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1. 发明专利

IE20040568A1 A method for transferring process control models between plasma processing chambers 未知
公开(公告)号：IE20040568A1
公开(公告)日：2006-03-08
申请号：IE20040568
申请日：2004-08-26
申请人： SCIENT SYSTEMS RES LTD
发明人： O'LEARY KEVIN , MARTINEZ FRANCISCO , CARBERRY MARCUS
IPC分类号： C23C16/00 , H01J37/32 , H01J99/00
摘要： A method for transferring a multi-variate proces control model from one RF-powered plasma processin chamber (the reference chamber) to another nominally identical RF-powered plasma processing chamber (the target chamber) comprises first determining a multi-variate process control model on the reference tool based upon sensor data, 100. Then, a set of sensor data is taken for the reference chamber b running a designed experiment, 102, and a corresponding set of sensor data is taken for the target chamber using the same designed experiment, 104. The relationship between the reference and target chambers is determined by comparing the results of the designed experiments and calculating a transform matrix representing differences between the two chambers, 106. Finally, the process control model is transformed from the reference chamber to the target chamber using the transform matrix thus obtained, 108.

2. 发明专利

IE20020107A1 Fault classification in a plasma process chamber 未知
公开(公告)号：IE20020107A1
公开(公告)日：2003-08-20
申请号：IE20020107
申请日：2002-02-13
申请人： SCIENT SYSTEMS RES LTD
发明人： HOPKINS MICHAEL
IPC分类号： G01N27/66
摘要： A method of fault classification in a plasma process chamber powered by an RF source comprises initially running a plurality of different baseline plasma processes on the chamber. For each baseline process, the magnitudes of a plurality of Fourier components of delivered RF power are determined and stored as an impedance fingerprint for that baseline process. In the case of a fault, one or more of the baseline processes is repeated according to a predetermined decision tree to determine the current fingerprints and classify the fault by comparing the current fingerprints with the original fingerprints.

3. 发明专利

IE20000569A1 A method of processing a High Frequency Signal Containing Multiple Fundamental Frequencies 未知
公开(公告)号：IE20000569A1
公开(公告)日：2002-01-09
申请号：IE20000569
申请日：2000-07-12
申请人： SCIENT SYSTEMS RES LTD
发明人： HOPKINS MICHAEL B , OVERARD JEAN-MARC
IPC分类号： G01R17/00 , G01R19/00 , G01R25/00 , G06F17/10
摘要： A method of processing a high frequency signal containing at least two different fundamental frequencies F1 and F2 and their harmonic components in order to extract at least one harmonic component of each of the two fundamental frequencies comprises sampling the signal at two sampling frequencies CK1 = F1 (M1/N1) and CK2 = F2 (M2/N2), where M1 and N1 are a first pair of integers having no common factor and M2 and N2 are a second pair of integers having no common factor. The sample values resulting from sampling at CK1 are stored cyclically in a set of M1 memory locations such that the nth sample value is stored cumulatively in the remM1[n]the memory location, and the sampled values resulting from sampling at CK2 are stored cyclically in a set of M2 memory locations such that the nth sample value is stored cumulatively in the remM2[n]the memory location. The sampling is continued at each sampling frequency CK1 and CK2 until sufficient sample values have been stored in each memory location of the corresponding set M1 or M2 to substantially average out the other fundamental frequency(s) and its/their harmonic components. Finally, a Fourier analysis of the sample values in each set M1 and M2 of memory locations is performed to extract the said at least one harmonic component of each fundamental frequency F1 and F2.

4. 发明专利

IES80660B2 Apparatus for sensing RF current delivered to a plasma and waveform sampling circuit for use with such apparatus 未知
公开(公告)号：IES80660B2
公开(公告)日：1998-11-04
申请号：IES980190
申请日：1998-03-16
申请人： SCIENT SYSTEMS RES LTD
发明人： HOPKINS MICHAEL
IPC分类号： H05H1/00 , G01R1/20 , G01R1/24 , G01R15/16 , G01R15/18 , G01R19/00 , G01R19/25 , G01R31/28 , H05H1/46 , H05H7/02 , G01R19/15

5. 发明专利

IE20030730A1 A method for process control of semiconductor manufacturing equipment 未知
公开(公告)号：IE20030730A1
公开(公告)日：2004-12-15
申请号：IE20030730
申请日：2003-10-03
申请人： SCIENT SYSTEMS RES LTD
发明人： SCANLAN JOHN , O'LEARY KEVIN , HOPKINS MICHAEL , CARBERRY MARCUS
IPC分类号： C23C16/52 , H01L21/00 , H05H1/00 , H01L21/66 , G05B19/418
摘要： A method of fault identification on a semiconductor manufacturing tool includes monitoring tool sensor output, establishing a fingerprint of tool states based on the plurality of sensors outputs, capturing sensor data indicative of fault conditions, building a library of such fault fingerprints, comparing present tool fingerprint with fault fingerprints to identify a fault condition and estimating the effect of such a fault condition on process output. The fault library is constructed by inducing faults in a systematic way or by adding fingerprints of known faults after they occur.

6. 发明专利

IE990818A1 Waveform sampling circuit 未知
公开(公告)号：IE990818A1
公开(公告)日：2000-12-27
申请号：IE990818
申请日：1998-03-16
申请人： SCIENT SYSTEMS RES LTD
发明人： HOPKINS MICHAEL
IPC分类号： A23L2/42 , A23F5/24 , A23F5/26 , A23L2/38 , A23L2/46 , G01R27/16
摘要： A waveform sampling circuit is provided for use inter alia with an apparatus for sensing RF current delivered to a plasma. The circuit includes means for sampling the waveform at a sampling frequency fs = f(M/N) where f is the fundamental frequency of the waveform and M and N are integers having no common factor. The sampling frequency fs is derived from the fundamental frequency f by frequency multiplication and division, and the values of M and N are adjustable. The circuit preferably includes storage means having M memory locations m1 to mM and means for storing the Sth sample value cumulatively in memory location mQ where Q = remM [S] until a plurality Na of sample values have been stored in each memory location, whereby the average sample value of the waveform at each sampled phase is given by the cumulative sum in the respective memory location divided by Na. Consecutive sample values are stored in non-consecutive memory locations such that consecutive memory locations contain sample values in phase order.

7. 发明专利

IE20030437A1 A method for process control of semiconductor manufacturing equipment 未知
公开(公告)号：IE20030437A1
公开(公告)日：2004-12-15
申请号：IE20030437
申请日：2003-06-11
申请人： SCIENT SYSTEMS RES LTD
发明人： HOPKINS MICHAEL , LEARYEL KEVIN O'
IPC分类号： G05B19/418 , H01L21/02 , H01L21/66
摘要： A method of fault identification on a semiconductor manufacturing tool includes monitoring tool sensor output, establishing a fingerprint of tool states based on the plurality of sensors outputs, capturing sensor data indicative of fault conditions, building a library of such fault fingerprints, comparing present tool fingerprint with fault fingerprints to identify a fault condition and estimating the effect of such a fault condition on process output. The fault library is constructed by inducing faults in a systematic way or by adding fingerprints of known faults after they occur.

8. 发明专利

IE20020773A1 A method for fault detection in a plasma process 未知
公开(公告)号：IE20020773A1
公开(公告)日：2004-03-24
申请号：IE20020773
申请日：2002-09-24
申请人： SCIENT SYSTEMS RES LTD
发明人： MORAIN CIARAN O'
IPC分类号： H01J37/32 , H01L21/311 , G01R23/16
摘要： A method of fault detection is described for use in a plasma process chamber powered by an RF source and subject to periodic standard preventive maintenance. Prior to a production run, the changes in magnitude of a plurality of Fourier components of the RF source resulting from known changes in a plurality of process conditions are determined and a single parameter which is a linear combination of a selected subset of said components is constructed. The construction is such that the combination is relatively sensitive to pre-selected process changes and relatively insensitive to said standard preventive maintenance. Then, during the production run, the single parameter is monitored to determine if there is a fault in the plasma process.

9. 发明专利

IE20020141A1 Plasma chamber conditioning 未知
公开(公告)号：IE20020141A1
公开(公告)日：2003-09-03
申请号：IE20020141
申请日：2002-02-22
申请人： SCIENT SYSTEMS RES LTD
发明人： SCANLAN JOHN
IPC分类号： H01J37/32 , H01L21/00 , H01L21/306
摘要： A method for determining the optimum number of conditioning wafers to be run following a wet clean of the walls of an RF plasma chamber (1) is based on an electrical precursor signal. Polymer build up on plasma chamber wall during normal chamber conditioning is monitored by observing components of the fundamental RF signal. After a pre-determined number of wafers has been run, a predictive model is used to determine the total number of wafers needed to complete the conditioning cycle.

10. 发明专利

AU7443501A A method for fault identification in a plasma process 未知
公开(公告)号：AU7443501A
公开(公告)日：2002-01-02
申请号：AU7443501
申请日：2001-06-18
申请人： SCIENT SYSTEMS RES LTD
发明人： SCANLAN JOHN , LAWLER JUSTIN , DANIELS STEPHEN
IPC分类号： C23C16/50 , C23C16/52 , H01J37/32 , H01L21/205 , H01L21/3065 , H01L21/66

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