会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Method and apparatus for electron-beam lithography
    • 电子束光刻的方法和装置
    • US07342241B2
    • 2008-03-11
    • US11179628
    • 2005-07-13
    • Yasuko AokiTsutomu TawaYoshimitsu Saze
    • Yasuko AokiTsutomu TawaYoshimitsu Saze
    • G21K5/04H01J33/00
    • H01J37/3174B82Y10/00B82Y40/00H01J2237/31793
    • The present invention is to provide an electron-beam lithography method and an electron-beam lithography apparatus that can draw patterns with a high precision despite a change in barometric pressure, can ensure a satisfactory throughput, and are inexpensive. In the electron-beam lithography method that uses an electron beam to draw patterns on a sample, a difference between a current measured barometric pressure and a previous measured barometric pressure, and an elapsed time between their barometric pressure-measurement points in time are determined. When the rate of the difference of their barometric pressures with respect to the elapsed time is equal to or larger than a prescribed barometric pressure change rate value, a drawing precision is calibrated.
    • 本发明是提供一种电子束光刻方法和电子束光刻设备,尽管大气压力发生变化,但能够高精度地绘制图案,可以确保令人满意的生产量,并且便宜。 在使用电子束在样品上绘制图案的电子束光刻方法中,确定当前测量的大气压力与先前测量的大气压力之间的差异以及它们在大气压力测量点之间的经过时间。 当大气压力相对于经过时间的差异的比率等于或大于规定的气压变化率值时,校准绘制精度。
    • 2. 发明申请
    • Method and apparatus for electron-beam lithography
    • 电子束光刻的方法和装置
    • US20060011080A1
    • 2006-01-19
    • US11179628
    • 2005-07-13
    • Yasuko AokiTsutomu TawaYoshimitsu Saze
    • Yasuko AokiTsutomu TawaYoshimitsu Saze
    • B41F33/00
    • H01J37/3174B82Y10/00B82Y40/00H01J2237/31793
    • The present invention is to provide an electron-beam lithography method and an electron-beam lithography apparatus that can draw patterns with a high precision despite a change in barometric pressure, can ensure a satisfactory throughput, and are inexpensive. In the electron-beam lithography method that uses an electron beam to draw patterns on a sample, a difference between a current measured barometric pressure and a previous measured barometric pressure, and an elapsed time between their barometric pressure-measurement points in time are determined. When the rate of the difference of their barometric pressures with respect to the elapsed time is equal to or larger than a prescribed barometric pressure change rate value, a drawing precision is calibrated.
    • 本发明是提供一种电子束光刻方法和电子束光刻设备,尽管大气压力发生变化,但能够高精度地绘制图案,可以确保令人满意的生产量,并且便宜。 在使用电子束在样品上绘制图案的电子束光刻方法中,确定当前测量的大气压力与先前测量的大气压力之间的差异以及它们在大气压力测量点之间的经过时间。 当大气压力相对于经过时间的差异的比率等于或大于规定的气压变化率值时,校准绘制精度。
    • 3. 发明授权
    • Charged particle beam apparatus
    • 带电粒子束装置
    • US08629395B2
    • 2014-01-14
    • US13521273
    • 2011-01-12
    • Hideo MorishitaMichio HatanoTakashi OhshimaMitsugu SatoTetsuya SawahataSukehiro ItoYasuko Aoki
    • Hideo MorishitaMichio HatanoTakashi OhshimaMitsugu SatoTetsuya SawahataSukehiro ItoYasuko Aoki
    • H01J37/28H01J37/244G01N23/22
    • H01J49/067H01J37/244H01J2237/2441H01J2237/24465H01J2237/2448H01J2237/28
    • In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (12-1); an aperture (16) that limits the diameter of the charged particle beam (4); optics (14, 17, 19) for the charged particle beam; a specimen holder (21); a charged particle detector (40) that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector. The charged particle detector (40) is provided with a first small detector (51) having a first detection sensitivity and a second small detector (52) having a second detection sensitivity, and makes the detection solid angle viewed from a position on the specimen, to which the charged particle beam (4) is to be radiated, to be the same for the first small detector (51) and the second small detector (52).
    • 为了提供一种带电粒子束装置,其能够将鉴别中的带电粒子束信号检测为多个能带,并且使用该信号获得每个能带的高分辨率图像,带电粒子束装置具有带电粒子 来源(12-1); 限制带电粒子束(4)的直径的孔(16); 用于带电粒子束的光学器件(14,17,19) 样品架(21); 检测来自试样的二次带电粒子和反射带电粒子的带电粒子检测器(40) 以及处理来自带电粒子检测器的输出信号的信号计算单元。 带电粒子检测器(40)具有第一检测灵敏度的第一小检测器(51)和具有第二检测灵敏度的第二小检测器(52),并从检体上的位置观察检测立体角, 对于第一小型检测器(51)和第二小型检测器(52),带电粒子束(4)将被照射到其上。
    • 9. 发明申请
    • Charged Particle Beam Apparatus
    • 带电粒子束装置
    • US20120298864A1
    • 2012-11-29
    • US13521273
    • 2011-01-12
    • Hideo MorishitaMichio HatanoTakashi OhshimaMitsugu SatoTetsuya SawahataSukehiro ItoYasuko Aoki
    • Hideo MorishitaMichio HatanoTakashi OhshimaMitsugu SatoTetsuya SawahataSukehiro ItoYasuko Aoki
    • H01J37/26
    • H01J49/067H01J37/244H01J2237/2441H01J2237/24465H01J2237/2448H01J2237/28
    • In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (12-1); an aperture (16) that limits the diameter of the charged particle beam (4); optics (14, 17, 19) for the charged particle beam; a specimen holder (21); a charged particle detector (40) that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector. The charged particle detector (40) is provided with a first small detector (51) having a first detection sensitivity and a second small detector (52) having a second detection sensitivity, and makes the detection solid angle viewed from a position on the specimen, to which the charged particle beam (4) is to be radiated, to be the same for the first small detector (51) and the second small detector (52).
    • 为了提供一种带电粒子束装置,其能够将鉴别中的带电粒子束信号检测为多个能带,并且使用该信号获得每个能带的高分辨率图像,带电粒子束装置具有带电粒子 来源(12-1); 限制带电粒子束(4)的直径的孔(16); 用于带电粒子束的光学器件(14,17,19) 样品架(21); 检测来自试样的二次带电粒子和反射带电粒子的带电粒子检测器(40) 以及处理来自带电粒子检测器的输出信号的信号计算单元。 带电粒子检测器(40)具有第一检测灵敏度的第一小检测器(51)和具有第二检测灵敏度的第二小检测器(52),并从检体上的位置观察检测立体角, 对于第一小型检测器(51)和第二小型检测器(52),带电粒子束(4)将被照射到其上。