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1. 发明申请

WO1998014501A1 PROCESS FOR THE PREPARATION OF THERMOTROPIC AROMATIC POLYESTERS DIRECTLY FROM DIALKYL AROMATIC ESTERS 审中-公开
标题翻译：从直立芳香酯直接制备热稳定性芳族聚酯的方法
公开(公告)号：WO1998014501A1
公开(公告)日：1998-04-09
申请号：PCT/US1997014268
申请日：1997-08-13
申请人： HOECHST CELANESE CORPORATION
发明人： HOECHST CELANESE CORPORATION , GUPTA, Balaram , BYLICKI, Matthew, J.
IPC分类号： C08G63/60
CPC分类号： C08G63/605 , C08G63/78 , C08G63/82 , C08G69/44
摘要： A process is provided for the formation of aromatic polyesters directly from the reaction of dialkyl ester of an aromatic carboxylic acid with dihydric phenols. The polycondensation is carried out in the presence of (a) a condensing agent; (b) a catalyst selected from the group consisting of derivatives of Group I metals, derivatives of Group IV A metals, derivatives of Group IV B metals, and mixtures thereof; and (c) a co-catalyst selected from the group consisting of methanesulfonic acid, sulfuric acid, p-toluenesulfonic acid, alkanoic acid having the formula CnHxFyCOOH, where n is an integer from 1 to 4, x and y are integers from 0 to 2n+1, and the sum of x and y is 2n+1, and mixtures thereof; at suitable temperatures and pressure conditions and for sufficient period of time to form the aromatic polyester.
摘要翻译：提供了直接由芳族羧酸与二元酚的二烷基酯反应形成芳族聚酯的方法。缩聚在（a）缩合剂存在下进行; （b）选自I族金属的衍生物，IV族金属的衍生物，IVB族金属的衍生物及其混合物的催化剂; 和（c）选自甲磺酸，硫酸，对甲苯磺酸，具有式C n H x F y COOH的链烷酸，其中n为1至4的整数的助催化剂，x和y为0至 2n + 1，x和y的和为2n + 1，以及它们的混合物; 在合适的温度和压力条件下和足够的时间以形成芳族聚酯。

2. 发明申请

WO1998008787A3 RESOLUTION OF RACEMIC MIXTURES USING POLYMERS CONTAINING CHIRAL UNITS 审中-公开
公开(公告)号：WO1998008787A3
公开(公告)日：1998-03-05
申请号：PCT/US1997/013874
申请日：1997-08-07
申请人： HOECHST CELANESE CORPORATION
发明人： YOON, Hyun, N. , LU, Mengshi , OGATO, Naoya
IPC分类号： C07B57/00
摘要： Described herein is a novel process to resolve a racemic compound into its optically active isomers without need for chemical transformation such as salt formation. The process advantageously utilizes polymers containing chiral moieties in their repeat units as well as exhibiting critical solution temperature behavior in a suitable solvent. An embodiment describes the resolution of tryptophan.

3. 发明申请

WO1997047678A1 METHOD OF PRIMING POLYOLEFIN ARTICLES FOR COATING 审中-公开
标题翻译：制备用于涂料的聚烯烃制品的方法
公开(公告)号：WO1997047678A1
公开(公告)日：1997-12-18
申请号：PCT/US1997010073
申请日：1997-06-06
申请人： HOECHST CELANESE CORPORATION
发明人： HOECHST CELANESE CORPORATION , HUBBARD, Michael, A. , McCAULLEY, James, A. , HOLCOMB, Douglas, R.
IPC分类号： C08J07/04
CPC分类号： C08J7/045 , C08J7/047 , C08J2323/02 , C08J2425/00 , C08J2429/00
摘要： A method for providing a waterborne, inorganic barrier coating to a polyolefin substrate is described. The method involves applying a primer composition containing a vinyl polymer, wherein at least 75 % of the polymer repeat units contain side groups having hydroxyl moieties, to the substrate. This primer coating facilitates the application and binding of the subsequently applied barrier coating composition to the substrate.
摘要翻译：描述了一种向聚烯烃基材提供水性无机阻隔涂层的方法。该方法包括将含有乙烯基聚合物的底漆组合物，其中至少75％的聚合物重复单元含有具有羟基部分的侧基。该底涂层有助于随后施加的阻挡涂层组合物与基底的应用和结合。

4. 发明申请

WO1997035231A2 THERMAL TREATMENT PROCESS OF POSITIVE PHOTORESIST COMPOSITION 审中-公开
标题翻译：积极光电组合物的热处理工艺
公开(公告)号：WO1997035231A2
公开(公告)日：1997-09-25
申请号：PCT/US1997003062
申请日：1997-02-27
申请人： HOECHST CELANESE CORPORATION
发明人： HOECHST CELANESE CORPORATION , DAMMEL, Ralph, R. , LU, Ping-Hung , SPAK, Mark, A. , ALILE, Oghogho
IPC分类号： G03C00/00
CPC分类号： G03F7/168
摘要： A flash softbake process for a diazonaphthoquinone sulfonate ester-novolak positive photoresist is described which offers significant advantages. This process uses a higher than conventional soft-baking (SB) temperature (>/=130 DEG C) and a very short baking time (
摘要翻译：描述了重氮萘醌磺酸酯 - 酚醛清漆型正性光致抗蚀剂的闪蒸软烘烤方法，其具有显着的优点。该方法使用比传统的软烘烤（SB）温度高（> / = 130℃）和抗蚀剂的非常短的烘烤时间（

5. 发明申请

WO1997033200A1 LIGHT-ABSORBING ANTIREFLECTIVE LAYERS WITH IMPROVED PERFORMANCE DUE TO REFRACTIVE INDEX OPTIMIZATION 审中-公开
标题翻译：具有改进性能的光吸收抗反射层由于折射率优化
公开(公告)号：WO1997033200A1
公开(公告)日：1997-09-12
申请号：PCT/US1997003754
申请日：1997-03-06
申请人： HOECHST CELANESE CORPORATION
发明人： HOECHST CELANESE CORPORATION , DAMMEL, Ralph, R. , NORWOOD, Robert, A.
IPC分类号： G03F07/09
CPC分类号： G03F7/091
摘要： The invention consists of a light-absorbing top antireflective layer which reduces the swing curve amplitude for photoresist materials used in the semiconductor industry. The coating may be water based but is not necessarily so. The advantage of a water-based coating is its ease of use, since it can be applied without intermixing to the softbaked photoresist, and is removed in the development step, so that process complexity is only minimally increased. One problem that has been associated with the existing non-absorbing antireflective coatings is that the optimum swing curve reduction is only achieved at a very low refractive index. The advantages of a dyed coating are: a) that the refractive index of the top coat can additionally be lowered by making use of anomalous dispersion effects if the dye is chosen judiciously, and b) that it is possible to achieve the optimum swing curve reduction at a higher refractive index of the top coat. By a combination of these two effects, the present invention demonstrates a reduction of the swing curve close to the theoretical minimum value, which constitutes a substantial improvement over existing antireflective topcoats.
摘要翻译：本发明包括一种吸收性的顶部抗反射层，其减少半导体工业中使用的光致抗蚀剂材料的摆动曲线幅度。涂层可以是水性的，但不一定如此。水性涂料的优点是其易于使用，因为它可以在不与软烘烤的光致抗蚀剂混合的情况下进行应用，并且在显影步骤中被去除，使得仅仅最小程度地提高了工艺复杂性。与现有的非吸收性抗反射涂层相关联的一个问题是仅在非常低的折射率下实现最佳摆动曲线减小。染色涂层的优点是：a）如果染色被明智地选择，则可以通过利用异常色散效应来额外降低顶涂层的折射率，以及b）可以实现最佳摆动曲线减小在顶涂层的较高折射率下。通过这两种效果的组合，本发明证明了接近理论最小值的摆动曲线的减小，这相对于现有的抗反射面漆构成了实质的改进。

6. 发明申请

WO1997031055A1 THERMOPLASTIC POLYMER COMPOSITION WITH IMPROVED WEAR PROPERTIES 审中-公开
标题翻译：具有改进磨损特性的热塑性聚合物组合物
公开(公告)号：WO1997031055A1
公开(公告)日：1997-08-28
申请号：PCT/US1996002591
申请日：1996-02-26
申请人： HOECHST CELANESE CORPORATION
发明人： HOECHST CELANESE CORPORATION , FORSCHIRM, Alex
IPC分类号： C08K05/10
CPC分类号： C08L59/00 , C08L23/00 , C08L101/00 , C08L2555/40 , C08L2666/04
摘要： A self-lubricating polymeric composition, characterized as a melt blend of a thermoplastic polymer and a lubricating system containing ultra high molecular weight polyethylenes, a polyester, acid metal salts, calcium salts, antioxidants and stabilizers. The composition may be prepared into shaped articles which exhibit improved surface wear resistance and coefficients of friction.
摘要翻译：一种自润滑聚合物组合物，其特征在于热塑性聚合物和含有超高分子量聚乙烯，聚酯，酸金属盐，钙盐，抗氧化剂和稳定剂的润滑体系的熔体共混物。组合物可以制备成具有改善的表面耐磨性和摩擦系数的成型制品。

7. 发明申请

WO1997025359A1 ACIDIC ION EXCHANGE RESIN AS A CATALYST TO SYNTHESIZE A NOVOLAK RESIN AND PHOTORESIST COMPOSITION THEREFROM 审中-公开
标题翻译： ACIDIC离子交换树脂作为催化剂合成NOVOLAK树脂和其中的光电组合物
公开(公告)号：WO1997025359A1
公开(公告)日：1997-07-17
申请号：PCT/US1996020165
申请日：1996-12-17
申请人： HOECHST CELANESE CORPORATION
发明人： HOECHST CELANESE CORPORATION , RAHMAN, M., Dalil , AUBIN, Daniel, P. , KOKINDA, Elaine, G. , DURHAM, Dana, L.
IPC分类号： C08G08/10
CPC分类号： C08G8/10 , G03F7/0236
摘要： The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having consistent molecular weight and a very low level of metal ions, utilizing a solid acid condensation catalyst. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resins and for producing semiconductor devices using such photoresist compositions.
摘要翻译：本发明提供了利用固体酸缩合催化剂生产具有一致分子量和非常低水平的金属离子的水不溶性水溶性酚醛清漆树脂的方法。还提供了一种用于生产具有来自这种酚醛清漆树脂的非常低水平的金属离子并且使用这种光致抗蚀剂组合物制造半导体器件的光致抗蚀剂组合物的方法。

8. 发明申请

WO1997023142A1 SHOES COMPRISING THREE-DIMENSIONAL FORMED FIBER PRODUCT 审中-公开
标题翻译：包含三维成形纤维制品的鞋子
公开(公告)号：WO1997023142A1
公开(公告)日：1997-07-03
申请号：PCT/US1996020179
申请日：1996-12-19
申请人： HOECHST CELANESE CORPORATION
发明人： HOECHST CELANESE CORPORATION , KIM, Dai, W. , BESSEY, William, E. , NAGEL, John , CLARK, Gregory, M. , HAAS, Joseph, S., W. , OAKLEY, Etheridge, O., Jr.
IPC分类号： A43B13/18
CPC分类号： B29C70/222 , A43B13/187 , A43B13/26 , B29C70/085 , B29L2031/507
摘要： Shoes for use in demanding applications, primarily athletics, are made from a three-dimensional fiber network that is semi-rigid and resilient. The fiber network is made from a textile fabric that has an array of projections made from the same fabric rising from the plane of the fabric.
摘要翻译：用于苛刻应用，主要是田径运动的鞋子由半刚性和弹性的三维纤维网制成。纤维网由纺织织物制成，该织物具有由从织物平面上升的相同织物制成的突起阵列。

9. 发明申请

WO1997020324A1 POLY(PHENYLENE SULFIDE) COMPOSITES HAVING A HIGH DIELECTRIC CONSTANT 审中-公开
标题翻译：具有高介电常数的聚（苯乙烯）复合材料
公开(公告)号：WO1997020324A1
公开(公告)日：1997-06-05
申请号：PCT/US1996018658
申请日：1996-11-22
申请人： HOECHST CELANESE CORPORATION
发明人： HOECHST CELANESE CORPORATION , WALPITA, Lak, M. , CHEN, Paul, N., Sr. , ZIPP, Christopher , HANLEY, Stephen, J.
IPC分类号： H01B03/30
CPC分类号： H01B3/301 , C08K3/24 , H05K1/0333 , H05K1/0373 , H05K1/16 , C08L81/02
摘要： Polymeric compositions having a high dielectric constant and low loss tangent are made from poly(phenylene sulfide), a ceramic having a high dielectric constant and a low loss tangent, and optionally an added reinforcing filler. The preferred ceramic is strontium titanate. The compositions have a dielectric constant of at least about 4. When mica, alumina, or magnesium titanate is used as an added reinforcing filler, the coefficient of thermal expansion diminishes significantly.
摘要翻译：具有高介电常数和低损耗角正切的聚合物组合物由具有高介电常数和低损耗角正切的陶瓷和可选地添加的增强填料的聚苯硫醚制成。优选的陶瓷是钛酸锶。组合物具有至少约4的介电常数。当使用云母，氧化铝或钛酸镁作为添加的增强填料时，热膨胀系数显着降低。

10. 发明申请

WO1997019969A1 METAL ION REDUCTION IN PHOTORESIST COMPOSITIONS BY CHELATING ION EXCHANGE RESIN 审中-公开
标题翻译：通过螯合离子交换树脂在光电组合物中减少金属离子
公开(公告)号：WO1997019969A1
公开(公告)日：1997-06-05
申请号：PCT/US1996018784
申请日：1996-11-21
申请人： HOECHST CELANESE CORPORATION
发明人： HOECHST CELANESE CORPORATION , RAHMAN, M., Dalil , AUBIN, Daniel, P.
IPC分类号： C08G08/00
CPC分类号： C08G8/00 , G03F7/0233 , G03F7/0236
摘要： The present invention provides methods for producing a photoresist having a very low level of metal ions, utilizing a treated chelating ion exchange resin to make the neutral ammonium salt or acid form. A method is also provided for producing semiconductor devices using such photoresist compositions.
摘要翻译：本发明提供了使用经过处理的螯合离子交换树脂制备中等铵盐或酸形式的具有非常低水平的金属离子的光致抗蚀剂的方法。还提供了一种用于制造使用这种光致抗蚀剂组合物的半导体器件的方法。

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