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    • 5. 发明授权
    • Vertical carbon nanotube-field effect transistor and method of manufacturing the same
    • 垂直碳纳米管场效应晶体管及其制造方法
    • US07132714B2
    • 2006-11-07
    • US11009145
    • 2004-12-13
    • Eun-ju BaeYo-sep MinWan-jun Park
    • Eun-ju BaeYo-sep MinWan-jun Park
    • H01L29/76
    • H01L51/057B82Y10/00G11C2213/18H01L51/0048
    • Provided are a vertical carbon nanotube field effect transistor (CNTFET) and a method of manufacturing the same. The method includes: forming a first electrode on a substrate; forming a stack of multiple layers (“multi-layer stack”) on the first electrode, the multiple layers including first and second buried layers and a sacrificial layer interposed between the first and second buried layers; forming a vertical well into the multi-layer stack; growing a CNT within the well; forming a second electrode connected to the CNT on the multi-layer stack into which the well has been formed; forming a protective layer on the second electrode; removing the sacrificial layer and exposing the CNT between the first and second buried layers; forming a gate insulating layer on the exposed surface of the CNT; and forming a gate enclosing the CNT on the gate insulating layer. The CNTFET and manufacturing method maximize the effect of electric field produced by the gate due to the channel completely enclosed by the gate while improving a ratio Ion/Ioff of on-current to off-current by fully depleting a depletion layer formed in the channel.
    • 提供了一种垂直碳纳米管场效应晶体管(CNTFET)及其制造方法。 该方法包括:在基板上形成第一电极; 在所述第一电极上形成多层叠层(“多层叠层”),所述多层包括第一和第二掩埋层以及介于所述第一和第二掩埋层之间的牺牲层; 在多层堆叠中形成垂直井; 在井内生长CNT; 在形成有所述阱的所述多层堆叠上形成连接到所述CNT的第二电极; 在所述第二电极上形成保护层; 去除牺牲层并将CNT暴露在第一和第二埋层之间; 在CNT的暴露表面上形成栅极绝缘层; 以及在所述栅极绝缘层上形成包围所述CNT的栅极。 CNTFET和制造方法由于由栅极完全封闭的通道产生的电场的影响最大化,同时通过完全耗尽在通道中形成的耗尽层来改善导通电流与截止电流的比值Ion / Ioff。
    • 6. 发明申请
    • Vertical carbon nanotube-field effect transistor and method of manufacturing the same
    • 垂直碳纳米管场效应晶体管及其制造方法
    • US20050156203A1
    • 2005-07-21
    • US11009145
    • 2004-12-13
    • Eun-ju BaeYo-sep MinWan-jun Park
    • Eun-ju BaeYo-sep MinWan-jun Park
    • H01L29/772H01L51/30H03K3/037H03K3/12H03K3/286
    • H01L51/057B82Y10/00G11C2213/18H01L51/0048
    • Provided are a vertical carbon nanotube field effect transistor (CNTFET) and a method of manufacturing the same. The method includes: forming a first electrode on a substrate; forming a stack of multiple layers (“multi-layer stack”) on the first electrode, the multiple layers including first and second buried layers and a sacrificial layer interposed between the first and second buried layers; forming a vertical well into the multi-layer stack; growing a CNT within the well; forming a second electrode connected to the CNT on the multi-layer stack into which the well has been formed; forming a protective layer on the second electrode; removing the sacrificial layer and exposing the CNT between the first and second buried layers; forming a gate insulating layer on the exposed surface of the CNT; and forming a gate enclosing the CNT on the gate insulating layer. The CNTFET and manufacturing method maximize the effect of electric field produced by the gate due to the channel completely enclosed by the gate while improving a ratio Ion/Ioff of on-current to off-current by fully depleting a depletion layer formed in the channel.
    • 提供了一种垂直碳纳米管场效应晶体管(CNTFET)及其制造方法。 该方法包括:在基板上形成第一电极; 在所述第一电极上形成多层叠层(“多层叠层”),所述多层包括第一和第二掩埋层以及介于所述第一和第二掩埋层之间的牺牲层; 在多层堆叠中形成垂直井; 在井内生长CNT; 在形成有所述阱的所述多层堆叠上形成连接到所述CNT的第二电极; 在所述第二电极上形成保护层; 去除牺牲层并将CNT暴露在第一和第二埋层之间; 在CNT的暴露表面上形成栅极绝缘层; 以及在所述栅极绝缘层上形成包围所述CNT的栅极。 CNTFET和制造方法由于由栅极完全封闭的通道产生的电场的影响最大化,同时通过完全耗尽在通道中形成的耗尽层来改善导通电流与截止电流的比值Ion / Ioff。