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    • 16. 发明公开
    • Waveguide grating and method and apparatus for forming same
    • Wellenleitergitter und Verfahren und Vorrichtung zu dessen Herstellung
    • EP1074865A3
    • 2002-04-24
    • EP00306602.4
    • 2000-08-02
    • Waseda UniversityFujimaki, MakotoUNIVERSITE DE MONTREAL
    • Fujimaki, MakotoOhki, YoshimichiBrebner, John L.Roorda, Sjoerd
    • G02B6/16G02B6/12
    • G02B6/02147G02B6/02095G02B6/02142G02B6/124
    • A waveguide grating formation method comprises the steps of accelerating ions (IB); causing the accelerated ions to pass through a mask (16) having a shape corresponding to the grating; and implanting the ions (IB'), which have passed through the mask, into the core (3), to form refractive index-variation portions (4) for the grating in the core. The other formation method comprises the steps of accelerating ions, converging an ion beam formed of the accelerated ions, to make a beam diameter identical with or smaller than a width of refractive index-variation portions in a direction of the central axis of the optical waveguide so as to provide a converged ion beam (IB'); and intermittently irradiating the converged ion beam to the core (3), while moving an irradiation position in the direction of the central axis, to implant the ions into the core so as to form the refractive index-variation portions (4) in the core.
    • 光栅形成方法包括加速离子的步骤; 使加速离子通过具有与光栅对应的形状的掩模; 以及将已经通过掩模的离子注入芯中,以形成用于芯中的光栅的折射率变化部分。 另一种形成方法包括以下步骤:加速离子,会聚由加速离子形成的离子束,使光束直径与光波导的中心轴方向的折射率变化部分的宽度相同或小于 以提供会聚的离子束; 并且在沿着中心轴方向移动照射位置时将会聚的离子束间歇地照射到芯,以将离子注入到芯中,以便在芯中形成折射率变化部分。
    • 17. 发明公开
    • Process and device for making gratings in optical fibres
    • Verfahren und Vorrichtung zur Herstellung von Gittern in optischen Fasern
    • EP1111415A1
    • 2001-06-27
    • EP00120971.7
    • 2000-09-27
    • Agilent Technologies, Inc., a corporation of the State of Delaware
    • Tallone, Luigi
    • G02B6/293G02B6/34G02B6/16G02B5/18
    • G02B6/02133G02B6/02142
    • During the process of writing a grating, the fibre (F) is placed in a support (16) which has a surface cut-out such as a V-shaped groove (18). The side walls (20) of this groove (18) form an angle (α) of 60° with respect to the direction (X12) of propagation of the radiation arriving from the source (12). The aforesaid surfaces (20) have characteristics of high reflectivity with respect to the aforesaid radiation. Consequently, during the writing process, the core (1A) of the fibre (F) is subjected to the action of a plurality of radiation fronts converging on the core. The first radiation front corresponds to the radiation arriving from the source (12) and two other radiation fronts (B, C) are obtained from this radiation by the effect of the reflection from the walls (20) of the surface cut-out of the support (16). The preferred application is to the making of long-period gratings.
    • 在写入光栅的过程中,光纤(F)被放置在具有诸如V形凹槽(18)的表面切口的支撑件(16)中。 该凹槽(18)的侧壁(20)相对于从源(12)到达的辐射的传播方向(X12)形成60°的角度(α)。 上述表面(20)具有相对于上述辐射的高反射率的特性。 因此,在写入过程中,纤维(F)的芯(1A)受到在芯上会聚的多个辐射前端的作用。 第一辐射前部对应于从源极(12)到达的辐射,并且通过来自该辐射的表面切口的壁(20)的反射的效应从该辐射获得另外两个辐射前沿(B,C) 支持(16)。 优选的应用是制造长周期光栅。
    • 20. 发明公开
    • Delocalisation of stitch errors in the writing of gratings
    • Korrektur der Gitterperiode beim Schreiben von Gittern
    • EP0886152A1
    • 1998-12-23
    • EP98303743.3
    • 1998-05-13
    • NORTHERN TELECOM LIMITED
    • Clements, Stephen John
    • G02B6/16G02B5/18
    • G02B5/1857G02B6/02142G02B6/124
    • Reducing the step size in a step and repeat process used to E-beam write field by field (11) a grating in a layer of resist (10) so that adjacent fields overlap, whereby two or more fields are employed to write each grating element, delocalises the stepping stitch errors, and thereby reduces their deleterious effect. The resulting increased writing complexity introduces other problems, and hence there is a limit beyond which further increasing the number of fields is no longer beneficial. By suitable grating of the irradiation dose in each field it has been found possible to increase further the delocalisation without further increasing the number of fields employed.
    • 在步骤中减小步长并重复用于电子束写入场的步骤(11)抗蚀剂层(10)中的光栅,使得相邻的场重叠,由此使用两个或更多个场来写入每个光栅元素 ,使步进针迹错误离域,从而降低其有害影响。 所产生的增加的写作复杂性引入了其他问题,因此存在超出这一限度的范围,其中进一步增加字段的数量不再有益。 通过在每个场中照射剂量的适当光栅,已经发现可以进一步增加离域,而不进一步增加使用的场数。