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1. 发明授权

US07678288B2 Method and structure for manufacturing bonded substrates using multiple photolithography tools 有权
标题翻译：使用多个光刻工具制造粘结衬底的方法和结构
公开(公告)号：US07678288B2
公开(公告)日：2010-03-16
申请号：US11004588
申请日：2004-12-03
申请人： Xiao Yang , Kegang Huang , Yuxiang Wang , Howard Woo
发明人： Xiao Yang , Kegang Huang , Yuxiang Wang , Howard Woo
IPC分类号： H01L21/302
CPC分类号： G03F7/70525 , G03F9/7046 , H01L21/2007
摘要： A method of manufacturing bonded substrate structures. The method includes providing a first substrate comprising a first surface region and processing the first surface region to form a first pattern region using a first photolithographic stepper characterized by a first tolerance criteria for alignment. The method also includes providing a second substrate comprising a second surface region and processing the second surface region through at least one masking process to form a second pattern region using a second photolithographic stepper characterized by a second tolerance criteria for alignment. Further, the method includes determining a masking process having a third tolerance criteria for alignment, the third tolerance criteria allowing for a change from the second to the first photographic stepper, processing the second substrate for at least the determined masking process using the first photolithographic stepper, and joining the first substrate to the second substrate to form a composite substrate structure.
摘要翻译：制造键合衬底结构的方法。该方法包括提供包括第一表面区域的第一基底和使用第一光刻步进器处理第一表面区域以形成第一图案区域，其特征在于用于对准的第一公差标准。该方法还包括提供包括第二表面区域的第二基底并通过至少一个掩模过程处理第二表面区域，以使用第二光刻步进器形成第二图案区域，其特征在于用于对准的第二容限标准。此外，该方法包括确定具有用于对准的第三公差准则的掩蔽处理，第三公差准则允许从第二照相步骤器改变到第一照相步进器，使用第一光刻步进器处理至少所确定的掩蔽处理的第二衬底并且将第一基板接合到第二基板以形成复合基板结构。

2. 发明申请

US20060121373A1 Method and structure for manufacturing bonded substrates using multiple photolithography tools 有权
标题翻译：使用多个光刻工具制造粘结衬底的方法和结构
公开(公告)号：US20060121373A1
公开(公告)日：2006-06-08
申请号：US11004588
申请日：2004-12-03
申请人： Xiao Yang , Kegang Huang , Yuxiang Wang , Howard Woo
发明人： Xiao Yang , Kegang Huang , Yuxiang Wang , Howard Woo
IPC分类号： G03F9/00 , G03B27/00 , G03C5/00 , G03B27/42
CPC分类号： G03F7/70525 , G03F9/7046 , H01L21/2007
摘要： A method of manufacturing bonded substrate structures. The method includes providing a first substrate comprising a first surface region and processing the first surface region to form a first pattern region using a first photolithographic stepper characterized by a first tolerance criteria for alignment. The method also includes providing a second substrate comprising a second surface region and processing the second surface region through at least one masking process to form a second pattern region using a second photolithographic stepper characterized by a second tolerance criteria for alignment. Further, the method includes determining a masking process having a third tolerance criteria for alignment, the third tolerance criteria allowing for a change from the second to the first photographic stepper, processing the second substrate for at least the determined masking process using the first photolithographic stepper, and joining the first substrate to the second substrate to form a composite substrate structure.
摘要翻译：制造键合衬底结构的方法。该方法包括提供包括第一表面区域的第一基底和使用第一光刻步进器处理第一表面区域以形成第一图案区域，其特征在于用于对准的第一公差标准。该方法还包括提供包括第二表面区域的第二基底并通过至少一个掩模过程处理第二表面区域，以使用第二光刻步进器形成第二图案区域，其特征在于用于对准的第二容限标准。此外，该方法包括确定具有用于对准的第三公差准则的掩蔽处理，第三公差准则允许从第二照相步骤器改变到第一照相步进器，使用第一光刻步进器处理至少所确定的掩蔽处理的第二衬底并且将第一基板接合到第二基板以形成复合基板结构。

3. 发明授权

US08908255B2 Fabrication of a high fill ratio silicon spatial light modulator 有权
标题翻译：高填充率硅空间光调制器的制造
公开(公告)号：US08908255B2
公开(公告)日：2014-12-09
申请号：US13418186
申请日：2012-03-12
申请人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Allen Payne , Ye Wang , Howard Woo
发明人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Allen Payne , Ye Wang , Howard Woo
IPC分类号： G02B26/08 , G02B26/00 , G02F1/29
CPC分类号： G02B26/0841
摘要： A method for forming an optical deflection device includes providing a semiconductor substrate comprising an upper surface region and a plurality of drive devices within one or more portions of the semiconductor substrate. The upper surface region includes one or more patterned structure regions and at least one open region to expose a portion of the upper surface region to form a resulting surface region. The method also includes forming a planarizing material overlying the resulting surface region to fill the at least one open region and cause formation of an upper planarized layer using the fill material. The method further includes forming a thickness of silicon material at a temperature of less than 300° C. to maintain a state of the planarizing material.
摘要翻译：一种形成光偏转装置的方法包括提供半导体衬底的一个或多个部分内包括上表面区域和多个驱动装置的半导体衬底。上表面区域包括一个或多个图案化结构区域和至少一个开放区域，以暴露上表面区域的一部分以形成所得表面区域。该方法还包括形成覆盖所得表面区域的平坦化材料以填充至少一个开放区域，并且使用填充材料形成上部平坦化层。该方法还包括在小于300℃的温度下形成硅材料的厚度以保持平坦化材料的状态。

4. 发明申请

US20100112492A1 FABRICATION OF A HIGH FILL RATIO SILICON SPATIAL LIGHT MODULATOR 有权
标题翻译：高比例硅太阳能光调制器的制造
公开(公告)号：US20100112492A1
公开(公告)日：2010-05-06
申请号：US12690878
申请日：2010-01-20
申请人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Allen Payne , Ye Wang , Howard Woo
发明人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Allen Payne , Ye Wang , Howard Woo
IPC分类号： G03F7/20 , B05D5/06 , C23F1/00
CPC分类号： G02B26/0841
摘要： A method for forming an optical deflection device includes providing a semiconductor substrate comprising an upper surface region and a plurality of drive devices within one or more portions of the semiconductor substrate. The upper surface region includes one or more patterned structure regions and at least one open region to expose a portion of the upper surface region to form a resulting surface region. The method also includes forming a planarizing material overlying the resulting surface region to fill the at least one open region and cause formation of an upper planarized layer using the fill material. The method further includes forming a thickness of silicon material at a temperature of less than 300° C. to maintain a state of the planarizing material.
摘要翻译：一种形成光偏转装置的方法包括提供半导体衬底的一个或多个部分内包括上表面区域和多个驱动装置的半导体衬底。上表面区域包括一个或多个图案化结构区域和至少一个开放区域，以暴露上表面区域的一部分以形成所得表面区域。该方法还包括形成覆盖所得表面区域的平坦化材料以填充至少一个开放区域，并且使用填充材料形成上部平坦化层。该方法还包括在小于300℃的温度下形成硅材料的厚度以保持平坦化材料的状态。

5. 发明申请

US20090002805A1 PROJECTION DISPLAY SYSTEM INCLUDING A HIGH FILL RATIO SILICON SPATIAL LIGHT MODULATOR 审中-公开
标题翻译：投影显示系统，包括高比例硅太阳能调光器
公开(公告)号：US20090002805A1
公开(公告)日：2009-01-01
申请号：US12210119
申请日：2008-09-12
申请人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Allen Payne , Ye Wang , William Spencer Worley, III , Dongmin Chen , Howard Woo
发明人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Allen Payne , Ye Wang , William Spencer Worley, III , Dongmin Chen , Howard Woo
IPC分类号： G02B26/08 , G06F3/038
CPC分类号： G02B26/0841
摘要： A display system includes a light source and a first optical system coupled to the light source and adapted to provide an illumination beam along an illumination path. The display system also includes a spatial light modulator positioned in the illumination path. The spatial light modulator includes a semiconductor substrate including a plurality of electrode devices and a hinge structure coupled to the semiconductor substrate. The hinge structure includes silicon material. The spatial light modulator also includes a mirror post coupled to the hinge structure and extending to a predetermined distance from the semiconductor substrate and a mirror plate coupled to the mirror post and overlying the plurality of electrode devices. The display system further includes a second optical system coupled to the spatial light modulator and adapted to project an image onto a projection surface.
摘要翻译：显示系统包括光源和耦合到光源并适于沿照明路径提供照明光束的第一光学系统。显示系统还包括位于照明路径中的空间光调制器。空间光调制器包括包括多个电极器件和耦合到半导体衬底的铰链结构的半导体衬底。铰链结构包括硅材料。空间光调制器还包括耦合到铰链结构并且延伸到半导体衬底预定距离的镜柱和耦合到镜柱并且覆盖多个电极器件的镜板。显示系统还包括耦合到空间光调制器并适于将图像投影到投影表面上的第二光学系统。

6. 发明申请

US20120171623A1 FABRICATION OF A HIGH FILL RATIO SILICON SPATIAL LIGHT MODULATOR 有权
标题翻译：高比例硅太阳能光调制器的制造
公开(公告)号：US20120171623A1
公开(公告)日：2012-07-05
申请号：US13418186
申请日：2012-03-12
申请人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Allen Payne , Ye Wang , Howard Woo
发明人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Allen Payne , Ye Wang , Howard Woo
IPC分类号： B05D5/06 , G03F7/20 , B05D5/12
CPC分类号： G02B26/0841
摘要： A method for forming an optical deflection device includes providing a semiconductor substrate comprising an upper surface region and a plurality of drive devices within one or more portions of the semiconductor substrate. The upper surface region includes one or more patterned structure regions and at least one open region to expose a portion of the upper surface region to form a resulting surface region. The method also includes forming a planarizing material overlying the resulting surface region to fill the at least one open region and cause formation of an upper planarized layer using the fill material. The method further includes forming a thickness of silicon material at a temperature of less than 300° C. to maintain a state of the planarizing material.
摘要翻译：一种形成光偏转装置的方法包括提供半导体衬底的一个或多个部分内包括上表面区域和多个驱动装置的半导体衬底。上表面区域包括一个或多个图案化结构区域和至少一个开放区域，以暴露上表面区域的一部分以形成所得表面区域。该方法还包括形成覆盖所得表面区域的平坦化材料以填充至少一个开放区域，并且使用填充材料形成上部平坦化层。该方法还包括在小于300℃的温度下形成硅材料的厚度以保持平坦化材料的状态。

7. 发明授权

US08159740B2 Fabrication of a high fill ratio silicon spatial light modulator 有权
标题翻译：高填充率硅空间光调制器的制造
公开(公告)号：US08159740B2
公开(公告)日：2012-04-17
申请号：US12690878
申请日：2010-01-20
申请人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Allen Payne , Ye Wang , Howard Woo
发明人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Allen Payne , Ye Wang , Howard Woo
IPC分类号： G02B26/08 , G02B26/00 , G02F1/29
CPC分类号： G02B26/0841
摘要： A method for forming an optical deflection device includes providing a semiconductor substrate comprising an upper surface region and a plurality of drive devices within one or more portions of the semiconductor substrate. The upper surface region includes one or more patterned structure regions and at least one open region to expose a portion of the upper surface region to form a resulting surface region. The method also includes forming a planarizing material overlying the resulting surface region to fill the at least one open region and cause formation of an upper planarized layer using the fill material. The method further includes forming a thickness of silicon material at a temperature of less than 300° C. to maintain a state of the planarizing material.
摘要翻译：一种形成光偏转装置的方法包括提供半导体衬底的一个或多个部分内包括上表面区域和多个驱动装置的半导体衬底。上表面区域包括一个或多个图案化结构区域和至少一个开放区域，以暴露上表面区域的一部分以形成所得表面区域。该方法还包括形成覆盖所得表面区域的平坦化材料以填充至少一个开放区域，并且使用填充材料形成上部平坦化层。该方法还包括在小于300℃的温度下形成硅材料的厚度以保持平坦化材料的状态。

8. 发明授权

US07453624B2 Projection display system including a high fill ratio silicon spatial light modulator 有权
标题翻译：投影显示系统包括高填充率硅空间光调制器
公开(公告)号：US07453624B2
公开(公告)日：2008-11-18
申请号：US11448537
申请日：2006-06-05
申请人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Allen Payne , Ye Wang , William Spencer Worley, III , Dongmin Chen , Howard Woo
发明人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Allen Payne , Ye Wang , William Spencer Worley, III , Dongmin Chen , Howard Woo
IPC分类号： G02B26/00
CPC分类号： G02B26/0841
摘要： A display system includes a light source and a first optical system coupled to the light source and adapted to provide an illumination beam along an illumination path. The display system also includes a spatial light modulator positioned in the illumination path. The spatial light modulator includes a semiconductor substrate including a plurality of electrode devices and a hinge structure coupled to the semiconductor substrate. The hinge structure includes silicon material. The spatial light modulator also includes a mirror post coupled to the hinge structure and extending to a predetermined distance from the semiconductor substrate and a mirror plate coupled to the mirror post and overlying the plurality of electrode devices. The display system further includes a second optical system coupled to the spatial light modulator and adapted to project an image onto a projection surface.
摘要翻译：显示系统包括光源和耦合到光源并适于沿照明路径提供照明光束的第一光学系统。显示系统还包括位于照明路径中的空间光调制器。空间光调制器包括包括多个电极器件和耦合到半导体衬底的铰链结构的半导体衬底。铰链结构包括硅材料。空间光调制器还包括耦合到铰链结构并且延伸到半导体衬底预定距离的镜柱和耦合到镜柱并且覆盖多个电极器件的镜板。显示系统还包括耦合到空间光调制器并适于将图像投影到投影表面上的第二光学系统。

9. 发明申请

US20070097487A1 High fill ratio silicon spatial light modulator 有权
标题翻译：高填充率硅空间光调制器
公开(公告)号：US20070097487A1
公开(公告)日：2007-05-03
申请号：US11448149
申请日：2006-06-05
申请人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Payne , Ye Wang , William Worley , Dongmin Chen , Howard Woo
发明人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Payne , Ye Wang , William Worley , Dongmin Chen , Howard Woo
IPC分类号： G02B26/00
CPC分类号： G02B26/0841 , G02B26/008
摘要： An optical deflection device for a display application. The optical deflection device includes a semiconductor substrate including an upper surface region and one or more electrode devices provided overlying the upper surface region. The optical deflection device also includes a hinge device including a silicon material and coupled to the upper surface region. The optical deflection device further includes a spacing defined between the upper surface region and the hinge device and a mirror structure including a post portion coupled to the hinge device and a mirror plate portion coupled to the post portion and overlying the hinge device.
摘要翻译：一种用于显示器应用的光学偏转装置。光偏转装置包括：半导体衬底，包括上表面区域和设置在上表面区域上的一个或多个电极器件。光学偏转装置还包括铰链装置，其包括硅材料并且连接到上表面区域。光学偏转装置还包括限定在上表面区域和铰链装置之间的间隔，以及反射镜结构，其包括联接到铰链装置的柱部分和耦合到柱部分并且覆盖铰链装置的镜板部分。

10. 发明申请

US20070097486A1 Projection display system including a high fill ratio silicon spatial light modulator 有权
标题翻译：投影显示系统包括高填充率硅空间光调制器
公开(公告)号：US20070097486A1
公开(公告)日：2007-05-03
申请号：US11448537
申请日：2006-06-05
申请人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Payne , Ye Wang , William Worley , Dongmin Chen , Howard Woo
发明人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Payne , Ye Wang , William Worley , Dongmin Chen , Howard Woo
IPC分类号： G02B26/00
CPC分类号： G02B26/0841
摘要： A display system includes a light source and a first optical system coupled to the light source and adapted to provide an illumination beam along an illumination path. The display system also includes a spatial light modulator positioned in the illumination path. The spatial light modulator includes a semiconductor substrate including a plurality of electrode devices and a hinge structure coupled to the semiconductor substrate. The hinge structure includes silicon material. The spatial light modulator also includes a mirror post coupled to the hinge structure and extending to a predetermined distance from the semiconductor substrate and a mirror plate coupled to the mirror post and overlying the plurality of electrode devices. The display system further includes a second optical system coupled to the spatial light modulator and adapted to project an image onto a projection surface.
摘要翻译：显示系统包括光源和耦合到光源并适于沿照明路径提供照明光束的第一光学系统。显示系统还包括位于照明路径中的空间光调制器。空间光调制器包括包括多个电极器件和耦合到半导体衬底的铰链结构的半导体衬底。铰链结构包括硅材料。空间光调制器还包括耦合到铰链结构并且延伸到半导体衬底预定距离的镜柱和耦合到镜柱并且覆盖多个电极器件的镜板。显示系统还包括耦合到空间光调制器并适于将图像投影到投影表面上的第二光学系统。

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