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    • 7. 发明申请
    • METHOD FOR THE PREPARATION OF TRICHLOROMETHYL-GROUP-SUBSTITUTED BENZENE
    • 三氯甲烷基取代苯的制备方法
    • US20160152533A1
    • 2016-06-02
    • US14905775
    • 2014-09-12
    • SHANGHAI FANGLUN NEW MATERIAL TECHNOLOGY CO., LTD.
    • Nongyue WANGXiongwei QUGuohua LIQuanzhong ZHAOJianming SHAOGuoqiang WEN
    • C07C17/08
    • C07C17/08C07C17/093C07C17/12C07C17/14C07C17/383C07C51/60C07C25/125C07C53/44C07C22/04C07C22/06
    • The present application relates to a method for photochlorination, and specifically to photochlorination by a photochemical reaction of an aromatic compound with gaseous chlorine so as to prepare a trichloromethyl-substituted benzene, and to a method using bis-(trichloromethyl)-benzene as the trichloromethyl-substituted benzene to prepare by further reaction bis-(chloroformyl)-benzene. Through the control of temperature, illuminance and consumption of gaseous chlorine, the method of this application can greatly improve the purity of trichloromethyl-substituted benzene and further prepare polymer-grade bis-(chloroformyl)-benzene with low cost. The present application also relates to a method for purifying trichloromethyl-substituted benzene, and specifically to a method for purifying trichloromethyl-substituted benzene via molecular distillation. The present application further relates to a photochlorination reactor for use in photochlorination reactions (such as those of the present application).
    • 本申请涉及一种光氯化方法,具体涉及通过芳族化合物与气态氯的光化学反应进行光氯化,以制备三氯甲基取代的苯,以及使用双(三氯甲基) - 苯作为三氯甲基的方法 通过进一步反应双 - (氯甲酰基) - 苯制备。 通过控制气态氯的温度,照度和消耗量,本方法可以大大提高三氯甲基取代苯的纯度,进一步制备聚合物级双(氯甲酰基) - 苯,成本低廉。 本申请还涉及三氯甲基取代的苯的纯化方法,特别涉及通过分子蒸馏纯化三氯甲基取代的苯的方法。 本申请还涉及用于光氯化反应的光氯化反应器(例如本申请的那些)。