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71. 发明公开

EP3037573A4 PLATING APPARATUS AND SENSING DEVICE USING SAME 有权
标题翻译：巴勒斯坦权力机构（PLATTIERUNGSVORRICHTUNG UND ERFASSUNGSVORRICHTUNG DAMIT）
公开(公告)号：EP3037573A4
公开(公告)日：2017-04-19
申请号：EP14837234
申请日：2014-07-31
申请人： YAMAMOTO-MS CO LTD , UNIV WASEDA
发明人： YAMAMOTO WATARU , KOIWA KIMIKO , HOMMA TAKAYUKI , YANAGISAWA MASAHIRO , SAITO MIKIKO , YAMAMOTO TOMOYUKI
IPC分类号： C25D17/08 , C23C18/16 , C25D17/00 , C25D17/06 , C25D17/12 , C25D21/12 , G01N27/42
CPC分类号： C23C18/1619 , C23C18/163 , C23C18/1683 , C25D17/001 , C25D17/002 , C25D17/004 , C25D17/008 , C25D17/06 , C25D17/10 , C25D17/12 , C25D21/12
摘要： A plating apparatus (1) includes: a holding member (2) that holds a plated object (W); a spacer (4) that is stacked on the holding member (2) via a first seal member (3) in an annular shape surrounding the plated object (W), and has a through portion (45) from which the plated object (W) is exposed and which stores a plating solution; and an anode member (6) that is stacked on the spacer (4) via a second seal member (3) in an annular shape surrounding the through portion (45), and has an anode layer (62) arranged to face the plated object (W) which is exposed from the through portion (45).
摘要翻译：电镀装置（1）包括：保持电镀对象（W）的保持构件（2）; 经由第一密封构件（3）以包围电镀对象（W）的环形形状堆叠在保持构件（2）上的间隔物（4），并且具有贯通部（45），电镀对象）暴露并存储电镀液; 以及阳极部件（6），其通过围绕所述贯通部（45）的环状的第二密封部件（3）堆叠在所述间隔件（4）上，并且具有布置成面向所述镀覆对象物的阳极层（62）（W）从所述贯通部（45）露出。

72. 发明公开

EP3009535A4 HOLDING DEVICE, AND HIGH-SPEED PLATING DEVICE PROVIDED WITH SAME 审中-公开
标题翻译： HALTEVORRICHTUNG UND HOCHGESCHWINDIGKEITSPLATTIERUNGSVORRICHTUNG DAMIT
公开(公告)号：EP3009535A4
公开(公告)日：2017-03-22
申请号：EP14811070
申请日：2014-06-06
申请人： KYB CORP
发明人： MOCHIZUKI YOSHITAKA , MIYAZAKI TOSHIHISA , TAKAMATSU AKIRA
IPC分类号： C25D17/06 , C25D17/00 , C25D21/00
CPC分类号： C25D5/08 , C25D5/003 , C25D7/00 , C25D17/004 , C25D17/02 , C25D17/06 , C25D17/08 , C25D17/12
摘要： Providing a holding device which can hold a plurality of types of workpieces and can reliably prevent a liquid in a liquid tank from leaking. The holding device (40) includes a holding member (41) configured to hold an article (workpiece) (1) to be plated in a holding chamber (45). The article (1) is disposed over a liquid tank in which a plating solution (liquid) flows and the holding chamber (45) communicating with the liquid tank. The holding member (41) has a plurality of abutting parts (43) which closely abut against portions of an outer periphery of the article (1) at a same level thereby to hold the article (1) therebetween. The abutting parts (43) are formed of a sponge sheet (elastic body) with chemical resistance. The holding device includes a pressurizing unit (50) configured to supply air into the holding chamber (45) to pressurize an atmosphere in the holding chamber (45) while the article (1) is held by the holding member (41).
摘要翻译：提供能够保持多种类型的工件并且能够可靠地防止液体罐中的液体泄漏的保持装置。保持装置40具有保持要被电镀的物品（被加工物）1的保持部件41。物品（1）配置在电镀液（液体）流动的液槽和与液槽连通的保持室（45）的上方。保持构件41具有多个抵接部43，该抵接部43以与物品1的外周的一部分在同一水平面紧贴的方式将物品1夹持在其间。抵接部43由具有耐药性的海绵片（弹性体）形成。保持装置包括加压单元（50），该加压单元（50）被构造成在物品（1）被保持构件（41）保持的同时向保持室（45）中供给空气以加压保持室（45）中的气氛。

73. 发明公开

EP3064618A1 APPARATUS FOR USE IN AN ELECTROETCHING OR ELECTRODEPOSITION PROCESS AND AN ELECTROETCHING OR ELECTRODEPOSITION PROCESS 有权转让
标题翻译： VERRICHTUNG ZUR VERWENDUNG在ELEKTROÄTZ-ODER ELEKTROABSCHEIDUNGSVERFAHREN UNDELEKTROÄTZ-ODER ELEKTROABSCHEIDUNGSVERFAHREN
公开(公告)号：EP3064618A1
公开(公告)日：2016-09-07
申请号：EP16154750.0
申请日：2016-02-09
申请人： Rolls-Royce plc
发明人： Desai, Alpesh , Davis, Richard , Cook, Colin
IPC分类号： C25F3/14 , C25D5/04 , C25D17/06 , C25D17/12 , C25F7/00
CPC分类号： C25D5/00 , C25D5/04 , C25D7/04 , C25D17/007 , C25D17/06 , C25D17/08 , C25D17/12 , C25F3/02 , C25F3/14 , C25F7/00
摘要： There is disclosed an apparatus for use in an electroetching or electrodeposition process in which material is etched from or deposited onto the surface of an electrically conductive component. The apparatus comprises a support for supporting the component within a tank containing an electrolytic solution; and a first-polarity electrode arranged to be located within the tank and immersed in the electrolytic solution and shaped to surround at least a part of the component in a contactless manner. In use, an electric field produced by the first-polarity electrode results in an electric variance between at least a part of the component and a second-polarity electrode having a polarity opposite to that of the first-polarity electrode. An electroetching and an electrodeposition process are also disclosed.
摘要翻译：公开了一种用于电蚀或电沉积工艺的装置，其中材料从导电部件的表面上蚀刻或沉积到导电部件的表面上。该装置包括用于将部件支撑在包含电解液的罐内的支撑件; 以及第一极性电极，其布置成位于所述罐内并浸没在所述电解液中并成形为以非接触方式围绕所述部件的至少一部分。在使用中，由第一极性电极产生的电场导致部件的至少一部分与具有与第一极性电极极性相反的极性的第二极性电极之间的电差异。还公开了一种电蚀和电沉积方法。

74. 发明授权

EP2593587B1 FILLING OF A PRINTING CHAMBER AND A CHUCK THEREFORE 有权
标题翻译：灌装喇叭和Chuck THEREFOR的
公开(公告)号：EP2593587B1
公开(公告)日：2016-09-07
申请号：EP11748301.6
申请日：2011-07-13
申请人： Luxembourg Institute of Science and Technology (LIST)
发明人： MÖLLER, Patrik , LINDGREN, Lennart , SVENSSON, Stefan , CHAUVET, Jean-Michel , SANTOS, Antonio , FREDENBERG, Mikael
IPC分类号： C25D1/00 , C25D7/12 , C25D17/00 , C25D17/06 , C25D17/12 , C25D17/14
CPC分类号： C25D7/123 , C25D17/001 , C25D17/06 , C25D17/12 , C25D17/14

75. 发明公开

EP3009535A1 HOLDING DEVICE, AND HIGH-SPEED PLATING DEVICE PROVIDED WITH SAME 审中-公开
标题翻译：保持装置以及提供有该装置的高速电镀装置
公开(公告)号：EP3009535A1
公开(公告)日：2016-04-20
申请号：EP14811070.3
申请日：2014-06-06
申请人： KYB Corporation
发明人： MOCHIZUKI, Yoshitaka , MIYAZAKI, Toshihisa , TAKAMATSU, Akira
IPC分类号： C25D17/06 , C25D17/00 , C25D21/00
CPC分类号： C25D5/08 , C25D5/003 , C25D7/00 , C25D7/04 , C25D17/004 , C25D17/02 , C25D17/06 , C25D17/08 , C25D17/12
摘要： Providing a holding device which can hold a plurality of types of workpieces and can reliably prevent a liquid in a liquid tank from leaking. The holding device (40) includes a holding member (41) configured to hold an article (workpiece) (1) to be plated in a holding chamber (45). The article (1) is disposed over a liquid tank in which a plating solution (liquid) flows and the holding chamber (45) communicating with the liquid tank. The holding member (41) has a plurality of abutting parts (43) which closely abut against portions of an outer periphery of the article (1) at a same level thereby to hold the article (1) therebetween. The abutting parts (43) are formed of a sponge sheet (elastic body) with chemical resistance. The holding device includes a pressurizing unit (50) configured to supply air into the holding chamber (45) to pressurize an atmosphere in the holding chamber (45) while the article (1) is held by the holding member (41).
摘要翻译：提供能够保持多种类型的工件并且能够可靠地防止液体罐中的液体泄漏的保持装置。保持装置40具有保持要被电镀的物品（被加工物）1的保持部件41。物品（1）配置在电镀液（液体）流动的液槽和与液槽连通的保持室（45）的上方。保持构件41具有多个抵接部43，该抵接部43以与物品1的外周的一部分在同一水平面紧贴的方式将物品1夹持在其间。抵接部43由具有耐药性的海绵片（弹性体）形成。保持装置包括加压单元（50），该加压单元（50）被构造成在物品（1）被保持构件（41）保持的同时向保持室（45）中供给空气以加压保持室（45）中的气氛。

76. 发明授权

EP2625318B1 DEVICE FOR SINGLE-SIDED ELECTROLYTIC TREATMENT OF A FLAT SUBSTRATE 有权
标题翻译： VORRICHTUNG ZUR EINSEITIGEN ELEKTROLYTISCHEN BEHANDLUNG EINES FLACHEN SUBSTRATS
公开(公告)号：EP2625318B1
公开(公告)日：2016-04-13
申请号：EP11770893.3
申请日：2011-10-06
申请人： Meco Equipment Engineers B.V.
发明人： LOERMANS, Peter Jacobus Gerardus
IPC分类号： C25D5/02 , C25D7/12 , C25D17/00 , C25D17/06 , H01L31/18
CPC分类号： C25D5/028 , C25D17/001 , C25D17/005 , C25D17/06 , H01L31/0322 , H01L31/18 , Y02E10/541

77. 发明公开

EP2806469A4 PLATING APPARATUS AND PLATING METHOD FOR SOLAR CELL SUBSTRATE, IN WHICH ELECTROPLATING AND LIGHT-INDUCED PLATING ARE SIMULTANEOUSLY PERFORMED 有权
标题翻译：电镀镀层和太阳能电池基板与电镀同步实施与光致电镀
公开(公告)号：EP2806469A4
公开(公告)日：2015-10-07
申请号：EP13738076
申请日：2013-01-04
申请人： HOJIN PLATECH CO LTD
发明人： KIM PAN SOO , LEE DUK HAENG , JUNG WOON SUK
IPC分类号： H01L31/18 , C23C18/16 , C25D5/00 , C25D5/08 , C25D7/12 , C25D17/00 , C25D17/06 , C25D17/12 , C25D21/12 , H01L21/67 , H01L31/0224 , H01L31/042
CPC分类号： H01L31/18 , C23C18/1653 , C25D5/006 , C25D5/08 , C25D7/126 , C25D17/001 , C25D17/008 , C25D17/06 , C25D17/12 , C25D21/12 , H01L21/6723 , H01L31/022425 , Y02E10/50

78. 发明公开

EP2623646A4 APPARATUS FOR PLATING CYLINDER 审中-公开
标题翻译： DEVICE电镀缸
公开(公告)号：EP2623646A4
公开(公告)日：2015-09-23
申请号：EP11829066
申请日：2011-09-27
申请人： THINK LABS KK
发明人： SHIGETA TATSUO
IPC分类号： C25D17/06 , C25D7/04 , C25D17/00 , C25D17/10 , C25D21/02
CPC分类号： C25D21/02 , C25D7/04 , C25D17/005 , C25D17/06 , C25D17/10

79. 发明公开

EP2893056A2 GALVANISCHE BESCHICHTUNG VON BEHANDLUNGSGUT UNTER VERWENDUNG EINER INNENANODE 有权
标题翻译：处理电镀层使用内部阴极
公开(公告)号：EP2893056A2
公开(公告)日：2015-07-15
申请号：EP13750886.7
申请日：2013-08-22
申请人： Atotech Deutschland GmbH
发明人： LODICI, Roberto , TRATZ, Guenther
IPC分类号： C25D5/02 , C25D7/04 , C25D17/06 , C25D17/12 , C25D17/00 , C25D17/08
CPC分类号： C25D7/04 , C25D5/02 , C25D17/005 , C25D17/007 , C25D17/06 , C25D17/08 , C25D17/12
摘要： A device is designed for electroplating a material being treated (8) and has a hollow space (9) with an inner surface (51) to be coated. The device comprises a first frame part (11) with a first electrode (21) for holding and electrically contacting the material being treated (8). The device comprises a second frame part (12) with a carrier (23) for a second electrode (22), wherein the carrier (23) is set up for fastening the second electrode (22) in such a way that the second electrode (22) protrudes into the hollow space (9) of the material being treated (8) held by the first electrode (21) without touching the material being treated (8). The first frame part (11) and the second frame part (12) are mechanically connected to one another. The first electrode (21) and the second electrode (22) are electrically insulated from one another.

80. 发明授权

EP2573201B1 Method for refurbishing ptal coating to turbine hardware removed from service 有权
标题翻译：一种用于PTAL康复方法涂层的从操作涡轮机硬件抽出
公开(公告)号：EP2573201B1
公开(公告)日：2015-05-20
申请号：EP12185530.8
申请日：2012-09-21
申请人： General Electric Company
发明人： Woodard, Nicholas Shawn , Rucker, Michael H. , Cupito, John Louis , Worthing JR., Richard R. , King, Albert
IPC分类号： C23C10/02 , C23C10/58 , B23P6/00 , F01D5/28 , F01D5/00 , C25D7/00 , C25D5/02 , C25D3/50 , C25D17/02 , C25D17/12 , C25D17/00 , C25D17/10 , C25D17/06 , C25D5/50
CPC分类号： B23P6/002 , C23C10/02 , C23C10/58 , C25D3/50 , C25D5/02 , C25D5/50 , C25D7/008 , C25D17/00 , C25D17/007 , C25D17/008 , C25D17/06 , C25D17/10 , C25D17/12 , F01D5/005 , F01D5/288

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