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1. 发明公开

KR20200142057A 화상 해석 방법, 세그먼테이션 방법, 골밀도 측정 방법, 학습 모델 작성 방법 및 화상 작성 장치 审中-公开
公开(公告)号：KR20200142057A
公开(公告)日：2020-12-21
申请号：KR20207032563
申请日：2019-03-20
申请人： SHIMADZU CORP
发明人： TAKAHASHI WATARU , OSHIKAWA SHOTA
IPC分类号： A61B6/00 , A61B6/03 , G06N20/00 , G06T7/00 , G06T7/11 , G16H30/40 , G16H50/20
摘要： 제어부 (80) 는, X 선화상작성부 (81) 와, X 선화상과 X 선화상용교사골부화상을기억하는 X 선화상기억부 (82) 와, 골부를포함하는영역의 DRR 화상을작성하는 DRR 화상작성부 (83) 와, DRR 화상과기계학습용의 DRR 화상용교사골부화상을기억하는 DRR 화상기억부 (84) 와, X 선화상과 X 선화상용교사골부화상을사용하여기계학습을실행함과함께 DRR 화상과 DRR 화상용교사골부화상을사용하여기계학습을실행함으로써골부를인식하기위한학습모델을작성하는학습부 (85) 와, 피검자의골부를포함하는영역의 X 선화상에대해학습부 (85) 에서작성한학습완료모델을이용하여변환을실시함으로써골부를나타내는화상을작성하는골부화상작성부 (86) 를구비한다.

2. 发明公开

KR20090053796A RADIOGRAPHY APPARATUS AND RADIATION DETECTION SIGNAL PROCESSING METHOD 审中-公开
标题翻译：放射线检测信号处理方法
公开(公告)号：KR20090053796A
公开(公告)日：2009-05-27
申请号：KR20097003761
申请日：2009-02-24
申请人： SHIMADZU CORP
发明人： OKAMURA SHOICHI
IPC分类号： A61B6/00
摘要： 이 발명의 방사선촬상장치에서는, X선 검출신호가 축적된 시간인 축적시간이, 조사시간에 대응하지 않은 고정된 소정 시간으로서, 한 종류의 축적시간만으로 촬상이 행해진다. 한 종류의 축적시간만이라도, 고정된 소정 시간으로 축적이 행해진 X선검출신호를 1화상 분씩 판독하여, 복수 화상분의 축적프레임 데이터를 얻어서, 조사에 관련된 복수의 축적프레임 데이터에 기초하여 X선 화상을 얻을 수 있다. 따라서, 한 종류의 축적시간으로 촬상이나 신호처리를 행할 수 있다.
방사선 촬상장치

3. 发明公开

KR20090037923A ULTRASONOGRAPH 审中-公开
标题翻译：超声检查
公开(公告)号：KR20090037923A
公开(公告)日：2009-04-16
申请号：KR20097002484
申请日：2009-02-06
申请人： SHIMADZU CORP , MEDIA CROSS CO LTD
发明人： KATOH JUN ICHI , ITOH MASAO
IPC分类号： A61B8/06
摘要： A schedule storage section (23) stores a predetermined time schedule of image storage. An avascularizing unit (30) avascularizes an upper arm artery of a subject by pressurizing the upper arm, releases the avascularization after a predetermined time, and sends a depressurization start signal to a control section (17). When a time specified by the time schedule passes after the reception of the depressurization start signal, the control section (17) stores an ultrasonic image in an image storage section (22). A blood vessel diameter measuring section (18) measures the diameter of the blood vessel from the ultrasonic tomograms of the blood vessel captured during the rest and after the avascularization release and stored in the image storage section (22). A maximum blood vessel diameter estimating section (20) and a %FMD calculating section (21) estimate the maximum blood vessel diameter after the release and the calculate the %FMD from these measured blood vessel diameters, respectively. With this, after the avascularization is started, from the storage of the measurement image to the %FMD calculation can be automatically carried out without needing the assistance of the operator, and the troublesome work of the operator necessary to measure the %FMD can be greatly reduced.
摘要翻译：时间表存储部分（23）存储图像存储的预定时间表。血管化单元（30）通过对上臂进行加压来使受检者的上臂动脉血管化，在预定时间后释放血流，并将减压开始信号发送到控制部（17）。当在接收到减压开始信号之后通过时间表指定的时间时，控制部分（17）将超声波图像存储在图像存储部分（22）中。血管直径测量部分（18）根据在休息期间和血管再生释放后捕获的血管的超声波断层图像测量血管的直径并存储在图像存储部分（22）中。最大血管直径估计部分（20）和％FMD计算部分（21）估计释放后的最大血管直径，并从这些测量的血管直径计算出％FMD。这样，在开始血管重建之后，可以在不需要操作者的帮助的情况下自动执行从测量图像的存储到％FMD计算，并且可以大大地测量测量％FMD所必需的麻烦的操作降低。

4. 发明公开

KR20100095369A Absorption spectroscopic analyzer for semiconductor manufacturing process 无效
标题翻译：用于半导体制造工艺的吸收光谱分析仪
公开(公告)号：KR20100095369A
公开(公告)日：2010-08-30
申请号：KR20100008254
申请日：2010-01-29
申请人： SHIMADZU CORP , TOKYO ELECTRON LTD
发明人： AKIYAMA OSAMU , AKIMOTO MASASHI , MORIYA TSUYOSHI , YAMAWAKU JUN
IPC分类号： G01N21/15 , G01N21/39 , G01N1/00 , G01N1/22 , G01N15/06 , G01N21/3554 , H01L21/205 , H01L21/3065
CPC分类号： G01N21/3554 , G01N21/031 , G01N21/05 , G01N21/3504 , G01N21/9501 , H01L21/67253
摘要： PURPOSE: An optical extinction analyzing device for a semiconductor manufacturing process is provided to prevent the attaching of particles to the inside of an analyzing device. CONSTITUTION: An optical extinction analyzing device for a semiconductor manufacturing process comprises a fluid path converting mechanism(50) and a spectrophotometer(51). A fluid path converting mechanism is connected to the exhaust channel of the process chamber of the semiconductor manufacturing process. The spectrophotometer is connected to the exhaust channel. The spectrophotometer comprises cell and optical system. The spectrophotometer measures the moisture concentration among the process gas. A particle counter measuring particle is included in the process chamber. The fluid path converting mechanism comprises a controller.
摘要翻译：目的：提供一种用于半导体制造工艺的光学消光分析装置，以防止颗粒附着到分析装置的内部。构成：用于半导体制造工艺的光学消光分析装置包括流体路径转换机构（50）和分光光度计（51）。流体路径转换机构连接到半导体制造工艺的处理室的排气通道。分光光度计连接到排气通道。分光光度计包括电池和光学系统。分光光度计测量工艺气体中的水分浓度。颗粒计数器测量颗粒包含在处理室中。流体路径转换机构包括控制器。

5. 发明公开

KR20210008051A 교사 라벨 화상 수정 방법, 학습 완료 모델의 작성 방법 및 화상 해석 장치 审中-公开
公开(公告)号：KR20210008051A
公开(公告)日：2021-01-20
申请号：KR20207035363
申请日：2018-08-06
申请人： SHIMADZU CORP
发明人： TAKAHASHI WATARU , AKAZAWA AYAKO , OSHIKAWA SHOTA
IPC分类号： G06T7/00 , G06N20/00
摘要： 이교사라벨화상수정방법은, 학습데이터 (10) 의입력화상 (11) 에대해, 학습데이터를사용한학습완료모델 (1) 에의해세그먼테이션처리를실시하여, 판정용라벨화상 (14) 을작성하는스텝과, 판정용라벨화상 (14) 과교사라벨화상 (12) 에대하여, 대응하는부분끼리의라벨을비교하는스텝과, 라벨의비교결과에기초하여, 교사라벨화상에포함되는라벨영역 (13) 을수정하는스텝을포함한다.

6. 发明公开

KR20090042291A GEAR PUMP 有权
标题翻译：齿轮泵
公开(公告)号：KR20090042291A
公开(公告)日：2009-04-29
申请号：KR20097004368
申请日：2006-09-08
申请人： SHIMADZU CORP
发明人： ISHINAKA TSUGUNORI , KOMATSU KOJI , ISHIHARA TAKUMI
IPC分类号： F04C2/18 , F04C2/14
CPC分类号： F04C2/086 , F04C2/18 , F04C11/001 , F04C14/26
摘要： A gear pump (1) that requires a reduced number of materials and a smaller installation space and that is produced at reduced material costs. The gear pump (1) has one or more gear pairs (6, 7) in which drive gears (61, 71) and driven gears (62, 72) are meshed with each other, and also has a casing (2) for receiving the gear pairs (6, 7). The casing (2) is constructed from a body (4), a front cover (3), and a rear cover (5). The body (4) has eyeglass-shaped holes (4a, 4b) for receiving the gear pairs, bearing holes (4x, 4y) communicating with the eyeglass-shaped holes (4a, 4b) and in which shafts (611, 621, 711, 721) for supporting gears (61, 62, 71, 72) forming the gear pairs are inserted, a low-pressure side port (43) communicating with the eyeglass hole (4a) and sucking a low-pressure operation liquid, high-pressure side ports (41, 42) communicating with the eyeglass-shaped hole (4a) and discharging a high-pressure operation liquid, a valve installation section (44) provided near the high-pressure side ports (41, 42) and on which a valve can be installed, and a return path (45) running from the valve installation section (44) up to the low-pressure side port (43) and positioned in the front-rear direction corresponding to the bearing holes (4x, 4y). The front cover (3) and rear cover (5) are arranged at the front and rear sides of the body (4) to close the eyeglass-shaped hole (4a).
摘要翻译：齿轮泵（1），其需要减少材料数量和较小的安装空间，并以减少的材料成本生产。齿轮泵（1）具有一个或多个齿轮对（6,7），其中驱动齿轮（61,71）和从动齿轮（62,72）彼此啮合，并且还具有壳体（2）齿轮对（6,7）。壳体（2）由主体（4），前盖（3）和后盖（5）构成。主体（4）具有用于容纳齿轮对的眼镜孔（4a，4b），与眼镜孔（4a，4b）连通的轴承孔（4x，4y），其中轴（611,621,711 插入形成齿轮对的用于支撑齿轮（61,62,71,72）的支承部件（721），与眼镜孔（4a）连通并吸入低压操作液体的低压侧端口（43）与眼镜孔连通并排出高压操作液的压力侧端口（41,42），设置在高压侧端口（41,42）附近的阀安装部（44）可以安装阀，以及从阀安装部分（44）运行到低压侧端口（43）并且位于与轴承孔（4x，4y）相对应的前后方向上的返回路径（45））。前盖（3）和后盖（5）布置在主体（4）的前侧和后侧，以封闭眼镜孔（4a）。

7. 发明申请

WO2015075817A1 SUBSTRATE PROCESSING SYSTEM 审中-公开
标题翻译：基板加工系统
公开(公告)号：WO2015075817A1
公开(公告)日：2015-05-28
申请号：PCT/JP2013081538
申请日：2013-11-22
申请人： SHIMADZU CORP
发明人： TAKEDA NAOYA , HIRATSUKA MASAO , UENO MASAYOSHI
IPC分类号： B65G49/06 , H01L21/677
CPC分类号： H01L21/67781 , H01L21/67712
摘要： Disclosed is a substrate processing system capable of transferring a plurality of substrate carriers, each of which has vertically mounted thereon substrates to be processed. The substrate processing system is provided with: a substrate placing apparatus that places the substrates on the substrate carriers; a processing apparatus that processes the substrates mounted on the substrate carriers; a transfer apparatus that circulates the substrate carriers between the substrate placing apparatus and the processing apparatus; and a substrate carrier placing mechanism that has a branch path connected to the transfer apparatus, and a storage region where the substrate carriers which move on the branch path are stored. The substrate carriers are taken out at the storage region from the substrate processing system.
摘要翻译：公开了一种能够传送多个基板载体的基板处理系统，每个基板载体垂直地安装在待处理的基板上。基板处理系统设置有：将基板放置在基板载体上的基板放置装置; 处理安装在基板载体上的基板的处理装置; 使基板载体在基板载置装置与处理装置之间循环的传送装置; 以及具有连接到转印装置的分支路径的基板载体放置机构，以及存储在分支路径上移动的基板载体的存储区域。从基板处理系统的存储区域取出基板载体。

8. 发明申请

WO2013057505A3 MASS ANALYSER, MASS SPECTROMETER AND ASSOCIATED METHODS 审中-公开
标题翻译：质谱分析仪，质谱仪及相关方法
公开(公告)号：WO2013057505A3
公开(公告)日：2013-08-22
申请号：PCT/GB2012052593
申请日：2012-10-19
申请人： SHIMADZU CORP , SHCHEPUNOV VYACHESLAV , GILES ROGER
发明人： SHCHEPUNOV VYACHESLAV , GILES ROGER
IPC分类号： H01J49/42 , H01J49/40
CPC分类号： H01J49/062 , H01J49/40 , H01J49/408 , H01J49/4245
摘要： A mass analyser for use in a mass spectrometer. The mass analyser has a set of electrodes including electrodes arranged to form at least one electrostatic sector, the set of electrodes being spatially arranged to be capable of providing an electrostatic field in a reference plane suitable for guiding ions along a closed orbit in the reference plane, wherein the set of electrodes extend along a drift path that is locally orthogonal to the reference plane and that curves around a reference axis so that, in use, the set of electrodes provide a 3D electrostatic field region. The mass analyser is configured so that, in use, the 3D electrostatic field region provided by the set of electrodes guides ions having different initial coordinates and velocities along a single predetermined 3D reference trajectory that curves around the reference axis.
摘要翻译：用于质谱仪的质量分析仪。质量分析器具有一组电极，其包括布置成形成至少一个静电扇区的电极，该组电极在空间上布置成能够在参考平面中提供适合于沿着参考平面中的闭合轨道引导离子的静电场，其中所述电极组沿着与所述参考平面局部正交并且围绕参考轴线弯曲的漂移路径延伸，使得在使用中所述电极组提供3D静电场区域。质量分析器被配置为使得在使用中由该组电极提供的3D静电场区域沿着围绕参考轴线弯曲的单个预定3D参考轨迹引导具有不同初始坐标和速度的离子。

9. 发明申请

WO2007043137A9 NUCLEAR MEDICAL DIAGNOSIS DEVICE 审中-公开
标题翻译：核医学诊断设备
公开(公告)号：WO2007043137A9
公开(公告)日：2007-05-31
申请号：PCT/JP2005018360
申请日：2005-10-04
申请人： SHIMADZU CORP , OOI JYUNICHI
发明人： OOI JYUNICHI
IPC分类号： G01T1/161 , G01T1/172 , G01T1/20
CPC分类号： G01T1/1644
摘要： A nuclear medical diagnosis device includes: a plurality of scintillator arrays each formed by a plurality of scintillators having different attenuation times of the light emitting pulse in the ?-ray incident depth direction; incidence timing calculation means for calculating the timing of the incidence into the scintillator array; scintillator array identification means for identifying the scintillator into which the ?-ray has come; and an incidence timing correction unit of a position calculation processing unit for judging whether to correct the incidence timing calculated by the incidence timing calculation unit according to the scintillator array identified by the scintillator array identification unit. Even when a scintillator having a different attenuation time of the light emitting pulse is used for the ?-ray detector, the incidence timing can be corrected according to the result of judgment by the incidence timing correction unit so as to improve the detection sensitivity and obtain an accurate tomogram without causing degradation of a reconfigured image.
摘要翻译：一种核医疗诊断装置，其特征在于，具备：多个闪烁器阵列，各自由所述发光脉冲在所述γ射线入射深度方向上的衰减时间不同的多个闪烁器构成; 入射定时计算装置，用于计算入射到闪烁体阵列中的定时; 闪烁器阵列识别装置，用于识别α射线到来的闪烁体; 以及位置计算处理单元的入射定时校正单元，用于根据由闪烁体阵列识别单元识别的闪烁体阵列判断是否校正由入射定时计算单元计算的入射定时。即使当具有不同发光脉冲的衰减时间的闪烁体被用于γ射线检测器时，也可以根据入射定时校正单元的判断结果校正入射定时，从而提高检测灵敏度并获得准确的断层图像而不会导致重构图像的劣化。

10. 发明申请

WO2004103636A2 SUBSTRATE POLISHING APPARATUS 审中-公开
标题翻译：基板抛光装置
公开(公告)号：WO2004103636A2
公开(公告)日：2004-12-02
申请号：PCT/JP2004007152
申请日：2004-05-19
申请人： EBARA CORP , SHIMADZU CORP , HIROKAWA KAZUTO , KOBAYASHI YOICHI , NAKAI SHUNSUKE , OHTA SHINROU , TSUKUDA YASUO
发明人： HIROKAWA KAZUTO , KOBAYASHI YOICHI , NAKAI SHUNSUKE , OHTA SHINROU , TSUKUDA YASUO
IPC分类号： B24B49/12 , B24D7/12 , H01L21/306 , B24B
CPC分类号： B24B37/12 , B24B37/013 , B24B49/12 , H01L21/30625
摘要： A substrate polishing apparatus (10) polishes a substrate (20) to a flat mirror finish. The substrate polishing apparatus (10) has a polishing table (12) against which a substrate (20) is pressed, a light-emitting and light-receiving device (24) to emit measurement light from the polishing table (12) to the substrate (20) and to receive reflected light from the substrate (20) for measuring a film on the substrate (20), a fluid supply passage (42) for supplying a measurement fluid, through which the measurement light and the reflected light pass, to a fluid chamber (68) provided at a light-emitting and light-receiving position of the polishing table (12), and a fluid supply control device (56, 58) for controlling supply of the measurement fluid to the fluid chamber (68).
摘要翻译：基板研磨装置（10）将基板（20）抛光成平面镜面。基板研磨装置（10）具有：被加压基板（20）的研磨台（12），从研磨台（12）向基板发射测定光的发光和受光装置（24）（20）接收来自基板（20）的反射光，用于测量基板（20）上的薄膜;流体供给通道（42），用于将测量光和反射光通过的测量流体通过，设置在所述研磨台（12）的发光和受光位置处的流体室（68）和用于控制向所述流体室（68）供给所述测量流体的流体供应控制装置（56,58）。

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