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51. 发明公开

EP1350997A3 Seal device and method for operating the same and substrate processing apparatus comprising a vacuum chamber 有权
标题翻译：密封装置中，操作方法及基板处理装置包括真空室
公开(公告)号：EP1350997A3
公开(公告)日：2010-09-08
申请号：EP03007399.3
申请日：2003-04-02
申请人： EBARA CORPORATION
发明人： Shinozaki, Hiroyuki
IPC分类号： F16J15/40 , H01L21/00
CPC分类号： H01L21/67126 , F16J15/406 , Y10S414/135 , Y10S414/139 , Y10S414/141
摘要： The present invention provides a seal device comprising a sealing passage which allows communication between a first space and a second space, and evacuation lines individually connected to the first space and the sealing passage. A gas feed line for feeding dry gas is connected to the sealing passage.

52. 发明授权

EP1047162B1 Excimer laser device 有权
标题翻译：受激准分子激光装置
公开(公告)号：EP1047162B1
公开(公告)日：2008-09-17
申请号：EP00108648.7
申请日：2000-04-20
申请人： EBARA CORPORATION
发明人： Sekiguchi, Shinichi , Shinozaki, Hiroyuki , Barada, Toshimitsu , Nakazawa, Toshiharu
IPC分类号： H01S3/225 , H01S3/036
CPC分类号： F16C32/047 , H01S3/036 , H01S3/225

53. 发明授权

EP1056171B2 Discharge-pumped excimer laser device 有权
标题翻译：放电泵浦准分子激光
公开(公告)号：EP1056171B2
公开(公告)日：2008-06-18
申请号：EP00111269.7
申请日：2000-05-25
申请人： EBARA CORPORATION
发明人： Sekiguchi, Shinichi , Shinozaki, Hiroyuki , Barada, Toshimitsu , Nakazawa, Toshiharu
IPC分类号： H01S3/225 , H01S3/03
CPC分类号： F16C32/047 , H01S3/03 , H01S3/036 , H01S3/225

54. 发明授权

EP1093157B1 Substrate processing method and apparatus 有权
标题翻译：用于处理衬底的方法和装置
公开(公告)号：EP1093157B1
公开(公告)日：2006-12-20
申请号：EP00122439.3
申请日：2000-10-13
申请人： EBARA CORPORATION
发明人： Shinozaki, Hiroyuki
IPC分类号： H01L21/00
CPC分类号： B05D1/005 , B05C11/06 , H01L21/31133 , H01L21/312 , H01L21/6715 , Y10S134/902
摘要： A substrate processing method and apparatus capable of uniformly supplying a processing liquid to a substrate surface in substrate processing such as development processing without exerting an influence on the physical properties of the processing liquid and without damaging the substrate. A rotating blade is disposed above the horizontally placed substrate so as to face the substrate. The processing liquid is supplied to the surface of the substrate, and the rotating blade is rotated while being kept out of contact with the processing liquid to induce a gas current. The gas current forms a mass of processing liquid having an internal circulating current on the substrate surface below the rotating blade.

55. 发明授权

EP1056122B1 Substrate treating apparatus and method of operating the same 有权
标题翻译：基板处理装置和操作方法
公开(公告)号：EP1056122B1
公开(公告)日：2006-08-23
申请号：EP00111268.9
申请日：2000-05-25
申请人： EBARA CORPORATION
发明人： Shinozaki, Hiroyuki
IPC分类号： H01L21/00
CPC分类号： H01L21/6704 , H01L21/67034

56. 发明公开

EP1071118A3 Substrate rotating apparatus 有权
标题翻译： Substratdrehvorrichtung
公开(公告)号：EP1071118A3
公开(公告)日：2005-10-26
申请号：EP00115587.8
申请日：2000-07-19
申请人： EBARA CORPORATION
发明人： Shinozaki, Hiroyuki
IPC分类号： H01L21/00 , H01L21/68 , C23C16/458
CPC分类号： H01L21/68792 , F16C32/047 , F16C2300/42 , F16C2300/62
摘要： A rotor is placed in a space communicating with a processing chamber. Stator-side constituent members of magnetic bearings and a stator-side constituent member of a motor are placed in a space defined outside the space communicating with the processing chamber by a partition provided between the rotor and the stator-side constituent members. Further, a material electromagnetically equivalent to yokes of electromagnets as stator-side constituent members of the magnetic bearings is fitted in portions of the partition where the yokes are located. The partition constitutes a stator housing as a whole. The magnetic bearings include an axial magnetic bearing and a radial magnetic bearing. The axial magnetic bearing is divided into three or more magnetic bearings, which are positioned so that imaginary lines connecting points where the divided axial magnetic bearings are disposed form an approximately regular triangle or polygon.

57. 发明授权

EP0747503B1 Reactant gas injector for chemical vapor deposition apparatus 失效
标题翻译： Reaktivgasinjektor用于化学气相沉积设备
公开(公告)号：EP0747503B1
公开(公告)日：2003-10-29
申请号：EP96109191.5
申请日：1996-06-07
申请人： EBARA CORPORATION
发明人： Murakami, Takeshi , Takeuchi, Noriyuki , Shinozaki, Hiroyuki , Tsukamoto, Kiwamu , Fukunaga, Yukio , Hongo, Akihisa
IPC分类号： C23C16/44 , C30B25/14
CPC分类号： C23C16/45512 , C23C16/455 , C23C16/45565 , C23C16/4557 , C30B25/14

58. 发明公开

EP1176325A2 Magnetic bearing apparatus 审中-公开
标题翻译：磁轴承
公开(公告)号：EP1176325A2
公开(公告)日：2002-01-30
申请号：EP01118169.0
申请日：2001-07-26
申请人： EBARA CORPORATION
发明人： Shinozaki, Hiroyuki
IPC分类号： F16C39/06
CPC分类号： F16C32/0457 , F16C2360/45
摘要： There is provided a magnetic bearing apparatus having no necessity of providing a magnetic flux sensor in the vicinity of a supporting electromagnet and no necessity of increasing the number of signal lines in a cable and capable of achieving an advantage similar to a conventional magnet flux feedback type power amplifier in a controller. The magnetic bearing apparatus for supporting a supported member by a magnetic force without contact comprises a current sensor (11) for detecting a control current output from a power amplifier (7) and a displacement sensor (10) for detecting a displacement of the supported member (1).
A control current detection signal Si of the current sensor (11) and a displacement detection signal Sg of the displacement sensor (10) are supplied to an estimator (20) that estimates a magnetic flux or magnetic flux density generated between a surface of the electromagnet (4) and an electromagnetic target (3) on the supported member (1). An estimated value is fed back from the estimator (20) to the power amplifier (7) that supplies a control current i to an electromagnetic coil (6).

59. 发明公开

EP1164667A2 Electric discharge gas laser 有权
标题翻译：气体放电激光器
公开(公告)号：EP1164667A2
公开(公告)日：2001-12-19
申请号：EP01113983.9
申请日：2001-06-08
申请人： EBARA CORPORATION
发明人： Ooyama, Atushi , Sekiguchi, Shinichi , Shinozaki, Hiroyuki , Barada, Toshimitsu , Nakazawa, Toshiharu
IPC分类号： H01S3/036
CPC分类号： F16C32/0444 , F16C32/0489 , H01S3/036 , H01S3/225
摘要： There is provided an electric discharge gas laser comprising a housing containing a laser gas; a rotating fan provided in the housing to circulate the gas in the housing; a bearing device for magnetically supporting a rotating shaft of the rotating, the bearing device being provided with a sensor device comprising a sensor for sensing the position of the rotating shaft to generate signals indicating the position of the rotating shaft, and a signal processor for receiving and processing the signals delivered from the sensor to output processed signals; and a control separated from the bearing device and functionally associated with the bearing device to receive the processed signals from the sensor device for controlling the bearing device on the basis of the processed signals.

60. 发明公开

EP1162651A2 Substrate rotating apparatus 审中-公开
标题翻译： Substratdrehvorrichtung
公开(公告)号：EP1162651A2
公开(公告)日：2001-12-12
申请号：EP01113981.3
申请日：2001-06-08
申请人： EBARA CORPORATION
发明人： Shinozaki, Hiroyuki
IPC分类号： H01L21/00
CPC分类号： H01L21/68792
摘要： An apparatus for rotating a semiconductor substrate is provided which comprises a substrate holder for carrying the substrate thereon, a rotor for directly or indirectly supporting the substrate holder, a magnetic floating mechanism for magnetically floating and supporting the rotor in a non-contact state, and magnetic rotating mechanism for magnetically rotating the rotor. The magnetic floating mechanism and magnetic rotating mechanism are formed as a single integral unit structure. The unit structure includes a first set of windings for generating a magnetic field to provide the rotor with a rotating force, and a second set of windings for generating a magnetic field to float and support the rotor at a predetermined position. The first and second sets of windings are disposed on a single yoke plate made of a magnetic material.
摘要翻译：提供了一种用于旋转半导体衬底的装置，其包括用于承载衬底的衬底保持器，用于直接或间接支撑衬底保持器的转子，用于以非接触状态磁浮动和支撑转子的磁浮动机构，以及用于使转子磁转的磁旋转机构。磁浮机构和磁旋转机构形成为单个整体单元结构。单元结构包括用于产生磁场以向转子提供旋转力的第一组绕组和用于产生磁场的第二组绕组，用于将转子浮动并支撑在预定位置。第一和第二组绕组设置在由磁性材料制成的单个磁轭板上。

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