会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 27. 发明公开
    • LIGHT-ABSORBING POLYMER, METHOD FOR SYNTHESIZING THE SAME, AND FILM-FORMING COMPOSITION AND ANTIREFLECTION FILM PREPARED USING SAID POLYMER
    • 光吸收的高分子合成方法和成膜所制造此聚合物组成及防反射膜
    • EP0861855A1
    • 1998-09-02
    • EP97940386.2
    • 1997-09-16
    • CLARIANT INTERNATIONAL LTD.
    • KANG, Wen-BingTOKIDA, AkihikoARAMAKI, KayoTANAKA, Hatsuyuki Clariant (Japan) K. K.KIMURA, Ken
    • C08F8/14C08F8/32C08F216/00C08F222/00C08L29/00C08L35/00C09D5/00C09D129/00C09D135/00G03F7/11
    • C08F8/34C08F8/30C09D5/32G03F7/091
    • A radiation absorbing polymer is characterized by having a main chain of copolymer containing recurring units with dicarboxylic acid or carboxylic anhydride group with an organic chromophore bonded to the carboxyl group through methylene or alkylene linkage group, where the organic chromophore is bonded to the carboxyl group by esterification reaction.
      Residual carboxyl groups of the radiation absorbing polymer can optionally be amidized and/or imidized with an aromatic compounds having a reactive amino group.
      The radiation absorbing polymer shows a good step coverage when the polymer is dissolved in the same solvent as is used for resist solution together with, upon necessity, an aromatic compound with a reactive amino group to improve the characteristics and can form an antireflective coating which is insoluble in a resist solvent after baking the coated film on the substrates.
      Then the photoresist is applied on the antireflective coating and is exposed by radiation such as deep ultraviolet radiation. A resist pattern with high resolving power is formed, which is not affected by standing wave upon manufacturing integrated circuit elements.
    • 辐射吸收聚合物由具有共聚物包含被通过亚甲基或亚烷基连接基团,其中有机发色团是通过结合到羧基结合到羧基的有机发色团的二羧酸或具有羧酸酐基团的重复单元的主链为特征的 酯化反应。 辐射吸收聚合物的残留羧基可任选被酰胺化的和/或与芳族化合物具有活性氨基酰亚胺化。 辐射吸收聚合物显示了良好的阶梯覆盖当聚合物溶解在相同的溶剂用于抗蚀剂溶液一起,根据需要添加到芳族化合物与反应性氨基基团,以提高特性,并且可以形成在抗反射涂层的所有其 不溶于抗蚀剂烘烤涂膜-在基板上之后溶剂。 然后光致抗蚀剂施加在抗反射涂层和通过辐射暴露:如深紫外线辐射。 具有高分辨力的抗蚀图案被形成,所有这一切都不会受在制造集成电路元件的驻波。