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1. 发明专利

JP2014038958A Immersion type cleaner 有权
标题翻译：浸入式清洁剂
公开(公告)号：JP2014038958A
公开(公告)日：2014-02-27
申请号：JP2012181008
申请日：2012-08-17
申请人： Pre-Tech Co Ltd , 株式会社プレテック , National Institute Of Advanced Industrial & Technology , 独立行政法人産業技術総合研究所
发明人： NAITO YOSUKE , AMANO YUTAKA , HARA SHIRO
IPC分类号： H01L21/304
CPC分类号： H01L21/67057 , H01L21/68707
摘要： PROBLEM TO BE SOLVED: To provide a dip type wafer cleaner which can efficiently clean a wafer.SOLUTION: A wafer cleaner of the present invention comprises a chamber 5 having a plurality of washing tanks 8a and 8b to which washing liquid is fed and a wafer W can be inserted, and a wafer holding and carrying part 6 movably attached to the chamber 5 for immersing the wafer W into one of the washing tanks 8a and 8b in a state where the wafer W is held. The wafer W which has been immersed in the washing tank 8a can be immersed into the other washing tank 8a, after taking the wafer W out of the washing tank 8a.
摘要翻译：要解决的问题：提供一种可以有效地清洁晶片的浸渍型晶片清洁器。解决方案：本发明的晶片清洁器包括具有多个洗涤槽8a和8b的室5，清洗液被供给到其中，可以插入W，以及可移动地附接到室5的晶片保持和承载部分6，用于在晶片W被保持的状态下将晶片W浸入其中一个清洗槽8a和8b中。将晶片W从洗涤槽8a中取出后，已经浸没在洗涤槽8a中的晶片W能够浸入到另一个洗涤槽8a中。

2. 发明专利

JP2014038959A Cleaner using spin table 有权
标题翻译：清洁器使用旋转表
公开(公告)号：JP2014038959A
公开(公告)日：2014-02-27
申请号：JP2012181017
申请日：2012-08-17
申请人： Pre-Tech Co Ltd , 株式会社プレテック , National Institute Of Advanced Industrial & Technology , 独立行政法人産業技術総合研究所
发明人： NAITO YOSUKE , AMANO YUTAKA , HARA SHIRO
IPC分类号： H01L21/304
CPC分类号： H01L21/67051 , H01L21/6719 , H01L21/67724 , H01L21/67748 , H01L21/68785 , H01L21/68792
摘要： PROBLEM TO BE SOLVED: To provide a spin table type wafer cleaner which can efficiently clean a wafer with a plurality of cleaning mechanisms.SOLUTION: A wafer cleaner of the present invention comprises a spin table 5, a first cleaning mechanism 7, and a second cleaning mechanism 8. The spin table 5 has a setting surface 5a on which a wafer W is set, and is rotatable in a circumferential direction. The first cleaning mechanism 7 is mounted on the spin table 5 facing thereto and feeds first cleaning liquid to a side edge of the spin table 5. The second cleaning mechanism 8 is mounted on the spin table 5 facing thereto and feeds second cleaning liquid to a side edge of the spin table 5 different from that of the first cleaning mechanism 7. By rotating the spin table 5 and moving the wafer W from a first cleaning point to a second cleaning point, the wafer W can be washed with each of the first and second mechanisms 7 and 8, and the wafer W is revolved at a high speed on the spin table 5 to be dried using spinning motion.
摘要翻译：要解决的问题：提供一种能够利用多个清洁机构有效地清洁晶片的旋转台式晶片清洁器。解决方案：本发明的晶片清洁器包括旋转台5，第一清洁机构7和第二清洁机构7 清洁机构8.旋转台5具有设置表面5a，其上设置有晶片W，并且可以在周向上旋转。第一清洁机构7安装在面向其上的旋转台5上，并将第一清洁液供给到旋转台5的侧边缘。第二清洁机构8安装在面向其上的旋转台5上，并将第二清洁液体供给到旋转台5的侧边缘与第一清洁机构7不同。通过旋转旋转台5并将晶片W从第一清洁点移动到第二清洁点，晶片W可以用第一和第二机构7和8，并且晶片W在旋转台5上以高速旋转以通过旋转运动而被干燥。

3. 发明专利

JP2014038957A Cleaning device using mixing nozzle 有权
标题翻译：使用混合喷嘴清洁装置
公开(公告)号：JP2014038957A
公开(公告)日：2014-02-27
申请号：JP2012181001
申请日：2012-08-17
申请人： Pre-Tech Co Ltd , 株式会社プレテック , National Institute Of Advanced Industrial & Technology , 独立行政法人産業技術総合研究所
发明人： NAITO YOSUKE , AMANO YUTAKA , HARA SHIRO
IPC分类号： H01L21/304
CPC分类号： H01L21/67051
摘要： PROBLEM TO BE SOLVED: To provide a wafer washing device which uses a mixing nozzle capable of efficiently washing a wafer with a cleaning fluid.SOLUTION: A wafer washing device 1 cleans a wafer W with ozone water formed by mixing an ozone gas with ultra pure water and includes: a chuck surface 6b on which the wafer W is installed; and a composite nozzle 8 which is provided facing the wafer W installed on the chuck surface 6b. The composite nozzle 8 is attached so that a delivery port 8c is located close to the wafer W and mixes the ozone gas and the ultra pure water, which are supplied from the exterior, near the delivery port 8c.
摘要翻译：要解决的问题：提供一种使用能够用洗涤液有效地洗涤晶片的混合喷嘴的晶片清洗装置。解决方案：晶片洗涤装置1用臭氧气体与超纯水混合形成的臭氧水清洗晶片W 水，包括：安装有晶片W的卡盘面6b; 以及与安装在卡盘面6b上的晶片W相对设置的复合喷嘴8。复合喷嘴8被安装成使得输送口8c位于晶片W附近，并将从外部供给的臭氧气体和超纯水混合在输送口8c附近。

4. 发明专利

JP2010258084A Substrate holding jig and cleaning device 有权
标题翻译：基板控制和清洁装置
公开(公告)号：JP2010258084A
公开(公告)日：2010-11-11
申请号：JP2009104068
申请日：2009-04-22
申请人： Pre-Tech Co Ltd , Shin Etsu Handotai Co Ltd , 信越半導体株式会社 , 株式会社プレテック
发明人： SHIBA KAZUHIKO , NAITO YOSUKE , SATO MICHITO , OHIRA TADAO
IPC分类号： H01L21/304 , B08B3/12
摘要： PROBLEM TO BE SOLVED: To provide a substrate holding jig that is resistant to a damage by ultrasonic wave and prevents a trouble of substrate conveyance because of displacement of substrate holding position when cleaning a substrate by using a megasonic cleaning device, and performs appropriate cleaning. SOLUTION: In a batch-type megasonic cleaning device, the substrate holding jig holds a substrate in a cleaning tank during cleaning, and it includes side plates facing each other to hold the substrate within the cleaning tank, two or more quartz supporting member whose both ends are connected to the side plates, and a plurality of resin holding members that have one holding groove respectively and are attached to the quartz supporting members. The resin holding member is attached to the quartz supporting member so that it may not be in contact with the other resin holding member, and the periphery of the substrate is inserted into the holding groove of the resin holding member, thereby holding the substrate. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种耐超声波损伤的基板保持夹具，并且通过使用兆声波清洗装置来清洁基板时由于基板保持位置的位移而防止基板输送的麻烦，并执行适当的清洁。解决方案：在分批式兆声波清洗装置中，基板保持夹具在清洁期间将基板保持在清洗槽中，并且其包括彼此面对的侧板，以将基板保持在清洗槽内，两个或更多个石英支撑其两端连接到侧板，以及多个树脂保持构件，其分别具有一个保持槽并附接到石英支撑构件。树脂保持构件安装在石英支承构件上，使其不与另一个树脂保持构件接触，并且将基板的周边插入到树脂保持构件的保持槽中，从而保持基板。版权所有（C）2011，JPO＆INPIT

5. 发明专利

JP2007134619A Drying system and method of flat-plate-form object 有权
标题翻译：平板对象的干燥系统和方法
公开(公告)号：JP2007134619A
公开(公告)日：2007-05-31
申请号：JP2005328419
申请日：2005-11-14
申请人： Pre-Tech Co Ltd , 株式会社プレテック
发明人： KATO MASAYUKI , SONE HISAAKI , NAITO YOSUKE
IPC分类号： H01L21/304 , B65G49/07 , H01L21/677
摘要： PROBLEM TO BE SOLVED: To provide a drying system and method of flat-plate-form objects whereby such flat-plate-form objects as semiconductor wafers can be so dried in their clean states as to leave no water mark and no stain over their whole surfaces after the washing of them. SOLUTION: The drying system 1 of flat-plate-form objects is the system for drying wafers of flat-plate-form objects W after rinsing them with a pure water, and has at least a water vessel 3 for so supporting therein the peripheries of the flat-plate-form objects W in the state of standing them as to rinse them with the pure water, an air feeding duct 4 for blowing a clean air from above the flat-plate-form objects on them after taking out them from the pure water, robot hands 5 for so grasping the peripheries of the flat-plate-form objects whereon the clean air has been blown as to carry out them from the water vessel, and a drying stage 6 for drying in a sucking way the under portions of the flat-plate-form objects without its contacting with the flat-plate-form objects grasped by the robot hands. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种平板形物体的干燥系统和方法，由此可以将这样的平板形物体作为半导体晶片在其干净状态下干燥以便不留下水痕并且没有污点在它们的洗涤后，在整个表面上。解决方案：平板形物体的干燥系统1是在用纯水冲洗之后干燥平板状物体W的晶片的系统，并且至少具有用于支撑在其中的水槽3 平板形物体W的外围处于静置状态，用纯水冲洗;空气供给管道4，用于从取出后的平板状物体上方吹出清洁空气他们从纯净水，机器人手5抓住清洁空气吹过的平板形物体的外围，从水槽中进行运送;以及干燥台6，以吸吮方式进行干燥平板形物体的下部不与机器人手抓住的平板状物体接触。版权所有（C）2007，JPO＆INPIT

6. 发明专利

JP2007042856A Cleaner and cleaning liquid drip preventing method 审中-公开
标题翻译：清洁和清洁液体预防方法
公开(公告)号：JP2007042856A
公开(公告)日：2007-02-15
申请号：JP2005225179
申请日：2005-08-03
申请人： Pre-Tech Co Ltd , 株式会社プレテック
发明人： NAKADA MITSURU , OHATA SHINICHIRO , SONE HISAAKI , NAITO YOSUKE
IPC分类号： H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a cleaner which reliably prevents a cleaning liquid from dripping from a cleaning liquid delivering means after stopping feeding the cleaning liquid.
SOLUTION: The cleaner has a cleaning tank for cleaning substrates, and waste liquid collecting tank for collecting waste liquids in the cleaning tank for cleaning the substrates with the cleaning liquid fed to the substrates in the tank. It comprises at least a cleaning liquid feed piping for feeding the cleaning liquid, a cleaning liquid delivering means provided on the top end of the cleaning liquid feed piping for delivering the cleaning liquid to the substrates, a feed valve for switching over the feed and the feed stop of the cleaning liquid, a cleaning liquid suction piping connected at one end to the cleaning liquid feed piping between the feed valve and the cleaning liquid delivering means for sucking the cleaning liquid remaining in the cleaning liquid feed piping, a suction valve for switching over the suction and suction stop of the cleaning liquid, and a pump for sucking the cleaning liquid. With the feed valve closed, the pump sucks the remaining cleaning liquid to prevent the liquid from dripping.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种清洁器，其可靠地防止清洁液在停止供给清洗液之后从清洗液输送装置滴下。解决方案：清洁器具有用于清洁基板的清洗槽和用于在清洗槽中收集废液的废液收集罐，用于将进料到罐中的基板的清洗液清洁基板。至少包括用于供给清洗液的清洗液供给配管，设置在清洗液供给配管的顶端的清洗液输送机构，用于将清洗液输送到基板，将进料切换的供给阀和清洁液的进料停止，一端连接到供给阀和用于吸入残留在清洗液供给管道中的清洗液的清洗液输送装置之间的清洗液供给管路的清洗液吸入配管，切换用吸入阀在清洁液体的抽吸和停止之上，以及用于吸入清洗液体的泵。在进给阀关闭的情况下，泵吸入剩余的清洁液体以防止液体滴落。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2012049247A Single wafer processing cleaning equipment 审中-公开
标题翻译：单辊加工清洗设备
公开(公告)号：JP2012049247A
公开(公告)日：2012-03-08
申请号：JP2010188424
申请日：2010-08-25
申请人： Pre-Tech Co Ltd , 株式会社プレテック
发明人： AMANO YUTAKA , IKUMA SHINGO , NAITO YOSUKE
IPC分类号： H01L21/304 , B05B1/34 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide single wafer processing cleaning equipment capable of effectively cleaning an object to be cleaned by preventing incomplete cleaning and drying of the object to be cleaned.SOLUTION: Single wafer processing cleaning equipment comprises: a cleaning table including at least one rotational flow forming part having an ejection hole for ejecting fluid and/or gas along a cylindrical recessed part and an inner wall surface of the recessed part, the cleaning table being arranged so that the rotational flow forming part is close to at least one surface to be cleaned and/or dried of an object to be cleaned; and a holding body arranged around the periphery of the cleaning table, for holding the object to be cleaned close to the rotational flow forming part of the cleaning table by contacting with a side surface of the object to be cleaned, in which the fluid and/or the gas ejected from the ejection hole of the rotational flow forming part allows at least one surface of the object to be cleaned to be cleaned and/or dried while the holding body fixes and holds the side surface of the object to be cleaned.
摘要翻译：要解决的问题：提供能够通过防止被清洁物体的不完全清洁和干燥来有效地清洁待清洁物体的单晶片处理清洁设备。单晶处理清洗设备包括：清洁台，包括至少一个旋转流形成部分，其具有用于沿着凹部的圆筒形凹部和内壁表面排出流体和/或气体的喷射孔，清洁台被布置成使得旋转流形成部分接近待清洁物体的待清洁和/或干燥的至少一个表面; 以及保持体，其布置在所述清洁台的周边周围，用于通过与所述待清洁物体的侧表面接触来将待清洁物体靠近所述清洁台的旋转流形成部分保持，其中所述流体和/ 或者从旋转流动形成部的喷出孔喷出的气体，在保持体固定并保持待清洗对象物的侧面的同时，能够使待清洁物体的至少一个表面被清洁和/或干燥。版权所有（C）2012，JPO＆INPIT

8. 发明专利

JP2007053274A Cleaning equipment and fractional reclaiming method of cleaning liquid 审中-公开
$Cleaning equipment and fractional reclaiming method of cleaning liquid$
标题翻译：清洁设备和清洁液的分级回收方法
公开(公告)号：JP2007053274A
公开(公告)日：2007-03-01
申请号：JP2005238178
申请日：2005-08-19
申请人： Pre-Tech Co Ltd , 株式会社プレテック
发明人： KATO MASAYUKI , NAITO YOSUKE
IPC分类号： H01L21/304 , B08B3/02 , G02F1/13 , G02F1/1333
摘要： PROBLEM TO BE SOLVED: To provide cleaning equipment in which fractional reclaiming of cleaning liquid used for cleaning a cleaned substrate is performed conveniently with high precision, and resoiling of the cleaned substrate by the used cleaning liquid can be prevented, and to provide a fractional reclaiming method of cleaning liquid. SOLUTION: The cleaning equipment 1 for cleaning a cleaned substrate 9 by ejecting cleaning liquid and performing fractional reclaiming of used cleaning liquid comprises a means 4 for holding the cleaned substrate 9, a ring-like means 5 arranged to surround the cleaned substrate 9 and performing fractional reclaiming of used cleaning liquid, and a pump 14 for sucking the cleaning liquid. The cleaning liquid fractional reclaiming means 5 has a wall for collecting the cleaning liquid by preventing the used cleaning liquid from scattering. A plurality of holes 10 for sucking the cleaning liquid are formed in the lower portion of the cleaning liquid collecting wall, and suction valves 11 for switching suction and suction stop of the cleaning liquid are provided in correspondence with the cleaning liquid suction holes 10. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供清洁设备，其中用于清洁清洁的基材的清洁液的分级回收以高精度方便地进行，并且可以防止通过使用的清洗液回收清洁的基板，并且提供一种清洗液的分级回收方法。解决方案：用于通过喷射清洗液体清洗洗涤液体并进行分级回收清洗液的清洁设备1包括用于保持清洁过的基板9的装置4，布置成围绕清洁的基板的环状装置5 并且执行使用过的清洁液的分级回收，以及用于吸取清洗液的泵14。清洗液分离回收装置5具有用于通过防止使用的清洁液体飞散而收集清洁液体的壁。在清洁液收集壁的下部形成有用于吸取清洗液的多个孔10，并且与清洗液吸入孔10对应设置有用于切换清洗液吸入和吸引停止的吸入阀11。 P>版权所有（C）2007，JPO＆INPIT

9. 发明专利

JP2010010652A Single wafer cleaning apparatus 审中-公开
标题翻译：单面清洗装置
公开(公告)号：JP2010010652A
公开(公告)日：2010-01-14
申请号：JP2009022870
申请日：2009-02-03
申请人： Pre-Tech Co Ltd , 株式会社プレテック
发明人： SHIBA KAZUHIKO , NAITO YOSUKE
IPC分类号： H01L21/304 , B08B3/12 , H01L21/306 , H01L21/683
摘要： PROBLEM TO BE SOLVED: To provide a single wafer cleaning apparatus capable of preventing mutual contamination between cleaned objects which occurs when a backside of the cleaned object and a cleaning apparatus are in contact with each other, and suppressing reattachment of a cleaning liquid and cleaned dirt on the cleaned object. SOLUTION: The single wafer cleaning apparatus includes at least a chuck pin for holding a side surface of the cleaned object, a flange arranged beneath the cleaned object and having a discharge port for discharging a liquid, and a liquid splash preventing plate arranged on an outer side of the flange for preventing splash of the liquid discharged from the flange. A backside of the cleaned object is floated with a liquid by the flange in a non-contact state, and the chuck pin holds the side surface of the cleaned object to clean the cleaned object. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够防止被清洁物体的背面和清洁装置相互接触时发生的被清洁物体之间的相互污染的单个晶片清洁装置，并且抑制清洗液体的再附着并清洁被清洁物体上的污垢。解决方案：单晶片清洁装置至少包括用于保持被清洁物体的侧表面的卡盘销，布置在清洁物体下方的凸缘，并具有用于排出液体的排出口，以及布置在液体防溅板在凸缘的外侧上，用于防止从凸缘排出的液体飞溅。清洁物体的背面通过法兰在非接触状态下以液体浮动，并且卡盘销保持被清洁物体的侧表面以清洁被清洁物体。版权所有（C）2010，JPO＆INPIT

10. 发明专利

JP2008288541A Single wafer processing cleaning apparatus 审中-公开
标题翻译：单辊加工清洗装置
公开(公告)号：JP2008288541A
公开(公告)日：2008-11-27
申请号：JP2007189284
申请日：2007-07-20
申请人： Pre-Tech Co Ltd , 株式会社プレテック
发明人： SHIBA KAZUHIKO , KATO MASAYUKI , HATTORI MARE , NAITO YOSUKE
IPC分类号： H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a single wafer processing cleaning apparatus by which damage to a substrate can be suppressed and high cleaning effect can be easily obtained even when treating a substrate having a substrate surface which is easy to get damaged and a substrate on which especially a device pattern is formed.
SOLUTION: The single wafer processing cleaning apparatus 1 includes a holding means 2 for holding a substrate W and a cleaning liquid exhaust means 4 which ejects a cleaning liquid 3 toward an upper surface W1 of the substrate held by the holding means. The apparatus includes at least a propagative water supply means 6 for supplying propagative water to a lower surface W2 of the substrate and a vibration means 7 which is so proximately arranged that a film 5 is formed just under the substrate by the propagative water, to apply ultrasonic vibration permeable to the substrate to the propagative water film. The ultrasonic vibration applied from the vibration means 7 to the propagative water film 5 is transmitted through the substrate W and applied to the cleaning liquid 3 on the upper surface W1 of the substrate, thereby the upper surface W1 of the substrate is cleaned.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种可以抑制基板损伤的单晶片处理清洁装置，即使在处理容易损坏的基板表面的基板和也可以容易地获得高清洗效果的情况下其上形成有特别是器件图案的衬底。解决方案：单个晶片处理清洁装置1包括用于保持基板W的保持装置2和清洁液体排出装置4，清洗液排出装置4朝向由保持装置保持的基板的上表面W1喷射。该装置至少包括用于向基底的下表面W2供应传播水的传播水供给装置6以及靠近布置的振动装置7，使得膜5通过传播水形成在基底下方，以施加超声波振动可透过基底至传播水膜。从振动装置7向传播水膜5施加的超声振动通过基板W透过，并被施加到基板的上表面W1上的清洗液体3，从而清洁基板的上表面W1。版权所有（C）2009，JPO＆INPIT

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