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    • 91. 发明公开
    • Gas distribution ring for plasma gun
    • GasvaltelungsringfürPlasmabrenner。
    • EP0244773A2
    • 1987-11-11
    • EP87106309.5
    • 1987-04-30
    • THE PERKIN-ELMER CORPORATION
    • Yakovlevitch, DanielRotolico, Anthony J.
    • H05H1/34H05H1/42
    • H05H1/3405B05B7/226H05H2001/3436H05H2001/3468H05H2001/3478H05H2001/3484
    • A gas distribution ring for a plasma gun comprises a ring member with two sets of gas inlet orifices extending from the outer surface inwardly through the ring member. The outer surface has an undulated groove for an 0-ring formed therein, and the orifices are positioned with respect to the undulated O-ring such that one set of orifices are isolated on one side of the O-ring and the other set of orifices are isolated on the other side of the O-ring. In a preferred embodiment the orifices of one set are radial with respect to the axis of the ring, and the orifices on the other side of the undulated O-ring have a tangential component to provide vortical gas flow in the arc region of the gun. The gas distribution ring positioned in the plasma spray gun permits a simple choice between radial and vortical flow in the arc region of the gun, without alteration of the gun.
    • 用于等离子体枪的气体分配环包括具有两组从外表面向内延伸穿过环件的气体入口孔的环件。 外表面具有用于形成在其中的O形环的凹凸槽,并且孔相对于波状O形环定位,使得一组孔在O形环和另一组孔口的一侧被隔离 在O形圈的另一侧是隔离的。 在优选实施例中,一组的孔相对于环的轴线是径向的,并且波纹O形环的另一侧上的孔具有切向分量,以在枪的弧区域中提供涡流气流。 定位在等离子喷枪中的气体分配环允许在枪的弧区域中的径向和涡旋流之间的简单选择,而不改变喷枪。