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    • 3. 发明授权
    • Method and apparatus for neutralizing stray current impulses
    • 用于中和杂散电流脉冲的方法和装置
    • US06690565B2
    • 2004-02-10
    • US10118016
    • 2002-04-09
    • Michel Montreuil
    • Michel Montreuil
    • H01T2300
    • H02H9/005
    • The attenuation of the stray current impulse limits the capacitive leakage. The value of the inductance, coupled to the parasitic capacitance of the charge, creates a reactive filter effect. Since the effect is reactive, the impulse energy is not absorbed. The energy is therefore redistributed in time, but since the intensity of the tension is greatly diminished, the coupling through the capacitances is diminished. The apparatus comprises a core which includes 1, 2, 3 or 4 coils. The apparatus is typically a high quality reactance which includes a low reactive value in opposition of the line current (residual mode) and a high reactive value for the circulation of the parallel current (common mode).
    • 杂散电流脉冲的衰减限制了电容泄漏。 与电荷的寄生电容耦合的电感值产生反应滤波器效应。 由于效应是反应性的,脉冲能量不被吸收。 因此能量在时间上重新分布,但是由于张力的强度大大降低,所以通过电容的耦合被减弱。 该装置包括一个包括1,2,3或4个线圈的芯。 该装置通常是高质量电抗,其包括与线电流(残余模式)相对的低无功值和用于并联电流(共模)的循环的高无功值。
    • 4. 发明授权
    • Personal defense device
    • 个人防御装置
    • US06643114B2
    • 2003-11-04
    • US10084972
    • 2002-03-01
    • Kenneth J. Stethem
    • Kenneth J. Stethem
    • H01T2300
    • F41H13/0018A01K15/029F21V33/0076F41B15/04H05C1/06
    • A personal defense device includes an electrical stun circuit and electrodes with a structure adapted for use as an impact weapon as well, and further includes a radially disposed flashlight or signal light therewith. The electrical circuitry for the stun apparatus is formed of flexible circuit material with dual circuit paths between each component, for reliability and resistance to damage due to impact forces incurred when the device is used as an impact weapon. A second, normally closed interrupter switch is provided for the stun circuit, with the user of the present device being required to hold the interrupter switch in order to keep the stun circuitry from operating when the master switch is turned on. The end opposite the handle includes a series of impact ribs with cutting blades removably installable thereon, to produce shallow (non-life threatening) cuts in an assailant during an attack.
    • 个人防护装置还包括电眩光电路和具有适于用作冲击武器的结构的电极,并且还包括径向设置的手电筒或信号灯。 用于眩光装置的电路由柔性电路材料形成,在每个部件之间具有双电路路径,用于可靠性并且由于当该装置用作冲击武器时产生的冲击力而导致的损坏。 为眩光电路提供了第二个常闭断路器开关,本装置的用户需要保持断路器开关,以便在主开关接通时保持眩晕电路不工作。 与手柄相对的端部包括一系列具有可拆卸地安装在其上的切割刀片的冲击肋,以在攻击期间在攻击者中产生浅的(非危及生命的)切割。
    • 5. 发明授权
    • Ceramic electrostatic chuck assembly and method of making
    • 陶瓷静电吸盘组装及其制造方法
    • US06483690B1
    • 2002-11-19
    • US09892634
    • 2001-06-28
    • Shu NakajimaNeil Benjamin
    • Shu NakajimaNeil Benjamin
    • H01T2300
    • H01L21/6833
    • A sintered ceramic electrostatic chucking device (ESC) which includes a patterned electrostatic clamping electrode embedded in a ceramic body wherein the clamping electrode includes at least one strip of a sintered electrically conductive material arranged in a fine pattern. Due to the fineness of the electrode pattern employed, stresses induced during manufacture of the ESC are reduced such that the clamping electrode remains substantially planar after the sintering operation. The resulting ESC allows for improved clamping uniformity. Another ESC includes an insulating or semi-conducting body and a clamping electrode having a high resistivity and or a high lateral impedance. The electrostatic chucking device provides improved RF coupling uniformity when RF energy is coupled thorough the clamping electrode from an underlying RF electrode. The RF electrode can be a separate baseplate or it can be a part of the chuck. The ESC's may be used to support semiconductor substrates such as semiconductor wafers in plasma processing equipment.
    • 一种烧结陶瓷静电夹持装置(ESC),其包括嵌入在陶瓷体中的图案化静电夹持电极,其中所述夹持电极包括布置成精细图案的至少一个烧结导电材料条。 由于所使用的电极图案的细度,ESC制造期间引起的应力减小,使得夹紧电极在烧结操作之后保持基本平坦。 所得的ESC允许改进的夹紧均匀性。 另一个ESC包括绝缘或半导电体和具有高电阻率或高横向阻抗的夹持电极。 当RF能量通过来自底层RF电极的钳位电极耦合时,静电夹持装置提供改进的RF耦合均匀性。 RF电极可以是单独的基板,也可以是卡盘的一部分。 ESC可用于支持诸如等离子体处理设备中的半导体晶片的半导体衬底。
    • 6. 发明授权
    • Chuck equipment
    • 卡盘设备
    • US06781812B2
    • 2004-08-24
    • US09768173
    • 2001-01-24
    • Koh FuwaKen Maehira
    • Koh FuwaKen Maehira
    • H01T2300
    • H01L21/6833C23C14/50
    • A chuck equipment which can hold insulating substrates is provided. First and second electrodes are provided to be exposed on the base the surface of which is insulated. The insulating substrate is placed in contact with or in close proximity to the surfaces of the first and second electrodes. Since an electric field having a high rate of spatial change is established between the first and second electrodes, the substrate is held against the surface of the chuck equipment by the gradient force. Since the magnitude of the gradient force depends on that of the rate of change of the electric field, a voltage may be applied between the first and second electrodes to establish an electric field of 1.0×106V/m or greater.
    • 提供了可以容纳绝缘基板的卡盘设备。 提供第一和第二电极以暴露在其表面绝缘的基底上。 绝缘基板被放置成与第一和第二电极的表面接触或紧邻第一和第二电极的表面。 由于在第一和第二电极之间建立具有高空间变化率的电场,所以基板通过倾斜力抵靠在卡盘设备的表面上。 由于梯度力的大小取决于电场的变化率,所以可以在第一和第二电极之间施加电压以建立1.0×10 6 V / m以上的电场。
    • 9. 发明授权
    • Using localized ionizer to reduce electrostatic charge from wafer and mask
    • 使用局部电离器来减少晶片和掩模的静电电荷
    • US06507474B1
    • 2003-01-14
    • US09597126
    • 2000-06-19
    • Bhanwar SinghRamkumar SubramanianKhoi A. PhanBryan K. ChooBharath Rangarajan
    • Bhanwar SinghRamkumar SubramanianKhoi A. PhanBryan K. ChooBharath Rangarajan
    • H01T2300
    • G03F7/70616G03F7/70941
    • One aspect of the present invention elates to a method of reducing electrostatic charges on a patterned photoresist to improve evaluation of the developed photoresist, involving the steps of evaluating the patterned photoresist to determine if electrostatic charges exist thereon; positioning an ionizer near the patterned photoresist, the ionizer generating ions thereby reducing the electrostatic charges on the patterned photoresist; and evaluating the patterned photoresist with an electron beam. Another aspect of the present invention relates to a system for reducing electrostatic charges on a patterned photoresist, containing a charge sensor for determining if electrostatic charges exist on the patterned photoresist and measuring the electrostatic charges; an ionizer positioned near the patterned photoresist having electrostatic charges thereon for reducing the electrostatic charges on the patterned photoresist; a controller for setting at least one of time of ion generation and amount of ion generation by the ionizer, the controller coupled to the charge sensor and the ionizer; and a scanning electron microscope or an atomic force microscope for evaluating the patterned photoresist having reduced electrostatic charges thereon with an electron beam.
    • 本发明的一个方面是提供减少图案化光致抗蚀剂上的静电电荷以改进对显影光致抗蚀剂的评估的方法,包括评估图案化光致抗蚀剂以确定静电电荷是否存在于其中的步骤; 在图案化的光致抗蚀剂附近定位电离器,离子发生器产生离子,从而减少图案化光致抗蚀剂上的静电电荷; 并用电子束评估图案化的光致抗蚀剂。 本发明的另一方面涉及一种用于减少图案化光致抗蚀剂上的静电电荷的系统,其包含用于确定图案化光致抗蚀剂上是否存在静电电荷并测量静电电荷的电荷传感器; 位于图案化的光致抗蚀剂附近的电离器,其上具有静电电荷,用于减少图案化光致抗蚀剂上的静电电荷; 用于设置离子发生时间和离子发生量中的至少一个的控制器,耦合到电荷传感器和离子发生器的控制器; 以及扫描电子显微镜或原子力显微镜,用于用电子束评估其上具有降低的静电电荷的图案化光致抗蚀剂。