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1. 发明公开

EP0173465A2 Glow discharge electron beam method and apparatus for the surface recrystallization of solid substances 失效
标题翻译：一种用于在辉光放电的电子束和布置为固体的表面积再结晶所产生的信号中的应用程序。
公开(公告)号：EP0173465A2
公开(公告)日：1986-03-05
申请号：EP85305438.5
申请日：1985-07-30
申请人： APPLIED ELECTRON CORPORATION
发明人： Rocca,Jorge J. , Collins.George J. , Moore,Cameron A.
IPC分类号： H01L21/20 , H01L21/263 , H01J3/02 , H01J37/305
CPC分类号： B82Y10/00 , H01J1/312 , H01J37/317 , H01J37/32018 , H01L21/2636
摘要： The recrystallization of polycrystalline or amorphous materials commonly used as semiconductor substrates is accomplished by employing as a heat source a cold cathode, glow discharge electron beam gun (24) that emits a sharply focussed line electron beam (10) arranged to impinge on a moving substrate material (19). The method yields large surface areas that are substantially free from defects with minimum subsurface heating and rapid throughput.
摘要翻译：多晶或非晶材料的通常用作半导体衬底中的重结晶是通过采用作为加热源的冷阴极来完成，辉光放电，电子束枪（24）做了发射布置在急剧聚焦线电子束（10），以撞击在移动基底材料（19）。该方法的产率较大表面积确实是来自用最小的地下加热和快速的吞吐量基本上无缺陷。

2. 发明公开

EP0173465A3 Glow discharge electron beam method and apparatus for the surface recrystallization of solid substances 失效
标题翻译：玻璃放电电子束方法及固体物质表面再结晶装置
公开(公告)号：EP0173465A3
公开(公告)日：1988-02-24
申请号：EP85305438
申请日：1985-07-30
申请人： APPLIED ELECTRON CORPORATION
发明人： Rocca,Jorge J. , Collins.George J. , Moore,Cameron A.
IPC分类号： H01L21/20 , H01L21/263 , H01J03/02 , H01J37/305
CPC分类号： B82Y10/00 , H01J1/312 , H01J37/317 , H01J37/32018 , H01L21/2636
摘要： The recrystallization of polycrystalline or amorphous materials commonly used as semiconductor substrates is accomplished by employing as a heat source a cold cathode, glow discharge electron beam gun (24) that emits a sharply focussed line electron beam (10) arranged to impinge on a moving substrate material (19). The method yields large surface areas that are substantially free from defects with minimum subsurface heating and rapid throughput.

3. 发明授权

US4904866A Wide area soft vacuum abnormal glow electron beam discharge hardening process 失效
标题翻译：广域软真空异常辉光电子束放电硬化过程
公开(公告)号：US4904866A
公开(公告)日：1990-02-27
申请号：US272641
申请日：1988-11-17
申请人： George J. Collins , Jayaram Krishnaswamy
发明人： George J. Collins , Jayaram Krishnaswamy
IPC分类号： G03F7/20 , H01J37/317 , H01J37/32
CPC分类号： H01J37/32018 , G03F7/2024 , H01J37/317
摘要： A process for large area hardening of photoresists or polymer films placed on substrates is disclosed. The process requires the use of a short duration (
摘要翻译：公开了一种用于放置在基底上的光致抗蚀剂或聚合物膜的大面积硬化的方法。该过程需要使用通过异常辉光放电在软真空中产生的短持续时间（<1 us。）脉冲电子束。脉冲电子束与图案化的光致抗蚀剂/聚合物抗蚀剂相互作用，以通过电子诱导的交联使其上的图案硬化或稳定。使用软的真空环境可以同时进行热和化学诱导的硬化。

4. 发明授权

US4801839A Mounting of a cold cathode directly to a vacuum chamber wall 失效
标题翻译：将冷阴极直接安装到真空室壁上
公开(公告)号：US4801839A
公开(公告)日：1989-01-31
申请号：US939054
申请日：1986-12-08
申请人： George J. Collins , Jack D. Meyer , Zeng-qi Yu
发明人： George J. Collins , Jack D. Meyer , Zeng-qi Yu
IPC分类号： H01J37/32 , H01S3/038 , H01J1/96 , H01J7/26 , H01J17/38
CPC分类号： H01J37/32009 , H01S3/038
摘要： A cold cathode for generating an abnormal glow discharge electron beam within a vacuum chamber is mounted to a wall of the vacuum chamber such that only the emitting front face of the cold cathode, itself electrically insulated from the vacuum chamber wall by a narrow gap therebetween, is located inside the vacuum chamber, while the remainder of the cold cathode is located outside the vacuum chamber.
摘要翻译：用于在真空室内产生异常辉光放电电子束的冷阴极安装在真空室的壁上，使得只有冷阴极的发射前面本身与真空室壁之间狭窄的间隙与绝缘室壁电绝缘，位于真空室内，而冷阴极的其余部分位于真空室外。

5. 发明授权

US4910436A Wide area VUV lamp with grids and purging jets 失效
标题翻译：广域VUV灯，带网格和吹扫喷嘴
公开(公告)号：US4910436A
公开(公告)日：1990-03-20
申请号：US155235
申请日：1988-02-12
申请人： George J. Collins , Zeng-qi Yu , Tien-yu Sheng
发明人： George J. Collins , Zeng-qi Yu , Tien-yu Sheng
IPC分类号： C23C16/48 , C23C16/50 , H01J37/32
CPC分类号： H01J37/32018 , C23C16/482 , C23C16/50
摘要： A disc-shaped plasma, generated by a ring-shaped cold cathode is used both as an in-situ large area (10-20 cm in diameter) VUV lamp and as a source of ground state and excited atoms. The atoms created in the disc-shaped plasma may be used for initiating sensitized atom-molecule reactions in the volume that dissociate the molecules as well as for providing external energy to heterogenous surface reactions. Multiple grid electrodes are used to extract ions or electrons from the plasma during the deposition process. The disc-shaped plasma is of narrow width which is optically thin for resonance photons emitted in a direction perpendicular to the disc to minimize undesired resonance trapping and associated line reversal. This VUV lamp operates without the need for optical windows; hence, ground state and excited atoms, created in the disc-shaped plasma, can diffuse from the disc-shaped plasma toward the substrate.
摘要翻译：由环形冷阴极产生的盘形等离子体既用作原位大面积（直径为10-20cm）的VUV灯，也用作基态和激发原子的源。在圆盘形等离子体中产生的原子可以用于在解离分子的体积中引发致敏原子 - 分子反应以及为异源表面反应提供外部能量。在沉积过程中，使用多个栅格电极从等离子体中提取离子或电子。盘形等离子体的宽度窄，对于在与盘垂直的方向上发射的共振光子而言是光学薄的，以最小化不期望的共振捕获和相关的线反转。该VUV灯不需要光学窗口即可运行; 因此，在盘形等离子体中产生的基态和激发原子可以从盘形等离子体向衬底扩散。

6. 发明授权

US4827137A Soft vacuum electron beam patterning apparatus and process 失效
标题翻译：软真空电子束图案装置及工艺
公开(公告)号：US4827137A
公开(公告)日：1989-05-02
申请号：US856950
申请日：1986-04-28
申请人： George J. Collins , Jayaram Krishnaswamy
发明人： George J. Collins , Jayaram Krishnaswamy
IPC分类号： G03F7/20 , H01J37/317
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/2047 , H01J37/3175 , H01J2237/06366 , H01J2237/31788
摘要： A cold cathode glow discharge electron gun operating in the abnormal glow region produces a wide area collimated electron beam employed for flood exposure of thin film materials through electron beam transmission masks, resulting in spatially localized exposure and patterning of the thin film materials.
摘要翻译：在异常辉光区域中操作的冷阴极辉光放电电子枪产生用于薄膜材料通过电子束透射掩模进行暴露曝光的广泛准直电子束，导致薄膜材料的空间局部曝光和图案化。

7. 发明授权

US4782267A In-situ wide area vacuum ultraviolet lamp 失效
标题翻译：原位广域真空紫外线灯
公开(公告)号：US4782267A
公开(公告)日：1988-11-01
申请号：US827336
申请日：1986-02-07
申请人： George J. Collins , Zeng-qi Yu
发明人： George J. Collins , Zeng-qi Yu
IPC分类号： H01J61/72 , C23C13/08 , B05D3/06
CPC分类号： H01J61/72
摘要： An open wide area vacuum ultraviolet lamp for use in microelectronics processing applications employes a ring-shaped cold cathode to produce a trapped electron beam discharge of generally disc-shaped cross section in a low pressure molecular gas environment and without the use of VUV windows.
摘要翻译：用于微电子加工应用的开放式广域真空紫外线灯采用环形冷阴极，在低压分子气体环境中产生大致盘形截面的俘获电子束放电，而不使用VUV窗。

8. 发明授权

US4737688A Wide area source of multiply ionized atomic or molecular species 失效
标题翻译：多电离原子或分子物种的广泛来源
公开(公告)号：US4737688A
公开(公告)日：1988-04-12
申请号：US888501
申请日：1986-07-22
申请人： George J. Collins , Zeng-gi Yu
发明人： George J. Collins , Zeng-gi Yu
IPC分类号： H01J27/02 , H01J27/08 , H01J37/08 , H05H1/02 , H05H1/03
CPC分类号： H01J27/022 , H01J27/08 , H01J37/08
摘要： Apparatus for generating multiply charged ions from a source of wide area for use in ion implantation is based upon electron beam plasma interactions which more efficiently create a large density of multiply ionized species than conventional plasma sources over a wide area (1-20 cm in diameter). The beam electrons are generated from a glow discharge electron gun operating in the abnormal glow discharge state. More multiply ionized species are created because of the larger number of electrons at high energy present in a beam created discharge as compared to conventional hollow cathode or thermionic cathode ion sources. By using a ring-shaped cold cathode beam electron generator it is possible to realize a wide area source 2-20 cm in diameter. This multiple ion source permits the realization of a fixed ion implantation energy using a lower electrostatic potential because multiply ionized species are accelerated rather than singly ionized species.
摘要翻译：用于从用于离子注入的宽区域产生多电荷离子的设备基于电子束等离子体相互作用，其在广泛区域（直径为1-20cm）上更有效地产生比常规等离子体源大的多电离离子源的大密度）。束电子由在异常辉光放电状态下工作的辉光放电电子枪产生。由于与传统的空心阴极或热离子阴极离子源相比，在产生放电的光束中存在较高的能量的电子数量较多，所以产生更多的多重离子化物质。通过使用环形冷阴极射束电子发生器，可以实现直径为2-20厘米的宽范围源。该多重离子源允许使用较低的静电电位实现固定的离子注入能量，因为多个离子化物质被加速而不是单一电离物质。

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