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11. 发明授权

EP3274305B1 METHODS AND APPARATUS FOR CUTTING A SUBSTRATE 有权
公开(公告)号：EP3274305B1
公开(公告)日：2023-09-06
申请号：EP16709951.4
申请日：2016-03-15
发明人： O'CONNOR, Gerard , COLLINS, Adam
IPC分类号： C03B33/02 , B23K26/364 , B23K26/0622 , B23K26/073 , B23K26/082 , B23K26/08 , B23K26/402 , B23K101/18 , B23K103/00

12. 发明授权

EP3523083B1 SYSTEM AND METHOD FOR LASER PROCESSING OF MATERIALS. 有权
公开(公告)号：EP3523083B1
公开(公告)日：2023-08-09
申请号：EP17872052.0
申请日：2017-11-20
发明人： AVDOKHIN, Alexey , TZANKOV, Pancho , BABUSHKIN, Andrei , EHRMANN, Jonathan , KMETEC, Jeffrey
IPC分类号： B23K26/06 , B23K26/352 , B23K26/40 , H01S3/067 , B23K103/08 , B23K103/10 , B23K103/12 , B23K103/00 , B23K26/00 , B23K26/064 , B23K26/067 , B23K26/354

13. 发明授权

EP3807608B1 DRUCKMESSEINRICHTUNG UND VERFAHREN ZU DEREN HERSTELLUNG 有权
公开(公告)号：EP3807608B1
公开(公告)日：2023-07-26
申请号：EP19726665.3
申请日：2019-05-23
发明人： ROßBERG, Andreas , THAM, Anh Tuan , SCHMIDT, Elke , PONATH, Nils , CONRADT, Jonas , WANG, Yanli , UEHLIN, Thomas
IPC分类号： G01L9/00 , G01L13/02 , G01L19/04 , G01L19/14 , C04B37/02 , B23K20/02 , B23K101/36 , B23K103/14 , B23K103/18 , B23K103/00 , B23K20/233

14. 发明授权

EP2933050B1 Method for processing polymeric sheets, and associated sheets 有权
公开(公告)号：EP2933050B1
公开(公告)日：2023-06-07
申请号：EP14425043.8
申请日：2014-04-16
发明人： Rossi, Renzo , Boghi, Claudio , Paolucci, Fabrizio
IPC分类号： B23K26/00 , B23K26/06 , B23K26/08 , B23K26/352 , B41M5/26 , B29C59/16 , B41M5/24 , B23K103/00

15. 发明公开

EP4169064A1 AUTOMATIC KERF OFFSET MAPPING AND CORRECTION SYSTEM FOR LASER DICING 审中-公开
公开(公告)号：EP4169064A1
公开(公告)日：2023-04-26
申请号：EP21830159.6
申请日：2021-05-20
申请人： Applied Materials, Inc.
发明人： BALAKRISHNAN, Karthik , PARK, Jungrae , TAN, Zavier Zai, Yeong , ABHINAND, Sai , PAPANU, James, S.
IPC分类号： H01L21/78 , H01L21/67 , B23K26/38 , H01L21/3065 , B23K103/00

18. 发明公开

EP4122633A1 FESTKÖRPERTEILUNG MITTELS STOFFUMWANDLUNG 审中-公开
公开(公告)号：EP4122633A1
公开(公告)日：2023-01-25
申请号：EP22195120.5
申请日：2015-11-27
申请人： Siltectra GmbH
发明人： RICHTER, Jan , BEYER, Christian , RIESKE, Ralf
IPC分类号： B23K26/00 , B23K26/402 , H01L21/78 , B28D5/00 , B23K26/40 , B23K26/53 , B23K103/00
摘要： Die vorliegende Erfindung bezieht sich auf ein Verfahren zum Erzeugen eines Ablösebereichs (2) in einem Festkörper (1) zum Ablösen eines Festkörperanteils (12), insbesondere einer Festkörperschicht (12), von dem Festkörper (1), wobei der abzulösende Festkörperanteil (12) dünner ist als der um den Festkörperanteil (12) reduzierte Festkörper. Erfindungsgemäß umfasst das Verfahren mindestens die Schritte: Bereitstellen eines zu bearbeitenden Festkörpers (1), wobei der Festkörper (1) bevorzugt aus einer chemischen Verbindung besteht; Bereitstellen einer LASER-Lichtquelle; Beaufschlagen des Festkörpers (1) mit LASER-Strahlung der LASER-Lichtquelle, wobei die Laserstrahlen über eine Oberfläche (5) des abzutrennenden Festkörperanteils (12) in den Festkörper (1) eindringen, wobei die LASER-Strahlung einen vorgegebenen Anteil des Festkörpers (1) im Inneren des Festkörpers (1) zur Ausbildung eines Ablösebereichs (2) oder mehrerer Teilablösebereiche (25, 27, 28, 29) definiert beaufschlagt, dadurch gekennzeichnet, dass durch die Laserbeaufschlagung nacheinander mehrere Modifikationen (9) in dem Kristallgitter erzeugt werden, wobei das Kristallgitter in Folge der Modifikationen (9) in den die Modifikationen (9) umgebenden Bereichen zumindest in jeweils einem Anteil davon einreist, wobei durch die Risse im Bereich der Modifikationen (9) der Ablösebereich (2) vorgegeben wird oder mehrere Teilablösebereiche (25, 27, 28, 29) vorgegeben werden.

19. 发明公开

EP4119281A1 MANUFACTURING METHOD OF ELECTRODE PLATE, MANUFACTURING METHOD OF SECONDARY BATTERY, ELECTRODE PLATE, AND SECONDARY BATTERY 审中-公开
公开(公告)号：EP4119281A1
公开(公告)日：2023-01-18
申请号：EP22181789.3
申请日：2022-06-29
申请人： Prime Planet Energy & Solutions, Inc.
发明人： TSUKAMOTO, Kentaro , MAGARI, Yoshifumi
IPC分类号： B23K26/0622 , B23K26/362 , B23K26/38 , H01M4/133 , H01M4/1393 , H01M4/66 , H01M10/0525 , H01M50/533 , B23K101/36 , B23K101/38 , B23K103/12 , B23K103/00 , H01M4/587
摘要： According to the present disclosure, it is possible to inhibit the electrically conductive foreign substance from falling off and being peeled off from the electrode plate that has been already manufactured, so as to contribute in improving the safety property of the secondary battery. The manufacturing method of the electrode plate herein disclosed includes a precursor preparing step for preparing an electrode precursor 20A including an active material provided area A1 in which an electrode active material layer 24 is provided on a surface of the electrode core 22 and including a core exposed area A2 in which the electrode active material layer 24 is not provided and the electrode core 22 is exposed, and an active material provided area cutting step for cutting the active material provided area A1 by a pulse laser, and a core exposed area cutting step for cutting the core exposed area A2 by the pulse laser. Then, in the case where the pulse width (ns) of the pulse laser is represented by X and the lap rate (%) is represented by Y for the core exposed area cutting step, a condition represented by Y≥-3logX+106 is satisfied. According to the manufacturing method of the electrode plate as described above, it is possible to inhibit the electrically conductive foreign substance from falling off and being peeled off from the electrode plate that has been already manufactured, and thus it is possible to contribute in improving the safety property of the secondary battery.

20. 发明公开

EP4074455A3 MARKING DEVICE, MEDIUM, CONTAINER, AND MARKING METHOD 审中-实审
公开(公告)号：EP4074455A3
公开(公告)日：2023-01-11
申请号：EP22156212.7
申请日：2022-02-10
申请人： Ricoh Company, Ltd.
发明人： Hirayama, Rie , Fujita, Kazuhiro , Serizawa, Keiichi
IPC分类号： B23K26/06 , B23K26/0622 , B23K26/082 , B23K26/08 , B23K26/362 , B23K26/402 , B41M5/24 , B23K101/12 , B23K103/00
摘要： A marking device (1), a medium (100), a container, and a marking method. The marking device (1) includes a first marker (10) including a first optical system (12) having a first focal point (111), the first marker (10) being configured to concentrate a first light (L1) onto a first area (101) of a non-planar portion (110) of a medium (100) to perform marking on the first area (101), the non-planar portion (110) including a plurality of areas (101, 102) including the first area (101) and a second area (102), and a second marker (20) including a second optical system (22) having a second focal point (112). The second marker (20) is configured to concentrate a second light (L2) onto the second area (102) to perform the marking on the second area (102). The second focal point (112) of the second optical system (22) is different from the first focal point (111) of the first optical system (12) in a direction parallel to a central axis (51) of the first optical system (12).

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