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1. 发明授权

US06271514B1 Multi-beam scanner including a dove prism array 有权
标题翻译：多光束扫描仪，包括鸽子棱镜阵列
公开(公告)号：US06271514B1
公开(公告)日：2001-08-07
申请号：US09272947
申请日：1999-03-19
申请人： Timothy N. Thomas , Paul C. Allen
发明人： Timothy N. Thomas , Paul C. Allen
IPC分类号： H01J314
CPC分类号： G02B27/642 , G02B26/123
摘要： A precision printing system uses multiple scan beams that an acousto-optic modulator (AOM) separately modulates. An array of optical elements such as dove prisms separately rotates each of the beams about a central ray of the beam to eliminate blurred edges, skew, and variations in line thickness caused by the direction of propagation of acoustic waves in the AOM being at an angle to a scan direction. In particular, the amount of rotation is selected so that in the final image the direction in which illumination progresses across a cross-section of a beam is in a direction opposite the scan direction. A method of making the array includes attaching rods to a flat, grinding or polishing the combination of the rods and flat to form three planar regions that correspond to facets on prisms. Removing the rods/prisms from the flat. Using photolithography and etching to form grooves in a substrate, and a mounting the rods/prisms in the grooves on the substrate. Integrated circuit processing techniques that control the spacing, widths, and depths of the grooves provide precise control of critical alignment of the prisms.
摘要翻译：精密打印系统使用声光调制器（AOM）分别调制的多个扫描光束。诸如鸽子棱镜的光学元件阵列分别围绕光束的中心射线旋转每个光束以消除模糊边缘，偏斜以及由AOM中的声波的传播方向导致的线偏移方向的变化到扫描方向。特别地，选择旋转量，使得在最终图像中，横跨横截面的光束照射的方向在与扫描方向相反的方向上。制造阵列的方法包括将杆附接到平面，研磨或抛光杆和平面的组合以形成对应于棱镜上的面的三个平面区域。从平面上取下杆/棱镜。使用光刻和蚀刻在基板中形成凹槽，并将棒/棱镜安装在基板上的凹槽中。控制槽的间距，宽度和深度的集成电路处理技术提供对棱镜的临界对准的精确控制。

2. 发明授权

US5815245A Scanning lithography system with opposing motion 失效
标题翻译：扫描光刻系统具有相反的运动
公开(公告)号：US5815245A
公开(公告)日：1998-09-29
申请号：US410601
申请日：1995-03-22
申请人： Timothy N. Thomas , Paul C. Allen
发明人： Timothy N. Thomas , Paul C. Allen
IPC分类号： G02B17/08 , G03F7/20 , H01L21/027 , G03B27/42 , G03B27/68 , G03B27/70
CPC分类号： G03F7/70691 , G02B17/008 , G03F7/70225 , G03F7/70358
摘要： A small field scanning photolithography system uses opposing motion of a reticle and a blank to compensate for image reversal by a projection system such as a conventional Wynne-Dyson optical system which forms a reverted image on a blank. The reticle has a reverted pattern. During scanning, the reticle moves along a reverted axis in a direction opposite the direction in which the blank moves. The opposing motions can either expose a stripe on the blank or index the reticle and blank for exposure of a next stripe. In one embodiment of the invention, the reticle and blank are on independently movable precision air bearing stages. Typically, the blank and reticle move together perpendicular the reverted axis and in opposite direction along the reverted axis. The stages can move the reticle and blank different amounts to correct for shrinkage and temperature changes which cause the size of the reticle and blank to differ.
摘要翻译：小场扫描光刻系统使用掩模版和坯料的相反运动来补偿诸如常规Wynne-Dyson光学系统的投影系统的图像反转，该系统在空白上形成回复图像。标线具有恢复的图案。在扫描期间，光罩沿着与坯件移动方向相反的方向沿着回复的轴线移动。相反的动作可以在空白处暴露一条条纹，也可以标记掩模版和空白以曝光下一条纹。在本发明的一个实施例中，标线片和坯料在可独立移动的精密空气轴承平台上。通常，坯料和掩模版沿着回复的轴线垂直于反转的轴线并且沿相反的方向一起移动。阶段可以移动掩模版和空白不同的量以校正收缩和温度变化，这导致标线和空白的尺寸不同。

3. 发明授权

US08288683B2 Fast axis beam profile shaping for high power laser diode based annealing system 有权
标题翻译：基于高功率激光二极管的退火系统的快轴光束轮廓成形
公开(公告)号：US08288683B2
公开(公告)日：2012-10-16
申请号：US12291002
申请日：2008-11-04
申请人： Dean Jennings , Abhilash J. Mayur , Timothy N. Thomas , Vijay Parihar , Vedapuram S. Achutharaman , Randhir P. S. Thakur
发明人： Dean Jennings , Abhilash J. Mayur , Timothy N. Thomas , Vijay Parihar , Vedapuram S. Achutharaman , Randhir P. S. Thakur
IPC分类号： B23K26/00
CPC分类号： B23K26/0738 , B23K26/0613 , B23K26/0676 , H01L21/268 , H01L29/7833 , Y10T117/1016
摘要： A dynamic surface anneal apparatus for annealing a semiconductor workpiece has a workpiece support for supporting a workpiece, an optical source and scanning apparatus for scanning the optical source and the workpiece support relative to one another along a fast axis. The optical source includes an array of laser emitters arranged generally in successive rows of the emitters, the rows being transverse to the fast axis. Plural collimating lenslets overlie respective ones of the rows of emitters and provide collimation along the fast axis. The selected lenslets have one or a succession of optical deflection angles corresponding to beam deflections along the fast axis for respective rows of emitters. Optics focus light from the array of laser emitters onto a surface of the workpiece to form a succession of line beams transverse to the fast axis spaced along the fast axis in accordance with the succession of deflection angles.
摘要翻译：用于退火半导体工件的动态表面退火装置具有用于支撑工件的工件支撑件，用于沿着快轴相对于彼此扫描光源和工件支撑件的光源和扫描装置。光源包括大致以发射器的连续行布置的激光发射器的阵列，该列横向于快轴。多个准直的小透镜叠加在发射器排中的相应行上，并沿着快轴提供准直。所选择的小透镜具有对应于沿着快轴的光束偏转的相应行发射器的一个或一系列光学偏转角。将来自激光发射器阵列的光聚焦到工件的表面上，以根据偏转角的顺序形成一系列沿着快轴间隔开的快轴的线束。

4. 发明申请

US20090046750A1 INCREASED NANOSECOND LASER PULSE-TO-PULSE ENERGY REPEATABILITY USING ACTIVE LASER PULSE ENERGY CONTROL 审中-公开
标题翻译：增加激光器激光脉冲能量可重复使用激光脉冲能量控制
公开(公告)号：US20090046750A1
公开(公告)日：2009-02-19
申请号：US11839415
申请日：2007-08-15
申请人： JIPING LI , Timothy N. Thomas , Dean Jennings , Bruce E. Adams , Aaron Muir Hunter
发明人： JIPING LI , Timothy N. Thomas , Dean Jennings , Bruce E. Adams , Aaron Muir Hunter
IPC分类号： H01S3/10
CPC分类号： B23K26/0622 , H01L21/02686 , H01L21/2026
摘要： A method and apparatus for reducing the pulse-to-pulse laser energy variation (i.e., increasing the pulse-to-pulse laser energy repeatability) from a pulsed laser source are provided. In this manner, laser pulses impingent on a processing plane, such as the surface of a wafer or other substrate, may have substantially the same energy content leading to a more controlled process when compared to conventional processing. The method may be based on in-situ detection of the pulse energy level and the subsequent active adjustment of the transmitted laser pulse energy in a closed-loop control scheme. Furthermore, the active adjustment of the laser pulse energy may occur within a few nanoseconds after the original laser pulse is generated by a pulsed laser source.
摘要翻译：提供了一种用于从脉冲激光源减少脉冲对脉冲激光能量变化（即，增加脉冲到脉冲激光能量重复性）的方法和装置。以这种方式，与常规处理相比，照射在诸如晶片或其它基板的表面的处理平面上的激光脉冲可具有基本上相同的能量含量，导致更受控制的过程。该方法可以基于在闭环控制方案中脉冲能级的随机检测和随后的发射激光脉冲能量的主动调节。此外，在通过脉冲激光源产生原始激光脉冲之后，激光脉冲能量的主动调节可能在几纳秒内发生。

5. 发明申请

US20090034072A1 METHOD AND APPARATUS FOR DECORRELATION OF SPATIALLY AND TEMPORALLY COHERENT LIGHT 审中-公开
标题翻译：用于装饰空间和时间相干光的方法和装置
公开(公告)号：US20090034072A1
公开(公告)日：2009-02-05
申请号：US11831838
申请日：2007-07-31
申请人： Dean Jennings , Timothy N. Thomas , Stephen Moffatt , Jiping Li , Bruce E. Adams , Samuel C. Howells
发明人： Dean Jennings , Timothy N. Thomas , Stephen Moffatt , Jiping Li , Bruce E. Adams , Samuel C. Howells
IPC分类号： G02B5/30
CPC分类号： G02B27/28 , G02B27/283 , G02B27/48
摘要： A method and apparatus for decorrelating coherent light from a light source, such as a pulsed laser, in both time and space in an effort to provide intense and uniform illumination are provided. The techniques and apparatus described herein may be incorporated into any application where intense, uniform illumination is desired, such as pulsed laser annealing, welding, ablating, and wafer stepper illuminating.
摘要翻译：提供了一种用于在时间和空间上从光源（例如脉冲激光）去除相干光的方法和装置，以提供强烈和均匀的照明。本文描述的技术和装置可以并入任何需要强烈均匀照明的应用中，例如脉冲激光退火，焊接，烧蚀和晶片步进照明。

6. 发明授权

US08432613B2 Multi-stage optical homogenization 有权
标题翻译：多级光学均匀化
公开(公告)号：US08432613B2
公开(公告)日：2013-04-30
申请号：US12762351
申请日：2010-04-18
申请人： Dean C. Jennings , Timothy N. Thomas , Samuel C. Howells , Bruce E. Adams , Jiping Li
发明人： Dean C. Jennings , Timothy N. Thomas , Samuel C. Howells , Bruce E. Adams , Jiping Li
IPC分类号： G02B27/10
CPC分类号： H01L21/67115 , B23K26/0006 , B23K26/0622 , B23K26/0648 , B23K26/0652 , B23K26/12 , B23K26/125 , B23K26/127 , B23K26/352 , B23K26/354 , B23K2101/40 , B23K2103/56 , G02B27/0927 , G02B27/0961 , H01L21/02678 , H01L21/02686 , H01L21/268
摘要： Substrate processing equipment and methods are used to improve the uniformity of illumination across an illuminated portion of a substrate by processing light with multiple optical homogenizers. The multiple optical homogenizers each include micro-lens arrays and Fourier lens. The multiple optical homogenizers are arranged so that the output numerical aperture of one of the optical homogenizers is within 5% of the input numerical aperture of another optical homogenizer.
摘要翻译：基板处理设备和方法用于通过用多个光学均化器处理光线来改善衬底的照射部分上的照明的均匀性。多个光学均质器各自包括微透镜阵列和傅里叶透镜。多个光学均质器被布置成使得一个光学均质器的输出数值孔径在另一个光学均化器的输入数值孔径的5％内。

7. 发明申请

US20110006044A1 PYROMETER FOR LASER ANNEALING SYSTEM COMPATIBLE WITH AMORPHOUS CARBON OPTICAL ABSORBER LAYER 有权
标题翻译：激光退火系统与不对称碳光吸收层兼容的紫外光
公开(公告)号：US20110006044A1
公开(公告)日：2011-01-13
申请号：US12886809
申请日：2010-09-21
申请人： Jiping Li , Bruce E. Adams , Timothy N. Thomas , Aaron Muir Hunter , Abhilash J. Mayur , Rajesh S. Ramanujam
发明人： Jiping Li , Bruce E. Adams , Timothy N. Thomas , Aaron Muir Hunter , Abhilash J. Mayur , Rajesh S. Ramanujam
IPC分类号： B23K26/08 , B23K26/42
CPC分类号： B23K26/0665 , B23K26/03 , B23K26/032 , B23K26/034 , B23K26/18 , B23K2101/40
摘要： In a laser annealing system for workpieces such as semiconductor wafers, a pyrometer wavelength response band is established within a narrow window lying between the laser emission band and a fluorescence emission band from the optical components of the laser system, the pyrometer response band lying in a wavelength region at which the optical absorber layer on the workpiece has an optical absorption coefficient as great as or greater than the underlying workpiece. A multi-layer razor-edge interference filter having a 5-8 nm wavelength cut-off edge transition provides the cut-off of the laser emission at the bottom end of the pyrometer response band.
摘要翻译：在用于诸如半导体晶片的工件的激光退火系统中，在位于激光发射带和来自激光系统的光学部件的荧光发射带之间的狭窄窗口内建立高温计波长响应带，高温计响应带位于工件上的光吸收层的光吸收系数大于或大于下面工件的波长区域。具有5-8nm波长截止边缘跃迁的多层剃刀边缘干涉滤光器提供在高温计响应带的底端处的激光发射的截止。

8. 发明授权

US07674999B2 Fast axis beam profile shaping by collimation lenslets for high power laser diode based annealing system 有权
标题翻译：基于高功率激光二极管的退火系统的准直小透镜的快轴光束轮廓成形
公开(公告)号：US07674999B2
公开(公告)日：2010-03-09
申请号：US11508781
申请日：2006-08-23
申请人： Dean Jennings , Abhilash J. Mayur , Timothy N. Thomas , Vijay Parihar , Vedapuram S. Achutharaman , Randhir P. S. Thakur
发明人： Dean Jennings , Abhilash J. Mayur , Timothy N. Thomas , Vijay Parihar , Vedapuram S. Achutharaman , Randhir P. S. Thakur
IPC分类号： H01L21/324 , H01L21/477
CPC分类号： B23K26/0738 , B23K26/0613 , B23K26/0676 , H01L21/268 , H01L29/7833 , Y10T117/1016
摘要： A dynamic surface anneal apparatus for annealing a semiconductor workpiece has a workpiece support for supporting a workpiece, an optical source and scanning apparatus for scanning the optical source and the workpiece support relative to one another along a fast axis. The optical source includes an array of laser emitters arranged generally in successive rows of the emitters, the rows being transverse to the fast axis. Plural collimating lenslets overlie respective ones of the rows of emitters and provide collimation along the fast axis. The selected lenslets have one or a succession of optical deflection angles corresponding to beam deflections along the fast axis for respective rows of emitters. Optics focus light from the array of laser emitters onto a surface of the workpiece to form a succession of line beams transverse to the fast axis spaced along the fast axis in accordance with the succession of deflection angles.
摘要翻译：用于退火半导体工件的动态表面退火装置具有用于支撑工件的工件支撑件，用于沿着快轴相对于彼此扫描光源和工件支撑件的光源和扫描装置。光源包括大致以发射器的连续行布置的激光发射器的阵列，该列横向于快轴。多个准直的小透镜叠加在发射器排中的相应行上，并沿着快轴提供准直。所选择的小透镜具有对应于沿着快轴的光束偏转的相应行发射器的一个或一系列光学偏转角。将来自激光发射器阵列的光聚焦到工件的表面上，以根据偏转角的顺序形成一系列沿着快轴间隔开的快轴的线束。

9. 发明申请

US20090091817A1 HIGH SPEED PHASE SCRAMBLING OF A COHERENT BEAM USING PLASMA 有权
标题翻译：使用等离子体的相干光束的高速相位扫描
公开(公告)号：US20090091817A1
公开(公告)日：2009-04-09
申请号：US11868933
申请日：2007-10-08
申请人： Dean Jennings , Bruce E. Adams , Timothy N. Thomas , Stephen Moffatt
发明人： Dean Jennings , Bruce E. Adams , Timothy N. Thomas , Stephen Moffatt
IPC分类号： G02B26/08 , B23K26/00
CPC分类号： H01L21/67115
摘要： A laser beam is modulated at a very high frequency to produce uniform radiant flux densities on substrate surface processing regions during thermal processing. Beam modulation is achieved by passing the laser beam through a plasma which causes phase randomization within the laser beam. This method may be used for any application where intense, uniform illumination is desired, such as pulsed laser annealing, ablating, and wafer stepper illuminating.
摘要翻译：激光束以非常高的频率被调制，以在热处理期间在衬底表面处理区域上产生均匀的辐射通量密度。通过使激光束通过等离子体来实现光束调制，其引起激光束内的相位随机化。该方法可以用于需要强烈均匀照明的任何应用，例如脉冲激光退火，烧蚀和晶片步进照明。

10. 发明申请

US20090084986A1 Multiple band pass filtering for pyrometry in laser based annealing systems 有权
标题翻译：在激光基退火系统中进行高频测量的多带通滤波
公开(公告)号：US20090084986A1
公开(公告)日：2009-04-02
申请号：US12283615
申请日：2008-09-12
申请人： Bruce E. Adams , Dean Jennings , Aaron M. Hunter , Abhilash J. Mayur , Vijay Parihar , Timothy N. Thomas
发明人： Bruce E. Adams , Dean Jennings , Aaron M. Hunter , Abhilash J. Mayur , Vijay Parihar , Timothy N. Thomas
IPC分类号： G01J5/00 , G21G1/00
CPC分类号： G02B5/281 , G01J5/06 , H01S5/005 , H01S5/4012
摘要： A thermal processing system includes a source of laser radiation emitting at a laser wavelength, beam projection optics disposed between the reflective surface and a substrate support capable of holding a substrate to be processed, a pyrometer responsive to a pyrometer wavelength, and a wavelength responsive optical element having a first optical path for light in a first wavelength range including the laser wavelength, the first optical path being between the source of laser radiation and the beam projection optics, and a second optical path for light in a second wavelength range including the pyrometer wavelength, the second optical path being between the beam projection optics and the pyrometer. The system can further include a pyrometer wavelength blocking filter between the source of laser radiation and the wavelength responsive optical element.
摘要翻译：热处理系统包括以激光波长发射的激光辐射源，设置在反射表面和能够保持要处理的衬底的基板支撑件之间的光束投影光学器件，响应于高温计波长的高温计和波长响应光学元件，其具有用于包括激光波长的第一波长范围内的光的第一光路，所述第一光路位于激光辐射源和光束投影光学器件之间，以及用于在包括高温计的第二波长范围内的光的第二光路波长，第二光路位于光束投影光学器件和高温计之间。该系统还可以包括在激光辐射源和波长响应光学元件之间的高温计波长阻挡滤波器。

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