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101. 发明公开

EP3046174A1 REDOX FLOW SECONDARY BATTERY AND ELECTROLYTE MEMBRANE FOR REDOX FLOW SECONDARY BATTERY 有权转让
标题翻译：氧化还原液流二次电池电解质膜的氧化还原液流二次电池
公开(公告)号：EP3046174A1
公开(公告)日：2016-07-20
申请号：EP16159747.1
申请日：2012-12-27
申请人： Asahi Kasei E-materials Corporation
发明人： Kato, Akihiro , Miyake, Naoto
IPC分类号： H01M8/18 , C08J5/22 , C08L27/18 , C08L79/04 , H01B1/06 , H01M8/02 , H01M8/10 , H01B1/12 , H01M8/20 , H01M8/0239 , H01M8/0241 , H01M8/0293 , H01M8/1023 , H01M8/1039 , H01M8/1058
CPC分类号： H01M8/188 , C08J5/2287 , C08J2327/18 , C08L27/18 , H01B1/122 , H01M8/0239 , H01M8/0241 , H01M8/0289 , H01M8/0293 , H01M8/1023 , H01M8/1039 , H01M8/1058 , H01M8/20 , H01M2300/0082 , Y02E60/528 , C08L71/12 , C08L81/04
摘要： This redox flow secondary battery has an electrolyte tank (6) containing: a positive electrode cell chamber (2) containing a positive electrode (1) comprising a carbon electrode; a negative electrode cell chamber (4) containing a negative electrode (3) comprising a carbon electrode; and an electrolyte membrane (5) as a barrier membrane that separates/isolates the positive electrode cell chamber (2) and the negative electrode cell chamber (4). The positive electrode cell chamber (2) contains a positive electrode electrolyte containing an active substance, the negative electrode cell chamber (4) contains a negative electrode electrolyte containing an active substance, and the redox flow secondary battery charges and discharges on the basis of the change in valency of the active substances in the electrolytes. The electrolyte membrane (5) contains an ion exchange resin composition that is primarily a polyelectrolye polymer, and the electrolyte membrane (5) has a reinforcing material comprising a fluorine-based porous membrane.

102. 发明公开

EP3018742A1 ELECTROLYTE SOLUTION AND METHOD FOR MANUFACTURING SAME, CONTINUOUS DISSOLVING DEVICE, ELECTROLYTE MEMBRANE, ELECTRODE CATALYST LAYER, MEMBRANE-ELECTRODE ASSEMBLY, AND FUEL CELL 有权转让
标题翻译：电解质溶液及其制备方法THEREOF PASS开盖装置，电解质膜电极催化剂层，电极装置和燃料电池膜
公开(公告)号：EP3018742A1
公开(公告)日：2016-05-11
申请号：EP14820166.8
申请日：2014-06-26
申请人： Asahi Kasei E-Materials Corporation , DAIKIN INDUSTRIES, LTD.
发明人： TAGO, Takahiro , MURAKAMI, Tetsuya , OHTSUKA, Kazuhiro
IPC分类号： H01M8/02 , C08F214/18 , C08F216/14 , C08J5/18 , H01B1/06 , H01M4/86 , H01M8/10
CPC分类号： H01M8/1039 , C08F216/14 , C08J5/2237 , H01M4/9008 , H01M8/1004 , H01M8/1023 , H01M8/1081 , H01M2008/1095 , H01M2300/0082 , Y02P70/56
摘要： A method for producing an electrolyte solution including a supply step of continuously supplying an emulsion based a polymer electrolyte and a solvent into a dissolution facility, and a dissolution step of continuously dissolving the polymer electrolyte in the solvent by heating the interior of the dissolution facility to obtain the electrolyte solution.
摘要翻译：一种用于在电解质溶液生产包含连续供给的供给步骤方法乳液为基础的高分子电解质并进入溶解设施中的溶剂，和通过加热溶解设施的内部连续地在溶剂中的聚合物电解质溶解的溶解步骤获得电解质溶液。

103. 发明公开

EP3007237A1 LED PATTERN WAFER, LED EPITAXIAL WAFER, AND PRODUCTION METHOD FOR LED EPITAXIAL WAFER 有权
标题翻译： MUSTER-WAFERFÜREINE LEUCHTDIODE UND EPITAKTISCHER WAFERFÜREINE LEUCHTDIODE
公开(公告)号：EP3007237A1
公开(公告)日：2016-04-13
申请号：EP14803459.8
申请日：2014-05-28
申请人： Asahi Kasei E-Materials Corporation
发明人： KOIKE, Jun
IPC分类号： H01L33/22 , H01L21/205 , H01L21/3065
CPC分类号： H01L33/20 , H01L21/0237 , H01L21/0243 , H01L21/02458 , H01L21/0254 , H01L22/12 , H01L33/005 , H01L33/007
摘要： A pattern wafer (10) for LEDs is provided with an uneven structure A (20) having an arrangement with n-fold symmetry substantially on at least a part of the main surface, where in at least a part of the uneven structure A (20), a rotation shift angle Θ meets 0°≤Θ≤(180/n)° in which Θ is the rotation shift angle of an arrangement axis A of the uneven structure A (20) with respect to a crystal axis direction in the main surface, and a top of the convex-portion of the uneven structure A (20) is a corner portion with a radius of curvature exceeding "0". A first semiconductor layer (30), light emitting semiconductor layer (40) and second semiconductor layer (50) are layered on the uneven structure A (20) to constitute an epitaxial wafer (100) for LEDs. It is possible to provide the pattern wafer for LEDs and epitaxial wafer for LEDs with cracks and internal quantum efficiency IQE improved.
摘要翻译：用于LED的图案晶片（10）设置有基本上在主表面的至少一部分上具有n倍对称配置的不平坦结构A（20），其中在不平坦结构A（20）的至少一部分），旋转偏移角〜满足0°‰〜（¯）（180 / n）°，其中〜是不平坦结构A（20）相对于晶轴方向的排列轴A的旋转移位角主表面和凹凸结构A（20）的凸部的顶部是曲率半径超过“0”的角部。第一半导体层（30），发光半导体层（40）和第二半导体层（50）被层叠在不平坦结构A（20）上以构成用于LED的外延晶片（100）。可以提供用于LED的图案晶片和用于具有裂纹和内部量子效率IQE的LED的外延晶片。

104. 发明授权

EP2613390B1 FLUORINE-CONTAINING POLYMER ELECTROLYTE MEMBRANE 有权转让
标题翻译： FLUOR含氟聚合物电解质膜
公开(公告)号：EP2613390B1
公开(公告)日：2016-01-13
申请号：EP11830709.9
申请日：2011-10-05
申请人： Asahi Kasei E-Materials Corporation
发明人： YAMANE, Michiyo , MIYAKE, Naoto
IPC分类号： H01M8/02 , C08J9/42 , C08L27/18 , H01B1/06 , H01M8/10 , C08J5/22 , C09D127/22 , H01B1/12
CPC分类号： H01M8/1018 , C08J5/2206 , C08J2323/18 , C08L27/18 , C08L2205/02 , C09D127/22 , H01B1/122 , H01M8/1023 , H01M8/103 , H01M8/1032 , H01M8/1039 , H01M8/1044 , H01M8/106 , H01M8/1062 , H01M2008/1095 , Y02E60/521 , C08L27/22

105. 发明授权

EP2407521B1 COATING COMPOSITION, COATING FILM, LAMINATE, AND PROCESS FOR PRODUCTION OF LAMINATE 有权转让
标题翻译：涂料组合物，涂膜层压板和制造方法层压
公开(公告)号：EP2407521B1
公开(公告)日：2015-07-29
申请号：EP10750899.6
申请日：2010-03-11
申请人： Asahi Kasei E-Materials Corporation
发明人： TAKANOHASHI, Hiroaki , HIROSE, Junichi , GOTO, Waka , OGAWA, Shuichiro , SHIRAISHI, Kentaro
IPC分类号： C09D201/00 , B05D7/24 , B32B9/00 , B32B27/18 , C09D5/02 , C09D7/12 , C09D143/04 , C09D151/08 , C09D183/04 , G02B1/10 , G02B1/11
CPC分类号： B05D3/007 , C08F220/18 , C08F222/38 , C08F230/08 , C08G77/20 , C08G77/70 , C08J7/045 , C08J2369/00 , C08K3/22 , C08K3/36 , C08K5/5415 , C08K5/5425 , C08K2003/2241 , C09D5/006 , C09D5/024 , C09D5/18 , C09D7/62 , C09D7/65 , C09D7/67 , C09D7/68 , C09D143/04 , C09D147/00 , F24S70/275 , G02B1/10 , G02B1/105 , G02B1/18 , G02B5/08 , H01L31/02167 , H01L31/048 , H01L31/0481 , H02S40/10 , H02S40/20 , Y02E10/46 , Y02E10/50 , Y02E10/52 , Y10T428/2438 , Y10T428/24942 , Y10T428/24975 , Y10T428/25 , Y10T428/254 , Y10T428/256 , Y10T428/259
摘要： [Problem to be Solved] Provided is a coating composition excellent in antifouling properties, transparency and hydrophilicity and capable of maintaining surface hydrophilicity even at high temperature. [Solution] A coating composition containing (A) a metal oxide particle having a number average particle size of 1 nm to 400 nm, and (B) a polymer particle, in which the content of an aqueous-phase component in the component (B), represented by the following expression (I), is 20 mass% or less. The content of the aqueous - phase component % = dry mass of a filtrate obtained by filtering the component B at a molecular cutoff of 50 , 000 × 100 - total mass of solid content / mass of the filtrate - dry mass of the filtrate × 100 / the total mass of solid content

106. 发明公开

EP2862707A1 FUNCTION-TRANSFERRING OBJECT, METHOD FOR TRANSFERRING FUNCTIONAL LAYER, PACKAGE AND FUNCTION-TRANSFERRING FILM ROLL 审中-公开
标题翻译：功能转换对象，方法用于转移功能层，包装和功能支持的电影角色
公开(公告)号：EP2862707A1
公开(公告)日：2015-04-22
申请号：EP13804276.7
申请日：2013-06-10
申请人： Asahi Kasei E-Materials Corporation
发明人： KOIKE, Jun , YAMAGUCHI, Fujito
IPC分类号： B32B3/30 , B29C59/02 , B29C59/04 , H01L21/027
CPC分类号： B32B3/30 , B32B27/08 , B32B27/16 , B32B27/38 , B32B27/42 , B32B37/025 , B32B37/18 , B32B38/10 , B32B2307/536 , B32B2307/538 , B32B2457/00 , B32B2457/18 , B32B2457/206 , B32B2551/00 , G03F7/0002 , H01L2933/0083 , Y10T428/1352 , Y10T428/24355
摘要： A function transfer product (14) is provided with a carrier (10) having a concavo-convex structure (11) of nanostructure, and a functional layer (12) provided on the concavo-convex structure (11). The functional layer (12) is beforehand provided on the surface of the concavo-convex structure (11), and is directly brought into contact with one main surface of a target object (20), and then the carrier (10) is removed from the functional layer (12) to transfer the functional layer (12) to the target object (20). An average pitch of the concavo-convex structure (11) ranges from 1 nm to 1500 nm, the functional layer (12) contains a resin, and a ratio (Ra/lor) between surface roughness (Ra) on the exposed surface side of the functional layer (12) and a distance between a top position of a convex-portion of the concavo-convex structure (11) and the exposed surface of the functional layer (12) is 1.2 or less. Further, the functional layer (12) is arranged inside concave portions (11a), and the exposed surface thereof is in a non-liquid state at a temperature of 20°C under light shielding. It is possible to add the function onto the target object (20) with high accuracy.
摘要翻译：函数转移产物（14）设置有具有纳米结构的凹凸结构（11）的载体（10），和设置在该凹凸结构（11）的功能层（12）。功能层（12）被预先设置凹凸结构（11）的表面上，并且直接接触与目标对象（20）的一个主表面上，然后所述载体（10）由去除功能层（12）到所述功能层（12）转移到目标对象（20）。凹凸结构的平均间距（11）的范围为1个纳米到1500纳米，所述功能层（12）包含上的暴露的表面侧的树脂，和表面粗糙度（Ra）之间的比率（RA / LOR）功能层（12）和所述凹凸结构（11）的凸部的顶部位置和所述功能层（12）的暴露的表面之间的距离为1.2或更小。此外，功能层（12）布置的凹部（11A）内，并且其露出面是在非液体状态在20℃下光屏蔽的温度。有可能添加函数到所述目标物体（20）以高精确度。

107. 发明授权

EP2261276B1 POLYOLEFIN MICROPOROUS MEMBRANE AND PRODUCTS OF WINDING 有权
标题翻译：微孔聚烯烃和缠绕制品
公开(公告)号：EP2261276B1
公开(公告)日：2015-01-28
申请号：EP09729155.3
申请日：2009-03-26
申请人： Asahi Kasei E-materials Corporation
发明人： TAKEDA, Hisashi , INAGAKI, Daisuke , IIDANI, Kazuya , IZUMI, Yoshihiko
IPC分类号： H01M2/16 , C08J5/18 , C08L23/04 , C08L23/06 , C08L23/10 , C08L23/12
CPC分类号： H01M2/1653 , C08J5/18 , C08J2323/02 , C08J2323/04 , C08J2323/06 , C08J2423/10 , C08J2423/12 , H01M4/131 , H01M4/133 , H01M10/0525

108. 发明公开

EP2827361A1 MOLD, RESIST LAMINATE AND MANUFACTURING PROCESS THEREFOR, AND MICRORELIEF STRUCTURE 审中-公开
标题翻译：模具，抗蚀层压板及其制造工艺及微结构
公开(公告)号：EP2827361A1
公开(公告)日：2015-01-21
申请号：EP13761076.2
申请日：2013-03-11
申请人： Asahi Kasei E-materials Corporation
发明人： KOIKE, Jun
IPC分类号： H01L21/027 , B29C33/38 , B29C33/42 , B29C59/02 , B32B3/26
CPC分类号： B29C59/022 , B29C33/3857 , B29C33/424 , B29C71/04 , B29C2059/023 , B29K2027/12 , B29K2883/00 , B29K2995/0077 , B32B3/266 , B32B3/30 , B32B27/08 , B32B27/20 , B32B27/281 , B32B27/283 , B32B27/325 , B32B27/36 , B32B2264/102 , B32B2264/104 , B32B2307/518 , B32B2315/00 , B32B2457/00 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L33/22 , H01L2924/0002 , Y10T428/24322 , Y10T428/24612 , H01L2924/00
摘要： A resist layered product (30) is provided with an inorganic substrate (21), first resist layer (22) provided on one main surface of the inorganic substrate (21), and second resist layer (23), provided on the first resist layer (22), provided with a concavo-convex structure (23a) on its surface. In the concavo-convex structure (23a), a thickness of a residual film after transfer is 50 nm or less, the ratio (lcv/lcc) of a top width of convex-portion (lcv) to an opening width of concave-portion (lcc) of a fine pattern of a mold is in a predetermined range, and the ratio (Vr2/Vcm) between a concave-portion volume (Vcm) of the fine pattern of the mold and a volume (Vr2) of the second resist layer (23) is in a predetermined range. It is possible to easily form a resist mask (25) having a thin and uniform residual film on the inorganic substrate (21).
摘要翻译：抗蚀剂层叠体（30）具备无机基板（21），设置在无机基板（21）的一个主面上的第一抗蚀剂层（22）和设置在第一抗蚀剂层（23）上的第二抗蚀剂层（22），在其表面上设有凹凸结构（23a）。在凹凸构造（23a）中，转印后的残膜的厚度为50nm以下，凸部的顶部宽度（lcv）相对于凹部的开口宽度的比率（lcv / lcc）（lcc）在模具的精细图案的预定范围内，并且模具的精细图案的凹部体积（Vcm）和第二抗蚀剂的体积（Vr2）之间的比率（Vr2 / Vcm）层（23）处于预定范围内。可以容易地在无机基板（21）上形成具有薄而均匀的残留膜的抗蚀剂掩模（25）。

109. 发明公开

EP2808735A1 FINE UNEVENNESS STRUCTURE BODY, DRY ETCHING THERMO-REACTIVE RESIST MATERIAL, MOLD FABRICATION METHOD, AND MOLD 有权
标题翻译：细凹凸结构，生产形式方法和热利用产品反应型抗蚀材料
公开(公告)号：EP2808735A1
公开(公告)日：2014-12-03
申请号：EP13741525.3
申请日：2013-01-24
申请人： ASAHI KASEI E-MATERIALS CORPORATION
发明人： MITAMURA, Yoshimichi
IPC分类号： G03F7/004 , B29C33/38 , G03F7/40 , H01L21/027
CPC分类号： B29C33/3842 , B29C33/38 , B29C33/42 , B29C59/002 , B29K2905/06 , B29L2031/757 , B81C99/0085 , C09K13/00 , C23F1/00 , G03F7/0002 , G03F7/04 , G03F7/0755 , H01L21/0337 , Y10T428/24612
摘要： A fine concavo-convex structure product (10) is provided with an etching layer (11), and a resist layer (12) comprised of a heat-reactive resist material for dry etching provided on the etching layer (11), a concavo-convex structure associated with opening portions (12a) formed in the resist layer (12) is formed in the etching layer (11), a pattern pitch P of a fine pattern of the concavo-convex structure ranges from 1 nm to 10 µm, a pattern depth H of the fine pattern ranges from 1 nm to 10 µm, and a pattern cross-sectional shape of the fine pattern is a trapezoid, a triangle or a mixed shape thereof. The heat-reactive resist material for dry etching has, as a principal constituent element, at least one species selected from the group consisting of Cu, Nb, Sn, Mn, oxides thereof, nitrides thereof and NiBi.
摘要翻译：甲微细凹凸结构的产物（10）在蚀刻层（11）设置有，和抗蚀剂层（12）包括用于提供所述蚀刻层（11）上的干蚀刻的热反应型抗蚀剂材料的，一个concavo- 在该抗蚀剂层（12）形成的开口部分（12a）的相关联的凹凸结构的蚀刻层（11），所述凹凸结构的微细图案的图案间距P为1纳米至10微米的范围内形成，一微细图案的图案深度H为1纳米至10微米，和图案的精细图案的横截面形状是梯形，三角形或它们的混合形状。所述热反应型抗蚀剂材料的干式蚀刻具有作为主要构成要素，其选自包括Cu，Nb的，锡，锰中选择的至少一种物质，它们的氧化物，它们的和NiBi氮化物。

110. 发明公开

EP2808368A1 COATING COMPOSITION AND ANTIREFLECTION FILM 有权转让
标题翻译： BESCHICHTUNGSZUSAMMENSETZUNG UND反义词
公开(公告)号：EP2808368A1
公开(公告)日：2014-12-03
申请号：EP13740897.7
申请日：2013-01-23
申请人： Asahi Kasei E-Materials Corporation
发明人： SHIRAISHI, Kentaro , TAKANOHASHI, Hiroaki
IPC分类号： C09D201/00 , C09D5/02 , C09D5/16 , C09D7/12 , C09D143/04 , C09D183/04 , G02B1/11 , H01L31/052
CPC分类号： H01L31/02168 , C08G77/442 , C08K3/22 , C08K3/36 , C08K7/18 , C08K9/06 , C08K2201/016 , C09D5/006 , C09D5/028 , C09D5/1618 , C09D7/67 , C09D7/69 , C09D7/70 , C09D143/04 , C09D183/00 , C09D183/10 , G02B1/11 , G02B1/111 , H01L31/048 , H01L31/0543 , H02S40/20 , Y02E10/52 , Y10T428/25 , C08K5/5415
摘要： The coating composition according to the present invention includes a metal oxide (A) containing a spherical metal oxide (a1) and a chain metal oxide (a2) having an aspect ratio (major diameter/minor diameter) of 3 to 25, and a polymer emulsion particle (B). The coating composition according to the present invention preferably further includes a hydrolyzable silicon compound (C). The antireflection film according to the present invention is obtained by applying and drying the coating composition on a substrate.
摘要翻译：根据本发明的涂料组合物包含含有球形金属氧化物（a1）的金属氧化物（A）和长径比（长径/短径）为3〜25的链状金属氧化物（a2），聚合物乳剂颗粒（B）。根据本发明的涂料组合物优选还包括可水解硅化合物（C）。本发明的抗反射膜是通过在基材上涂布干燥涂料组合物得到的。

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