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    • 72. 发明公开
    • Method of protecting or shielding a device from oxygen within a glass-melting furnace
    • 一种用于在玻璃熔化池保护或屏蔽的装置从氧方法。
    • EP0164809A1
    • 1985-12-18
    • EP85200916.6
    • 1982-11-04
    • Corning Glass Works
    • Palmquist, Ronald WilliamCarley, Harold James
    • C03B5/16C03B5/027C03B5/18
    • C03B5/1672C03B5/027C03B5/0275C03B5/167C03B5/185
    • A method is disclosed for protecting or shielding a device such as an electrode (130,130', 130") within a glass-melting furnace (110), the device (130,130', 130") being maintained at elevated temperatures above an oxidizing temperature thereof. The device (130,130', 130") is dipped into the molten glass (112) to a selected immersion level (D2) along a selected length thereof susceptible to temperatures in excess of the oxidation temperature, and maintained at the immersion level (D2) for a sufficient time to allow the molten glass to adhere to and coat the device over said selected length. The device with its adhered molten glass coating (140) is withdrawn from the molten glass at least to a selected operating level (D1) above the immersion level (D2) such that the device is shielded from oxidizing agents along the selected length.
    • 一种方法,光盘游离缺失用于保护或屏蔽寻求作为电极的装置(130,130分钟,130秒)的玻璃熔融炉(110),所述设备(130,130分钟,130秒)内保持在上述升高的温度下 到它们的氧化温度。 的装置(130,130分钟,130秒)被浸入熔融玻璃(112)到所选择的沉浸程度(D2)沿一选定的长度上易受过量氧化温度的温度,并保持在沉浸程度( D2)足够的时间以允许所述熔融玻璃粘附到并涂覆设备在所述选择的长度。 与它附着的熔融玻璃涂层(140)的装置,从熔融玻璃中取出至少浸没水平(D2)之上的选择的操作电平(D1)研究做该装置从氧化沿着所选择的长度剂屏蔽。