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161. 发明公开

EP2722704A2 Projection optical system, and exposure apparatus and exposure method 审中-公开
公开(公告)号：EP2722704A2
公开(公告)日：2014-04-23
申请号：EP13185919.1
申请日：2004-05-06
申请人： Nikon Corporation
发明人： Omura, Yasuhiro
IPC分类号： G02B17/08 , H01L21/027
CPC分类号： G03B27/522 , G02B17/08 , G02B17/0812 , G02B17/0828 , G02B17/0844 , G02B17/0892 , G03F7/70225 , G03F7/70341
摘要： A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1. Every transmitting member and every reflecting member with a refracting power forming the projection optical system are arranged along a single optical axis (AX) and the projection optical system has an effective imaging area of a predetermined shape not including the optical axis.

162. 发明公开

EP2722703A2 Projection optical system, and exposure apparatus and exposure method 审中-公开
标题翻译： Optisches Projektionssystem，und Belichtungsvorrichtung und Belichtungsverfahren
公开(公告)号：EP2722703A2
公开(公告)日：2014-04-23
申请号：EP13185918.3
申请日：2004-05-06
申请人： Nikon Corporation
发明人： Omura, Yasuhiro
IPC分类号： G02B17/08 , H01L21/027
CPC分类号： G03B27/522 , G02B17/08 , G02B17/0812 , G02B17/0828 , G02B17/0844 , G02B17/0892 , G03F7/70225 , G03F7/70341
摘要： A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1. Every transmitting member and every reflecting member with a refracting power forming the projection optical system are arranged along a single optical axis (AX) and the projection optical system has an effective imaging area of a predetermined shape not including the optical axis.
摘要翻译：用于在第二表面（W）上形成第一表面（R）的缩小图像的反射折射投射光学系统是具有优异成像性能的相对紧凑的投影光学系统，并且还针对各种像差（诸如色差和曲率）进行校正并且能够确保大的有效的图像侧数值孔径，同时适当地抑制光学表面上的反射损失。投影光学系统包括至少两个反射镜（CM1，CM2）和第一表面侧的表面具有正折射力的边界透镜（Lb），并且填充了边界透镜和第二表面之间的光路具有折射率大于1.1的介质（Lm）。每个发射构件和具有形成投影光学系统的折射能力的每个反射构件沿着单个光轴（AX）布置，并且投影光学系统具有不包括光轴的预定形状的有效成像区域。

163. 发明公开

EP2572224A4 A COMPACT, LIGHT-TRANSFER SYSTEM FOR USE IN IMAGE RELAY DEVICES, HYPERSPECTRAL IMAGERS AND SPECTROGRAPHS 审中-公开
标题翻译：小型光传输系统USE IN像中继设备和HYPERSPEKTRALABBILDUNGSVORRICHTUNGEN摄谱仪
公开(公告)号：EP2572224A4
公开(公告)日：2013-12-11
申请号：EP11782797
申请日：2011-05-12
申请人： ITRES RES LTD
发明人： ACHAL STEPHEN
IPC分类号： G02B17/00 , G01J3/02 , G01J3/18 , G01J3/28 , G02B17/08 , G02B27/40
CPC分类号： G02B17/08 , G01J3/0208 , G01J3/021 , G01J3/2823 , G02B13/22 , G02B17/0892

164. 发明公开

EP2660852A2 Projection optical system, exposure apparatus and exposure method 有权
公开(公告)号：EP2660852A2
公开(公告)日：2013-11-06
申请号：EP13174484.9
申请日：2006-05-08
申请人： Nikon Corporation
发明人： Omura, Yasuhiro , Okada, Takaya , Nagasaka, Hiroyuki
IPC分类号： H01L21/027 , G02B13/24 , G02B17/08 , G03F7/20 , G02B1/06 , G02B21/33
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).

165. 发明授权

EP1880249B1 SYSTEME OPTIQUE POUR UN DISPOSITIF DE LITHOGRAPHIE 有权
标题翻译：光学系统，用于平版印刷装置对
公开(公告)号：EP1880249B1
公开(公告)日：2012-05-23
申请号：EP06754963.4
申请日：2006-05-02
申请人： SAGEM Défense Sécurité
发明人： TANNE, Jean-François , MICHELIN, Jean-Luc , GEYL, Roland
IPC分类号： G03F7/20 , G02B17/08
CPC分类号： G02B17/008 , G02B17/0892 , G03F7/70225
摘要： The invention relates to a unit-magnification optical system that is telecentric in the image and object space, for use in medium-resolution lithography, comprising: a Dyson-Winne structure having a spherical concave mirror (10) working for an object (31) and an image (32) passing through its center of curvature, and an optical unit (11) placed in the vicinity of the center of curvature of said mirror, characterized in that it comprises, between the concave mirror and the optical unit: - a group (40) consisting of at least two lenses situated in the vicinity of said optical unit and having a field correction function and function for confining beams in a reduced volume, and; - a group (50) consisting of at least two other lenses situated in the vicinity of the concave mirror and serving to correct the opening and chromatism.

166. 发明授权

EP1532490B1 OPTISCHES ABBILDUNGSSYSTEM, INSBESONDERE KATADIOPTRISCHES REDUKTIONSOBJEKTIV 有权
标题翻译：光影像系统，尤其是反折射缩小透镜
公开(公告)号：EP1532490B1
公开(公告)日：2012-04-04
申请号：EP03794908.8
申请日：2003-08-21
申请人： Carl Zeiss SMT GmbH
发明人： ZACZEK, Christoph , Kürz, Birgit , ULLMANN, Jens , WAGNER, Christian
IPC分类号： G03F7/20 , G02B17/08 , G02B5/08
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225 , G03F7/70308 , G03F7/70566
摘要： The invention relates to an optical reproduction system, which can be configured for example as a catadioptric projection lens. Said system comprises an optical axis, a first deflection mirror, which is tilted in relation to the optical axis at a first tilt angle and a second deflection mirror, which is tilted in relation to the optical axis at a second tilt angle. One of the deflection mirrors has a ratio Rsp of the reflection coefficient Rs for s-polarised light to the reflection coefficient Rp for p-polarised light, in an incidence angle range that includes the tilt angle, of greater than one, whereas the corresponding ratio for the other deflection mirror is less than one. The deflection mirrors thus ensure that the polarisation-dependent influence of the traversing light remains minimal.

167. 发明授权

EP2189848B1 Catadioptric projection objective 失效转让
标题翻译：反射折射投影物镜
公开(公告)号：EP2189848B1
公开(公告)日：2012-03-28
申请号：EP09015829.6
申请日：2005-07-08
申请人： Carl Zeiss SMT GmbH
发明人： Shafer, David , Ulrich, Wilhelm , Dodoc, Aurelian , Von Bünau, Rudolf , Mann, Hans-Jürgen , Epple, Alexander , Beder, Susanne , Singer, Wolfgang
IPC分类号： G02B17/00 , G02B17/08 , G03F7/20
CPC分类号： G02B17/0892 , G02B17/0828 , G03F7/70225 , G03F7/70275 , G03F7/70341

168. 发明公开

EP2234141A4 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：光导照明系统，曝光装置以及元件制造工艺
公开(公告)号：EP2234141A4
公开(公告)日：2012-01-25
申请号：EP08861567
申请日：2008-11-04
申请人： NIPPON KOGAKU KK
发明人： TANITSU OSAMU , KITA NAONORI
IPC分类号： H01L21/027 , G02B17/08 , G02B19/00 , G02B26/08 , G03F7/20
CPC分类号： G03F7/70116 , G02B17/0892 , G02B26/0833
摘要： An illumination optical system achieves a desired pupil intensity distribution, for example, while suppressing influence of a diffraction blur of a diffraction image formed on an illumination pupil by reflected light from microscopic mirror elements arranged regularly. The illumination optical system (IL) which illuminates an illumination target surface (M) on the basis of light from a light source (1) is provided with a spatial light modulator (3a) having a plurality of optical elements arrayed two-dimensionally and being individually controllable, a distribution forming optical system (4, 5) which forms a predetermined light intensity distribution on an illumination pupil on the basis of light having traveled via the spatial light modulator, and a control unit (CR) which integrally controls postures of a group of optical elements according to a shape of the predetermined light intensity distribution formed on the illumination pupil.

169. 发明公开

EP1864177A4 SMALL ULTRA-HIGH NA CATADIOPTRIC OBJECTIVE 有权
标题翻译：具有超HIGH NA窄折反射物镜
公开(公告)号：EP1864177A4
公开(公告)日：2012-01-25
申请号：EP06739860
申请日：2006-03-28
申请人： KLA TENCOR TECH CORP
发明人： CHUANG YUNG-HO , SHAFER DAVID , ARMSTRONG JOSEPH J
IPC分类号： G02B21/00 , G02B17/08 , G02B21/02 , G03F7/20
CPC分类号： G02B17/0892 , G02B17/0812 , G02B17/0856 , G02B21/02 , G02B21/04 , G03F7/70225 , G03F7/70275 , G03F7/70341

170. 发明授权

EP1720199B1 OPTICAL SYSTEM, EXPOSURE SYSTEM, AND EXPOSURE METHOD 有权
标题翻译：光学系统，曝光系统和曝光方法
公开(公告)号：EP1720199B1
公开(公告)日：2011-12-07
申请号：EP05703645.1
申请日：2005-01-14
申请人： NIKON CORPORATION
发明人： OMURA, Yasuhiro, c/o NIKON CORPORATION
IPC分类号： H01L21/027 , G02B13/24 , G02B17/08 , G03F7/20
CPC分类号： G02B17/0892 , G02B13/143 , G02B17/08 , G02B27/28 , G03F7/70091 , G03F7/70191 , G03F7/70566 , G03F7/70966
摘要： An optical system is able to achieve a substantially azimuthal polarization state in a lens aperture while suppressing loss of light quantity, based on a simple configuration. The optical system of the present invention is provided with a birefringent element (21) for achieving a substantially circumferential distribution or a substantially radial distribution as a fast axis distribution in a lens aperture, and an optical rotator (22) located behind the birefringent element and adapted to rotate a polarization state in the lens aperture. The birefringent element has an optically transparent member which is made of a uniaxial crystal material and a crystallographic axis of which is arranged substantially in parallel with an optical axis of the optical system. A beam bundle of substantially spherical waves in a substantially circular polarization state is incident to the optically transparent member.

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