或没有机械力并且留下最小的粘合剂（206）的程度。在光掩模（156,174,210）上。通过含有冷却剂的歧管（176,178,180,182）与防护薄膜组件框架（158,172,204）接触或通过冷却剂喷嘴（202）喷洒冷却剂（202）来冷却粘合剂（206）直接在薄膜框架（158,172,204）上。

7. 发明授权

EP3147937B1 DEBRIS REMOVAL FROM A TRENCH FORMED ON A PHOTOLITHOGRAPHIC MASK 有权转让
公开(公告)号：EP3147937B1
公开(公告)日：2020-07-15
申请号：EP16178942.5
申请日：2008-09-16
申请人： Rave LLC
发明人： Robinson, Tod Evan , Arruza, Bernabe J. , Roessler, Kenneth Gilbert
IPC分类号： B08B1/00 , B08B7/00 , B03C7/00 , G03F1/72 , G03F7/20 , G03F1/82

8. 发明公开

EP3408707A1 DEBRIS REMOVAL FROM HIGH ASPECT STRUCTURES 审中-公开
公开(公告)号：EP3408707A1
公开(公告)日：2018-12-05
申请号：EP17744875.0
申请日：2017-01-26
申请人： Rave LLC
发明人： ROBINSON, Tod
IPC分类号： G03F1/82 , G03F7/00 , G01Q70/12 , B08B1/00 , B08B7/00
CPC分类号： B08B7/0028 , G01Q60/42 , G01Q70/12 , G01Q80/00 , G03F1/82
摘要： A system for removing debris from a surface of a substrate, the system including a cantilever arm and a tip supported by the cantilever arm. The tip has a proximal portion and a distal portion such that the tip is supported by the cantilever arm via the proximal portion. The system further includes at least one nanofibril attached to the distal portion of the tip, and the at least one nanofibril is configured to elastically deform against or around the debris or the surface of the substrate.

9. 发明公开

EP3272432A2 DEBRIS REMOVAL FROM HIGH ASPECT STRUCTURES 有权转让
标题翻译：从高高度结构去除残骸
公开(公告)号：EP3272432A2
公开(公告)日：2018-01-24
申请号：EP17172136.8
申请日：2017-05-22
申请人： Rave LLC
发明人： ROBINSON, Tod Evan , ARRUZA, Bernabe J. , ROESSLER, Kenneth Gilbert , BRINKLEY, David , LECLAIRE, Jeffrey E.
IPC分类号： B08B7/00 , G03F1/82
CPC分类号： G03F1/72 , G01N23/2252 , G01N23/2273 , G01N2021/95676 , G01N2223/6116 , G01N2223/652 , G01Q20/02 , G01Q60/42 , G01Q70/12 , G01Q80/00
摘要： A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.
摘要翻译：用于收集和分析纳米加工过程中使用的尖端碎片的碎片收集和测量系统，该系统包括辐照源，辐照检测器，致动器和控制器。照射源可操作以将入射照射引导至尖端，并且照射检测器可操作以接收来自尖端的样本照射，样本照射是由于直接入射照射施加至尖端而产生的。控制器可操作地耦合到致动器系统和辐射检测器，并且控制器可操作以基于辐照检测器对样本辐照的第一响应接收第一信号，并且控制器可操作以实现尖端以及基于第一信号的照射源和照射检测器中的至少一个。

10. 发明公开

EP2178655A4 APPARATUS AND METHOD FOR INDIRECT SURFACE CLEANING 有权转让
标题翻译：用于间接表面清洁的装置和方法
公开(公告)号：EP2178655A4
公开(公告)日：2014-05-07
申请号：EP08796835
申请日：2008-07-30
申请人： RAVE LLC
发明人： LECLAIRE JEFFREY E , ROESSLER KENNETH GILBER , BRINKLEY DAVID
IPC分类号： G03C5/00 , B08B7/00 , G03F1/00 , G03F1/82 , H01L21/00
CPC分类号： B08B7/0042 , G03F1/82 , Y10S134/902
摘要： A method for laser surface cleaning of a target surface that has limited or no access to the environment directly above the surface to be cleaned. The method includes the ability to clean the surface with a reduced risk of substrate damage. The method includes direct laser excitation of a contaminated substrate surface and thermal transfer from the substrate to the contaminating particulate or contamination layer. The method also includes producing a thermally based removal and reducing a risk of substrate damage by keeping the temperature required to produce surface cleaning below the thermal damage level of the substrate material. In addition, the method includes reducing the risk of substrate damage by utilizing relatively long pulse-widths, providing for improved removal of small contaminants/particles, and directing the beam through a material disposed relative to the surface that is part of the substrates environmental enclosure.
摘要翻译：一种用于目标表面的激光表面清洁的方法，该方法在待清洁的表面正上方限制或不接近环境。该方法包括以较低的底物损伤风险清洁表面的能力。该方法包括对污染的基底表面的直接激光激发和从基底到污染颗粒或污染层的热传递。该方法还包括通过将产生表面清洁所需的温度保持在基底材料的热损伤水平以下来产生基于热的去除并降低基底损伤的风险。此外，该方法包括通过利用相对较长的脉冲宽度降低衬底损伤的风险，提供改善的小污染物/颗粒的去除以及引导光束通过相对于作为衬底环境外壳的一部分的表面设置的材料。

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