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81. 发明公开

EP3078693A1 BLOCK COPOLYMER 有权
标题翻译：嵌段共聚物
公开(公告)号：EP3078693A1
公开(公告)日：2016-10-12
申请号：EP14868480.6
申请日：2014-12-09
申请人： LG Chem, Ltd.
发明人： LEE, Je Gwon , KIM, Jung Keun , PARK, No Jin , LEE, Mi Sook , KU, Se Jin , CHOI, Eun Young , YOON, Sung Soo
IPC分类号： C08F297/00 , C08F299/00 , C08F212/08 , C08F220/10 , C08L53/00 , C08J5/18
CPC分类号： C08F293/005 , B81C1/00428 , B81C1/00531 , B81C2201/0149 , B82Y40/00 , C07C35/48 , C07C43/215 , C07C43/225 , C07C217/84 , C07C2601/16 , C07D209/48 , C07F7/1852 , C08F12/20 , C08F12/22 , C08F12/26 , C08F12/32 , C08F212/14 , C08F220/10 , C08F220/30 , C08F2438/03 , C08J5/18 , C08J7/123 , C08J7/14 , C08J2353/00 , C09D153/00 , G03F7/0002 , G03F7/038 , G03F7/039 , G03F7/162
摘要： The present application provides the block copolymers and their application. The present application may provide the block copolymers that have excellent self assembling and phase separation properties and therefore that can be effectively used in various applications. The present application may also provide applications of the block copolymers.
摘要翻译：本申请提供了嵌段共聚物及其应用。本申请可以提供具有优异的自组装性和相分离性并因此可以有效用于各种应用的嵌段共聚物。本申请还可以提供嵌段共聚物的应用。

82. 发明公开

EP3078690A1 BLOCK COPOLYMER 有权
公开(公告)号：EP3078690A1
公开(公告)日：2016-10-12
申请号：EP14867923.6
申请日：2014-12-08
申请人： LG Chem, Ltd.
发明人： KIM, Jung Keun , LEE, Jeong Kyu , LEE, Je Gwon , LEE, Mi Sook , PARK, No Jin , KU, Se Jin , CHOI, Eun Young , OH, Sung Joon , YOON, Sung Soo
IPC分类号： C08F297/00 , C08F299/00 , C08F212/08 , C08F220/10 , C08L53/00 , C08J5/18
CPC分类号： C08F293/005 , B81C1/00428 , B81C1/00531 , B81C2201/0149 , B82Y40/00 , C07C35/48 , C07C43/215 , C07C43/225 , C07C217/84 , C07C2601/16 , C07D209/48 , C07F7/1852 , C08F12/20 , C08F12/22 , C08F12/26 , C08F12/32 , C08F212/14 , C08F220/10 , C08F220/30 , C08F2438/03 , C08J5/18 , C08J7/123 , C08J7/14 , C08J2353/00 , C09D153/00 , G03F7/0002 , G03F7/038 , G03F7/039 , G03F7/162
摘要： The present application provides the block copolymers and their application. The present application may provide the block copolymers that have excellent self assembling and phase separation properties and therefore that can be effectively used in various applications. The present application may also provide applications of the block copolymers.

83. 发明公开

EP3078687A1 BLOCK COPOLYMER 审中-公开
公开(公告)号：EP3078687A1
公开(公告)日：2016-10-12
申请号：EP14867501.0
申请日：2014-12-08
申请人： LG Chem, Ltd.
发明人： LEE, Je Gwon , KIM, Jung Keun , PARK, No Jin , YOON, Sung Soo
IPC分类号： C08F297/00 , C08F299/00 , C08F212/14 , C08F212/12 , C08F220/10 , C08F220/30 , C08F216/12 , C08L55/00 , C08J5/00 , C08J7/04
CPC分类号： C08F293/005 , B81C1/00428 , B81C1/00531 , B81C2201/0149 , B82Y40/00 , C07C35/48 , C07C43/215 , C07C43/225 , C07C217/84 , C07C2601/16 , C07D209/48 , C07F7/1804 , C08F12/20 , C08F12/22 , C08F12/26 , C08F12/32 , C08F212/14 , C08F220/10 , C08F220/30 , C08F2438/03 , C08J5/18 , C08J7/123 , C08J7/14 , C08J2353/00 , C09D153/00 , G03F7/0002 , G03F7/038 , G03F7/039 , G03F7/162
摘要： The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.

84. 发明授权

EP2530526B1 Vorrichtung zum Drehbelacken von Substraten 有权
标题翻译：一种用于基板的Drehbelacken
公开(公告)号：EP2530526B1
公开(公告)日：2016-03-23
申请号：EP12170047.0
申请日：2012-05-30
申请人： Solar-Semi GmbH
发明人： Muffler, Pirmin
IPC分类号： G03F7/16
CPC分类号： G03F7/162 , H01L21/6715 , H01L21/6719 , H01L21/68735

85. 发明授权

EP1999779B1 VORRICHTUNG UND VERFAHREN ZUM BESCHICHTEN EINES MIKRO- UND/ODER NANOSTRUKTURIERTEN STRUKTURSUBSTRATS SOWIE BESCHICHTETES STRUKTURSUBSTRAT 有权
标题翻译： DEVICE AND METHOD FOR涂层的微观和/或纳米结构的结构基材和涂布结构体基板
公开(公告)号：EP1999779B1
公开(公告)日：2014-09-10
申请号：EP07723216.3
申请日：2007-03-13
申请人： Thallner, Erich
发明人： Thallner, Erich
IPC分类号： G03F7/16 , H01L21/67
CPC分类号： H01L21/6715 , G03F7/162

86. 发明公开

EP2635936A2 ANORDNUNG ZUR HERSTELLUNG VON STRUKTURIERTEN SUBSTRATEN 有权
标题翻译：安排结构化基底生产
公开(公告)号：EP2635936A2
公开(公告)日：2013-09-11
申请号：EP11818940.6
申请日：2011-11-07
申请人： Centofex LDA & Comandita
发明人： THIEL, Klaus-Peter , BOHNET, Hans
IPC分类号： G03F7/16
CPC分类号： H01L21/02104 , B05C11/08 , B05C11/1039 , B05C13/02 , G03F7/162 , G03F7/3021 , G03F7/3092 , H01L21/67051 , H01L21/6708
摘要： The invention relates to an arrangement for producing structured substrates. Said arrangement comprises a device for applying layer systems (1) including a device for applying liquid materials (2), in particular photopolymer solutions, to rotating substrates, a housing (6), a rotating holder (3) for the substrate to be coated, a feeder (13) for liquid materials to be applied, and a collection device (4) that includes multiple removal contraptions (5) for liquid materials that do not remain on the substrate. The housing (6) of the device for applying liquid materials (2) is filled with an inert gas, in particular dried, molecular nitrogen, noble gas, or a mixture thereof. The additional receptacles and conduits of the arrangement for producing structured substrates are gas-tight and are designed such that an inert molecular nitrogen or noble gas atmosphere is created above the liquid contents thereof. The collection device (4) has various collection zones (9) in which different liquid materials can be selectively collected and selectively removed via the associated removal contraption (5). Said design of the arrangement for producing structured substrates allows to improve the quality of the production process and significantly lower the cost of the process as the quantity of photopolymers and other liquid materials required for the production process can be drastically reduced.

87. 发明公开

EP1693886A4 SUBSTRATE TREATMENT DEVICE CONTROL METHOD AND SUBSTRATE TREATMENT DEVICE 审中-公开
标题翻译：基板处理设备控制方法及基板管理设备
公开(公告)号：EP1693886A4
公开(公告)日：2011-08-17
申请号：EP04820143
申请日：2004-11-30
申请人： TOKYO ELECTRON LTD
发明人： SHINOZUKA S , WADA S , YAMASHITA MASAMI
IPC分类号： G05B19/418 , H01L21/027 , G03F7/16 , G03F7/30 , H01L21/00 , H01L21/02 , H01L21/677 , H01L21/68
CPC分类号： H01L21/67745 , G03F7/162 , G03F7/3021 , H01L21/67276

88. 发明公开

EP1830393A4 PHOTORESIST COATING LIQUID SUPPLYING APPARATUS, AND PHOTORESIST COATING LIQUID SUPPLYING METHOD AND PHOTORESIST COATING APPARATUS USING SUCH PHOTORESIST COATING LIQUID SUPPLYING APPARATUS 有权
标题翻译：设备用于将光致抗蚀剂涂布液及摄食法光致抗蚀剂包衣液和光致抗蚀剂涂覆装置，这种装置用于将光致抗蚀剂涂布液
公开(公告)号：EP1830393A4
公开(公告)日：2010-04-14
申请号：EP05809597
申请日：2005-11-25
申请人： AZ ELECTRONIC MATERIALS USA
发明人： TANIGUCHI KATSUTO , KOJIMA KAZUHIRO , NOYA ATSUKO
IPC分类号： H01L21/027 , B05C5/02 , B05C11/10 , B05D3/00 , G03F7/16
CPC分类号： G03F7/162 , B05C11/10

89. 发明授权

EP1868229B1 Liquid processing apparatus 有权
标题翻译：流体处理装置
公开(公告)号：EP1868229B1
公开(公告)日：2010-01-13
申请号：EP07011675.1
申请日：2007-06-14
申请人： TOKYO ELECTRON LIMITED
发明人： Ito, Norihiro
IPC分类号： H01L21/00 , B05C11/02 , G03F7/16
CPC分类号： G03F7/162 , G03F7/3021 , H01L21/6704 , H01L21/67051 , H01L21/67075 , H01L21/6708 , H01L21/68728 , H01L21/68742 , H01L21/68785 , H01L21/68792 , Y10S134/902

90. 发明公开

EP1845416A3 Coating compositions for photolithography 审中-公开
标题翻译：用于光刻的涂料组合物
公开(公告)号：EP1845416A3
公开(公告)日：2009-05-20
申请号：EP07007293.9
申请日：2007-04-10
申请人： Rohm and Haas Electronic Materials, L.L.C.
发明人： Gallagher, Michael K. , Zampini, Anthony , Ongayi, Owendi
IPC分类号： G03F7/11 , G03F7/09 , G03F7/32
CPC分类号： G03F7/11 , G03F7/038 , G03F7/039 , G03F7/091 , G03F7/162 , G03F7/168 , G03F7/20 , G03F7/32 , G03F7/322 , G03F7/38 , G03F7/40 , H01L21/0275 , H01L21/0276
摘要： In a first aspect, methods are provided that comprise : (a) applying a curable composition on a substrate; (b) applying a hardmask composition above the curable composition; (c) applying a photoresist composition layer above the hard mask composition, wherein one or more of the compositions are removed in an ash-free process. In a second aspect, methods are provided that comprise (a) applying an organic composition on a substrate; (b) applying a photoresist composition layer above the organic composition, wherein the organic composition comprises a material that produce an alkaline-soluble group upon thermal and/or radiation treatment. Related compositions also are provided.

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