专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

EP2659021A1 THERMAL DIFFUSION CHAMBER CONTROL DEVICE AND METHOD 审中-公开
标题翻译： STEUERUNGSVORRICHTUNG超越FÜREINEWÄRMEDIFFUSIONSKAMMER
公开(公告)号：EP2659021A1
公开(公告)日：2013-11-06
申请号：EP11852375.2
申请日：2011-12-22
申请人： Poole Ventura, Inc.
发明人： ERICKSON, Mark, R. , DINGUS, Aaron, L. , CUSTER, Arthur, W., III , POOLE, Henry, J. , JAMSHIDI, Nader
IPC分类号： C23C4/06
CPC分类号： C23C16/4411 , C23C16/45578 , C23C16/463 , C23C16/466 , C23C16/52 , F28C3/005 , F28D1/0477 , F28D2021/0077 , F28F1/32 , G05D23/1927 , G05D23/193 , G05D23/1932 , G05D23/1934 , G05D23/22 , H01L21/67109
摘要： Preferably, obtaining internal and external thermal measurement values of a sealed process chamber (168) allows a control system (202) to generate a control signal based on a comparison of the internal and external thermal measurement values to the predetermined value. The control signal is provided to a fluid handling system (216), wherein the fluid handling system modulates flow of a first fluid around the exterior of the sealed process chamber. The control signal is further provided to a closed loop heat exchange system (220), wherein the closed loop heat exchange system modulates flow of a second fluid within an interior cavity of the sealed process chamber based on the control signal. The control signal is still further provided to an open loop heat exchange system (218), wherein the open loop heat exchange system modulates flow of a third fluid within the interior cavity of the sealed process chamber.
摘要翻译：优选地，获得密封处理室的内部和外部热测量值允许控制系统基于内部和外部热测量值与预定值的比较来产生控制信号。控制信号被提供给流体处理系统，其中流体处理系统调节围绕密封处理室的外部的第一流体的流动。控制信号进一步提供给闭环热交换系统，其中闭环热交换系统基于控制信号调节密封处理室的内腔内的第二流体的流动。控制信号还被提供给开环热交换系统，其中开环热交换系统调节密封处理室的空腔内部的第三流体的流动。

2. 发明公开

EP2668663A1 THERMAL DIFFUSION CHAMBER 审中-公开
标题翻译：热扩散室
公开(公告)号：EP2668663A1
公开(公告)日：2013-12-04
申请号：EP12739785.9
申请日：2012-01-16
申请人： Poole Ventura, Inc.
发明人： ERICKSON, Mark, R. , DINGUS, Aaron, L. , CUSTER, III, Arthur, W. , POOLE, Henry, J. , JAMSHIDI, Nader
IPC分类号： H01L21/22
CPC分类号： F27B5/10 , F27B5/04 , F27B5/06 , Y10T29/49007 , Y10T29/4935
摘要： A frame supporting a containment chamber, the containment chamber is preferably configured to enclose and confine a process chamber. A heat source module is disposed between the containment chamber and the process chamber, while a thermal regulation cavity is maintained between the heat source module and the process chamber. Preferably, at least one fluid inlet box is in fluidic communication with the thermal regulation cavity, in which the fluid inlet box provides a plate valve that mitigates the flow of fluids from the thermal regulation cavity through the fluid inlet box and to an environment external to the thermal regulation cavity. Additionally, the preferred fluid inlet box further includes a flow adjustment structure interacting with the plate valve to control fluid flow from the environment external to the thermal regulation cavity past the plate valve and into thermal regulation cavity.

3. 发明申请

WO2014142975A1 THERMAL DIFFUSION CHAMBER WITH CONVECTION COMPRESSOR 审中-公开
标题翻译：带膨胀压缩机的热扩散室
公开(公告)号：WO2014142975A1
公开(公告)日：2014-09-18
申请号：PCT/US2013/032132
申请日：2013-03-15
申请人： POOLE VENTURA, INC.
发明人： ERICKSON, Mark, R. , POOLE, Henry, J. , JAMSHIDI, Nader , CUSTER, Arthur, W. , DINGUS, Aaron, L.
IPC分类号： F28F27/00
CPC分类号： F27B5/04 , F27B5/14 , F27B5/18 , F27B17/0016 , F27B17/0025 , F27B17/0075 , F27D19/00 , F27D21/00 , F28D1/0477 , F28D2021/0077 , F28F1/32
摘要： Preferably, a frame (104) supporting a containment chamber ( 102), with a sealed process chamber (168) confined within the containment chamber, and at least one fluid inlet structure (112) in fluidic communication with an exterior of the sealed process chamber, the fluid inlet structure including at least a flow adjustment structure (136) to control a fluid flow from a fluid source (912) around the exterior of the sealed process chamber; and an open loop fluid convection system (904) in fluidic communication with an interior of the sealed process chamber, wherein the fluid convection system includes a rotary compressor assembly (916) that extends into the sealed process chamber is disclosed.
摘要翻译：优选地，支撑容纳室（102）的框架（104）具有限定在容纳室内的密封处理室（168），以及与密封处理室的外部流体连通的至少一个流体入口结构（112），所述流体入口结构至少包括流动调节结构（136），以控制来自所述密封处理室外部的流体源（912）的流体流动; 以及与所述密封处理室的内部流体连通的开环流体对流系统（904），其中所述流体对流系统包括延伸到所述密封处理室中的旋转式压缩机组件（916）。

4. 发明公开

EP2659024A1 THERMAL DIFFUSION CHAMBER WITH HEAT EXCHANGER 审中-公开
标题翻译：有热交换热量扩散室
公开(公告)号：EP2659024A1
公开(公告)日：2013-11-06
申请号：EP11856573.8
申请日：2011-12-22
申请人： Poole Ventura, Inc.
发明人： ERICKSON, Mark, R. , POOLE, Henry, J. , JAMSHIDI, Nader , CUSTER, Arthur, W., III , DINGUS, Aaron, L.
IPC分类号： C23C16/00 , C23C16/46 , F27B5/16
CPC分类号： H01L21/67109 , F28C3/005 , F28D1/0477 , F28D2021/0077 , F28F1/32 , H01L21/6719 , Y10T29/4935
摘要： A diffusion chamber, precluding migration and leakage of the gaseous selenide species to atmosphere during the processing of solar panel substrates, the chamber comprising a frame supporting a containment chamber having a sealed process chamber confined within, a first fluid handling system/heat source module in fluidic communication with an exterior of the sealed process chamber, and a second fluid handling system/heat source module in fluidic communication with an interior of the sealed process chamber.

5. 发明申请

WO2014126592A1 THERMAL DIFFUSION CHAMBER WITH COOLING TUBES 审中-公开
标题翻译：带冷却管的热扩散室
公开(公告)号：WO2014126592A1
公开(公告)日：2014-08-21
申请号：PCT/US2013/029769
申请日：2013-03-08
申请人： POOLE VENTURA, INC.
发明人： ERICKSON, Mark, R. , POOLE, Henry, J. , JAMSHIDI, Nader , CUSTER, Arthur, W., III. , DINGUS, Aaron, L.
IPC分类号： F27D9/00
CPC分类号： F27D9/00 , F27B17/0025 , F27D19/00 , F27D21/00 , H01L21/67017 , H01L21/67109 , H01L21/6719
摘要： Preferably, a frame ( 104) supporting a containment chamber (102), which in turn confines a sealed process chamber ( 168), is provided. Further, at least one fluid inlet box (1 12) in fluidic communication with an exterior of the sealed, process chamber is presented, in which the fluid, inlet box includes at least a flow adjustment structure (136) to control a fluid flow from a fluid source around the exterior of the sealed process chamber; and an open loop heat exchange system (298) in fluidic communication with an interior of the sealed process chamber is present, within at least a portion of the open loop heat exchange system resides internal to the sealed process chamber.
摘要翻译：优选地，提供支撑容纳室（102）的框架（104），其又限制密封处理室（168）。此外，呈现与密封的处理室的外部流体连通的至少一个流体入口箱（112），其中流体入口箱包括至少一个流量调节结构（136），以控制来自围绕密封处理室的外部的流体源; 并且存在与密封处理室的内部流体连通的开环热交换系统（298），所述开环热交换系统的至少一部分位于密封处理室内部。

6. 发明申请

WO2014133565A1 IN-SITU SPUTTERING APPARATUS 审中-公开
标题翻译：现场飞溅设备
公开(公告)号：WO2014133565A1
公开(公告)日：2014-09-04
申请号：PCT/US2013/035374
申请日：2013-04-05
申请人： POOLE VENTURA, INC.
发明人： ERICKSON, Mark, R. , POOLE, Henry, J. , CUSTER, Arthur, W.
IPC分类号： C23C14/34
CPC分类号： C23C14/046 , C23C14/35 , C23C14/351 , H01J37/32669
摘要： A sputtering apparatus (100) that includes at least a target (164) presented as an inner surface of a confinement structure (166), the inner surface of the confinement structure is preferably an internal wall of a circular tube. A cathode (102, 104) is disposed adjacent the internal wall of the circular tube. The cathode preferably provides a hollow core, within which a magnetron is disposed. Preferably, an actuator (168, 170, 196) is attached to the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator. Additionally, a carriage (112) supporting the cathode and communicating with the target is preferably provided, and a cable bundle (120) interacting with the cathode and linked to a cable bundle take up mechanism (146) provided power and coolant to the cathode, magnetron, actuator and an anode (108) of the sputtering apparatus.
摘要翻译：至少包括作为限制结构（166）的内表面的靶（164）的溅射装置（100），限制结构的内表面优选为圆管的内壁。阴极（102,104）邻近圆管的内壁设置。阴极优选地提供中空芯，其中设置有磁控管。优选地，致动器（168,170,196）附接到磁控管，其中在激活致动器时磁控管在中空芯内的位置被改变。此外，优选地设置支撑阴极并与靶连通的托架（112），并且与阴极相互作用并连接到电缆束卷取机构（146）的电缆束（120）向阴极提供电源和冷却剂，磁控管，致动器和溅射装置的阳极（108）。

7. 发明申请

WO2012103252A1 THERMAL CHAMBER 审中-公开
标题翻译：热室
公开(公告)号：WO2012103252A1
公开(公告)日：2012-08-02
申请号：PCT/US2012/022597
申请日：2012-01-25
申请人： POOLE VENTURA, INC. , CUSTER, Arthur, W., III , POOLE, Henry, J. , ERICKSON, Mark, R. , JAMSHIDI, Nader , DINGUS, Aaron, L.
发明人： CUSTER, Arthur, W., III , POOLE, Henry, J. , ERICKSON, Mark, R. , JAMSHIDI, Nader , DINGUS, Aaron, L.
IPC分类号： F16J15/02
CPC分类号： H01L21/67098
摘要： A process chamber (106) that provides an interior surface and an exterior surface is confined within a containment chamber (102). Secured to the containment chamber is a collar (108) that communicates with the process chamber. A seal (110) formed between the process chamber and the collar, includes at least an adjustable backing ring (116) encircling the exterior surface of the process chamber, a preload ring (118) secured to the collar, and a sealing structure (120) encircling the process chamber and positioned between the adjustable backing ring and the preload ring. The adjustable backing ring is adjustably secured a predetermined distance from the preload ring, based on a perimeter dimension of the process chamber, to form the seal between the process chamber and the collar.
摘要翻译：提供内表面和外表面的处理室（106）被限制在容纳室（102）内。固定到容纳室是与处理室连通的套环（108）。形成在处理室和套环之间的密封件（110）包括环绕处理室的外表面的至少一个可调衬垫环（116），固定到套环的预加载环（118）和密封结构（120 ）环绕处理室并且位于可调衬垫环和预压环之间。基于处理室的周边尺寸，可调整的背衬环可调节地固定在距预压环的预定距离处，以形成处理室和套环之间的密封。

8. 发明申请

WO2012103248A1 HEAT SOURCE DOOR FOR A THERMAL DIFFUSION CHAMBER 审中-公开
标题翻译：用于热扩散室的热源门
公开(公告)号：WO2012103248A1
公开(公告)日：2012-08-02
申请号：PCT/US2012/022592
申请日：2012-01-25
申请人： POOLE VENTURA, INC. , POOLE, Henry, J. , ERICKSON, Mark, R. , JAMSHIDI, Nader , DINGUS, Aaron, L. , CUSTER, Arthur, W., III
发明人： POOLE, Henry, J. , ERICKSON, Mark, R. , JAMSHIDI, Nader , DINGUS, Aaron, L. , CUSTER, Arthur, W., III
IPC分类号： C23C16/00
CPC分类号： F27D1/1808 , F27B5/04 , F27D99/0006 , H01L21/67109 , H01L21/67115 , H01L21/67126 , H01L21/6719 , H01L21/67772 , Y10T29/4935
摘要： A frame (104) supporting a containment chamber (102), the containment chamber is preferably configured to enclose and confine a process chamber (106). A heat source module (108) is disposed between the containment chamber and the process chamber, while a collar (1 12) communicates with the process chamber and is secured to the process chamber. Preferably, a heat source door (1 14) is in fluidic communication with the process chamber, and includes at least a top hat section (1 16) secured to a main body portion (1 18), an over center latch (120) secured to the top hat section and interacting with the collar, the over center latch mitigates an inadvertent opening of the process chamber, and a lamp feed-through (122) is preferably secured to the main body portion and supports a heat source device (142).
摘要翻译：支撑容纳室（102）的框架（104），所述容纳室优选地构造成封闭和限制处理室（106）。热源模块（108）设置在容纳室和处理室之间，而套环（112）与处理室连通并固定到处理室。优选地，热源门（114）与处理室流体连通，并且至少包括固定到主体部分（118）的顶帽部分（116），固定在主体部分（118）上的过中心闩锁（120）到顶帽部分并与套环相互作用，过中心闩锁减轻了处理室的无意开口，并且灯馈通（122）优选地固定到主体部分并且支撑热源装置（142）。

9. 发明申请

WO2012092134A1 THERMAL DIFFUSION CHAMBER CONTROL DEVICE AND METHOD 审中-公开
标题翻译：热扩散室控制装置及方法
公开(公告)号：WO2012092134A1
公开(公告)日：2012-07-05
申请号：PCT/US2011/066886
申请日：2011-12-22
申请人： POOLE VENTURA, INC. , ERICKSON, Mark, R. , DINGUS, Aaron, L. , CUSTER, Arthur, W., III , POOLE, Henry, J. , JAMSHIDI, Nader
发明人： ERICKSON, Mark, R. , DINGUS, Aaron, L. , CUSTER, Arthur, W., III , POOLE, Henry, J. , JAMSHIDI, Nader
IPC分类号： C23C4/06
CPC分类号： C23C16/4411 , C23C16/45578 , C23C16/463 , C23C16/466 , C23C16/52 , F28C3/005 , F28D1/0477 , F28D2021/0077 , F28F1/32 , G05D23/1927 , G05D23/193 , G05D23/1932 , G05D23/1934 , G05D23/22 , H01L21/67109
摘要： Preferably, obtaining internal and external thermal measurement values of a sealed process chamber (168) allows a control system (202) to generate a control signal based on a comparison of the internal and external thermal measurement values to the predetermined value. The control signal is provided to a fluid handling system (216), wherein the fluid handling system modulates flow of a first fluid around the exterior of the sealed process chamber. The control signal is further provided to a closed loop heat exchange system (220), wherein the closed loop heat exchange system modulates flow of a second fluid within an interior cavity of the sealed process chamber based on the control signal. The control signal is still further provided to an open loop heat exchange system (218), wherein the open loop heat exchange system modulates flow of a third fluid within the interior cavity of the sealed process chamber.
摘要翻译：优选地，获得密封处理室（168）的内部和外部热测量值允许控制系统（202）基于内部和外部热测量值与预定值的比较来产生控制信号。控制信号被提供给流体处理系统（216），其中流体处理系统调节围绕密封处理室的外部的第一流体的流动。控制信号进一步提供给闭环热交换系统（220），其中闭环热交换系统基于控制信号调节密封处理室的内腔内的第二流体的流动。控制信号还被提供给开环热交换系统（218），其中开环热交换系统调节密封处理室的内腔内的第三流体的流动。

10. 发明申请

WO2014143078A1 IN-SITU SPUTTERING APPARATUS 审中-公开
标题翻译：现场飞溅设备
公开(公告)号：WO2014143078A1
公开(公告)日：2014-09-18
申请号：PCT/US2013/035384
申请日：2013-04-05
申请人： POOLE VENTURA, INC.
发明人： ERICKSON, Mark, R. , POOLE, Henry, J. , CUSTER, Arthur, W. , JAMSHIDI, Nader , HERSHCOVITCH, Ady
IPC分类号： C23C14/34
CPC分类号： C23C14/35 , C23C14/046 , H01J37/32394 , H01J37/3405 , H01J37/3435 , H01J37/3438 , H01J37/3444
摘要： Λ sputtering apparatus (100) that includes at least a target (164) presented as an inner surface of a confinement structure (166), the inner surface of the confinement structure is preferably an internal wall of a circular tube. A cathode (102. 104) is disposed adjacent the internal wall of the circular tube. The cathode preferably provides a hollow core, within which a magnetron is disposed. Preferably, an actuator (168, 170, 196, 256) is attached to the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator. Additionally, a carriage (112, 222) supporting the cathode and communicating with the target is preferably provided, and a cable bundle (120, 220) interacting with the cathode and linked to a cable bundle take up mechanism (146) provides power and coolant to the cathode, magnetron, actuator and an anode (108) of the sputtering apparatus.
摘要翻译： Λ溅射装置（100）至少包括作为限制结构（166）的内表面的靶（164），限制结构的内表面优选为圆管的内壁。阴极（102.104）被设置成邻近圆管的内壁。阴极优选地提供中空芯，其中设置有磁控管。优选地，致动器（168,170,196,256）附接到磁控管，其中在激活致动器时磁控管在中空芯内的位置被改变。此外，优选地提供支撑阴极并与靶连通的托架（112,222），并且与阴极相互作用并连接到电缆束卷取机构（146）的电缆束（120,220）提供电力和冷却剂到阴极，磁控管，致动器和溅射装置的阳极（108）。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式