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21. 发明授权

EP2667400B1 Interference electron microscope 有权
公开(公告)号：EP2667400B1
公开(公告)日：2018-11-21
申请号：EP13169141.2
申请日：2013-05-24
申请人： RIKEN , Hitachi, Ltd.
发明人： Tanigaki, Toshiaki , Aizawa, Shinji , Matsuda, Tsuyoshi , Harada, Ken , Takahashi, Yoshio
IPC分类号： H01J37/295
CPC分类号： H01J37/261 , H01J37/295 , H01J2237/026 , H01J2237/1514 , H01J2237/2614
摘要： In an interference electron microscope, a first electron biprism (12) is disposed between an acceleration tube (39) and an illumination-lens system, a mask (29) is disposed between the acceleration tube and the first electron biprism, and the first electron biprism is arranged in a shadow that the mask forms. Current densities of first and second electron beams on a parabolic surface of an objective lens system where a sample (6) is positioned are controlled by a control system by an optical action of the illumination-lens system, the mask is imaged on the parabolic surface of the objective lens system, and an electro-optical length between the first electron biprism and the parabolic surface of the objective lens where the sample is positioned is controlled without generating Fresnel fringes on a sample surface from the mask and the first electron biprism.

22. 发明授权

EP3161852B1 ELEKTRONENSTRAHLTEILER 有权
公开(公告)号：EP3161852B1
公开(公告)日：2018-06-27
申请号：EP14741520.2
申请日：2014-06-30
申请人： Friedrich-Alexander-Universität Erlangen-Nürnberg
发明人： HAMMER, Jakob , HOMMELHOFF, Peter
IPC分类号： H01J37/147
CPC分类号： H01J37/1472 , H01J37/1471 , H01J2237/2614

23. 发明公开

EP3270404A1 METHOD OF IMAGING A SPECIMEN USING PTYCHOGRAPHY 审中-公开
标题翻译：一种使用电子图谱成像的方法
公开(公告)号：EP3270404A1
公开(公告)日：2018-01-17
申请号：EP16179172.8
申请日：2016-07-13
申请人： FEI Company
发明人： Bosch, Eric
IPC分类号： H01J37/22 , H01J37/28
CPC分类号： H01J37/222 , H01J37/20 , H01J37/228 , H01J37/244 , H01J37/28 , H01J2237/226 , H01J2237/2614
摘要： A method of imaging a specimen using ptychography, whereby a charged-particle beam is directed from a source through an illuminator so as to traverse the specimen and land upon a detector, an output of the detector being used in combination with a mathematical reconstruction technique so as to calculate at least one property of a chargedparticle wavefront exiting the specimen, wherein:
- Said property is a phase of the wavefront;
- Said mathematical reconstruction technique directly reconstructs said phase, rather than deriving it indirectly from a reconstructed function of amplitude and phase.
摘要翻译：一种使用ptychography对样本成像的方法，其中带电粒子束从源通过照射器引导以穿过样本并落在检测器上，检测器的输出与数学重建技术结合使用，如此以计算离开样本的带电粒子波前的至少一个特性，其中： - 所述特性是波前的相位; - 所述数学重建技术直接重建所述相位，而不是从振幅和相位的重构函数间接推导出。

24. 发明授权

EP2750160B1 Phase plate and method of fabricating same 有权转让
标题翻译： Phasenplatte und Herstellungsverfahrendafür
公开(公告)号：EP2750160B1
公开(公告)日：2017-03-22
申请号：EP13199471.7
申请日：2013-12-23
申请人： JEOL LTD.
发明人： Ijima, Hirofumi , Konyuba, Yuji
IPC分类号： H01J37/04 , H01J37/26
CPC分类号： G03F7/001 , H01J37/02 , H01J37/04 , H01J37/26 , H01J2237/2614

25. 发明授权

EP2758980B1 VERFARHEN ZUR AUSRICHTUNG EINER PHASENPLATTE IN EINEM ELEKTRONENMIKROSKOP 有权转让
标题翻译： EEREM ELEKTRONENMIKROSKOP中的VERFARHEN ZUR AUSRICHTUNG EINER PHASENPLATTE
公开(公告)号：EP2758980B1
公开(公告)日：2017-03-15
申请号：EP12769987.4
申请日：2012-09-12
申请人： Stiftung caesar Center of Advanced European Studies and Research
发明人： IRSEN, Stephan , PATTAI, Steffen
IPC分类号： H01J37/26 , H01J37/22
CPC分类号： H01J37/265 , H01J37/222 , H01J2237/2614

26. 发明公开

EP3067912A1 PHASE PLATE, METHOD OF FABRICATING SAME, AND ELECTRON MICROSCOPE 审中-公开
标题翻译： PHASENPLATTE，VERFAHREN ZUR HERSTELLUNG DAVON UND ELEKTRONENMIKROSKOP
公开(公告)号：EP3067912A1
公开(公告)日：2016-09-14
申请号：EP16159962.6
申请日：2016-03-11
申请人： JEOL LTD.
发明人： IIJIMA, Hirofumi
IPC分类号： H01J37/26 , H01J37/04
CPC分类号： H01J37/147 , H01J37/026 , H01J37/04 , H01J37/26 , H01J2237/2614 , H01J2237/2802
摘要： A phase plate capable of suppressing electrification and a method of fabricating the plate are provided. The phase plate (100) is for use in an electron microscope and includes a phase control layer (30) provided with a through-hole (32) and at least one conductive layer (20) covering and closing off the through-hole (32). The conductive layer (20) is formed on at least one of a first surface (31a) and a second surface (31b) of the phase control layer (30), the second surface (31b) being on the opposite side of the first surface (31 a). The phase control layer (30) produces a given phase difference between electron waves transmitted through the phase control layer (30) and electron waves transmitted through the through-hole (32).
摘要翻译：提供一种能够抑制起电的相位板及其制造方法。相位板（100）用于电子显微镜，包括设置有通孔（32）的相位控制层（30）和覆盖并封闭通孔（32）的至少一个导电层（20））。导电层（20）形成在相位控制层（30）的第一表面（31a）和第二表面（31b）中的至少一个上，第二表面（31b）位于第一表面（31a）。相位控制层（30）产生通过相位控制层（30）传播的电子波和通过通孔（32）传输的电子波之间的给定相位差。

27. 发明授权

EP2561542B1 CHARACTERISTIC DETERMINATION 有权
标题翻译：性能的测定。
公开(公告)号：EP2561542B1
公开(公告)日：2016-03-30
申请号：EP11720833.0
申请日：2011-04-19
申请人： Phase Focus Limited
发明人： HUMPHRY, Martin , MAIDEN, Andrew
IPC分类号： H01J37/22 , G01B11/24 , G01B11/30 , G01N23/04
CPC分类号： H01J37/222 , G01B11/24 , G01B11/303 , G01N23/043 , H01J2237/226 , H01J2237/2614

28. 发明授权

EP2795655B1 GENERATION OF CHARGED PARTICLE VORTEX WAVES 有权
标题翻译：涡波的带电粒子生产
公开(公告)号：EP2795655B1
公开(公告)日：2015-11-25
申请号：EP12813341.0
申请日：2012-12-19
申请人： Universiteit Antwerpen
发明人： VERBEECK, Johan , VAN TENDELOO, Gustaaf
IPC分类号： G01N23/225 , H01J37/04 , H01J37/26
CPC分类号： H01J37/04 , G01N23/2251 , G01N2223/101 , H01J37/26 , H01J37/263 , H01J2237/1504 , H01J2237/24557 , H01J2237/24564 , H01J2237/2614

29. 发明公开

EP2750160A3 Phase plate and method of fabricating same 有权转让
标题翻译：相位板及其制造方法
公开(公告)号：EP2750160A3
公开(公告)日：2015-09-16
申请号：EP13199471.7
申请日：2013-12-23
申请人： JEOL Ltd.
发明人： Ijima, Hirofumi , Konyuba, Yuji
IPC分类号： H01J37/04 , H01J37/26
CPC分类号： G03F7/001 , H01J37/02 , H01J37/04 , H01J37/26 , H01J2237/2614
摘要： A method of fabricating a phase plate (100), for use in a transmission electron microscope, with simple process steps is offered. The method includes a step (S100) of forming a first layer (22) on a substrate, a step (S102) of patterning the first layer (22) to form through-holes (2) extending through the first layer (22), a step (S104) of etching the surface of the substrate (10) opposite to the surface on which the first layer (22) is formed to form an opening (4) which is in communication with the through-holes (2) and which exposes the first layer (22), and a step (S106) of forming a second layer (24) on the first layer (22).

30. 发明公开

EP2667400A3 Interference electron microscope 审中-公开
标题翻译：电子干涉显微镜
公开(公告)号：EP2667400A3
公开(公告)日：2015-01-28
申请号：EP13169141.2
申请日：2013-05-24
申请人： RIKEN , Hitachi Ltd.
发明人： Tanigaki, Toshiaki , Aizawa, Shinji , Matsuda, Tsuyoshi , Harada, Ken , Takahashi, Yoshio
IPC分类号： H01J37/295
CPC分类号： H01J37/261 , H01J37/295 , H01J2237/026 , H01J2237/1514 , H01J2237/2614
摘要： In an interference electron microscope, a first electron biprism (12) is disposed between an acceleration tube (39) and an illumination-lens system, a mask (29) is disposed between the acceleration tube and the first electron biprism, and the first electron biprism is arranged in a shadow that the mask forms. Current densities of first and second electron beams on a parabolic surface of an objective lens system where a sample (6) is positioned are controlled by a control system by an optical action of the illumination-lens system, the mask is imaged on the parabolic surface of the objective lens system, and an electro-optical length between the first electron biprism and the parabolic surface of the objective lens where the sample is positioned is controlled without generating Fresnel fringes on a sample surface from the mask and the first electron biprism.

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