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JP2010067978A Photoresist supply device and method 审中-公开
标题翻译：光电设备和方法
公开(公告)号：JP2010067978A
公开(公告)日：2010-03-25
申请号：JP2009207317
申请日：2009-09-08
申请人： Semes Co Ltd , セメス株式会社Semes Co., Ltd.
发明人： HWANG SOO MIN , KIM DONG-HO
IPC分类号： H01L21/027 , B05C11/10
CPC分类号： G03F7/16 , B05C11/1013
摘要： PROBLEM TO BE SOLVED: To provide a photoresist supply device that is capable of supplying a constant amount of a photoresist and of previously detecting the presence of an abnormality in the constant discharge of a photoresist and the presence of air bubbles, and is employed in a semiconductor photolithography process.
SOLUTION: The photoresist supply device includes: a discharge nozzle for discharging the photoresist to a wafer; a metering pump for supplying a constant amount of the photoresist to the discharge nozzle; a trap tank for temporarily storing the photoresist that is supplied from the metering pump to the discharge nozzle; a bottle filled with the photoresist that is stored in the trap tank; an air bubble detection member for detecting whether air bubbles are included in the photoresist that is on standby to be supplied from the metering pump to the discharge nozzle; and a first drain line for coupling the metering pump to a waste fluid tank in order to drain the photoresist on standby in the metering pump to the waste fluid tank when the air bubble detection member detects the presence of the air bubbles.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供能够提供恒定量的光致抗蚀剂并且预先检测光致抗蚀剂的恒定放电中的异常的存在和气泡的存在的光致抗蚀剂供应装置，并且是用于半导体光刻工艺。解决方案：光致抗蚀剂供应装置包括：用于将光致抗蚀剂排放到晶片的放电喷嘴; 用于将一定量的光致抗蚀剂供应到排出喷嘴的计量泵; 用于临时存储从计量泵供给到排出喷嘴的光致抗蚀剂的捕集槽; 填充有存储在捕集罐中的光致抗蚀剂的瓶子; 气泡检测部件，用于检测处于备用状态的光致抗蚀剂中是否包含气泡以从计量泵供给至排出喷嘴; 以及用于将计量泵连接到废液箱的第一排水管线，以便当气泡检测构件检测到气泡的存在时，将计量泵中待机的光致抗蚀剂排出到废液箱。版权所有（C）2010，JPO＆INPIT

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