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11. 发明授权

EP0258027B1 Preparation of polysilicon by silane pyrolysis 有权
标题翻译：通过硅烷热解制备多晶硅
公开(公告)号：EP0258027B1
公开(公告)日：1992-08-19
申请号：EP87307464.5
申请日：1987-08-24
申请人： ETHYL CORPORATION
发明人： Gautreaux, Marcelian Francis , Allen, Robert Hall
IPC分类号： C01B33/02
CPC分类号： B01J8/26 , C01B33/027 , C01B33/029 , Y10S117/912 , Y10T428/2991 , Y10T428/2995

12. 发明授权

EP0305867B1 Hydrogen purification process 有权
标题翻译：氢气净化过程
公开(公告)号：EP0305867B1
公开(公告)日：1991-06-26
申请号：EP88113730.1
申请日：1988-08-23
申请人： ETHYL CORPORATION
发明人： Allen, Robert Hall
IPC分类号： C01B3/56 , C01B33/02 , C01B31/08
CPC分类号： C01B3/56 , C01B32/36 , C01B33/029 , C01B2203/043 , C01B2203/0465 , C01B2203/048

13. 发明公开

EP0363743A2 Preparation of high purity boron 失效
标题翻译： Herstellung von Bor hoher Reinheit。
公开(公告)号：EP0363743A2
公开(公告)日：1990-04-18
申请号：EP89117963.2
申请日：1989-09-28
申请人： ETHYL CORPORATION
发明人： Allen, Robert Hall , Ibrahim, Jameel
IPC分类号： C01B35/02 , C30B15/04
CPC分类号： C01B35/023 , C30B15/04 , Y10T428/29 , Y10T428/2982
摘要： Electronic grade boron in the form of free-flowing, bead-like particles, and suitable for use in continuous and semi-continuous Czochralski systems for preparing doped, single crystal silicon, said particles having an average size within the range of from 500 to 700 microns, a size distribution of less than 100 - 150 microns, and a purity of at least 99.9995 percent.
A process for preparing it, comprising contacting in a fluidized bed, (a) boron seed particles having a size within the range of from 150 to 200 millimicrons with (b) a gas comprising a thermally decomposable boron hydride, such as diborane ou decaborane, said seed particles being above the decompostition temperature of said hydride, whereby deposition of boron on said seed particles takes place until said particles have grown to an average size within the range of from 500 to 700 microns.
摘要翻译：电子级硼形式为自由流动的珠状颗粒，适用于制备掺杂单晶硅的连续和半连续切克劳斯基系统，所述颗粒的平均尺寸范围为500至700 微米，尺寸分布小于100-150微米，纯度至少为99.9995％。一种制备方法，包括在流化床中接触（a）尺寸在150至200毫微米范围内的硼晶粒，（b）包含可热分解的硼氢化物的气体，例如十硼烷乙硼烷，所述种子颗粒高于所述氢化物的分解温度，由此在所述种子颗粒上沉积硼直到所述颗粒已经生长至在500至700微米范围内的平均尺寸。

14. 发明公开

EP0305867A3 Hydrogen purification process 有权
标题翻译：氢气净化过程
公开(公告)号：EP0305867A3
公开(公告)日：1989-08-02
申请号：EP88113730.1
申请日：1988-08-23
申请人： ETHYL CORPORATION
发明人： Allen, Robert Hall
IPC分类号： C01B3/56 , C01B33/02 , C01B31/08
CPC分类号： C01B3/56 , C01B32/36 , C01B33/029 , C01B2203/043 , C01B2203/0465 , C01B2203/048
摘要： Hydrogen-containing effluent gas can be treated with activated carbon to remove boron or phosphorus impurity prior to recycle to a fluidized bed reactor. The process is conducted at cryogenic temperatures.

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