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    • 1. 发明授权
    • Semiconductor light emitting device
    • 半导体发光器件
    • US08488647B2
    • 2013-07-16
    • US12923634
    • 2010-09-30
    • Takahiro ArakidaShiro UchidaMasaki ShiozakiOsamu Maeda
    • Takahiro ArakidaShiro UchidaMasaki ShiozakiOsamu Maeda
    • H01S5/00
    • H01S5/0264H01S5/18313H01S5/18325
    • The present invention provides a semiconductor light emitting device realizing increased light detection precision by a simple manufacture process. One or more second oxidation layers are provided between an active layer and a semiconductor light detecting element in addition to a first oxidation layer for narrowing current. Since natural emission light includes many divergence components, the natural emission light is reflected and scattered by the second oxidation layer, and propagation of the natural emission light to the semiconductor light detecting element side is suppressed. The detection level of the natural emission light by the semiconductor light detecting element decreases, and light detection precision increases. The first and second oxidation layers are formed by a single oxidizing process so that the manufacturing process is simplified.
    • 本发明提供一种通过简单的制造工艺实现增加的光检测精度的半导体发光器件。 除了用于变窄的电流的第一氧化层之外,在有源层和半导体光检测元件之间提供一个或多个第二氧化层。 由于天然发射光包含许多发散分量,所以天然发射光被第二氧化层反射和散射,并且抑制了将自然发射光传播到半导体光检测元件侧。 半导体光检测元件的自然发光的检测水平降低,光检测精度提高。 第一和第二氧化层通过单一氧化工艺形成,从而简化了制造工艺。
    • 2. 发明申请
    • Semiconductor light emitting device
    • 半导体发光器件
    • US20110096806A1
    • 2011-04-28
    • US12923634
    • 2010-09-30
    • Takahiro ArakidaShiro UchidaMasaki ShiozakiOsamu Maeda
    • Takahiro ArakidaShiro UchidaMasaki ShiozakiOsamu Maeda
    • H01S5/02
    • H01S5/0264H01S5/18313H01S5/18325
    • The present invention provides a semiconductor light emitting device realizing increased light detection precision by a simple manufacture process. One or more second oxidation layers are provided between an active layer and a semiconductor light detecting element in addition to a first oxidation layer for narrowing current. Since natural emission light includes many divergence components, the natural emission light is reflected and scattered by the second oxidation layer, and propagation of the natural emission light to the semiconductor light detecting element side is suppressed. The detection level of the natural emission light by the semiconductor light detecting element decreases, and light detection precision increases. The first and second oxidation layers are formed by a single oxidizing process so that the manufacturing process is simplified.
    • 本发明提供一种通过简单的制造工艺实现增加的光检测精度的半导体发光器件。 除了用于变窄的电流的第一氧化层之外,在有源层和半导体光检测元件之间提供一个或多个第二氧化层。 由于天然发射光包含许多发散分量,所以天然发射光被第二氧化层反射和散射,并且抑制了将自然发射光传播到半导体光检测元件侧。 半导体光检测元件的自然发光的检测水平降低,光检测精度提高。 第一和第二氧化层通过单一氧化工艺形成,从而简化了制造工艺。
    • 6. 发明授权
    • Semiconductor laser
    • 半导体激光器
    • US07369594B2
    • 2008-05-06
    • US11276040
    • 2006-02-10
    • Shinichi AgatsumaShiro Uchida
    • Shinichi AgatsumaShiro Uchida
    • H01S5/00
    • H01S5/22H01S5/0655H01S5/2219H01S5/222H01S5/32325
    • A semiconductor laser of effective index type which has a lower cladding layer, an active layer, and an upper cladding layer, which are sequentially arranged upward, with said upper cladding layer being formed into the stripe ridge structure, wherein the upper cladding layer forming the foot and slope of said stripe ridge structure is covered with a buried layer of layered structure made up of two or more low refractive index layers to prevent absorption of the laser light, with a light-absorbing layer interposed between them which absorbs the laser light of oscillatory wavelength. This semiconductor laser prevents kinks due to higher-order modes, and hence it realizes a high level of output.
    • 一种有效折射率类型的半导体激光器,其具有下包层,有源层和上包层,所述下包层依次布置在上方,所述上包层形成为条脊结构,其中形成 所述条纹脊结构的脚和斜面被由两个或更多个低折射率层组成的层状结构的掩埋层覆盖以防止激光的吸收,其间插入有吸收光的吸收层,其吸收激光的 振荡波长。 该半导体激光器防止由于高阶模式引起的扭结,因此实现了高水平的输出。
    • 7. 发明授权
    • Semiconductor laser device and fabrication method thereof
    • 半导体激光器件及其制造方法
    • US06954477B2
    • 2005-10-11
    • US10821342
    • 2004-04-09
    • Shiro UchidaTsuyoshi Tojo
    • Shiro UchidaTsuyoshi Tojo
    • H01S5/042H01S5/22H01S5/00
    • H01S5/22H01S5/0425H01S5/2213
    • A method of fabricating a ridge-waveguide type semiconductor laser device having a large half-value width and a high kink level is provided. First, an effective refractive index difference Δn between an effective refractive index neff1 of the ridge and an effective refractive index neff2 of a portion on each of both sides of the ridge is taken as Δn=neff1−neff2, and a ridge width is taken as W. On such an assumption, constants “a”, “b”, “c”, and “d” of the following three equations are set on X-Y coordinates (X-axis: W, Y-axis: Δn) The first equation is expressed by Δn≦a×W+b, where “a” and “b” are constants determining a kink level. The second equation is expressed by W≧c, where “c” is a constant specifying a minimum ridge width at the time of formation of the ridge. The third equation is expressed by Δn≧d, where “d” is a constant specified by a desired half-width value θpara. Then at least either of a kind and a thickness of an insulating film, a thickness of an electrode film on the insulating film, and a kind and a thickness of a portion, located on each of both the sides of the ridge, of the upper cladding layer is set in such a manner that a combination of Δn and W satisfies the above three equations.
    • 提供一种制造具有大的半值宽度和高扭结等级的脊 - 波导型半导体激光器件的方法。 首先,脊的两侧的部分的有效折射率nλef​​f1 <! - SIPO - >的有效折射率差值Deltan, 被取为Deltan = n eff1 eff2 ,并且脊宽度取为W.在这样的假设下,常数“a”,“b”,“c 在XY坐标(X轴:W,Y轴:Deltan)上设置以下三个方程的“d”和“d”。第一方程由Deltan <= axW + b表示,其中“a”和“b” 是确定扭结水平的常数。 第二方程用W> = c表示,其中“c”是指定形成脊时的最小脊宽度的常数。 第三个方程由Deltan> = d表示,其中“d”是由期望的半角值θ指定的常数。 然后,将绝缘膜的种类和厚度,绝缘膜上的电极膜的厚度和位于隆起的两侧的每一侧上的部分的种类和厚度中的至少一个,上部 以如下方式设置包层:Deltan和W的组合满足上述三个等式。