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1. 发明申请

WO2022005716A1 SELECTIVE DEPOSITION OF CARBON ON PHOTORESIST LAYER FOR LITHOGRAPHY APPLICATIONS 审中-公开
公开(公告)号：WO2022005716A1
公开(公告)日：2022-01-06
申请号：PCT/US2021/036547
申请日：2021-06-09
申请人： APPLIED MATERIALS, INC.
发明人： GAO, Larry , FUNG, Nancy
IPC分类号： H01L21/033 , H01L21/311 , C23C16/042 , C23C16/26 , C23C16/56 , G03F7/0042 , G03F7/16 , G03F7/2002 , G03F7/26 , H01L21/02115 , H01L21/02274 , H01L21/0273 , H01L21/0276 , H01L21/0332 , H01L21/0335 , H01L21/0337 , H01L21/0338 , H01L21/31116 , H01L21/31138 , H01L21/31144 , H01L21/67103 , H01L21/67109 , H01L21/67248 , H01L21/6831
摘要： Embodiments disclosed within include a method for etching a hardmask layer includes forming a photoresist layer comprising an organometallic material on a hardmask layer comprising a metal-containing material, exposing the photoresist layer to ultraviolet radiation through a mask having a selected pattern, removing unirradiated areas of the photoresist layer to pattern the photoresist layer, forming a passivation layer comprising a carbon-containing material selectively on a top surface of the patterned photoresist layer, including selectively depositing passivation material over a top surface of a patterned photoresist layer trimming undesired portions of the passivation material, and etching the hardmask layer exposed by the patterned photoresist layer having the passivation layer formed thereon.

2. 发明申请

WO2021247590A1 SELF-ASSEMBLED MONOLAYER DEPOSITION FROM LOW VAPOR PRESSURE ORGANIC MOLECULES 审中-公开
公开(公告)号：WO2021247590A1
公开(公告)日：2021-12-09
申请号：PCT/US2021/035266
申请日：2021-06-01
申请人： APPLIED MATERIALS, INC.
发明人： LIANG, Qiwei , NEMANI, Srinivas D. , WONG, Keith Tatseun , JAN, Antony K.
IPC分类号： B05D1/00 , C23C16/04 , C23C16/455 , H01L21/768 , H01L21/67 , C23C14/12 , C23C14/243 , C23C14/26 , C23C14/505 , C23C16/0245 , C23C16/0272 , C23C16/042 , C23C16/45544 , C23C16/54 , C23C16/56 , H01J37/32449 , H01J37/32522 , H01J37/32816 , H01L21/0271 , H01L21/32 , H01L21/6719 , H01L21/68742
摘要： The present disclosure generally relates to a substrate processing chamber, a substrate processing apparatus, and a substrate processing method for self-assembled monolayer (SAM) deposition of low vapor pressure organic molecules (OM) followed by further substrate processing, such as atomic layer deposition.

3. 发明申请

WO2021122805A1 HALTESYSTEM ZUM HALTEN VON SUBSTRATEN WÄHREND EINER BEARBEITUNG DER OBERFLÄCHEN DER SUBSTRATE 审中-公开
公开(公告)号：WO2021122805A1
公开(公告)日：2021-06-24
申请号：PCT/EP2020/086504
申请日：2020-12-16
申请人： OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
发明人： SIEBERT, Max , EGGEMANN, Jens , BECKER, Christian , MUELLER, Dieter
IPC分类号： C23C14/04 , C23C14/50 , C23C16/04 , C23C16/458 , B25B11/00 , B25J11/00 , B05B13/02 , B05C13/00 , B05B13/0207 , B05B13/0228 , B05B13/0242 , B05B13/0285 , C23C14/042 , C23C16/042 , C23C16/4587
摘要： Die Erfindung betrifft ein Haltesystem (1) zum Halten von Substraten (12) zur Verwendung in einer Oberflächenbearbeitungsanlage mit einem Abdeckbereich (20), umfassend eine Mehrzahl an Fixierelementen (2), einen innerhalb des Abdeckbereichs (20) angeordneten Körper (24) zur Aufnahme der Fixierelemente (2) und ein Positionierungselement (26) zur Einstellung des Abdeck- und eines Bearbeitungsbereiches (20, 22), wobei eine Mehrzahl von Substraten (12) durch die Fixierelemente (2) fixierbar und innerhalb des Bearbeitungsbereiches (22) bearbeitbar sind.

4. 发明申请

WO2022011068A1 DISPLAY ARTICLES WITH DIFFRACTIVE, ANTIGLARE SURFACES AND METHODS OF MAKING THE SAME 审中-公开
公开(公告)号：WO2022011068A1
公开(公告)日：2022-01-13
申请号：PCT/US2021/040770
申请日：2021-07-08
申请人： CORNING INCORPORATED
发明人： FENG, Jiangwei , HART, Shandon Dee , KOCH III, Karl William , NELSON, Cameron Robert , SENARATNE, Wageesha , WOOD, William Allen
IPC分类号： C03C17/23 , C03C15/00 , C03C17/3435 , C03C21/002 , C03C2204/08 , C03C2218/34 , C03C3/076 , C03C3/083 , C23C14/021 , C23C14/042 , C23C16/0227 , C23C16/042 , G02B1/11 , G02B1/118 , G02B1/14 , G02B2207/101 , G02B27/4205 , G02B27/4272 , G02B5/0221 , G02B5/0268
摘要： A display article is described herein that includes: a substrate comprising a thickness and a primary surface; and the primary surface having defined thereon a diffractive surface region. The diffractive surface region comprises a plurality of structural features that comprises a plurality of different heights in a multimodal distribution. Further, the substrate exhibits a sparkle of less than 4%, as measured by pixel power deviation (PPD140) at an incident angle of 0˚ from normal, a distinctness of image (DOI) of less than 80% at an incident angle of 20˚ from normal, and a transmittance haze of less than 20% from an incident angle of 0˚ from normal.

5. 发明申请

WO2021141261A1 조명용 유기 발광소자 제조 장치 审中-公开
公开(公告)号：WO2021141261A1
公开(公告)日：2021-07-15
申请号：PCT/KR2020/018227
申请日：2020-12-14
申请人： 주식회사 로티
发明人： 임우빈 , 전의수 , 서정은
IPC分类号： H01L51/56 , H01L51/00 , C23C16/04 , C23C14/24 , C23C16/042 , H01L51/001 , H01L51/0011
摘要： 본 발명은 조명용 유기 발광소자 제조 장치는 조명용 유기발광소자(organic light emitted diode, OLED)를 제조하는 제조 장치에 있어서, 너비 방향의 양단으로 기설정된 간격의 기재통공이 형성된 띠 형상의 기재를 공급하고, 복수 위치에 설치된 증착원으로부터 기화재료를 토출하여 순차적으로 증착하면서 합지된 섀도마스크를 회수하는 공급증착부; 상기 공급증착부의 증착 범위에 각각 배치되어 있으며, 상기 기재에 삽입되어 함께 이동되도록 하부면에 배치되어 있으며, 복수의 증착 위치별로 회전운동을 직선운동을 변환하는 무한 궤도 형태로 구비되어 바깥둘레에 상기 기재통공에 삽입되는 궤도돌출돌기를 가지는 궤도이동부; 상기 궤도이동부의 횡방향 양끝에 배치되어 있으며, 상기 궤도이동부가 이동되도록 변환되는 회전력을 제공하는 궤도구동부; 상기 궤도이동부의 이동되는 상부와 하부에 각각 배치되어 있으며, 상기 궤도이동부의 장력을 조절하는 장력조절부; 및 상기 궤도이동부의 이동 속도와 장력을 측정하여 상기 궤도구동부의 구동 속도와 상기 장력조절부의 장력 조절하도록 제어하는 제어부;를 포함한다.

6. 发明申请

WO2022011072A1 DISPLAY ARTICLES WITH ANTIGLARE SURFACES AND THIN, DURABLE ANTIREFLECTION COATINGS 审中-公开
公开(公告)号：WO2022011072A1
公开(公告)日：2022-01-13
申请号：PCT/US2021/040774
申请日：2021-07-08
申请人： CORNING INCORPORATED
发明人： HART, Shandon Dee , KOCH III, Karl William , KOSIK WILLIAMS, Carlo Anthony , LIN, Lin , NELSON, Cameron Robert , PRICE, James Joseph , SENAWIRATNE, Jayantha , VERRIER, Florence Christine Monique , WEIDMAN, David Lee
IPC分类号： C03C17/23 , C03C15/00 , C03C17/3435 , C03C21/002 , C03C2204/08 , C03C2218/34 , C03C3/076 , C03C3/083 , C23C14/021 , C23C14/042 , C23C16/0227 , C23C16/042 , G02B1/11 , G02B1/118 , G02B1/14 , G02B2207/101 , G02B27/4205 , G02B27/4272 , G02B5/0221 , G02B5/0268
摘要： A display article is described herein that includes: a substrate comprising a thickness and a primary surface; a textured surface region; and an antireflective coating disposed on the textured surface region. The textured surface region comprises structural features and an average texture height (Rtext) from 50 nm to 300 nm. The substrate exhibits a sparkle of less than 5%, as measured by PPD140, and a transmittance haze of less than 40%, at a 0˚ incident angle. The antireflective coating comprises alternating high refractive index and low refractive index layers. Each of the low index layers comprises a refractive index of less than or equal to 1.8, and each of the high index layers comprises a refractive index of greater than 1.8. The article also exhibits a first-surface average photopic specular reflectance (%R) of less than 0.3% at any incident angle from about 5˚ to 20˚ from normal at visible wavelengths.

7. 发明申请

WO2022011070A1 TEXTURED REGION TO REDUCE SPECULAR REFLECTANCE INCLUDING A LOW REFRACTIVE INDEX SUBSTRATE WITH HIGHER ELEVATED SURFACES AND LOWER ELEVATED SURFACES AND A HIGH REFRACTIVE INDEX MATERIAL DISPOSED ON THE LOWER ELEVATED SURFACES 审中-公开
公开(公告)号：WO2022011070A1
公开(公告)日：2022-01-13
申请号：PCT/US2021/040772
申请日：2021-07-08
申请人： CORNING INCORPORATED
发明人： HART, Shandon Dee , KOCH III, Karl William , SENARATNE, Wageesha , WOOD, William Allen
IPC分类号： C03C17/22 , C03C15/00 , C03C17/3435 , C03C21/002 , C03C2204/08 , C03C2218/34 , C03C3/076 , C03C3/083 , C23C14/021 , C23C14/042 , C23C16/0227 , C23C16/042 , G02B1/11 , G02B1/118 , G02B1/14 , G02B2207/101 , G02B27/4205 , G02B27/4272 , G02B5/0221 , G02B5/0268
摘要： A substrate for a display article includes (a) a primary surface; and (b) a textured region on at least a portion of the primary surface, the textured region comprising: (i) one or more higher surfaces residing at a higher mean elevation parallel to a base-plane disposed below the textured region and extending through the substrate; (ii) one or more lower surfaces residing at a lower mean elevation parallel to the base-plane that is less than the higher mean elevation; and (iii) a high-index material disposed on each of the one or more lower surfaces residing at the lower mean elevation, the high-index material forming one or more intermediate surfaces residing at an intermediate mean elevation parallel to the base-plane that is greater than the lower mean elevation but less than the higher mean elevation, the high-index material comprising an index of refraction that is greater than the index of refraction of the substrate.

8. 发明申请

WO2021228387A1 CARRIER FOR A ROLLER TRANSPORT SYSTEM, ROLLER TRANSPORT SYSTEM, AND VACUUM PROCESSING APPARATUS 审中-公开
公开(公告)号：WO2021228387A1
公开(公告)日：2021-11-18
申请号：PCT/EP2020/063373
申请日：2020-05-13
申请人： APPLIED MATERIALS, INC. , EHMANN, Christian Wolfgang , KLEIN, Wolfgang , LINDENBERG, Ralph
发明人： EHMANN, Christian Wolfgang , KLEIN, Wolfgang , LINDENBERG, Ralph
IPC分类号： C23C14/04 , C23C14/56 , C23C16/04 , C23C16/458 , C23C16/54 , C23C14/50 , H01L21/677 , B65D19/00 , B65D81/02 , B65G13/00 , B65G54/02 , C23C14/042 , C23C14/562 , C23C14/568 , C23C16/042 , C23C16/4587 , C23C16/545 , H01L21/67706 , H01L21/67709 , H01L21/67712
摘要： A carrier (100) for being transported in a transport direction (X) on a roller transport track (200a, 200b), the carrier (100) comprises a first rail (120) with a first roller contact surface configured for supporting the carrier (100) on at least one first roller (210a, 210b) on the roller transport track (200a, 200b); the first rail (120) comprises a first main section (124) with a first main roller contact surface (126) and a first forward end section (150) with a first forward end surface (160), the first roller contact surface being formed by the first main roller contact surface (126) and the first forward end surface (160); wherein the first forward end surface (160) is a sloped surface (160) and/or the first forward end section (126) of the first rail (120) is flexible.

9. 发明申请

WO2023059381A1 METHODS FOR FORMING LOW RESISTIVITY TUNGSTEN FEATURES 审中-公开
公开(公告)号：WO2023059381A1
公开(公告)日：2023-04-13
申请号：PCT/US2022/038211
申请日：2022-07-25
申请人： APPLIED MATERIALS, INC.
发明人： WANG, Peiqi , CHENG, Cheng , WU, Kai , HA, Insu , LEE, Sang Jin
IPC分类号： H01L21/768 , H01L21/285 , C23C16/042 , C23C16/38 , C23C16/45553 , C23C16/56
摘要： A structure of a substrate is provided including a tungsten-containing layer including a nucleation layer and a fill layer. The nucleation layer is disposed along sidewalls of the opening. The nucleation layer includes boron and tungsten. The fill layer is disposed over the nucleation layer within the opening. The tungsten-containing layer includes a resistivity of about 16 pQ cm or less. The tungsten-containing layer has a thickness of about 200 A to about 600 A. The tungsten-containing layer thickness is half a width of the tungsten-containing layer disposed within the opening between opposing sidewall portions of the opening.

10. 发明申请

WO2022011073A1 ANTI-GLARE SUBSTRATE FOR A DISPLAY ARTICLE INCLUDING A TEXTURED REGION WITH PRIMARY SURFACE FEATURES AND SECONDARY SURFACE FEATURES IMPARTING A SURFACE ROUGHNESS THAT INCREASES SURFACE SCATTERING 审中-公开
公开(公告)号：WO2022011073A1
公开(公告)日：2022-01-13
申请号：PCT/US2021/040775
申请日：2021-07-08
申请人： CORNING INCORPORATED
发明人： FENG, Jiangwei , ISAAC, Corinne Elizabeth , LI, Shenping , SENARATNE, Wageesha , WOOD, William Allen
IPC分类号： C03C15/00 , C03C21/00 , G03F7/00 , C03C17/3435 , C03C21/002 , C03C2204/08 , C03C2218/34 , C03C3/076 , C03C3/083 , C23C14/021 , C23C14/042 , C23C16/0227 , C23C16/042 , G02B1/11 , G02B1/118 , G02B1/14 , G02B2207/101 , G02B27/4205 , G02B27/4272 , G02B5/0221 , G02B5/0268
摘要： A substrate for a display article is described herein that includes (a) a primary surface; and (b) a textured region on at least a portion of the primary surface; the textured region comprising: (i) primary surface features, each comprising a perimeter parallel to a base-plane extending through the substrate disposed below the textured region, wherein the perimeter of each of the primary surface features comprises a longest dimension of at least 5 µm; and (ii) one or more sections each comprising secondary surface features having a surface roughness (Ra) within a range of 5 nm to 100 nm. In some instances, an arrangement of the surface features reflect a random distribution. A method of forming the same is disclosed.

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