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91. 发明公开

EP2599106A4 METHOD AND SYSTEM FOR PROVIDING PROCESS TOOL CORRECTABLES 无效
标题翻译： VERFAHREN UND系统ZUR BEREITSTELLUNG VON PROZESSWERKZEUG-KORREKTURMITTELN
公开(公告)号：EP2599106A4
公开(公告)日：2016-10-26
申请号：EP11813139
申请日：2011-07-27
申请人： KLA TENCOR CORP
发明人： COHEN GUY , KLEIN DANA , IZIKSON PAVEL
IPC分类号： H01L21/02 , H01L21/027 , H01L21/66
CPC分类号： G05B19/41875 , G05B2219/32182 , Y02P90/22

92. 发明公开

EP2949015A4 193NM LASER AND INSPECTION SYSTEM 有权
标题翻译： 193nm的激光和检查系统，以便
公开(公告)号：EP2949015A4
公开(公告)日：2016-09-07
申请号：EP14742754
申请日：2014-01-24
申请人： KLA TENCOR CORP
发明人： CHUANG YUNG-HO ALEX , ARMSTRONG J JOSEPH , DRIBINSKI VLADIMIR , DENG YUJUN , FIELDEN JOHN
IPC分类号： H01S3/00 , G01N21/95 , G01N21/956 , G02F1/35 , G02F1/39
CPC分类号： H01S3/1083 , G01N21/84 , G01N21/9501 , G01N21/956 , G01N2021/95676 , G02F1/3534 , G02F1/3536 , G02F1/39 , G02F2001/3507 , G02F2201/16 , H01S3/0078 , H01S3/0092 , H01S3/0602 , H01S3/067
摘要： A laser for generating an output wavelength of approximately 193.4 nm includes a fundamental laser, an optical parametric generator, a fourth harmonic generator, and a frequency mixing module. The optical parametric generator, which is coupled to the fundamental laser, can generate a down-converted signal. The fourth harmonic generator, which may be coupled to the optical parametric generator or the fundamental laser, can generate a fourth harmonic. The frequency mixing module, which is coupled to the optical parametric generator and the fourth harmonic generator, can generate a laser output at a frequency equal to a sum of the fourth harmonic and twice a frequency of the down-converted signal.

93. 发明公开

EP2751832A4 METHOD AND SYSTEM FOR DETECTING AND CORRECTING PROBLEMATIC ADVANCED PROCESS CONTROL PARAMETERS 无效
标题翻译：方法和装置检测和纠正问题的FORGE SCHRITTENER工艺控制参数
公开(公告)号：EP2751832A4
公开(公告)日：2016-07-20
申请号：EP12828638
申请日：2012-08-30
申请人： KLA TENCOR CORP
发明人： CHOI DONGSUB , TIEN DAVID
IPC分类号： G05B19/418 , G05B13/04 , H01L21/66
CPC分类号： G05B19/41875 , G05B13/04 , G05B2219/32018 , G05B2219/32191 , G05B2219/42001 , G05B2219/45031 , Y02P90/22

94. 发明公开

EP2896062A4 DUAL-LENS-GUN ELECTRON BEAM APPARATUS AND METHODS FOR HIGH-RESOLUTION IMAGING WITH BOTH HIGH AND LOW BEAM CURRENTS 有权
标题翻译：双透镜电子枪法高分辨率成像和高标度的束流
公开(公告)号：EP2896062A4
公开(公告)日：2016-06-08
申请号：EP13837241
申请日：2013-09-13
申请人： KLA TENCOR CORP
发明人： JIANG XINRONG , HAN LIQUN
IPC分类号： H01J37/26
CPC分类号： H01J37/063 , H01J3/029 , H01J3/08 , H01J37/09 , H01J2237/0458 , H01J2237/30472
摘要： One embodiment relates to an electron beam apparatus which includes a dual-lens electron gun for emitting an electron beam. The electron beam is a high beam-current electron beam in a first operating mode and a low beam-current electron beam in a second operating mode. The apparatus further includes a column aperture which is out of the path of the high beam-current electron beam in the first operating mode and is centered about an optical axis of the electron beam apparatus in the second operating mode. Another embodiment relates to an electron gun which includes a first gun lens, a beam limiting aperture, and a second gun lens. The first gun lens focuses the electrons before they pass through the beam-limiting aperture while the second gun lens focuses the electrons after they pass through the beam-limiting aperture. Other embodiments, aspects and features are also disclosed.

95. 发明公开

EP2537180A4 METHOD AND SYSTEM FOR PROVIDING PROCESS TOOL CORRECTABLES USING AN OPTIMZED SAMPLING SCHEME WITH SMART INTERPOLATION 有权
标题翻译：方法和系统提供PROZESSWERKZEUGKORRIGIERBARER使用优化的扫描方案智能插值
公开(公告)号：EP2537180A4
公开(公告)日：2016-05-04
申请号：EP11745086
申请日：2011-02-14
申请人： KLA TENCOR CORP
发明人： IZIKSON PAVEL , KANDEL DANIEL , ROBINSON JOHN
IPC分类号： H01L21/66 , H01L21/027
CPC分类号： H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： The present invention may include performing a first measurement on a wafer of a first lot of wafers via an omniscient sampling process, calculating a first set of process tool correctables utilizing one or more results of the measurement performed via an omniscient sampling process, randomly selecting a set of field sampling locations of the wafer of a first lot of wafers, calculating a second set of process tool correctables by applying an interpolation process to the randomly selected set of field sampling locations, wherein the interpolation process utilizes values from the first set of process tool correctables for the randomly selected set of field sampling locations in order to calculate correctables for fields of the wafer of the first lot not included in the set of randomly selected fields, and determining a sub-sampling scheme by comparing the first set of process tool correctables to the second set of correctables.
摘要翻译：本发明可以包括经由在全知采样处理的第一批晶圆的晶片上执行第一测量，计算第一组处理工具可校正值的利用通过在全知采样过程所执行的测量的一个或多个结果，随机地选择一个集的第一批晶圆的晶片的场的采样位置的，通过施加到内插处理，以随机选择的组场采样位置的，worin内插处理计算第二组处理工具可校正值的利用来自所述第一组工艺的值工具可校正值用于为了计算可校正值对未包括在所述一组随机选择的视野的第一批次的晶片的字段中的随机选择的组场采样位置的，和确定性采矿子采样方案，通过比较所述第一组处理工具的可校正值到第二组可校正值的。

96. 发明公开

EP2836874A4 ARRANGEMENT OF RETICLE POSITIONING DEVICE FOR ACTINIC INSPECTION OF EUV RETICLES 有权
标题翻译：安排RETIKELPOSITIONIERUNGSVORRICHTUNG辐射调查EUV光罩作者：
公开(公告)号：EP2836874A4
公开(公告)日：2016-04-27
申请号：EP13775812
申请日：2013-04-10
申请人： KLA TENCOR CORP
发明人： SUBRAHMANYAN PRADEEP , WILLIAMS MARK , NAYFEH SAMIR
IPC分类号： G03F1/84 , G03B27/62 , G03F7/20
CPC分类号： G01N21/01 , G03F1/84
摘要： A reticle positioning apparatus for actinic EUV reticle inspection including a sealed inspection chamber containing a reticle stage for holding a reticle. The reticle stage has a magnetically suspended upper stage with a long travel in a “y” direction and a magnetically suspended lower stage with a long travel in an “x” direction; and a cable stage chamber isolated from the inspection chamber by a cable chamber wall. The cable stage chamber has a cable stage movable in the “y” direction; and a tube connected at one end to the reticle stage and to the cable stage at the other end. The tube passes from the cable stage through the inspection chamber through a seal in the chamber wall and opening into the cable entry chamber for entry of cables and hoses within the cable stage chamber, which cables and hoses pass through the tube to the reticle stage.

97. 发明公开

EP2836817A4 TEMPERATURE CONTROL IN EUV RETICLE INSPECTION TOOL 审中-公开
标题翻译：温度控制IN A EUV光罩检测工具
公开(公告)号：EP2836817A4
公开(公告)日：2016-03-30
申请号：EP13776111
申请日：2013-04-08
申请人： KLA TENCOR CORP
发明人： CHILESE FRANK , WACK DANIEL , FOWLER DOUGLAS
IPC分类号： G01N21/33 , G03F7/20
CPC分类号： G03F7/20 , G01N2021/95676 , G03F1/22 , G03F1/84 , G03F7/70875 , G03F7/70891

98. 发明公开

EP2839505A4 APPARATUS AND METHOD FOR SYNCHRONIZING SAMPLE STAGE MOTION WITH A TIME DELAY INTEGRATION CHARGE-COUPLE DEVICE IN A SEMICONDUCTOR INSPECTION TOOL 有权
标题翻译：装置和方法用于同步与时间延迟积分电荷耦合器件的样品台运动IN AHALBLEITERPRÜFWERKZEUG
公开(公告)号：EP2839505A4
公开(公告)日：2015-11-25
申请号：EP13777897
申请日：2013-04-15
申请人： KLA TENCOR CORP
发明人： SUBRAHMANYAN PRADEEP , WACK DANIEL , WRIGHT MICHAEL , ALLES DAVID
IPC分类号： H01L21/68 , H01L21/66
CPC分类号： G01N21/9501 , G01N21/956 , G01N2021/95676
摘要： A method for synchronizing sample stage motion with a time delay integration (TDI) charge-couple device (CCD) in a semiconductor inspection tool, including: measuring a lateral position of a stage holding a sample being inspected; measuring a vertical position of the stage; determining a corrected lateral position of an imaged pixel of the sample based on the measured lateral and vertical positions; and synchronizing charge transfer of the TDI CCD with the corrected lateral position of the imaged pixel.

99. 发明公开

EP2780679A4 HIGH THROUGHPUT HOT TESTING METHOD AND SYSTEM FOR HIGH BRIGHTNESS LIGHT EMITTING DIODES 无效
标题翻译：高通量HOT程序和系统与高亮度LED
公开(公告)号：EP2780679A4
公开(公告)日：2015-11-25
申请号：EP12850675
申请日：2012-11-13
申请人： KLA TENCOR CORP
发明人： SOLARZ RICHARD
IPC分类号： G01K11/20 , G01N21/66 , G01N21/71 , H01L21/66 , H01L33/32 , H01L33/44 , H05B33/10
CPC分类号： G01R31/44 , G01N21/66 , G01N21/71 , H01L33/32 , H01L33/44 , H05B33/10

100. 发明公开

EP2831673A4 APPARATUS AND METHODS FOR RETICLE HANDLING IN AN EUV RETICLE INSPECTION TOOL 有权
标题翻译：用于EUV型检测工具中的处理的装置和方法
公开(公告)号：EP2831673A4
公开(公告)日：2015-11-11
申请号：EP13769488
申请日：2013-03-25
申请人： KLA TENCOR CORP
发明人： CHILESE FRANCIS CHARLES , POHLMANN ULRICH , WOLTER DETLEF , WALSH JOSEPH FLEMING
IPC分类号： G03F1/84 , G03F7/20
CPC分类号： G03F7/70691 , B25J11/0095 , G03F1/84 , G03F7/70741
摘要： Systems and methods to control particle generation in a reticle inspection system are presented. The number of particles added to a reticle during an entire load-inspect-unload sequence of a reticle inspection system is reduced by performing all reticle contact events in a controlled, flowing air environment. In one embodiment, the reticle is fixed to a carrier by clamping outside of the vacuum environment, and the carrier, rather than the reticle, is coupled to the reticle stage of the inspection system. In this manner, the high levels of back-side particulation associated with electrostatic chucking are avoided. In addition, the carrier is configured to be coupled to the reticle stage in any of four different orientations separated by ninety degrees.
摘要翻译：介绍了在掩模版检测系统中控制粒子产生的系统和方法。通过在受控流动的空气环境中执行所有掩模版接触事件，在掩模版检查系统的整个负载检查 - 卸载顺序期间添加到掩模版的颗粒数量减少。在一个实施例中，通过夹紧在真空环境之外将掩模版固定到载体上，并且载体而不是掩模版被耦合到检查系统的掩模版平台。以这种方式，避免了与静电吸附相关的高水平的背面微粒。另外，载体被配置成以分开九十度的四个不同取向中的任一个耦合到标线片台。

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