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1. 发明申请

WO2014020459A1 WATER-DISPERSIBLE ELECTRICALLY CONDUCTIVE FLUORINE-CONTAINING POLYANILINE COMPOSITIONS FOR LITHOGRAPHY 审中-公开
标题翻译：含水电导液含氟聚合物组合物
公开(公告)号：WO2014020459A1
公开(公告)日：2014-02-06
申请号：PCT/IB2013/055097
申请日：2013-06-21
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , SHIN-ETSU CHEMICAL CO,. LTD. , IBM UNITED KINGDOM LIMITED , IBM (CHINA) INVESTMENT COMPANY LIMITED
发明人： SOORIYAKUMARAN, Ratnam , BOZANO, LUISA, Dominica , SUNDBERG, Linda, Karin , SHERWOOD, Mark, Hull , NAGASAWA, Takayuki , WATANABE, Satoshi
IPC分类号： C08L79/02
CPC分类号： G03F7/2059 , C08G73/0266 , C08L25/18 , C08L79/02 , C08L79/08 , C09D179/08 , G03F7/11 , G03F7/38 , H01B1/128
摘要： A water dispersible composition comprises a polyaniline copolymer having a weight average molecular weight of at least 30,000 and a polymeric acid comprising sulfonic acid groups. The polyaniline copolymer comprises i) about 10 mol% to about 15 mol% of a fluorine- containing first aniline repeat unit based on total moles of repeat units in the polyaniline copolymer, and ii) a second aniline repeat unit comprising no fluorine. The sulfonic acid groups of the polymeric acid are present in a molar amount greater than or equal to total moles of repeat units of the polyaniline copolymer. The composition has a conductivity of at least 0.0001 S/cm.
摘要翻译：水分散性组合物包含重均分子量为至少30,000的聚苯胺共聚物和包含磺酸基团的聚合酸。聚苯胺共聚物包括i）基于聚苯胺共聚物中的重复单元的总摩尔数的约10mol％至约15mol％的含氟第一苯胺重复单元，以及ii）不包含氟的第二苯胺重复单元。聚合酸的磺酸基存在的摩尔量大于或等于聚苯胺共聚物的重复单元的总摩尔数。该组合物具有至少0.0001S / cm的电导率。

2. 发明授权

US4741920A Mesh and printing screen for screen printing and a method for the preparation thereof 失效
标题翻译：丝网印刷丝网印刷及其制备方法
公开(公告)号：US4741920A
公开(公告)日：1988-05-03
申请号：US883172
申请日：1986-07-08
申请人： Susumu Ueno , Toru Nakanishi , Kenji Fushimi , Keiichi Ishikawa , Yasuo Emori
发明人： Susumu Ueno , Toru Nakanishi , Kenji Fushimi , Keiichi Ishikawa , Yasuo Emori
IPC分类号： B41N1/24 , G03F7/12 , B05D3/06
CPC分类号： B41N1/247 , G03F7/12
摘要： A greatly improved printing screen used for screen printing is provided in respect of the durability in printing, resistance against solvents and antistatic performance based on a mesh of polyester or nylon filaments. According to the invention, the base mesh is subjected to exposure to low temperature plasma of an inorganic gas prior to coating with a photosensitive resin composition in the form of an aqueous emulsion. When the plasma-treated mesh is coated, prior to coating with the photosensitive resin emulsion, with a surface active agent or when the photosensitive resin emulsion is admixed with a surface active agent, further improvement can be obtained in the antistatic performance of the screen. When a base screen dyed in yellow is used, the drawbacks caused by halation in the pattern-wise exposure of the screen to light can be greatly reduced.
摘要翻译：关于印刷耐久性，耐溶剂性和基于聚酯或尼龙丝网的抗静电性能，提供了用于丝网印刷的大大改进的印刷丝网。根据本发明，在用水乳液形式的感光性树脂组合物涂布之前，将基底网暴露于无机气体的低温等离子体。当等离子体处理的网被涂覆时，在用感光性树脂乳液涂布之前，用表面活性剂，或当将感光性树脂乳液与表面活性剂混合时，可以在屏幕的抗静电性能方面得到进一步的改进。当使用黄色染色的基本屏幕时，可以大大降低由于屏幕对于光的图案曝光而产生的不利影响。

3. 发明申请

US20180265360A1 COMPOSITE SUBSTRATE, METHOD FOR FORMING NANOCARBON FILM, AND NANOCARBON FILM 审中-公开
公开(公告)号：US20180265360A1
公开(公告)日：2018-09-20
申请号：US15534652
申请日：2015-12-16
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Shoji Akiyama , Yoshihiro Kubota , Makoto Kawai , Shigeru Konishi , Hiroshi Mogi
IPC分类号： C01B32/184 , B32B9/00 , B32B9/04 , B32B37/18 , B32B38/00 , C30B29/36 , C01B32/956 , H01L21/02 , H01L29/16 , H01L29/34
摘要： Provided is a composite substrate which is provided with: a single crystal silicon carbide thin film 11 having a thickness of 1μm or less; a handle substrate 12 which supports the single crystal silicon carbide thin film 11 and is formed from a heat-resistant material (excluding single crystal silicon carbide) having a heat resistance of not less than 1,100° C.; and an intervening layer 13 which has a thickness of 1μm or less and is arranged between the single crystal silicon carbide thin film 11 and the handle substrate 12, and which is formed from at least one material selected from among silicon oxide, silicon nitride, aluminum oxide, aluminum nitride, zirconium oxide, silicon and silicon carbide, or from at least one metal material selected from among Ti, Au, Ag, Cu, Ni, Co, Fe, Cr, Zr, Mo, Ta and W. This composite substrate according to the present invention enables the formation of a nanocarbon film having few defects at low cost.

4. 发明专利

JP2013256445A Method for producing single crystal silicon 审中-公开
标题翻译：生产单晶硅的方法
公开(公告)号：JP2013256445A
公开(公告)日：2013-12-26
申请号：JP2013170876
申请日：2013-08-21
申请人： Shin-Etsu Chemical Co Ltd , 信越化学工業株式会社
发明人： NEZU SHIGEYOSHI , OKADA JUNICHI , KUME FUMITAKA
IPC分类号： C30B29/06 , C01B33/035 , C30B15/02
摘要： PROBLEM TO BE SOLVED: To provide a technique where high purity single crystal silicon can be obtained by a multi-pulling method.SOLUTION: An allowable total amount of heavy metal impurity concentration in a bulk of a polycrystalline silicon lump to keep each concentration of chromium, iron, nickel, copper and cobalt in CZ single crystal silicon 0.05 ppta or less is 759 ppta when the number n of multi-pulling is one. The allowable total amount of the heavy metal impurity concentration decreases according to the increasing of the number of the multi-pulling and becomes roughly 150 ppta (152 ppta) in the case of n=5 and roughly 75 ppta (76 ppta) in the case of n=10. Therefore, high purity single crystal silicon can be obtained by a multi-pulling method if a polycrystalline silicon lump group consisting of only the polycrystalline silicon lump where the total amount of the heavy metal impurity concentration of chromium, iron, nickel, copper and cobalt detected from the bulk is 150 ppta or less is used as a raw material.
摘要翻译：要解决的问题：提供通过多牵引方法可以获得高纯度单晶硅的技术。解决方案：在多晶硅块体中允许的重金属杂质浓度的允许总量，以保持每种浓度的铬，CZ单晶硅中的铁，镍，铜和钴0.05ppta以下，多拉为n时为759ppta。重金属杂质浓度的允许总量根据多拉的数量的增加而减少，在n = 5的情况下变为大约150ppta（152ppta），在这种情况下大约为75ppta（76ppta）的n = 10。因此，如果由只有多晶硅团组成的多晶硅团块，其中检测到铬，铁，镍，铜和钴的重金属杂质浓度的总量，则可以通过多牵引方法获得高纯度单晶硅从大量的150 ppta或更少作为原料。

5. 发明专利

JP2013245236A Silicone rubber composition 有权
标题翻译：硅橡胶组合物
公开(公告)号：JP2013245236A
公开(公告)日：2013-12-09
申请号：JP2012117651
申请日：2012-05-23
申请人： Shin-Etsu Chemical Co Ltd , 信越化学工業株式会社
发明人： INO HIROOMI , TODOROKI DAICHI
IPC分类号： C08L83/07 , C08K5/548
摘要： PROBLEM TO BE SOLVED: To provide a nonconductive silicone rubber composition having excellent antistatic properties.SOLUTION: To provide a nonconductive silicone rubber composition obtained by allowing 100 pts.mass of a thermoset-type silicone rubber composition to contain 0.0001-5 pts.mass of an ion-conductive antistatic agent selected from silicone-modified zwitterion compounds.
摘要翻译：要解决的问题：提供具有优异抗静电性能的非导电性硅橡胶组合物。解决方案：提供通过使100质量份热固性硅橡胶组合物含有0.0001-5重量份的选自硅氧烷改性的两性离子化合物的离子导电抗静电剂。

6. 发明专利

JP2013234301A Photocurable and thermosetting resin composition, molded product and article 审中-公开
标题翻译：可光热固化树脂组合物，模制产品和文章
公开(公告)号：JP2013234301A
公开(公告)日：2013-11-21
申请号：JP2012109111
申请日：2012-05-11
申请人： Shin-Etsu Chemical Co Ltd , 信越化学工業株式会社
发明人： TSUCHIDA KAZUHIRO , HIROKAMI MUNENAO , MIZUNASHI TOMOYUKI
IPC分类号： C08F290/06 , C08F290/14 , C08G77/26 , C08J7/04
摘要： PROBLEM TO BE SOLVED: To provide a photocurable and thermosetting resin composition suitable for a functional film material and an antifouling scratch-resistant coating material.SOLUTION: As a resin composition, a silicon compound having the following structure is used as a main component of a siloxane unit. In the structure, a linking group between a (meth)acryloxy group as a photo-polymerizable group and silicon includes a urethane bond, and 1 to 5 (meth)acryloxy groups are linked to the same silicon atom by chemical bonds excluding a siloxane bond. In this way, by using the silicon compound, a distance between crosslinking points in a cured resin is increased compared to conventional compositions to alleviate curing shrinkage while keeping sufficient hardness. The hardness and toughness of a cured product are both achieved in a high level by a secondary interaction by a hydrogen bond between structural groups in the urethane bond moiety.
摘要翻译：要解决的问题：提供适用于功能膜材料和防污擦伤涂层材料的光固化性和热固性树脂组合物。解决方案：作为树脂组合物，使用具有以下结构的硅化合物作为硅氧烷单元。在该结构中，作为光聚合性基团的（甲基）丙烯酰氧基与硅的连接基团包含氨基甲酸酯键，并且通过除硅氧烷键之外的化学键将1〜5个（甲基）丙烯酰氧基连接到相同的硅原子。以这种方式，通过使用硅化合物，与常规组合物相比，固化树脂中的交联点之间的距离增加，以减轻固化收缩同时保持足够的硬度。固化产物的硬度和韧性都通过氨基甲酸酯键部分中的结构基团之间的氢键的二次相互作用在高水平上实现。

7. 发明专利

JP2013234157A Silicone-modified zwitterionic compound and method for producing the same 有权
标题翻译：硅氧烷改性的ZWITTERIONIC化合物及其生产方法
公开(公告)号：JP2013234157A
公开(公告)日：2013-11-21
申请号：JP2012108236
申请日：2012-05-10
申请人： Shin-Etsu Chemical Co Ltd , 信越化学工業株式会社
发明人： INO HIROOMI
IPC分类号： C07F7/10
摘要： PROBLEM TO BE SOLVED: To provide a new silicone-modified zwitterionic compound with high solubility and a low melting point, and to provide a method for producing the same.SOLUTION: A silicone-modified zwitterionic compound is provided, being represented by formula (1) [wherein, at least one of R, Rand Rhas a structure of formula (2), others are any of 1-6C alkyl, aryl, fluorine-substituted alkyl and hydroxyl-containing alkyl, and two of R, Rand Rmay form a ring; l is an integer of 3-6 (in formula (2), Ris 1-8C organic group or siloxane linkage-bearing group; R, Rand Rare any of 1-8C monovalent organic group, siloxane-linkage-bearing group and a siloxy group represented by -OSiRRR; m is 1-4; n is 1-10; and (a) is an integer of 0-2)].
摘要翻译：要解决的问题：提供具有高溶解度和低熔点的新的硅氧烷改性的两性离子化合物，并提供其制备方法。溶液：提供了由式（1）表示的硅氧烷改性的两性离子化合物）[其中，R，Rand Rhas中的至少一个是式（2）的结构，其它是1-6C烷基，芳基，氟取代的烷基和含羟基的烷基中的任何一个，R，Rand R may中的两个形成环; l为3-6的整数（式（2）中，R 1为1-8C有机基团或与硅氧烷键合的基团; R，由-OSiRRR表示的基团; m为1-4; n为1-10;和（a）为0-2的整数]]。

8. 发明专利

JP2013234078A Method of manufacturing porous glass deposit for optical fiber 有权
标题翻译：制造光纤多孔玻璃沉积的方法
公开(公告)号：JP2013234078A
公开(公告)日：2013-11-21
申请号：JP2012105373
申请日：2012-05-02
申请人： Shin-Etsu Chemical Co Ltd , 信越化学工業株式会社
发明人： URATA YUHEI
IPC分类号： C03B37/018
CPC分类号： C03B37/0142 , C03B2207/50 , C03B2207/60
摘要： PROBLEM TO BE SOLVED: To provide a method of manufacturing a porous glass deposit for optical fiber capable of reducing process cost by glass lathe while preventing large fluctuation in optical characteristics by restraining periodical variation of the outer diameter in the long direction while not changing the manufacturing unit to a large degree in a vapor phase axial deposition method.SOLUTION: In a method of manufacturing a porous glass deposit for optical fiber in which a combustion gas and an auxiliary combustion gas are supplied to a plurality of burners with a feed and soot is deposited on the starting material while it is drawn up in the axial direction, the apical part of the soot deposition layer is photographed during deposition and slope value (mm/mm) of the profile line of the vertical cross section of the apical part is calculated. In this method, gas condition of the gas supplied to a deposition burner for a first clad part deposition and a deposition burner for a second clad part deposition and the location of burners are adjusted so that the maximum value of the slope value formed in the vicinity of a first clad deposition layer formed by a deposition burner for the first clad deposition and a second clad deposition layer formed by a deposition burner for the second clad deposition is not higher than 6.6.
摘要翻译：要解决的问题：提供一种制造能够通过玻璃车床降低加工成本的光纤的多孔玻璃沉积物的制造方法，同时通过抑制长径方向的外径的周期性变化而防止光学特性的大的波动，同时不改变制造在气相轴向沉积方法中的大部分单元。解决方案：在制造用于光纤的多孔玻璃沉积物的方法中，其中燃烧气体和辅助燃烧气体被供给到具有进料和烟灰的多个燃烧器沉积在起始材料上，同时沿轴向拉伸，在沉积期间拍摄烟灰沉积层的顶部，并计算顶部垂直截面的轮廓线的斜率（mm / mm）。在该方法中，调节供给到用于第一包层部分沉积的沉积燃烧器的气体和用于第二包层部分沉积的沉积燃烧器和燃烧器的位置的气体条件，使得在附近形成的斜率值的最大值由用于第一包层沉积的沉积燃烧器形成的第一包覆淀积层和由用于第二包层沉积的沉积燃烧器形成的第二包层沉积层不高于6.6。

9. 发明专利

JP2013227433A Polymerizable monomer, polymeric compound, positive resist material and pattern forming method using the same 有权
标题翻译：可聚合单体，聚合物，正极材料和图案形成方法
公开(公告)号：JP2013227433A
公开(公告)日：2013-11-07
申请号：JP2012100568
申请日：2012-04-26
申请人： Shin-Etsu Chemical Co Ltd , 信越化学工業株式会社
发明人： HATAKEYAMA JUN , HASEGAWA KOJI
IPC分类号： C08F12/22 , C07C43/243 , C08F212/00 , C08F212/14 , C08F220/38 , C08F232/00 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0397 , C08F12/22 , C08F212/00 , C08F212/14 , C08F220/10 , C08F220/38 , G03F7/0045 , G03F7/0046 , G03F7/039 , G03F7/2041 , G03F7/30
摘要： PROBLEM TO BE SOLVED: To provide a polymeric compound suitable as a positive resist material giving a resist film that has higher resolution than a conventional positive resist material, has small line edge roughness and a good pattern profile after exposure, and has excellent etching durability and a little amount of outgassing during exposure, and in particular, suitable for a base resin of a chemically amplified positive resist material, and to provide a positive resist material and a pattern forming method using the polymeric compound, and a polymerizable monomer for obtaining the polymeric compound.SOLUTION: A polymerizable monomer is represented by general formula (1) (wherein Rrepresents a methyl group, ethyl group, propyl group, vinyl group or ethynyl group; the circle represents a cyclic bridged cyclic cycloalkyl group having 3 to 12 carbon atoms, which may include a double bond, however, it is not allowed that the circle is a cyclohexyl group and Ris an ethyl group; Rrepresents a hydrogen atom, a 1-4C straight-chain, branched or cyclic alkyl group; and m represents an integer of 1 to 4). The positive resist material shows a high contrast of an alkaline dissolution rate before and after exposure, suppresses swelling in an alkali developing solution, thereby preventing pattern collapse and achieving high resolution, has a good pattern profile and a good condition of edge roughness after exposure, and in particular, suppresses an acid diffusion rate and shows excellent etching durability.
摘要翻译：要解决的问题：为了提供适合作为正性抗蚀剂材料的高分子化合物，其赋予比常规正性抗蚀剂材料更高分辨率的抗蚀剂膜，具有小的线边缘粗糙度和曝光后的良好图案轮廓，并且具有优异的蚀刻耐久性和并且特别适用于化学放大的正性抗蚀剂材料的基础树脂，并且提供使用该聚合物的正性抗蚀剂材料和图案形成方法，以及用于获得聚合物的聚合性单体化合物。溶液：可聚合单体由通式（1）表示（其中R表示甲基，乙基，丙基，乙烯基或乙炔基;该环表示具有3至12个碳原子的环状桥连环烷基，其可以包括双键，然而，不允许该环为环己基并且Ris为乙基; Rrepresen 一个氢原子，一个1-4C的直链，支链或环状的烷基; m表示1〜4的整数）。正性抗蚀剂材料在曝光前后显示碱性溶解速度的高对比度，抑制碱性显影液中的溶胀，从而防止图案塌陷并实现高分辨率，具有良好的图案轮廓和曝光后的良好的边缘粗糙度条件，特别是抑制酸扩散速度，显示优异的蚀刻耐久性。

10. 发明专利

JP2013227374A Thermally-curable heat-conductive silicone grease composition 有权
标题翻译：热固性导热硅油组合物
公开(公告)号：JP2013227374A
公开(公告)日：2013-11-07
申请号：JP2012098765
申请日：2012-04-24
申请人： Shin-Etsu Chemical Co Ltd , 信越化学工業株式会社
发明人： MATSUMOTO NOBUAKI , YAMADA KUNIHIRO , TSUJI KENICHI
IPC分类号： C08L83/07 , C08K3/36 , C08K9/06 , C08L83/05 , C08L83/06
CPC分类号： C10M169/044 , C08G77/12 , C08G77/18 , C08G77/20 , C08K3/36 , C08K5/56 , C08K2003/2227 , C08K2201/001 , C08L83/00 , C08L83/04 , C10M2201/05 , C10M2201/06 , C10M2229/041 , C10M2229/0435 , C10M2229/047 , C10N2250/10
摘要： PROBLEM TO BE SOLVED: To provide a thermally-curable heat-conductive silicone grease composition which has high shape retention characteristics even in an early stage when the viscosity of the composition is low (the composition is easily applied), and which becomes soft (having low hardness) after being cured.SOLUTION: A thermally-curable heat-conductive silicone grease composition includes: (A) an organopolysiloxane having viscosity of 100 to 100,000 mPa s at 25°C and containing at least one alkenyl group per molecule; (B) an organopolysiloxane represented by general formula (1); (C) an organohydrogenpolysiloxane containing at least two hydrogen atoms each directly bound to a silicon atom per molecule; (D) a catalyst selected from a group consisting of platinum and platinum compounds; (F) a heat-conductive filler having heat conductivity of 10 W/m °C or more; and (G) silica fine powder, as essential components.
摘要翻译：要解决的问题：为了提供即使在组合物的粘度低（组合物容易涂布）的情况下，即使在早期阶段也具有高形状保持特性的可热固化的导热硅油组合物，并且变软（具有低硬度）。溶解性：可热固化的导热硅脂组合物包括：（A）在25℃下粘度为100至100,000mPa·s且每分子含有至少一个烯基的有机聚硅氧烷; （B）由通式（1）表示的有机聚硅氧烷; （C）每分子含有至少两个氢原子直接键合到硅原子上的有机氢聚硅氧烷; （D）选自铂和铂化合物的催化剂; （F）导热性为10W / m℃以上的导热性填料; 和（G）二氧化硅细粉，作为必要成分。

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