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1. 发明专利

JP2010130021A Spin head and apparatus for treating substrate including the same, and method for supporting substrate 有权
标题翻译：用于处理包括其的基板的旋转头和装置以及用于支撑基板的方法
公开(公告)号：JP2010130021A
公开(公告)日：2010-06-10
申请号：JP2009269018
申请日：2009-11-26
申请人： Semes Co Ltd , セメス株式会社Semes Co., Ltd.
发明人： LEE TAEK-YOUB , BAE JEONG-YONG , KIM CHOON-SIK
IPC分类号： H01L21/683 , H01L21/304
CPC分类号： H01L21/68728 , H01L21/67051 , H01L21/68785
摘要： PROBLEM TO BE SOLVED: To provide: a spin head supporting a substrate and rotating the substrate; an apparatus for treating a substrate having the same; and a method for supporting a substrate. SOLUTION: The spin head includes: a body; a plurality of chuck pins installed on the body and moving between supporting positions where a substrate is supported and waiting positions providing space for loading/unloading the substrate; and a chuck pin moving unit configured to move the chuck pins. The chuck pin moving unit includes a rotation rod coupled with each of the chuck pins, a pivot pin fixing the rotation rod to the body, and a driving member rotating the rotation rod using the pivot pin as a rotation shaft to move the chuck pin from the supporting position to the waiting position. When the body rotates, the rotation rod uses reverse centrifugal force to apply force to the chuck pin in a direction from the waiting position to the supporting position. The plurality of chuck pins include first pins and second pins that alternately chuck a substrate during a process. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供：支撑基板并旋转基板的旋转头; 用于处理具有该装置的基板的装置; 以及支撑基板的方法。解决方案：旋转头包括：身体; 多个卡盘销安装在主体上并在支撑基板的支撑位置之间移动，等待位置提供用于装载/卸载基板的空间; 以及配置成移动所述卡盘销的卡盘销移动单元。卡盘销移动单元包括与每个卡盘销连接的旋转杆，将旋转杆固定到主体的枢轴销，以及使用枢轴作为旋转轴将旋转杆旋转的驱动构件，以使卡盘销从支持位置到等待位置。当主体旋转时，旋转杆使用反向离心力，在从等待位置到支撑位置的方向上向卡盘销施加力。多个卡盘销包括在工艺期间交替地卡住衬底的第一销和第二销。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2012124528A Spin head and substrate processing method 有权
标题翻译：旋转头和基板加工方法
公开(公告)号：JP2012124528A
公开(公告)日：2012-06-28
申请号：JP2012045738
申请日：2012-03-01
申请人： Semes Co Ltd , セメス株式会社Semes Co., Ltd.
发明人： LEE WOO-SEOK , BAE JEONG-YONG , KIM WOO-YOUNG
IPC分类号： H01L21/304 , H01L21/306
CPC分类号： H01L21/6715 , H01L21/67051 , H01L21/6708
摘要： PROBLEM TO BE SOLVED: To provide a spin head which supports a substrate.SOLUTION: A spin head has a rotatable body and chuck pins protruding upward and supporting a side part of a substrate put on the body during the rotation. Each chuck pin has a vertical rod coupled to the body in the vertical direction. When the substrate is rotated, the vertical rod is positioned so as to be spaced apart from the substrate in the side direction. A support rod has a stream-line side surface. The support rod has a contact part which has the width gradually narrowing when viewed from above.
摘要翻译：要解决的问题：提供支撑基板的旋转头。解决方案：旋转头具有可旋转体和向上突出的卡盘销，并且在旋转期间支撑放置在主体上的基板的侧部。每个卡盘销具有在垂直方向上连接到主体的垂直杆。当基板旋转时，垂直杆被定位成在侧面方向上与基板间隔开。支撑杆具有流线侧表面。支撑杆具有从上方观察时宽度逐渐变窄的接触部。版权所有（C）2012，JPO＆INPIT

3. 发明专利

JP2009094514A Spin head, chuck pin used in it, and method for treating substrate 有权
标题翻译：旋转头，其中使用的插脚，以及处理基板的方法
公开(公告)号：JP2009094514A
公开(公告)日：2009-04-30
申请号：JP2008261203
申请日：2008-10-08
申请人： Semes Co Ltd , セメス株式会社Semes Co., Ltd.
发明人： LEE WOO-SEOK , BAE JEONG-YONG , KIM WOO-YOUNG
IPC分类号： H01L21/304 , H01L21/027 , H01L21/306
CPC分类号： H01L21/6715 , H01L21/67051 , H01L21/6708
摘要： PROBLEM TO BE SOLVED: To provide a spin head for supporting a substrate, capable of uniformly supplying a process liquid to the entire top surface area of the substrate.
SOLUTION: The spin head includes a rotatable body, and the chuck pins protruding upward and configured to support the side part of the substrate placed at the body when the body is rotated. The chuck pin includes a vertical rod vertically disposed at the body. When the substrate is rotated, the vertical rod is spaced apart from the substrate in the side direction. A support rod has a side face provided in a streamlined shape. The support rod has a contact portion whose width is gradually reduced when viewed from the top.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于支撑基板的旋转头，能够将处理液体均匀地供应到基板的整个顶表面区域。解决方案：旋转头包括可旋转的主体，并且卡盘销向上突出并且构造成当主体旋转时支撑放置在主体上的基板的侧部。卡盘销包括垂直设置在主体上的垂直杆。当基板旋转时，垂直杆在侧向方向上与基板间隔开。支撑杆具有设置成流线型形状的侧面。支撑杆具有从顶部观察时宽度逐渐减小的接触部分。版权所有（C）2009，JPO＆INPIT

4. 发明专利

JP2011014906A Method and apparatus for processing substrate 有权
标题翻译：用于处理基板的方法和装置
公开(公告)号：JP2011014906A
公开(公告)日：2011-01-20
申请号：JP2010143521
申请日：2010-06-24
申请人： Semes Co Ltd , セメス株式会社Semes Co., Ltd.
发明人： RHO EUN-SU , BAE JEONG-YONG
IPC分类号： H01L21/027 , H01L21/304
CPC分类号： G03F7/422 , G03F7/423 , H01L21/6708
摘要： PROBLEM TO BE SOLVED: To provide a method and apparatus for processing a substrate for removing photoresist on the substrate.SOLUTION: The method for processing a substrate includes steps of: arranging a substrate formed with a photoresist film; providing a processing liquid for removing the photoresist film onto the substrate; and providing mist on the substrate to contact the processing liquid. Since the mist reacts with the processing liquid to additionally form a hydroxide radical and, since the mist and the processing liquid perform heat generation reaction, the efficiency in removal of the photoresist can be improved.
摘要翻译：要解决的问题：提供一种处理基板以去除基板上的光致抗蚀剂的方法和装置。解决方案：用于处理基板的方法包括以下步骤：布置形成有光致抗蚀剂膜的基板; 提供用于将光致抗蚀剂膜去除到基底上的处理液体; 并在基板上提供雾以接触处理液体。由于雾与处理液反应以另外形成氢氧根，并且由于雾和处理液进行发热反应，因此可以提高光致抗蚀剂的除去效率。

5. 发明专利

JP2009141332A Device and method for feeding ozone-water mixed liquid, and substrate processing apparatus equipped therewith 审中-公开
标题翻译：用于输送臭氧混合液体的装置和方法，以及其中配备的基板处理装置
公开(公告)号：JP2009141332A
公开(公告)日：2009-06-25
申请号：JP2008284699
申请日：2008-11-05
申请人： Semes Co Ltd , セメス株式会社Semes Co., Ltd.
发明人： OH RAE-TAEK , KIM CHOON-SIK , BAE JEONG-YONG
IPC分类号： H01L21/304
CPC分类号： B01F3/0876 , B01F3/088 , B01F5/0077 , B01F5/061 , B01F15/0429 , B01F2003/04886 , B01F2215/0096 , B08B2203/005 , H01L21/67017
摘要： PROBLEM TO BE SOLVED: To provide a device and method for feeding ozone-water mixed liquid, and to provide a substrate processing apparatus equipped therewith.
SOLUTION: The device for feeding ozone-water mixed liquid is supplied with a processing liquid and an ozone water from each of a processing-liquid supplying line and an ozone-water supplying line. The feeder includes a mixing line to mix the processing liquid and the ozone water for producing the ozone-water mixed liquid within a predetermined concentration, and a distributing line to distribute the ozone-water mixed liquid produced in the mixing line into a processing unit. A mixing valve and a static mixer are provided in the mixing line. The ozone-water mixed liquid in a predetermined concentration is produced and supplied under an in-line mixing method without using a mixing vessel such as a mixing tank.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于供给臭氧水混合液体的装置和方法，并提供配备有其的基板处理装置。解决方案：向臭氧水混合液供给装置，由处理液供给管路和臭氧水供给管路供给处理液和臭氧水。进料器包括混合管线，用于混合处理液体和臭氧水，以产生预定浓度的臭氧水混合液体;以及分配管线，将混合生产线中产生的臭氧水混合液体分配到处理单元中。在混合管路中设置混合阀和静态混合器。在不使用混合槽等混合容器的情况下，以直列混合方式制造预定浓度的臭氧水混合液。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2005322903A Substrate-processing apparatus and substrate-processing method 有权
标题翻译：基板处理装置和基板处理方法
公开(公告)号：JP2005322903A
公开(公告)日：2005-11-17
申请号：JP2005126888
申请日：2005-04-25
申请人： Semes Co Ltd , セメス株式会社
发明人： KIM IN-JUN , CHO CHUNG-KUN , CHOI JANG-SEOB , CHOI YONG-NAM , BAE JEONG-YONG
IPC分类号： H01L21/3065 , C23F1/00 , H01L21/00 , H01L21/304 , H01L21/306
CPC分类号： H01L21/67086 , H01L21/67051 , H01L21/67069
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for etching the edge of the top surface and the undersurface of a wafer.
SOLUTION: The apparatus has a substrate support part for supporting the wafer and a protective part for preventing etching liquid from flowing into an etched part of the wafer. Further, etching is performed on the edge of the top surface and the undersurface of the wafer by wet etching, and etching is performed on a boundary between the etched part and the edge of the wafer by dry etching.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于蚀刻晶片的顶表面和下表面的边缘的设备。解决方案：该装置具有用于支撑晶片的基板支撑部分和用于防止蚀刻液体流入晶片的蚀刻部分的保护部件。此外，通过湿蚀刻在晶片的顶表面和下表面的边缘上进行蚀刻，并且通过干蚀刻对蚀刻部分和晶片边缘之间的边界进行蚀刻。版权所有（C）2006，JPO＆NCIPI

7. 发明专利

JP2006261674A Functional water supply system and functional water supply method 有权
标题翻译：功能水供应系统和功能水供应方法
公开(公告)号：JP2006261674A
公开(公告)日：2006-09-28
申请号：JP2006071653
申请日：2006-03-15
申请人： Semes Co Ltd , セメス株式会社
发明人： CHOI YONG-NAM , BAE JEONG-YONG , CHOI KWANG-IL , JUNG PYONG-SOON , KIM JU-WON , AN DOO-KEUN
IPC分类号： H01L21/304 , B01F1/00 , B01F5/06 , B01J4/00 , C02F1/68 , C02F1/78
CPC分类号： C02F1/008 , C01B5/00 , C02F1/685 , C02F2103/02 , C02F2103/026 , Y10T137/0324 , Y10T137/0329 , Y10T137/2509
摘要： PROBLEM TO BE SOLVED: To provide a system for supplying functional water to a device for cleaning a substrate using functional water. SOLUTION: In the system of the present invention, functional water generated from a functional water generator is supplied to a distributor through a functional water supply pipe. Then, the functional water is supplied to a device when the device is under process and recovered to the functional water generator through the functional water supply pipe when the device is not under the process. A buffer tank is provided in the functional water supply pipe. The density of the functional water is measured using a circulation line connected with the buffer tank. When the density of the functional water is deviated from a set range, the functional water is transported to the functional water generator through a transport pipe. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于使用功能水将功能水供给到用于清洗基板的装置的系统。解决方案：在本发明的系统中，通过功能性供水管将功能水发生器产生的功能水供给分配器。然后，当设备正在处理时，功能性水被供应到设备，并且当设备不在处理时，通过功能性供水管道将功能水供应到功能水发生器。在功能性供水管中设置缓冲罐。使用与缓冲罐连接的循环管线测量功能水的密度。当功能水的密度偏离设定范围时，功能水通过运输管道运送到功能水发生器。版权所有（C）2006，JPO＆NCIPI

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