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1. 发明授权

US06713437B2 Pressure heat treatment apparatus employed for preparing oxide superconducting wire 有权
标题翻译：用于制备氧化物超导线的压力热处理装置
公开(公告)号：US06713437B2
公开(公告)日：2004-03-30
申请号：US10279833
申请日：2002-10-25
申请人： Shinichi Kobayashi , Tetsuyuki Kaneko , Ryosuke Hata
发明人： Shinichi Kobayashi , Tetsuyuki Kaneko , Ryosuke Hata
IPC分类号： F27D1900
CPC分类号： H01L39/248 , C04B35/4525 , C04B35/62254 , C04B35/6262 , C04B2235/3208 , C04B2235/3213 , Y10S505/742 , Y10T29/49014
摘要： The method of preparing an oxide superconducting wire comprises steps of preparing a wire by coating raw material powder for a Bi—Pb—Sr—Ca—Cu—O based oxide superconductor including a 2223 phase with a metal and heat treating the wire in a pressurized atmosphere containing oxygen in a prescribed partial pressure, and the total pressure of the pressurized atmosphere is at least 0.5 MPa. The pressure heat treatment apparatus comprises a pressure furnace storing and heat treating a target in a pressurized atmosphere, a pressure regulator for measuring the total pressure in the pressure furnace, an oxygen concentration meter for measuring the oxygen concentration in the pressure furnace and a controller for controlling the oxygen partial pressure in the pressure furnace in response to the total pressure measured by the pressure regulator and the oxygen concentration measured by the oxygen concentration meter.
摘要翻译：制备氧化物超导线的方法包括以下步骤：通过将包含2223相的Bi-Pb-Sr-Ca-Cu-O基氧化物超导体的原料粉末涂覆在金属上并在加压含有规定分压的氧的气氛，加压气氛的总压为至少0.5MPa。压力热处理装置包括在加压气氛中存储和热处理靶的压力炉，用于测量压力炉中的总压的压力调节器，用于测量压力炉中的氧浓度的氧浓度计，以及用于响应于由压力调节器测量的总压力和由氧浓度计测量的氧气浓度来控制压力炉中的氧气分压。

2. 发明授权

US06644962B2 Heating furnace having heat regenerating burners and operation method thereof 失效
标题翻译：具有热再生燃烧器的加热炉及其操作方法
公开(公告)号：US06644962B2
公开(公告)日：2003-11-11
申请号：US10220726
申请日：2002-09-04
申请人： Ichiro Sugimoto , Kenta Karube , Masahiro Furukawa , Kazunari Andachi
发明人： Ichiro Sugimoto , Kenta Karube , Masahiro Furukawa , Kazunari Andachi
IPC分类号： F27D1900
CPC分类号： C21D1/52 , C21D9/0081 , F23D14/66 , F23L15/02 , F27B9/40 , F27B2009/3638 , F27D17/004 , F27D2017/007 , F27D2019/0031 , F27D2099/0056 , Y02E20/348
摘要： A method of controlling a furnace pressure for preventing air from intruding to a heating furnace, a method of stable operation during low combustion load of heat regenerating burners and a method of measuring concentration of an atmospheric gas in a heating furnace are proposed.
摘要翻译：提出了一种控制炉内压力以防止空气侵入加热炉的方法，提出了一种在热再生燃烧器的低燃烧负荷下稳定运行的方法以及在加热炉中测量气氛气体浓度的方法。

3. 发明授权

US06635854B1 Oven with water evaporator on door 失效
标题翻译：烤箱带水蒸发器门
公开(公告)号：US06635854B1
公开(公告)日：2003-10-21
申请号：US10079212
申请日：2002-02-20
申请人： Winston Shelton
发明人： Winston Shelton
IPC分类号： F27D1900
CPC分类号： F27D19/00 , F24C15/003 , F24C15/02
摘要： An oven includes a food chamber with an access door which houses a water evaporator chamber in fluid communication with the food chamber. By sensing the temperature of the water in the evaporator and the dry bulb temperature within the food chamber and by controlling a dry heat source that heats the air and a wet heat source that heats the water, the cook can control both the final food temperature and the degree of browning of the food.
摘要翻译：烤箱包括具有入口门的食物室，其容纳与食物室流体连通的水蒸发器室。通过感测蒸发器中的水的温度和食物室内的干球温度，并且通过控制加热空气的干燥热源和加热水的湿热源，烹调器可以控制最终的食物温度和食物的褐变程度。

4. 发明授权

US06276929B1 Method for controlling kiln pressure 有权
标题翻译：控制窑压的方法
公开(公告)号：US06276929B1
公开(公告)日：2001-08-21
申请号：US09145644
申请日：1998-09-02
申请人： Tsuyoshi Kuroda , Kenji Kawaguchi , Yasuhiro Ito
发明人： Tsuyoshi Kuroda , Kenji Kawaguchi , Yasuhiro Ito
IPC分类号： F27D1900
CPC分类号： F27D19/00 , F27B17/00
摘要： A method for controlling kiln pressure for a shuttle kiln having an exhaust gas fan and an exhaust gas damper in an exhaust gas passage includes the steps of performing a control operation for controlling the number of revolution of the exhaust gas fan to control flow rate of the exhaust gas to maintain the kiln pressure at a predetermined pressure, and performing a control operation for adjusting opening of the exhaust gas damper based on the number of revolution of the exhaust gas fan. The method can expand the control range of exhaust gas flow, and operation with energy saving efficiency can be performed.
摘要翻译：在废气通道中具有排气风扇和排气阻尼器的往复窑的窑压控制方法包括以下步骤：执行用于控制排气风扇的转数以控制排气风扇废气将窑压保持在预定压力，并且基于废气风扇的转数执行用于调节排气阻尼器的开度的控制操作。该方法可以扩大排气流量的控制范围，可以实现节能效率的运行。

5. 发明授权

US06790034B1 Kiln plant control system 失效
标题翻译：窑厂控制系统
公开(公告)号：US06790034B1
公开(公告)日：2004-09-14
申请号：US10129474
申请日：2003-01-21
申请人： Michael John Kearns , Tony Brian Lange , Neville Frewin
发明人： Michael John Kearns , Tony Brian Lange , Neville Frewin
IPC分类号： F27D1900
CPC分类号： F27B7/42 , C04B7/361 , F27B7/2016 , Y02P40/121
摘要： A controller for a kiln plant, typically a cement plant, has a thermodynamic controller which measures a number of variables including the kiln hood temperature and one or more output gas concentrations, and controls the fuel input to the kiln to maintain the hood temperature within a desired range and a main impeller of the kiln to maintain the measured gas concentrations within a predetermined range. The invention includes a quality controller wich controls the amount of 3CaO.SiO2 present in clinker produced by the plant. The controller comprises an inner controller which controls free-lime content in the clinker and a thermodynamic outer controller.
摘要翻译：用于窑炉设备（通常为水泥厂）的控制器具有热力学控制器，其测量多个变量，包括窑罩温度和一个或多个输出气体浓度，并且控制输入窑的燃料以将发动机罩温度保持在期望范围和窑的主叶轮，以将测量的气体浓度保持在预定范围内。本发明包括质量控制器，其控制由工厂生产的熟料中存在的3CaO.SiO 2的量。控制器包括控制熟料中的游离灰含量的内部控制器和热力学外部控制器。

6. 发明授权

US06544033B1 Wafer carrier 失效
标题翻译：晶圆载体
公开(公告)号：US06544033B1
公开(公告)日：2003-04-08
申请号：US09658362
申请日：2000-09-08
申请人： Lance A. Scudder , Lori Washington , Lori A. Callaghan , Bradley M. Curelop
发明人： Lance A. Scudder , Lori Washington , Lori A. Callaghan , Bradley M. Curelop
IPC分类号： F27D1900
CPC分类号： H01L21/68757 , H01L21/67346 , H01L21/67748
摘要： Provided herein is a wafer carrier comprising a disk and a pocket, wherein the pocket is centered in the disk and holds a wafer. Also provided is a method of processing or testing a wafer for a semiconductor device, comprising the steps of placing the wafer in the wafer carrier disclosed herein; loading the wafer carrier in a loadlock chamber; and transferring the wafer carrier from the loadlock chamber to a process chamber for processing or testing.
摘要翻译：本文提供了包括盘和袋的晶片载体，其中所述袋在盘中居中并保持晶片。还提供了一种用于半导体器件的晶片的处理或测试的方法，包括以下步骤：将晶片放置在本文公开的晶片载体中; 将所述晶片载体装载在负载锁定室中; 并将晶片载体从负载锁定室转移到用于处理或测试的处理室。

7. 发明授权

US06394796B1 Curing oven combining methods of heating 失效
标题翻译：固化烤箱加热加热方式
公开(公告)号：US06394796B1
公开(公告)日：2002-05-28
申请号：US09706939
申请日：2000-11-06
申请人： Alan D. Smith
发明人： Alan D. Smith
IPC分类号： F27D1900
CPC分类号： F27D19/00 , F26B3/283 , F27B17/0016 , F27D2099/0011 , H05B3/62
摘要： An oven having one or more independently adjusted radiant heaters that can be dynamically adjusted before and during a curing or heating process to account for the shape and size of an object being cured or heated, further comprising a means for dynamically controlling the level of heat output from the radiant heaters. The oven preferably has radiant heaters positioned on opposing sides of the object and one or more back panels positioned behind the radiant heaters to absorb any radiant heat that misses the object. The oven of the present invention also has a turbulent fan and a means for deflecting the air flow of the convection heat throughout the internal oven chamber and toward the object. In addition, the oven has an exhaust fan that can discharge the exhaust either outside of the oven or redirect the exhaust back into the oven chamber to raise the ambient temperature, depending on the application for which the oven is being used. A computer system uses one or more object sensors and ambient sensors to control the radiant heaters (both position and level of heat output), the turbulent fan, the exhaust fan, and water flow to the object sensor. The oven of the present invention combines three different types of method of heating: convection, ambient, and radiant. +
摘要翻译：一种具有一个或多个独立调节的辐射加热器的烘箱，其可以在固化或加热过程之前和期间被动态地调整以考虑被固化或加热的物体的形状和尺寸，还包括用于动态地控制热输出水平的装置从辐射加热器。烘箱优选地具有位于物体的相对侧上的辐射加热器和位于辐射加热器后面的一个或多个后面板，以吸收任何错过物体的任何辐射热。本发明的烘箱还具有湍流风扇和用于使对流热的气流偏转到整个内部烘箱室并朝向物体的装置。此外，烤箱具有排气风扇，该排气扇可以在炉外排放废气，或者根据使用烤箱的应用将排气重新排向炉室，以提高环境温度。计算机系统使用一个或多个物体传感器和环境传感器来控制辐射加热器（热输出的位置和水平），湍流风扇，排风扇和到物体传感器的水流。本发明的烤箱结合了三种不同类型的加热方法：对流，环境和辐射。 +

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