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1. 发明授权

EP2302458B1 Lithography system 有权转让
标题翻译：光刻系统
公开(公告)号：EP2302458B1
公开(公告)日：2016-09-14
申请号：EP10185251.5
申请日：2003-10-24
申请人： MAPPER LITHOGRAPHY IP B.V.
发明人： Van 't Spijker, Johannes Christiaan , Jager, Remco , Wieland, Marco Jan-Jaco , Kruit, Pieter
IPC分类号： G03F7/20 , H01J37/317
CPC分类号： G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482

2. 发明公开

EP2806451A4 DRIVE METHOD FOR SPATIAL LIGHT MODULATOR, METHOD FOR GENERATING PATTERN FOR EXPOSURE, AND EXPOSURE METHOD AND DEVICE 有权转让
标题翻译：驱动方法用于空间光调制器，用于生产图案曝光和曝光的方法和装置
公开(公告)号：EP2806451A4
公开(公告)日：2016-05-18
申请号：EP12865561
申请日：2012-12-26
申请人： NIPPON KOGAKU KK
发明人： OWA SOICHI , WATANABE YOJI
IPC分类号： H01L21/027 , G02B26/08 , G02F1/29 , G03F7/20
CPC分类号： G03F7/70058 , G02B26/0833 , G02F1/29 , G03F7/70283 , G03F7/70291 , G03F7/70508
摘要： In a drive method for a spatial light modulator, out of a first boundary region and a second boundary region arranged adjacently in a Y-direction and extending in an X-direction, mirror elements arranged at a first pitch not resolved by a projection optical system, in the X-direction in the first boundary region are set in the phase 0, and the other mirror elements therein are set in the phase À; mirror elements arranged at a second pitch not resolved by the projection optical system, in the X-direction in the second boundary region are set in the phase À, and the other mirror elements therein are set in the phase 0. When a pattern is projected onto an object with use of the spatial light modulator, the pattern can be formed with position accuracy or shape accuracy finer than a width of an image of each optical element of the spatial light modulator.

3. 发明公开

EP2323158A3 Lithography system and projection method 审中-公开
标题翻译：光刻系统和投影方法
公开(公告)号：EP2323158A3
公开(公告)日：2012-01-04
申请号：EP11157080.0
申请日：2007-03-09
申请人： Mapper Lithography IP B.V.
发明人： Kruit, Pieter , Wieland, Marco Jan-Jaco , Steenbrink, Stijn Willem Karel Herman , Jager, Remco
IPC分类号： H01J37/317 , H01J37/302 , G03F7/20 , B82Y10/00
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , G03F7/70291 , G03F7/70383 , G03F7/70508 , H01J37/3026 , H01J37/3174 , H01J2237/31764 , H01J2237/31766 , H01J2237/31771 , H01L21/67282
摘要： The present invention relates a probe forming lithography system for generating an pattern on to a target surface such as a wafer, using a black and white writing strategy, i.e. writing or not writing a grid cell, thereby dividing said pattern over a grid comprising grid cells, said pattern comprising features of a size larger than that of a grid cell, in each of which cells said probe is switched "on" or "off, wherein a probe on said target covers a significantly larger surface area than a grid cell, and wherein within a feature a position dependent distribution of black and white writings is effected within the range of the probe size as well as to a method upon which such system may be based.

4. 发明授权

EP1554634B1 Lithography system 有权转让
标题翻译：光刻系统
公开(公告)号：EP1554634B1
公开(公告)日：2011-12-21
申请号：EP03759083.3
申请日：2003-10-24
申请人： MAPPER LITHOGRAPHY IP B.V.
发明人： WIELAND, Marco J.-J., Mapper Lithography Hldg. BV , VAN'T SPIJKER, J. C., Mapper Lithography Hldg. BV , JAGER, Remco , KRUIT, Pieter
IPC分类号： G03F7/20 , H01J37/317
CPC分类号： G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要： The invention relates to a maskless lithography system for transferring a pattern onto the surface of a target, comprising at least one beam generator for generating a plurality of beamlets, modulation means comprising a plurality of modulators for modulating the magnitude of a beamlet, and a control unit for controling each of the modulators, wherein the control unit generates and delivers pattern data to said modulation means for controlling the magnitude of each individual beamlet, the control unit comprising at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting said at least one modulated light beam to said modulation means.
摘要翻译：用于将图案转移到目标表面上的无掩模光刻系统技术领域本发明涉及一种用于将图案转移到目标表面上的无掩模光刻系统，包括至少一个用于产生多个小射束的光束发生器，包括用于调制小射束大小的多个调制器的调制装置，单元，用于控制每个调制器，其中控制单元产生模式数据并将模式数据传送到所述调制装置，用于控制每个单独小射束的大小，控制单元包括至少一个用于存储模式数据的数据存储器，至少一个读出单元用于从数据存储器读出数据;至少一个数据转换器，用于将从数据存储器读出的数据转换为至少一个调制光束;以及至少一个光发送器，用于将所述至少一个调制光束到所述调制装置。

5. 发明公开

EP2302458A3 Lithography system 有权转让
标题翻译：光刻系统
公开(公告)号：EP2302458A3
公开(公告)日：2011-04-06
申请号：EP10185251.5
申请日：2003-10-24
申请人： MAPPER LITHOGRAPHY IP B.V.
发明人： Van 't Spijker, Johannes Christiaan , Jager, Remco , Wieland, Marco Jan-Jaco , Kruit, Pieter
IPC分类号： G03F7/20 , H01J37/317
CPC分类号： G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要： The invention relates to a maskless lithography system for transferring a pattern onto the surface of a target, comprising at least one beam generator for generating a plurality of beamlets, modulation means comprising a plurality of modulators for modulating the magnitude of a beamlet, and a control unit for controlling each of the modulators, wherein the control unit generates and delivers pattern data to said modulation means for controlling the magnitude of each individual beamlet, the control unit comprising at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting said at least one modulated light beam to said modulation means.
摘要翻译：用于将图案转移到目标表面上的无掩模光刻系统技术领域本发明涉及一种用于将图案转移到目标表面上的无掩模光刻系统，包括至少一个用于产生多个小射束的光束发生器，包括用于调制小射束大小的多个调制器的调制装置，单元，用于控制每个调制器，其中控制单元产生模式数据并将模式数据传送到所述调制装置，用于控制每个单独小射束的大小，控制单元包括至少一个用于存储模式数据的数据存储器，至少一个读出单元用于从数据存储器读出数据;至少一个数据转换器，用于将从数据存储器读出的数据转换为至少一个调制光束;以及至少一个光发送器，用于将所述至少一个调制光束到所述调制装置。

6. 发明公开

EP2302458A2 Lithography system 有权转让
公开(公告)号：EP2302458A2
公开(公告)日：2011-03-30
申请号：EP10185251.5
申请日：2003-10-24
申请人： MAPPER LITHOGRAPHY IP B.V.
发明人： Van 't Spijker, Johannes Christiaan , Jager, Remco , Wieland, Marco Jan-Jaco , Kruit, Pieter
IPC分类号： G03F7/20 , H01J37/317
CPC分类号： G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要： The invention relates to a maskless lithography system for transferring a pattern onto the surface of a target, comprising at least one beam generator for generating a plurality of beamlets, modulation means comprising a plurality of modulators for modulating the magnitude of a beamlet, and a control unit for controlling each of the modulators, wherein the control unit generates and delivers pattern data to said modulation means for controlling the magnitude of each individual beamlet, the control unit comprising at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting said at least one modulated light beam to said modulation means.

7. 发明公开

EP1618436A4 DETERMINATION OF CENTER OF FOCUS BY PARAMETER VARIABILITY ANALYSIS 审中-公开
标题翻译：焦点中心通过决定参数变异性分析
公开(公告)号：EP1618436A4
公开(公告)日：2010-08-25
申请号：EP04759392
申请日：2004-04-09
申请人： ACCENT OPTICAL TECH INC
发明人： LITTAU MICHAEL E , RAYMOND CHRISTOPHER J
IPC分类号： G03B27/52 , G01B9/00 , G01B11/00 , G01B11/04 , G01B11/06 , G01N21/00 , G03C5/00 , G03F20060101 , G03F7/20
CPC分类号： G01N21/956 , G01N21/4788 , G01N21/9501 , G01N2021/95615 , G03F7/70483 , G03F7/705 , G03F7/70508 , G03F7/70533 , G03F7/70641

8. 发明公开

EP1983552A1 Semiconductor production system 审中-公开
标题翻译：产品编号：
公开(公告)号：EP1983552A1
公开(公告)日：2008-10-22
申请号：EP08012855.6
申请日：2001-08-20
申请人： Hitachi Ltd.
发明人： Naya, Hidemitsu , Tomiyoshi, Rikio , Moriyama, Shigeo , Kikuchi, Mutsumi , Shimamura, Kotaro
IPC分类号： H01L21/00
CPC分类号： H01L21/67225 , G03F7/70508 , G03F7/70991 , G05B19/418 , G05B19/41855 , G05B2219/31323 , G05B2219/31326 , G05B2219/45031 , H01L21/67276 , H04L67/1097 , Y02P90/185 , Y02P90/24 , Y02P90/265
摘要： A semiconductor production system has a semiconductor manufacturing apparatus (20) having an exposure unit, a control unit for controlling the exposure unit and a storage device; a semiconductor inspection apparatus (10) having an observation unit, a control unit for controlling the observation unit and a storage device; and a storage device (30) commonly used by the semiconductor manufacturing apparatus and the semiconductor inspection apparatus. The manufacturing apparatus (20), the inspection apparatus (10) and the commonly used storage device (30) are interconnected via a storage area network (40). With the semiconductor manufacturing apparatus and the storage device linked together via the storage area network, a large volume of image data or design data can be communicated at high speed, thus improving the system throughput.
摘要翻译：半导体制造系统具有具有曝光单元的半导体制造装置（20），用于控制曝光单元的控制单元和存储装置; 具有观察单元的半导体检查装置（10），用于控制观察单元的控制单元和存储装置; 以及半导体制造装置和半导体检查装置共同使用的存储装置（30）。制造装置（20），检查装置（10）和常用的存储装置（30）经由存储区域网络40互连。随着半导体制造装置和存储装置经由存储区域网络连接在一起，可以高速地传送大量图像数据或设计数据，从而提高系统吞吐量。

9. 发明公开

EP1601007A4 INLINE CONNECTION SETTING METHOD AND DEVICE AND SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING SYSTEM 审中-公开
标题翻译： INLINE VERBINDUNGSEINRICHTVERFAHREN以及设备和基板处理装置及基板处理系统
公开(公告)号：EP1601007A4
公开(公告)日：2008-06-04
申请号：EP04716030
申请日：2004-03-01
申请人： TOKYO ELECTRON LTD
发明人： WADA SHIGEKI
IPC分类号： G06F13/10 , G03F7/20 , G06F13/14 , H01L21/00 , H01L21/027 , G03F7/16 , H01L21/68
CPC分类号： H01L21/67276 , G03F7/70508 , G03F7/70991
摘要： A method comprising at least the step of requesting the transfer of profile information on an exposure system to an inline-connected exposure system by a coating/developing device, the step of receiving the profile information from the exposure system by the coating/developing device, and the step of selecting software used in and by the coating/developing device in response to the profile information.

10. 发明公开

EP1695139A4 REAL TIME IMAGE RESIZING FOR DYNAMIC DIGITAL PHOTOLITHOGRAPHY 审中-公开
标题翻译： ECHTZEIT-BILDUMBEMESSUNGFÜRDIE DYNAMISCHE DIGITALE PHOTOLITHOGRAPHIE
公开(公告)号：EP1695139A4
公开(公告)日：2008-02-27
申请号：EP04814145
申请日：2004-12-14
申请人： AGILENT TECHNOLOGIES INC
发明人： SCHROEDER DALE W
IPC分类号： G03B27/42 , G02B26/00 , G02F1/1362 , G03B27/54 , G03B27/62 , G03F7/00 , G03F7/20 , G09G5/00
CPC分类号： G03F7/70291 , G02F1/136277 , G02F2203/12 , G03F7/70433 , G03F7/70508
摘要： A dynamic photolithography system (100) resizes a pattern (410) in real time and photolithographically transfers an image of the resized pattern (510) onto a surface (150) to compensate for distortions in the surface (150) and/or optics (114). The system (100) uses two or more pre-stored spatially offset renderings (400a…400N) of the pattern (410). Each spatially offset rendering (400a…400N) includes pixel data identifying light modulation elements (210) within a spatial light modulator (110) representing the pattern (410). The pattern (410) is spatially offset between the renderings (400a…400N). Portions of the two or more spatially offset renderings (400a…400N) are selected as a function of the distortion to resize the pattern (410) and photolithographically transfer the image of the resized pattern (510) onto the surface (150).
摘要翻译：动态光刻系统（100）实时调整图案（410）并且光刻地将调整大小的图案（510）的图像转印到表面（150）上以补偿表面（150）和/或光学器件）。系统（100）使用图案（410）的两个或更多个预先存储的空间偏移渲染（400a ... 400N）。每个空间偏移渲染（400a ... 400N）包括识别表示图案（410）的空间光调制器（110）内的光调制元件（210）的像素数据。图案（410）在渲染（400a ... 400N）之间在空间上偏移。根据失真来选择两个或更多个空间偏移渲染（400a ... 400N）的部分以调整图案（410）的大小并且将光栅尺寸图案（510）的图像光刻转移到表面（150）上。

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