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1. 发明申请

US20130088704A1 Ultra-Large Size Flat Panel Display Maskless Photolithography System and Method 有权
标题翻译：超大尺寸平板显示器无掩模光刻系统和方法
公开(公告)号：US20130088704A1
公开(公告)日：2013-04-11
申请号：US13648944
申请日：2012-10-10
申请人： Wenhui Mei , Weichong Du , Lujie Qu
发明人： Wenhui Mei , Weichong Du , Lujie Qu
IPC分类号： G03B27/58
CPC分类号： G03F7/20 , G03F7/70275 , G03F7/70291 , G03F7/70358 , G03F7/70725 , G03F7/70791
摘要： A maskless exposure system that has multiple maskless optical engines arranged in an (N×M) matrix that form and project a pattern onto a substrate. A first stage system is capable of driving the maskless optical engines in a first direction, a second stage system capable of holding and moving the substrate in a second direction perpendicular to the first direction. A control system that processes data and synchronizing movement of the first and second stage systems and a vision system that detects the positions of the second stage system to synchronize movements with the multiple optical engines.
摘要翻译：一种无掩模曝光系统，其具有以（N×M）矩阵排列的多个无掩模光学引擎，其形成并将图案投影到基板上。第一级系统能够在第一方向上驱动无掩模光学引擎，第二级系统能够在垂直于第一方向的第二方向上保持和移动衬底。一种控制系统，其处理第一和第二平台系统的数据和同步运动，以及视觉系统，其检测第二平台系统的位置以与多个光学引擎同步运动。

2. 发明申请

US20130044300A1 Double-Sided Maskless Exposure System and Method 有权
标题翻译：双面无掩膜曝光系统及方法
公开(公告)号：US20130044300A1
公开(公告)日：2013-02-21
申请号：US13523924
申请日：2012-06-15
申请人： Wenhui Mei , Weichong Du , Lujie Qu
发明人： Wenhui Mei , Weichong Du , Lujie Qu
IPC分类号： G03B27/68
CPC分类号： G03F7/2032 , G03F7/2057 , G03F7/70275 , G03F7/70291 , G03F7/70425 , G03F9/00 , G03F9/7088
摘要： A double-sided maskless exposure system and method consists of light sources which includes two light wavelength segments, maskless optical engines in which a 2D spatial light modulation(spatial light modulator) device, such as DMD, is generating a plurality of pixel array of the pattern, vision system, moving substrate and computer control system. The double-sided maskless exposure system at least includes two maskless optical engines with auto-calibration function which can correct any alignment error in-line. Each optical engine is for each side of the substrate. The optical engines are aligned each other in pairs and are simultaneously patterning on each side of the moving substrate. The system also includes a manipulator for moving, stepping or scanning the optical engines, relative to the substrate so that it can create a contiguous whole image on the both sides of the subject.
摘要翻译：双面无掩模曝光系统和方法由包括两个光波长段的光源组成，其中2D空间光调制（空间光调制器）设备（诸如DMD）正在产生多个像素阵列的无掩模光学引擎图案，视觉系统，移动基板和计算机控制系统。双面无掩模曝光系统至少包括具有自动校正功能的两个无掩模光学引擎，可以校正任何对准误差。每个光学引擎用于衬底的每一侧。光学引擎成对地彼此对准，并且在移动的基板的每一侧上同时进行图案化。该系统还包括用于相对于基板移动，步进或扫描光学引擎的操纵器，使得其可以在对象的两侧上创建连续的整个图像。

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