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    • 7. 发明授权
    • Positive resist composition
    • 正抗蚀剂组成
    • US6013407A
    • 2000-01-11
    • US875045
    • 1997-07-08
    • Shoji KawataHiroshi HayashiHirokazu HigashiTakeyoshi KatoMasahiro Nakamura
    • Shoji KawataHiroshi HayashiHirokazu HigashiTakeyoshi KatoMasahiro Nakamura
    • G03F7/022G03F7/023
    • G03F7/0236G03F7/0226G03F7/0233
    • A positive resist composition is excellent in sensitivity, film loss after development, resolution, thermal-flow resistance, storage stability, exposure margin and focus margin and comprises in combination (A) an alkali-soluble phenol resin, (B) a quinonediazide sulfonate type photosensitive agent and (C) a phenolic compound, wherein the phenolic compound (C) is at least one phenolic compound selected from the group consisting of phenolic compounds (CX) having a structural unit represented by the following formula (I) and phenolic compounds (CD) having a structural unit represented by the following formula (II): ##STR1## wherein R.sup.1 to R.sup.3 are, independently of one another, a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group which may be substituted, a cycloalkyl group which may be substituted, an alkenyl group which may be substituted, an alkoxy group which may be substituted, or an aryl group which may be substituted, R.sup.4 to R.sup.11 are, independently of one another, a hydrogen atom, an alkyl group which may be substituted, a cycloalkyl group which may be substituted, an alkenyl group which may be substituted, an aryl group which may be substituted, or an alkoxy group which may be substituted, and n is a positive integer; and ##STR2## wherein R.sup.12 to R.sup.15 are, independently of one another, a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group which may be substituted, a cycloalkyl group which may be substituted, an alkenyl group which may be substituted, an alkoxy group which may be substituted, or an aryl group which may be substituted, with the proviso that at least one of R.sup.12 to R.sup.15 is a hydroxyl group, and m is a positive integer.
    • PCT No.PCT / JP96 / 00061 Sec。 371日期1997年7月8日 102(e)日期1997年7月8日PCT 1996年1月17日PCT PCT。 公开号WO96 / 22563 日期:1996年7月25日正性抗蚀剂组合物具有优异的敏感性,显影后的膜损耗,分辨率,耐热流动性,储存稳定性,曝光余量和聚焦余量,并且包括(A)碱溶性酚醛树脂(B )醌二叠氮化物型光敏剂和(C)酚类化合物,其中所述酚类化合物(C)为选自具有由下式(I)表示的结构单元的酚类化合物(CX))组成的组中的至少一种酚类化合物 )和具有由下式(II)表示的结构单元的酚类化合物(CD):其中R 1至R 3彼此独立地为氢原子,羟基,卤素原子,可被取代的烷基 可被取代的环烷基,可被取代的链烯基,可被取代的烷氧基或可被取代的芳基R4至R11彼此独立地是 氢原子,可以被取代的烷基,可被取代的环烷基,可被取代的烯基,可被取代的芳基或可被取代的烷氧基,n是正的 整数; 并且其中R12至R15彼此独立地为氢原子,羟基,卤素原子,可被取代的烷基,可被取代的环烷基,可被取代的烯基,烷氧基 可以被取代的基团,或可以被取代的芳基,条件是R12至R15中的至少一个是羟基,m是正整数。
    • 9. 发明授权
    • Photosensitive composition from copolymers of ethylenic phosphorous
monomer(s) and elastomer
    • 乙烯基磷单体和弹性体共聚物的光敏组合物
    • US5889116A
    • 1999-03-30
    • US761092
    • 1996-12-05
    • Takao SuzukiAtsuhiro Kanzaki
    • Takao SuzukiAtsuhiro Kanzaki
    • C08F236/04C09D4/06G03F7/033C08L43/02C08L9/00
    • G03F7/033C08F236/04C09D4/06
    • A photosensitive composition is provided, which comprises (A) 20-65 wt. parts of an elastomer, (B) 35-80 wt. parts of a hydrophilic copolymer consisting essentially of, based on the weight of the copolymer, (1) 1-30 wt. % of units of a phosphorus-, boron- or sulfur-containing monoethylenically unsaturated monomer, (2) 0.5-25 wt. % of units of a phosphorus-, boron- or sulfur-containing diethylenically unsaturated monomer, (3) 40-90 wt. % of units of a conjugated diene monomer, and (4) 0-58.5 wt. % of units of other copolymerizable monomer; the total amount of the elastomer (A) and the hydrophilic copolymer (B) being 100 wt. parts, (C) 5-100 wt. parts of a photopolymerizable ethylenically unsaturated monomer, and (D) 0.1-10 wt. parts of a photopolymerization initiator. The photosensitive composition is useful for the preparation of a flexographic printing plate.
    • 提供了一种光敏组合物,其包含(A)20-65wt。 部分弹性体,(B)35-80wt。 亲水性共聚物的一部分基本上由共聚物的重量组成,(1)1-30wt。 含磷,硼或硫的单烯属不饱和单体的单位%,(2)0.5-25wt。 含磷,硼或含硫烯属不饱和单体的单位%,(3)40-90重量% 共轭二烯单体的单位%,(4)0-58.5重量% 其他可共聚单体的单位%; 弹性体(A)和亲水性共聚物(B)的总量为100重量% 部分,(C)5-100wt。 部分可光聚合的烯属不饱和单体,和(D)0.1-10重量% 部分光聚合引发剂。 光敏组合物可用于制备柔版印刷版。