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    • 60. 发明公开
    • Integrated circuit with MEMS element designed to avoid sticking and manufacturing method thereof
    • 集成电路与MEMS元件设计,以避免其粘附和制造方法
    • EP2695848A1
    • 2014-02-12
    • EP12180166.6
    • 2012-08-10
    • NXP B.V.
    • Lander, Robert
    • B81B3/00B81C1/00
    • B81B3/0018B81C1/00134B81C1/00928B81C2201/0133B81C2203/0136B81C2203/0145
    • An integrated circuit is disclosed comprising a MEMS (microelectromechanical system) element (10) in a plane of the integrated circuit, the MEMS element being suspended in a cavity (160) over a substrate (100), said cavity including a first cavity region (20) in said plane spatially separating an edge of the MEMS element from a wall section (12) of the cavity, said edge being arranged to be displaced relative to the wall section; and a second cavity region (30) in said plane forming part of a fluid path further including the first cavity region, said fluid path defining a first volume; and a third cavity region (34) in said plane defining a second volume in fluid connection with the second cavity region, wherein the maximum width of the second cavity region is larger than the maximum width of the third cavity region, the second and third cavity regions having maximum widths that are larger than the maximum width of the first cavity region, and wherein at least a part of the second volume is excluded from the fluid path.
    • 上集成电路计划盘游离缺失,其包括在该集成电路的MEMS(微机电系统)元件(10),所述MEMS元件悬挂在在基片的空腔(160)(100),所述腔体包括第一腔区域( 20)所述计划在从腔的壁部(12)的MEMS元件的边缘在空间上分离,所述边缘被布置相对于壁部分被移位; 和第二腔区域(30)的平面内成形进一步包括在第一腔室区域的流体路径的一部分,所述流体路径限定在所述A第一体积; 并且在所述限定与第二腔区域流体连接的第二体积,worin第二空腔区域的最大宽度的第三空腔区域(34)平面比第三腔区域的最大宽度,所述第二和第三空腔更大的 具有最大宽度做区域比第一腔区域的最大宽度大,并且worin至少所述第二体积的一部分被从所述流体路径中排除。