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61. 发明公开

EP0877296A3 Transmission system for synchrotron radiation 失效
标题翻译： ÜbertragungssystemfürSynchrotronstrahlung
公开(公告)号：EP0877296A3
公开(公告)日：2000-12-13
申请号：EP98108256.3
申请日：1998-05-06
申请人： SUMITOMO HEAVY INDUSTRIES, LTD.
发明人： Toyota, Eijiro
IPC分类号： G03F7/20
CPC分类号： G03F7/70075 , G03F7/70191 , G03F7/70841
摘要： In a synchrotron radiation transmission system, a curved mirror (15) is disposed in a mirror box (12) for reflecting synchrotron radiation, the mirror box being formed with an incoming opening (13) and an outgoing opening (14) through which the synchrotron radiation having a horizontally elongated cross section passes. A swinging mechanism (16) supports the mirror so as to allow the synchrotron radiation which enters the mirror box via the incoming opening to be reflected by the mirror and to change the direction of propagation in a vertical plane and for swinging the mirror to change the angle of deviation of the direction of propagation. The swing axis is on a cross line, or on its extension, between an incidence plane of the synchrotron radiation and a tangential plane of the mirror at a reflection point and also on an incidence side of the synchrotron radiation from the reflection point. The swinging mechanism swings the mirror so that the reflection point of the synchrotron radiation moves on the reflecting surface of the mirror as the mirror swings, and that an incidence angle becomes larger as a distance between the source of the synchrotron radiation and the reflection point becomes longer.
摘要翻译：在同步加速器辐射传输系统中，在反射镜箱（12）中设置一个用于反射同步加速器辐射的曲面镜（15），该反射镜盒形成有一个进入开口（13）和一个出口（14），同步加速器具有横向细长横截面的辐射通过。摆动机构（16）支撑反射镜，以便允许通过进入的开口进入镜盒的同步加速器辐射被反射镜反射并改变垂直平面中的传播方向，并且用于使反射镜摆动以改变传播方向的偏差角。摆动轴在同步加速器辐射的入射平面与反射点的反射镜的切向平面之间以及来自反射点的同步加速器辐射的入射侧上处于十字线或其延伸部上。摆动机构使反射镜摆动，使得当反射镜摆动时同步加速器辐射的反射点在反射镜的反射表面上移动，并且随着同步加速器辐射源与反射点之间的距离变得变大，入射角变大更长的时间。

62. 发明公开

EP1052552A2 Gas bearings for use with vacuum chambers and their application in lithographic projection apparatus 审中-公开
标题翻译： Gaslager zur Verwendung mit Vakuumkammern und deren Anwendung in lithographischen Projektionsapparaten
公开(公告)号：EP1052552A2
公开(公告)日：2000-11-15
申请号：EP00303219.0
申请日：2000-04-17
申请人： ASM LITHOGRAPHY B.V.
发明人： Bisschops, Theodorus Hubertus Josephus , Vijfvinkel, Jakob , Soemers, Hermanus Mathias Joannes Rene , Driessen, Johannes Cornelis , Renkens, Michael Jozefa Mathijs , Bouwer, Adrianus Gerardus
IPC分类号： G03F7/20
CPC分类号： F16C29/025 , F16C32/0614 , F16C33/748 , F16C2300/62 , G03F7/70716 , G03F7/70808 , G03F7/70816 , G03F7/70841
摘要： A bearing for use in a vacuum chamber comprises a gas bearing discharging pressurised gas into a gap between two members to maintain a predetermined separation between those members. To avoid the gas forming the gas bearing being an unacceptable leak into the vacuum chamber, a vacuum pump is provided between the vacuum chamber and the gas bearing
摘要翻译：在真空室中使用的轴承包括将加压气体排出到两个构件之间的间隙中的气体轴承，以保持这些构件之间的预定间隔。为了避免形成气体轴承的气体是不可接受的泄漏到真空室中，真空泵设置在真空室和气体轴承之间

63. 发明公开

EP0909989A1 Photolithographic processing method and apparatus 失效
标题翻译：光刻处理方法和装置
公开(公告)号：EP0909989A1
公开(公告)日：1999-04-21
申请号：EP98124755.4
申请日：1991-09-25
申请人： CANON KABUSHIKI KAISHA
发明人： Toshiyuki, Komatsu, c/o Canon K.K. , Yasue, Sato, c/o Canon K.K. , Shin-Ichi, Kawate, c/o Canon K.K.
IPC分类号： G03F7/004 , C23C16/04 , H01L21/321
CPC分类号： H01L21/02071 , C23C16/047 , G03F1/68 , G03F7/00 , G03F7/0035 , G03F7/0042 , G03F7/2002 , G03F7/201 , G03F7/2022 , G03F7/2043 , G03F7/2053 , G03F7/265 , G03F7/36 , G03F7/38 , G03F7/7005 , G03F7/70841 , G03F7/70866 , G03F7/70875 , G03F7/70991 , H01L21/033 , H01L21/0332 , H01L21/0337 , H01L21/28556 , H01L21/28562 , H01L21/3086 , H01L21/31116 , H01L21/31144 , H01L21/31662 , H01L21/31683 , H01L21/32 , H01L21/321 , H01L21/32139
摘要： The present invention provides a processing method which comprises the steps of subjecting a surface to be processed, to selective irradiation with light in the desired gas atmosphere to form a surface-modified layer in the desired region; and applying selective processing to said surface-modified layer or the surface-unmodified layer; wherein said surface to be processed is heated in the step of forming said surface-modified layer. Furthermore, the present invention provides a processing apparatus which comprises a reaction vessel, a gas feeding means (434) for feeding a reactive gas into said reaction vessel, and a light guiding means (437) for guiding processing light into said reaction vessel, a substrate (431) placed in said reaction vessel being irradiated with said processing light so that the surface to be processed is processed; wherein said apparatus is provided with a means (433) for selectively heating said surface to be processed.
摘要翻译：本发明提供一种处理方法，其包括以下步骤：对要处理的表面进行选择性照射期望气体气氛中的光以在所需区域中形成表面改性层; 并对所述表面改性层或表面未改性层进行选择性加工; 其中所述待处理表面在形成所述表面改性层的步骤中被加热。此外，本发明提供一种处理装置，其包括反应容器，用于将反应气体供给到所述反应容器中的气体供给装置（434）以及用于将处理光引导到所述反应容器中的光引导装置（437），用所述处理光照射放置在所述反应容器中的衬底（431），从而处理待处理表面; 其中所述设备设置有用于选择性地加热所述待处理表面的装置（433）。

64. 发明授权

EP0540178B1 X-ray exposure apparatus and method for using it 失效
标题翻译： X射线曝光设备和方法
公开(公告)号：EP0540178B1
公开(公告)日：1998-05-06
申请号：EP92308909.8
申请日：1992-09-30
申请人： CANON KABUSHIKI KAISHA
发明人： Kasumi, Kazuyuki, c/o Canon Kabushiki Kaisha , Abe, Naoto, c/o Canon Kabushiki Kaisha , Ebinuma, Ryuichi, c/o Canon Kabushiki Kaisha , Hasegawa, Takayuki, c/o Canon Kabushiki Kaisha
IPC分类号： G03F7/20
CPC分类号： G03F7/70141 , G03F7/702 , G03F7/70841 , G03F7/70858 , G03F7/70891

65. 发明授权

EP0358426B1 SOR exposure system 失效
标题翻译： S.O.R.-Belichtungssystem
公开(公告)号：EP0358426B1
公开(公告)日：1996-02-07
申请号：EP89308922.7
申请日：1989-09-04
申请人： CANON KABUSHIKI KAISHA
发明人： Uda, Koji , Tanaka, Yutaka , Mori, Tetsuzo , Shimoda, Isamu , Uzawa, Schunichi
IPC分类号： G03F7/20
CPC分类号： G03F7/70525 , G03F7/70808 , G03F7/70841 , G03F7/70883 , G03F7/709 , G03F7/70991

66. 发明公开

EP0540178A3 X-ray exposure apparatus 失效
标题翻译： X射线曝光装置
公开(公告)号：EP0540178A3
公开(公告)日：1993-06-30
申请号：EP92308909.8
申请日：1992-09-30
申请人： CANON KABUSHIKI KAISHA
发明人： Kasumi, Kazuyuki, c/o Canon Kabushiki Kaisha , Abe, Naoto, c/o Canon Kabushiki Kaisha , Ebinuma, Ryuichi, c/o Canon Kabushiki Kaisha , Hasegawa, Takayuki, c/o Canon Kabushiki Kaisha
IPC分类号： G03F7/20
CPC分类号： G03F7/70141 , G03F7/702 , G03F7/70841 , G03F7/70858 , G03F7/70891
摘要： An X-ray apparatus is disclosed which includes a mirror (2) having a reflection surface, for expanding an X-ray beam (1) in a predetermined direction, a detecting device (8a, 8b) for detecting a relative positional relationship between the X-ray beam and the reflection surface with respect to a direction perpendicular to the reflection surface, and an adjusting device (6) for adjusting the relative position of the X-ray beam and the reflection surface on the basis of the detection. Also disclosed is an exposure apparatus and a semiconductor device manufacturing method using the X-ray apparatus.

67. 发明公开

EP0477890A2 Processing method and apparatus 失效
标题翻译：光刻胶Verarbeitungsverfahren und Vorrichtung。
公开(公告)号：EP0477890A2
公开(公告)日：1992-04-01
申请号：EP91116309.5
申请日：1991-09-25
申请人： CANON KABUSHIKI KAISHA
发明人： Komatsu, Toshiyuki, Canon Kabushiki Kaisha , Sato, Yasue, Canon Kabushiki Kaisha , Kawate, Shin-Ichi, Canon Kabushiki Kaisha
IPC分类号： G03F7/20 , C23C16/04 , H01L21/00 , G03F7/004
CPC分类号： H01L21/02071 , C23C16/047 , G03F1/68 , G03F7/00 , G03F7/0035 , G03F7/0042 , G03F7/2002 , G03F7/201 , G03F7/2022 , G03F7/2043 , G03F7/2053 , G03F7/265 , G03F7/36 , G03F7/38 , G03F7/7005 , G03F7/70841 , G03F7/70866 , G03F7/70875 , G03F7/70991 , H01L21/033 , H01L21/0332 , H01L21/0337 , H01L21/28556 , H01L21/28562 , H01L21/3086 , H01L21/31116 , H01L21/31144 , H01L21/31662 , H01L21/31683 , H01L21/32 , H01L21/321 , H01L21/32139
摘要： A processing method comprises:
a first step of depositing on a substrate which is a specimen a film of any one of a semiconductor, a metal and an insulator;
a second step of subjecting the surface of the film deposited in the first step, to irradiation with a beam having a given energy to produce a physical damage on the surface;
a third step of subjecting the film surface on which the physical damage is produced in the second step, to selective irradiation with light to partially cause a photochemical reaction so that a mask pattern depending on the desired device structure is formed on the film surface; and
a fourth step of carrying out photoetching using as a shielding member the mask pattern formed in the third step.
摘要翻译：一种处理方法包括：第一步骤，在作为样本的基板上沉积半导体，金属和绝缘体中的任一个的膜; 在第一步骤中沉积的膜的表面经受具有给定能量的光束照射以在表面上产生物理损伤的第二步骤; 在第二步骤中对产生物理损伤的膜表面进行第三步骤的选择性照射以部分地引起光化学反应，使得在膜表面上形成根据期望的器件结构的掩模图案; 以及第四步骤，使用在第三步骤中形成的掩模图案作为屏蔽部件进行光刻。

68. 发明公开

EP0358426A3 SOR exposure system 失效
标题翻译： SOR曝光系统
公开(公告)号：EP0358426A3
公开(公告)日：1991-04-17
申请号：EP89308922.7
申请日：1989-09-04
申请人： CANON KABUSHIKI KAISHA
发明人： Uda, Koji , Tanaka, Yutaka , Mori, Tetsuzo , Shimoda, Isamu , Uzawa, Schunichi
IPC分类号： G03F7/20
CPC分类号： G03F7/70525 , G03F7/70808 , G03F7/70841 , G03F7/70883 , G03F7/709 , G03F7/70991
摘要： Synchrotron orbital radiation (SOR) exposure system includes a SOR ring (8) and a plurality (15a-15c) of exposure apparatus each being coupled to the SOR ring and being arranged to expose a wafer to a mask pattern with X-rays contained in synchrotron radiation from the SOR ring (8) to thereby print the mask pattern on the wafer. Specific arrangement is provided to allow communication of a control of the SOR ring and respective controls of the exposure apparatuses. If any abnormality such as vacuum leakage occurs in one exposure apparatus, the information is transmitted to all the controls to start, in all the exposure apparatuses, appropriate operations to protect the exposure apparatuses against the abnormality. This makes it possible to prevent stoppage of the SOR exposure system as a whole even when any abnormality occurs in one exposure apparatus.

69. 发明公开

EP0353980A3 A mounting method 失效
标题翻译：安装方法
公开(公告)号：EP0353980A3
公开(公告)日：1990-03-28
申请号：EP89307779.2
申请日：1989-07-31
申请人： CANON KABUSHIKI KAISHA
发明人： Iwamoto, Kazunori , Uzawa, Shunichi , Kariya, Takao , Ebinuma, Ryuichi , Chiba, Hiroshi , Ohkawa, Shinkichi
IPC分类号： G12B5/00
CPC分类号： G03F7/707 , G03F7/70841 , G03F7/70858 , G03F7/70866 , G03F7/70883 , G12B5/00
摘要： A method of supporting or mounting a precision instrument for supporting a mask and a wafer in a vacuum container. It is particularly applicable to a SOR-X ray exposure apparatus wherein the mask and the wafer are disposed in a desired level of the reduced pressure, and exposure energy such as X-rays contained in synchrotron radiation is projected onto the wafer through the mask to print the pattern of the mask onto the wafer. In x-y-z coordinates with the x direction being vertical, the precision instrument in hung at at least two points which are spaced in the x direction, to the inside wall of the vacuum container. At one of the supporting points, the precision instrument is given latitude of x, y and z direction movement, and at the other supporting point, the precision instrument is fixed or is given a latitude only in the x direction. By this, when the vacuum container deforms by the difference between the internal and external pressures, the precision instrument can be supported correctly.

70. 发明授权

EP2098909B1 Connection device 有权
公开(公告)号：EP2098909B1
公开(公告)日：2012-09-26
申请号：EP09154207.6
申请日：2009-03-03
申请人： Ushio Denki Kabushiki Kaisha
发明人： Shirai, Takahiro
IPC分类号： G03F7/20
CPC分类号： G03F7/70933 , G03F7/70033 , G03F7/70841 , G03F7/70908 , G03F7/70916

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