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    • 1. 发明授权
    • Semiconductor storage device
    • 半导体存储设备
    • US07417908B2
    • 2008-08-26
    • US10564626
    • 2004-07-13
    • Sumio OgawaYasuji Koshikawa
    • Sumio OgawaYasuji Koshikawa
    • G11C7/00
    • G11C29/808
    • In a semiconductor memory device provided with a redundancy circuit for conducting a repair of defective memory cells, the memory cell defects which are unevenly distributed can be efficiently repaired.The semiconductor memory device has a plurality of memory blocks, and the memory block includes a plurality of segments. A redundancy memory block which substitutes for defective data of a segment is physically provided to each of the plurality of memory blocks. A block address of the redundancy memory block is logically allocated to the plurality of memory blocks in common.
    • 在设置有用于对缺陷存储单元进行修复的冗余电路的半导体存储器件中,可以有效地修复不均匀分布的存储单元缺陷。 半导体存储器件具有多个存储块,并且存储块包括多个段。 代替段的缺陷数据的冗余存储块物理地提供给多个存储块中的每一个。 冗余存储器块的块地址被共同地逻辑地分配给多个存储器块。
    • 2. 发明授权
    • Semiconductor memory device
    • 半导体存储器件
    • US07613056B2
    • 2009-11-03
    • US12171081
    • 2008-07-10
    • Sumio OgawaYasuji Koshikawa
    • Sumio OgawaYasuji Koshikawa
    • G11C29/00
    • G11C29/808
    • In a semiconductor memory device provided with a redundancy circuit for conducting a repair of defective memory cells, the memory cell defects which are unevenly distributed can be efficiently repaired.The semiconductor memory device has a plurality of memory blocks, and the memory block includes a plurality of segments. A redundancy memory block which substitutes for defective data of a segment is physically provided to each of the plurality of memory blocks. A block address of the redundancy memory block is logically allocated to the plurality of memory blocks in common.
    • 在设置有用于对缺陷存储单元进行修复的冗余电路的半导体存储器件中,可以有效地修复不均匀分布的存储单元缺陷。 半导体存储器件具有多个存储块,并且存储块包括多个段。 代替段的缺陷数据的冗余存储块物理地提供给多个存储块中的每一个。 冗余存储器块的块地址被共同地逻辑地分配给多个存储器块。
    • 4. 发明授权
    • Semiconductor device manufacturing system and method of manufacturing semiconductor devices
    • 半导体器件制造系统和半导体器件的制造方法
    • US06349240B2
    • 2002-02-19
    • US09814871
    • 2001-03-23
    • Sumio OgawaMinoru UekiShinichi Hara
    • Sumio OgawaMinoru UekiShinichi Hara
    • G06F1900
    • H01L22/20H01L2924/0002Y10T29/41H01L2924/00
    • A semiconductor device manufacturing system is provided in which chip position information is read without removing resin from a package so that the cause of a failure can be quickly identified and removed and the yield of chips can be rapidly improved. A replacement address reading device reads redundancy addresses from a semiconductor device which is determined as faulty in a test performed after the semiconductor device has been sealed into a package. A chip position analyzing device estimates, from the combination of these redundancy addresses, a lot number, a wafer number and a chip number of the faulty semiconductor device. A failure distribution mapping device maps the distribution of faulty chips in each wafer in the lot based on these numbers thus obtained. A failure cause determining device identifies which manufacturing device or processing step has caused the failures in the wafer process based on the above distribution.
    • 提供了一种半导体器件制造系统,其中读取芯片位置信息而不从包装中去除树脂,从而可以快速识别和去除故障的原因,并且可以快速提高芯片的产量。 替换地址读取装置从在半导体器件被封装到封装中之后执行的测试中被确定为有故障的半导体器件中读取冗余地址。 芯片位置分析装置从这些冗余地址的组合估计有缺陷的半导体器件的批号,晶片号和芯片数。 故障分布映射设备根据这样获得的数据,对批次中每个晶片中的故障芯片的分布进行映射。 故障原因确定装置基于上述分布来识别哪个制造装置或处理步骤已经导致晶片过程中的故障。
    • 8. 发明授权
    • Antifuse element and semiconductor device including same
    • 防漏元件和包括其的半导体器件
    • US07755163B2
    • 2010-07-13
    • US12219587
    • 2008-07-24
    • Sumio Ogawa
    • Sumio Ogawa
    • H01L29/00
    • H01L23/5252H01L2924/0002H01L2924/00
    • To provide an antifuse element comprising a gate electrode, a depletion channel region, a gate insulating film between the gate electrode and the channel region, and a diffusion layer region forming a junction with the channel region. An end of the gate electrode coincides substantially with a boundary between the channel region and the diffusion layer region as seen from a planar view, and is formed in a zigzag configuration. The end of the gate electrode is longer than the end with linear configuration and the end of the gate insulating film is likely to be subjected to breakdown.
    • 为了提供一种反熔丝元件,其包括栅极电极,耗尽沟道区域,栅极电极和沟道区域之间的栅极绝缘膜,以及形成与沟道区域的结的扩散层区域。 从平面图看,栅电极的一端大致与沟道区域和扩散层区域之间的边界重合,并以Z字形构成。 栅电极的端部比线状构造的端部长,栅极绝缘膜的端部容易受到击穿。