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    • 132. 发明公开
    • Transparent material having antireflective coating
    • 透明材料
    • EP0119331A1
    • 1984-09-26
    • EP83301370.9
    • 1983-03-11
    • TORAY INDUSTRIES, INC.
    • Taniguchi, TakashiMibae, Jiro
    • G02B1/10
    • C03C17/42C03C2217/73C03C2217/734G02B1/111
    • A transparent material having an antireflective coating comprising at least two layers, which is formed at least on a part of the surface of a transparent substrate is provided. The thickness and refractive index of the layer (layer 1) contiguous to the substrate and the thickness and refractive index of the outermost layer (layer 0) satisfy the following requirements: and wherein n, is the refractive index of layer I, no is the refractive index of layer 0, d 1 is the film thickness (nm) of layer 1, do is the film thickness (nm) of layer 0, I is a positive integer, m is an odd positive integer and λ is an optional standard wavelength (nm) selected within the visible ray wavelength region or in the vicinity thereof. The requirements of n 1 > no and n 1 > n s in which n s is the refractive index of the substrate are also satisfied. The composition for forming layer I comprises at least one member selected from Ti, Al and Zr alkoxides, acylates, chelate compounds of these metals and liquid dispersions of oxides of these metals in an amount of at least 10 wt.% as the metal oxide equivalent weight, based on the coating layer-forming components. The composition for forming layer 0 comprises an organic silicon compound of the formula: R 1 a R 2 6 Si(OR) 4-a-b wherein R' and R 2 are a C(1-10) hydrocarbon group which contains alkyl, alkenyl, aryl, halogeno, epoxy, amino, mercapto, methacryloxy or cyano, R is alkyl, alkoxyalkyl or acyl, a and b are 0 or 1, and the sum of a and b is 1 or 2, and/or a hydrolyzed product of the organic silicon compound in an amount of at least 20 wt.% as the solid content equivalent weight, based on the coating layer-forming components.
    • 提供了具有包括至少两层的抗反射涂层的透明材料,其至少形成在透明基板的表面的至少一部分上。 与衬底相邻的层(层I)的厚度和折射率以及最外层(层O)的厚度和折射率满足以下要求:I /4λ×0.7 nO和nI> nS的要求也是满足的。 用于形成层I的组合物包含至少一种选自Ti,Al和Zr醇盐的组分,酰化物,这些金属的螯合化合物和这些金属的氧化物的液体分散体,其量为至少10重量%作为金属氧化物当量 重量,基于涂层形成组分。 用于形成层O的组合物包含下式的有机硅化合物:R 1 a R bSi(OR)4-ab其中R 1和R 2是C(1-10)烃基 其中包含烷基,烯基,芳基,卤代,环氧基,氨基,巯基,甲基丙烯酰氧基或氰基,R是烷基,烷氧基烷基或酰基,a和b分别为0或1,a和b之和为1或2,和/ 或有机硅化合物的水解产物,其量为固体成分当量重量的至少20重量%,基于涂层形成组分。