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11. 发明公开

EP3137047A1 SOLVENT COMPOSITIONS BASED ON DIHYDROFARNESENE 有权
标题翻译： LÖSUNGSMITTELZUSAMMENSETZUNGENAUF DER BASIS VON DIHYDROFARNESEN
公开(公告)号：EP3137047A1
公开(公告)日：2017-03-08
申请号：EP15723609.2
申请日：2015-05-01
申请人： Amyris, Inc.
发明人： EPPLER, Ross, Keating , FISHER, Karl , VAZQUEZ, Roberto
IPC分类号： A61K8/31 , A61Q1/04 , A61Q5/06 , A61Q19/00 , C11D3/18 , C11D7/50
CPC分类号： A61K8/31 , A61Q1/04 , A61Q5/00 , A61Q5/065 , A61Q19/00 , C11D3/184
摘要： Provided herein are compositions comprising partially hydrogenated farnesene. In certain embodiments, the compositions are useful as solvents, degreasers, cleaning products, personal care products, and for other uses. Also provided herein are methods of making the compositions and methods of their use.
摘要翻译：本文提供了包含部分氢化法呢烯的组合物。在某些实施方案中，组合物可用作溶剂，脱脂剂，清洁产品，个人护理产品和用于其它用途。本文还提供了制备其组合物及其使用方法的方法。

12. 发明公开

EP1962327A1 WASHING LIQUID FOR PHOTOLITHOGRAPHY, AND METHOD FOR WASHING EXPOSURE DEVICE USING THE SAME 有权
标题翻译：洗涤粉洗涤曝光装置的光刻和方法
公开(公告)号：EP1962327A1
公开(公告)日：2008-08-27
申请号：EP06823501.9
申请日：2006-11-22
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： KOSHIYAMA, Jun , SAWADA, Yoshihiro , YOKOYA, Jiro , HIRANO, Tomoyuki
IPC分类号： H01L21/027 , C11D1/66 , C11D3/43 , G03F7/20 , H01L21/304
CPC分类号： C11D3/43 , C11D1/66 , C11D1/667 , C11D1/72 , C11D3/18 , C11D3/181 , C11D3/182 , C11D3/184 , C11D3/188 , G03F7/2041 , G03F7/70341 , G03F7/70925 , G03F7/70983
摘要： Problem: To provide a cleaning liquid for lithography and a cleaning method using it for photoexposure devices. In a process of liquid immersion lithography, the cleaning liquid may efficiently clean the photoexposure device site (especially optical lens member) contaminated with the component released from photoresist and remove the contaminant, and in addition, the waste treatment for the cleaning liquid is easy, the efficiency in substitution with the cleaning liquid for the medium for liquid immersion lithography is high, and the cleaning liquid does not detract from the throughput in semiconductor production. Means for Solution; A cleaning liquid for photolithography to be used for cleaning a photoexposure device in a process of liquid immersion lithography that comprises filling the space between the optical lens member of a photoexposure device and an object for photoexposure mounted on the wafer stage, with a medium for liquid immersion lithography, the cleaning liquid comprising (a) a surfactant. (b) a hydrocarbon solvent, and (c) water; and a cleaning method using it for photoexposure devices.
摘要翻译：问题：提供用于平版印刷的清洁液和使用它的照片曝光装置的清洁方法。在液浸曝光的过程中，清洗液可以有效地清洁照片曝光装置部位（特别是光学透镜部件）污染成分从光致抗蚀剂释放和去除污染物，并且另外，废物处理的清洗液很容易，与用于液浸曝光的介质的清洗液置换效率高，与清洗液不从半导体生产吞吐量减损。解决手段; 要用于在液浸曝光的过程清洗相片曝光装置用于光刻的清洗液没有包含填充照片曝光装置的光学透镜部件之间的空间，以对象为安装在晶片台上的照片曝光，具有用于液体的介质浸没式光刻，清洗液包含（A）表面活性剂。（B）烃溶剂，及（c）水; 和使用它的照片曝光装置的清洁方法。

13. 发明公开

EP3197507A1 MALODOR REDUCTION COMPOSITIONS 审中-公开
标题翻译：降低MALODOR组合物
公开(公告)号：EP3197507A1
公开(公告)日：2017-08-02
申请号：EP15775570.3
申请日：2015-09-25
申请人： The Procter & Gamble Company
发明人： FRANKENBACH, Gayle Marie , HOLLINGSHEAD, Judith Ann , HORENZIAK, Steven Anthony , MADHAV, Prakash J. , STANTON, David Thomas , READNOUR, Christine Marie , LIU, Zaiyou , CETTI, Jonathan Robert
IPC分类号： A61L9/01 , A61K8/35 , C11B9/00
CPC分类号： C11D3/0068 , A61K8/11 , A61K8/31 , A61K8/33 , A61K8/34 , A61K8/342 , A61K8/35 , A61K8/36 , A61K8/361 , A61K8/368 , A61K8/37 , A61K8/4926 , A61K8/494 , A61K8/4966 , A61K8/4973 , A61K8/498 , A61K8/58 , A61K8/731 , A61K8/8152 , A61K2800/56 , A61K2800/592 , A61K2800/5922 , A61L2/18 , A61L9/01 , A61L9/012 , A61L9/03 , A61L9/122 , A61L9/127 , A61L15/20 , A61L15/28 , A61L15/46 , A61L2209/21 , A61L2300/62 , A61Q5/02 , A61Q13/00 , A61Q15/00 , A61Q19/00 , A61Q19/10 , B01J20/24 , C08K5/0008 , C11B9/0015 , C11B9/0019 , C11B9/003 , C11B9/0034 , C11B9/0038 , C11B9/0042 , C11B9/0049 , C11B9/0053 , C11B9/0061 , C11B9/0076 , C11B9/008 , C11B9/0092 , C11D3/001 , C11D3/184 , C11D3/2034 , C11D3/2068 , C11D3/2072 , C11D3/2079 , C11D3/2093 , C11D3/2096 , C11D3/222 , C11D3/30 , C11D3/43 , C11D3/50 , C11D3/505 , C11D11/0017 , C11D17/0043 , C11D17/042 , C11D17/047 , C11D17/06 , D06B1/02 , G06F17/10 , G06F17/11 , G06F17/5018 , G06F19/701 , G06F19/705 , G06Q99/00
摘要： The present invention relates to methods of designing and making perfumed products and perfume raw materials for use in products and perfume raw materials selected by such methods and the use of same.
摘要翻译：本发明涉及恶臭减少组合物及其制备和使用方法。恶臭减少组合物适用于各种应用，包括用于消费品中，例如空气清新组合物，洗衣洗涤剂，织物增强剂，表面清洁剂，美容护理产品，菜肴护理产品，尿布，女性防护制品，和垃圾袋塑料薄膜。这种恶臭控制技术不会不适当地干扰用恶臭控制技术处理的加香或不加香的部位的气味。

14. 发明公开

EP3197426A1 FRESHENING COMPOSITIONS AND DEVICES COMPRISING SAME 审中-公开
公开(公告)号：EP3197426A1
公开(公告)日：2017-08-02
申请号：EP15781483.1
申请日：2015-09-25
申请人： THE PROCTER & GAMBLE COMPANY
发明人： FRANKENBACH, Gayle, Marie , HOLLINGSHEAD, Judith, Ann , HORENZIAK, Steven, Anthony
IPC分类号： A61K8/35 , C11B9/00
CPC分类号： C11D3/0068 , A61K8/11 , A61K8/31 , A61K8/33 , A61K8/34 , A61K8/342 , A61K8/35 , A61K8/36 , A61K8/361 , A61K8/368 , A61K8/37 , A61K8/4926 , A61K8/494 , A61K8/4966 , A61K8/4973 , A61K8/498 , A61K8/58 , A61K8/731 , A61K8/8152 , A61K2800/56 , A61K2800/592 , A61K2800/5922 , A61L2/18 , A61L9/01 , A61L9/012 , A61L9/03 , A61L9/122 , A61L9/127 , A61L15/20 , A61L15/28 , A61L15/46 , A61L2209/21 , A61L2300/62 , A61Q5/02 , A61Q13/00 , A61Q15/00 , A61Q19/00 , A61Q19/10 , B01J20/24 , C08K5/0008 , C11B9/0015 , C11B9/0019 , C11B9/003 , C11B9/0034 , C11B9/0038 , C11B9/0042 , C11B9/0049 , C11B9/0053 , C11B9/0061 , C11B9/0076 , C11B9/008 , C11B9/0092 , C11D3/001 , C11D3/184 , C11D3/2034 , C11D3/2068 , C11D3/2072 , C11D3/2079 , C11D3/2093 , C11D3/2096 , C11D3/222 , C11D3/30 , C11D3/43 , C11D3/50 , C11D3/505 , C11D11/0017 , C11D17/0043 , C11D17/042 , C11D17/047 , C11D17/06 , D06B1/02 , G06F17/10 , G06F17/11 , G06F17/5018 , G06F19/701 , G06F19/705 , G06Q99/00
摘要： The present invention relates to methods of designing and making perfumed products and perfume raw materials for use in products and perfume raw materials selected by such methods and the use of same.

15. 发明公开

EP3197423A1 PRODUCTS COMPRISING MALODOR REDUCTION MATERIALS 审中-公开
标题翻译：包含降解材料的产品
公开(公告)号：EP3197423A1
公开(公告)日：2017-08-02
申请号：EP15778475.2
申请日：2015-09-25
申请人： THE PROCTER & GAMBLE COMPANY
发明人： FRANKENBACH, Gayle, Marie , HOLLINGSHEAD, Judith, Ann , HORENZIAK, Steven, Anthony
IPC分类号： A61K8/35 , C11B9/00
CPC分类号： C11D3/0068 , A61K8/11 , A61K8/31 , A61K8/33 , A61K8/34 , A61K8/342 , A61K8/35 , A61K8/36 , A61K8/361 , A61K8/368 , A61K8/37 , A61K8/4926 , A61K8/494 , A61K8/4966 , A61K8/4973 , A61K8/498 , A61K8/58 , A61K8/731 , A61K8/8152 , A61K2800/56 , A61K2800/592 , A61K2800/5922 , A61L2/18 , A61L9/01 , A61L9/012 , A61L9/03 , A61L9/122 , A61L9/127 , A61L15/20 , A61L15/28 , A61L15/46 , A61L2209/21 , A61L2300/62 , A61Q5/02 , A61Q13/00 , A61Q15/00 , A61Q19/00 , A61Q19/10 , B01J20/24 , C08K5/0008 , C11B9/0015 , C11B9/0019 , C11B9/003 , C11B9/0034 , C11B9/0038 , C11B9/0042 , C11B9/0049 , C11B9/0053 , C11B9/0061 , C11B9/0076 , C11B9/008 , C11B9/0092 , C11D3/001 , C11D3/184 , C11D3/2034 , C11D3/2068 , C11D3/2072 , C11D3/2079 , C11D3/2093 , C11D3/2096 , C11D3/222 , C11D3/30 , C11D3/43 , C11D3/50 , C11D3/505 , C11D11/0017 , C11D17/0043 , C11D17/042 , C11D17/047 , C11D17/06 , D06B1/02 , G06F17/10 , G06F17/11 , G06F17/5018 , G06F19/701 , G06F19/705 , G06Q99/00
摘要： The present invention relates to methods of designing and making perfumed products and perfume raw materials for use in products and perfume raw materials selected by such methods and the use of same.
摘要翻译：本发明涉及恶臭减少组合物及其制备和使用方法。恶臭减少组合物适用于各种应用，包括用于消费品中，例如空气清新组合物，洗衣洗涤剂，织物增强剂，表面清洁剂，美容护理产品，菜肴护理产品，尿布，女性防护制品，和垃圾袋塑料薄膜。这种恶臭控制技术不会不适当地干扰用恶臭控制技术处理的加香或不加香的部位的气味。

16. 发明公开

EP1962327A4 WASHING LIQUID FOR PHOTOLITHOGRAPHY, AND METHOD FOR WASHING EXPOSURE DEVICE USING THE SAME 有权
标题翻译：洗涤粉洗涤曝光装置的光刻和方法
公开(公告)号：EP1962327A4
公开(公告)日：2014-04-30
申请号：EP06823501
申请日：2006-11-22
申请人： TOKYO OHKA KOGYO CO LTD
发明人： KOSHIYAMA JUN , SAWADA YOSHIHIRO , YOKOYA JIRO , HIRANO TOMOYUKI
IPC分类号： G03F7/20 , C11D1/66 , C11D1/72 , C11D3/18 , C11D3/43 , H01L21/027 , H01L21/304
CPC分类号： C11D3/43 , C11D1/66 , C11D1/667 , C11D1/72 , C11D3/18 , C11D3/181 , C11D3/182 , C11D3/184 , C11D3/188 , G03F7/2041 , G03F7/70341 , G03F7/70925 , G03F7/70983

17. 发明公开

EP2655589A1 CLEANING COMPOSITION AND METHOD 审中-公开
标题翻译：清洁组合物和方法
公开(公告)号：EP2655589A1
公开(公告)日：2013-10-30
申请号：EP11807719.7
申请日：2011-12-15
申请人： Reckitt & Colman (Overseas) Limited
发明人： DUNSTAN, Tim , FLETCHER, Paul D. I. , GRIFFITHS, Lee , MCKECHNIE, Malcolm Tom
IPC分类号： C11D17/00 , C11D3/18 , C11D3/20 , C11D3/39 , C11D7/50 , C11D7/24 , C11D7/26
CPC分类号： C11D17/0017 , C11D3/18 , C11D3/184 , C11D3/2017 , C11D3/3947 , C11D7/24 , C11D7/244 , C11D7/261 , C11D7/5027
摘要： A cleaning composition comprises a water- in- oil emulsion. The oil phase comprises a solvent having a Hildebrand parameter of from 12 - 20.
摘要翻译：清洁组合物包含油包水乳液。油相包含Hildebrand参数为12-20的溶剂。

18. 发明公开

EP2276825A1 FABRIC CARE EMULSIONS 审中-公开
标题翻译： FABRIC CARE乳液
公开(公告)号：EP2276825A1
公开(公告)日：2011-01-26
申请号：EP09732097.2
申请日：2009-04-09
申请人： Dow Corning Corporation
发明人： CAUVIN, Severine , SIMON, Christel , STAMMER, Andreas , UGAZIO, Stephane
IPC分类号： C11D17/00 , C11D3/37 , C11D3/382 , C11D3/384 , C11D3/18 , B01F17/54 , C11D3/00
CPC分类号： C11D17/0017 , B01F17/0071 , C11D3/0015 , C11D3/18 , C11D3/181 , C11D3/182 , C11D3/184 , C11D3/185 , C11D3/373 , C11D3/3742 , C11D3/382 , C11D3/384
摘要： The invention relates to oil-in-water emulsions, methods of making said emulsions and their uses in fabric care or hair care compositions. The fabric care composition comprises a silicone oil-in-water emulsion which emulsion is obtained by a. forming an oil phase by mixing at least one silicone compound with at least one silicone-free oil, b. optionally adding an emulsifier, c. adding water, d. forming an oil-in-water emulsion. A silicone oil, comprising a siloxane or polysiloxane compound, for example polydimethyl siloxane (polydimethyl silicone or PDMS), or a derivative thereof, e.g., amino and amido silicone, diluted with a silicone-free oil still can provide an emulsion providing high fabric care properties while decreasing the costs.
摘要翻译：本发明涉及水包油乳液，制备所述乳液的方法及其在织物护理或头发护理组合物中的用途。该织物护理组合物包含硅氧烷水包油乳液，该乳液通过a。通过混合至少一种硅氧烷化合物和至少一种不含硅氧烷的油形成油相，b。任选地加入乳化剂，c。加水d。形成水包油乳液。包含硅氧烷或聚硅氧烷化合物（例如聚二甲基硅氧烷（聚二甲基硅氧烷或PDMS））或其衍生物（例如氨基和酰胺硅氧烷）的硅油用无硅油稀释仍可提供乳液，提供高织物护理同时降低成本。

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