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31. 发明授权

EP1245036B1 ION IMPLANTATION ION SOURCE 有权
标题翻译：离子源
公开(公告)号：EP1245036B1
公开(公告)日：2013-06-19
申请号：EP00988056.8
申请日：2000-12-13
申请人： Semequip, Inc.
发明人： HORSKY, Thomas, N. , WILLIAMS, John N.
IPC分类号： C23C14/48 , H01J37/317 , H01J27/20 , H01L21/265 , H01J37/08
CPC分类号： H01J37/3171 , C23C14/48 , H01J27/205 , H01J37/08 , H01J2237/047 , H01J2237/049 , H01J2237/063 , H01J2237/0812 , H01J2237/0815 , H01J2237/082 , H01J2237/083 , H01J2237/0835 , H01J2237/31701 , H01J2237/31703 , H01J2237/31705 , H01L21/26513 , H01L21/2658 , H01L21/823814

32. 发明公开

EP2575159A1 Particle beam system and method for operating the same 有权转让
标题翻译： Teilchenstrahlsystem und Verfahren zum Betreiben dieses Systems
公开(公告)号：EP2575159A1
公开(公告)日：2013-04-03
申请号：EP11007980.3
申请日：2011-09-30
申请人： Carl Zeiss NTS GmbH
发明人： Biberger, Josef , Pulwey, Ralph , Wieczorek, Volker
IPC分类号： H01J37/28 , H01J37/04 , H01J37/147 , H01J37/26
CPC分类号： H01J37/265 , H01J37/045 , H01J37/1472 , H01J37/1474 , H01J37/28 , H01J2237/043 , H01J2237/063 , H01J2237/15 , H01J2237/2487 , H01J2237/2602
摘要： A method of operating a particle beam system comprises determining a deflection amount and a deflection time of a beam deflection module connected to a data network; determining an un-blank time of a beam blanking module connected to the data network; determining a blank time of the beam blanking module connected to the data network; generating a data structure comprising plural data records, wherein each data record includes a command representing an instruction for at least one of the modules, and a command time representing a time at which the instruction is to be sent to the data network; sorting the records of the data structure by command time; generating a set of digital commands based on the data structure; and sending the digital commands of the set to the network in an order corresponding to an order of the sorted records.
摘要翻译：操作粒子束系统的方法包括确定连接到数据网络的光束偏转模块的偏转量和偏转时间; 确定连接到数据网络的波束消隐模块的非空白时间; 确定连接到数据网络的波束消隐模块的空白时间; 生成包括多个数据记录的数据结构，其中每个数据记录包括表示至少一个所述模块的指令的命令以及表示所述指令要发送到所述数据网络的时间的命令时间; 通过命令时间对数据结构的记录进行排序; 基于数据结构生成一组数字命令; 并且以与排序记录的顺序相对应的顺序将集合的数字命令发送到网络。

33. 发明公开

EP1367609A1 HIGH-VOLTAGE ELECTRIC APPARATUS 有权
标题翻译： ELEKTRISCHE HOCHSPANNUNGSVORRICHTUNG
公开(公告)号：EP1367609A1
公开(公告)日：2003-12-03
申请号：EP02705086.3
申请日：2002-03-06
申请人： Hitachi, Ltd.
发明人： SATO, T., c/o Hitachi Ltd, Hitachi Res. Lab. , TAKEUCHI, R., c/o Hitachi Ltd, Hitachi Res. Lab. , KAGA, H., c/o Hitachi Ltd, Instruments
IPC分类号： H01B17/26 , H01B17/34 , H01J37/248
CPC分类号： H01J37/248 , H01J2237/063
摘要： Sufficient dielectric strength needs to be ensured for the high voltage connection (13-11) of the high voltage electrical equipment such as a pattern generation system for focused ion beam processing and observation (1), without enlarging the equipment.
The present invention seals an insulating liquid (13-113a) or gas (13-113b) in the space (13-113) between the connection bushing on the power supply side (13-111) and the flange on the power receiving side (13-112), and applies the water repellent treatment (13-111c) to a surface of the connection bushing or flange on the power receiving side, which the surface faces the space (13-113).
Such a configuration provides compact electrical equipment with high dielectric strength, which can prevent the condensation or moisture absorption on the insulation surface in the space of the high voltage connection and can prevent the leakage current increase even under high humidity environment.
摘要翻译：对于高压电气设备的高压连接（13-11）需要确保足够的介电强度，例如用于聚焦离子束加工和观察的图案生成系统（1），而不会扩大设备。本发明在电源侧（13-111）上的连接衬套与电源侧（13-111）上的凸缘之间的空间（13-113）中密封绝缘液体（13-113a）或气体（13-113b）电力接收侧（13-112），并且将防水处理（13-111c）施加到表面面向空间（13-113）的受电侧的连接衬套或凸缘的表面。这种构造提供了具有高介电强度的紧凑型电气设备，其可以防止在高压连接的空间中的绝缘表面上的冷凝或吸湿，并且即使在高湿度环境下也可以防止漏电流增加。

34. 发明公开

EP2903773A4 BULK DEPOSITION FOR TILTED MILL PROTECTION 有权
标题翻译：肖特隔离倾斜保护
公开(公告)号：EP2903773A4
公开(公告)日：2015-10-21
申请号：EP13843746
申请日：2013-10-07
申请人： FEI CO
发明人： STONE STACEY , LEE SANG HOON , BLACKWOOD JEFFREY , SCHMIDT MICHAEL
IPC分类号： G01N23/225 , H01J37/30
CPC分类号： H01J37/3005 , G01N1/32 , G01N23/2255 , G01N2223/104 , G01N2223/611 , H01J37/3007 , H01J37/3053 , H01J37/3056 , H01J37/31 , H01J2237/063 , H01J2237/08 , H01J2237/2813 , H01J2237/31732 , H01J2237/31745 , H01J2237/31749

35. 发明公开

EP2924709A1 Imaging a sample with multiple beams and multiple detectors 审中-公开
标题翻译： ABBILDUNG EINER探针麻醉师MEHREREN STRAHLEN UND MEHREREN DETEKTOREN
公开(公告)号：EP2924709A1
公开(公告)日：2015-09-30
申请号：EP15160701.7
申请日：2015-03-25
申请人： FEI COMPANY
发明人： Potocek, Pavel , Kooijman, Cornelis , Slingerland, Hendrik , Veen, van, Gerard , Boughorbel, Faysal , Faber, Pybe , Sluijterman, Albertus
IPC分类号： H01J37/244
CPC分类号： H01J37/261 , G01N21/6458 , G01N23/225 , G01N2223/418 , G01N2223/427 , G02B21/0016 , H01J37/06 , H01J37/1472 , H01J37/222 , H01J37/244 , H01J37/265 , H01J37/28 , H01J2237/063 , H01J2237/10 , H01J2237/226 , H01J2237/2446 , H01J2237/2447 , H01J2237/2448 , H01J2237/24507 , H01J2237/2602
摘要： A multi-beam apparatus for inspecting or processing a sample (232) with a multitude of focused beams, the apparatus equipped to scan a multitude of N beams (240-n) over the sample, the apparatus equipped with a multitude of M detectors (234-m) for detecting secondary radiation emitted by the sample when said sample is irradiated by the multitude of beams, each of the detectors capable of outputting a detector signal representing the intensity of the secondary radiation detected by the detector, , in working, each detector signal comprising information caused by multiple beams, the information caused by one beam thus spread over multiple detectors, the apparatus equipped with a programmable controller (236) for processing the multitude of detector signals to a multitude of output signals, using weight factors so that each output signal represents information caused by a single beam, characterized in that the weight factors are dynamic weight factors depending on the scan position of the beams with respect to the detectors and the distance between sample and detectors.
The weight factors describe the contribution of each beam to each detector. The invention is based on the insight that when scanning the beams over the sample, the position of the position where the secondary radiation is formed (the impact position) changes. Therefore the weight factors should be a function of the scan position.
Also the distance between sample and detector (the working distance) has a similar effect on the weight factors
It is noted that, as the position of the impact is known at all times the weight factors can be a known function of the scan position, working distance and, if applicable, the beam energies.
摘要翻译：一种用于用多个聚焦光束检测或处理样品（232）的多光束装置，所述装置配备用于扫描样品上的多个N个光束（240-n），所述装置配备有多个M个检测器每个检测器能够输出表示由检测器检测到的二次辐射的强度的检测器信号，每个检测器信号在工作时，每个检测器检测器信号包括由多个波束引起的信息，由一个波束引起的信息由此分布在多个检测器上，该装置配备有可编程控制器（236），用于使用加权因子将多个检测器信号处理到多个输出信号，使得每个输出信号表示由单个波束引起的信息，其特征在于，所述权重因子是取决于所述扫描位置的动态加权因子相对于检测器的光束和样品和检测器之间的距离。权重因子描述了每个光束对每个探测器的贡献。本发明基于以下认识：当扫描样品上的光束时，形成次级辐射的位置的位置（冲击位置）发生变化。因此，重量因子应该是扫描位置的函数。样品和检测器之间的距离（工作距离）对重量因子也有类似的影响。应注意的是，由于冲击位置始终是已知的，重量因子可以是扫描位置的已知功能，工作距离和（如果适用）射束能量。

36. 发明公开

EP2924707A1 Raman microscope and electron microscope analytical system 有权转让
标题翻译：拉曼 - 米克罗斯科夫和埃及电影
公开(公告)号：EP2924707A1
公开(公告)日：2015-09-30
申请号：EP14003366.3
申请日：2014-09-03
申请人： Tescan Orsay Holding, a.s. , Witec GmbH
发明人： Jiruse, Jaroslav , Hollricher, Olaf , Hanicinec, Martin
IPC分类号： H01J37/22 , G01N21/65 , H01J37/26 , G01J3/44
CPC分类号： H01J37/28 , G01J3/44 , G01N21/65 , G01N2201/061 , G01N2201/068 , G01Q30/025 , H01J37/18 , H01J37/20 , H01J37/226 , H01J37/228 , H01J37/26 , H01J2237/024 , H01J2237/063 , H01J2237/08 , H01J2237/24475 , H01J2237/2448 , H01J2237/2583 , H01J2237/2801 , H01J2237/2802
摘要： The invention relates to system using number of analytical devices such as electron microscope (4), Raman microscope (6), ion beam column (20) and scanning probe microscope (24) for sample (3) analysis concurrent, consecutive or with the mutual correlation of the analysis performed by the different devices in the same sample (3) area using the connection of the Raman microscope optical objective lens (11) and objective manipulator (17), that significantly reduces time needed for analyzing by Raman microscope (6) together with other devices and maintains high quality of the sensed signals comparable to stand alone analytical devices.
摘要翻译：本发明涉及用于样本（3）分析的电子显微镜（4），拉曼显微镜（6），离子束柱（20）和扫描探针显微镜（24）等分析装置的系统并行，连续或相互连接的系统使用拉曼显微镜光学物镜（11）和物镜操纵器（17）的连接，在相同样品（3）区域中由不同装置进行的分析的相关性，显着减少了通过拉曼显微镜（6）分析所需的时间，与其他设备一起保持与独立分析设备相当的感测信号的高质量。

37. 发明公开

EP2804199A3 Scanning charged particle microscope, image acquisition method, and electron detection method 有权转让
标题翻译：光栅Teilchenmikroskop，成像方法和电子检测方法
公开(公告)号：EP2804199A3
公开(公告)日：2015-04-22
申请号：EP14168549.5
申请日：2014-05-15
申请人： JEOL Ltd.
发明人： Otsuka, Takeshi
IPC分类号： H01J37/244 , H01J37/28 , H01J37/22
CPC分类号： H01J37/28 , H01J37/22 , H01J37/244 , H01J2237/063 , H01J2237/15 , H01J2237/2441 , H01J2237/2446 , H01J2237/24465 , H01J2237/2448 , H01J2237/24485 , H01J2237/2806
摘要： A scanning charged particle microscope is offered which can selectively detect and image electrons. The scanning charged particle microscope (100) has: a source (1) of a charged particle beam (E1); an objective lens (6) for bringing the charged particle beam (E1) emitted from the source (1) into focus at a sample (S); a scanning deflector (4) for scanning the focused charged particle beam (E1) over the sample (S); a sorting portion (10) for sorting out electrons emitted at given emission angles from electrons released from the sample (S) in response to irradiation of the sample (S) by the charged particle beam (E1); an electron deflector (20) for producing a deflecting field to deflect the electrons (E2) sorted out according to their energy; a detection portion (30) for detecting the electrons (E2) deflected by the electron deflector (20); and an image creating portion (44) for creating an image, based on the results of the detection performed by the detection portion (30).

38. 发明公开

EP2676285A2 FOCUSING A CHARGED PARTICLE IMAGING SYSTEM 有权
标题翻译：图像聚焦系统带电粒子
公开(公告)号：EP2676285A2
公开(公告)日：2013-12-25
申请号：EP12707198.3
申请日：2012-02-17
申请人： Applied Materials Israel Ltd. , Carl Zeiss SMT GmbH
发明人： RODGERS, Steven R. , KNIPPELMEYER, Rainer K. , KEMEN, Thomas , SCHUBERT, Stefan , ELMALIAH, Nissim
IPC分类号： H01J37/09 , H01J37/21 , H01J37/22 , H01J37/28
CPC分类号： H01J37/21 , H01J37/06 , H01J37/09 , H01J37/153 , H01J37/22 , H01J37/222 , H01J37/244 , H01J37/261 , H01J37/28 , H01J37/29 , H01J2237/0453 , H01J2237/049 , H01J2237/063 , H01J2237/1532 , H01J2237/21 , H01J2237/2817
摘要： A charged particle beam focusing apparatus (200) includes a charged particle beam generator (202) configured to project simultaneously at least one non-astigmatic charged particle beam and at least one astigmatic charged particle beam (217) onto locations on a surface of a specimen (39), thereby causing released electrons to be emitted from the locations. The apparatus also includes an imaging detector (31) configured to receive the released electrons from the locations and to form images of the locations from the released electrons. A processor (32) analyzes the image produced by the at least one astigmatic charged particle beam and in response thereto adjusts a focus of the at least one non-astigmatic charged particle beam.

39. 发明公开

EP2104946A4 METHOD FOR CREATING S/TEM SAMPLE AND SAMPLE STRUCTURE 有权
标题翻译：制备方法技术探针干细胞和一个样本结构
公开(公告)号：EP2104946A4
公开(公告)日：2012-09-26
申请号：EP07844522
申请日：2007-10-22
申请人： FEI CO
发明人： BLACKWOOD JEFF , STONE STACEY
IPC分类号： H01J37/305 , G01N1/32 , G06K9/46
CPC分类号： G01N1/28 , G01N1/06 , G01N1/08 , G01N1/32 , G01N23/04 , H01J37/06 , H01J37/18 , H01J37/20 , H01J37/26 , H01J37/28 , H01J37/3056 , H01J2237/063 , H01J2237/182 , H01J2237/204 , H01J2237/208 , H01J2237/2802 , H01J2237/31745 , H01J2237/31749

40. 发明公开

EP2426693A2 Ion source 审中-公开
标题翻译： Ionenquelle
公开(公告)号：EP2426693A2
公开(公告)日：2012-03-07
申请号：EP11009107.1
申请日：2000-12-13
申请人： Semequip, Inc.
发明人： The designation of the inventor has not yet been filed
IPC分类号： H01J37/08 , H01J3/02 , H01J37/317
CPC分类号： H01J37/3171 , C23C14/48 , H01J27/205 , H01J37/08 , H01J2237/047 , H01J2237/049 , H01J2237/063 , H01J2237/0812 , H01J2237/0815 , H01J2237/082 , H01J2237/083 , H01J2237/0835 , H01J2237/31701 , H01J2237/31703 , H01J2237/31705 , H01L21/26513 , H01L21/2658 , H01L21/823814
摘要： In an ion source (1) for use with an ion implant device comprising:
an ionization chamber (5) defined by a plurality of side walls defining an ionization volume (16), one (13) of said side walls including an ion extraction aperture (37) for enabling an ion beam to be extracted from said ionization chamber (16) along a predetermined axis defining an ion beam axis; and a gas source (2) in fluid communication with said ionization chamber (16); an electron source (12) for producing an electron beam for ionizing the gas in said ionization chamber (16); said electron source (12) has an emitter (33) external to the ionization volume (16) and one (13) of said sidewalls (13) includes an electron entrance aperture , said emitter (33) configured relative to said aperture to cause an electron beam (32) to be directed across the ionization chamber (16) and ionize said gas by direct electron impact ionization by energetic electrons
摘要翻译： 1.一种用于离子注入装置的离子源（1），包括：由限定电离体积（16）的多个侧壁限定的电离室（5），所述侧壁中的一个（13）包括离子提取孔（37），用于使离子束能够沿着限定离子束轴的预定轴从所述电离室（16）中提取; 和与所述电离室（16）流体连通的气体源（2）; 用于产生用于电离所述电离室（16）中的气体的电子束的电子源（12）。所述电子源（12）具有在电离体积（16）外部的发射极（33），并且所述侧壁（13）中的一个（13）包括电子入射孔，所述发射器（33）相对于所述孔配置，电子束（32）被引导穿过电离室（16），并通过能量电子的直接电子轰击电离使所述气体电离

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