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JP2009158925A Substrate processing apparatus, and substrate transfer method using the same 有权
标题翻译：基板处理装置，以及使用其的基板转印方法
公开(公告)号：JP2009158925A
公开(公告)日：2009-07-16
申请号：JP2008284227
申请日：2008-11-05
申请人： Semes Co Ltd , セメス株式会社Semes Co., Ltd.
发明人： KIM DUK-SIK , LEE JOON-JAE
IPC分类号： H01L21/677
CPC分类号： H01L21/67769 , H01L21/67178 , H01L21/67745 , H01L21/67766 , H01L21/67778
摘要： PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate transfer method using the same. SOLUTION: In the substrate processing apparatus 10, an interface unit transfers substrates between a first processing unit 30 and a second processing unit (exposure unit) 60, of a multi-layer structure. The interface unit is provided with substrate accommodating sections for carrying a substrate from and to the first processing unit. Buffer sections for preventing substrate transfer congestion are arranged in the interface unit or in the first processing unit. Thereby, the substrate transfer between the first processing unit and the second processing unit (exposure unit), of the multi-layer structure, can be performed more efficiently. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种使用其的基板处理装置和基板转印方法。解决方案：在基板处理装置10中，接口单元在多层结构的第一处理单元30和第二处理单元（曝光单元）60之间传送基板。接口单元设置有用于从第一处理单元承载基板的基板容纳部。用于防止底物转移拥塞的缓冲部分布置在接口单元或第一处理单元中。由此，可以更有效地进行多层结构的第一处理单元与第二处理单元（曝光单元）之间的基板转印。版权所有（C）2009，JPO＆INPIT

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