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    • 10. 发明专利
    • FORMING METHOD OF COLOR PATTERN FOR COLOR FILTER
    • JPH1048414A
    • 1998-02-20
    • JP20691896
    • 1996-08-06
    • NIPPON PAINT CO LTD
    • KIYOO MAMORUYAMAMOTO AKIRAFUJIWARA SATOSHI
    • G02B5/20G02F1/1335H01L21/027
    • PROBLEM TO BE SOLVED: To produce a color filter of high definition, excellent in color characteristics of pixels and contrast, with good reproducibility, by repeating for required times from a process to form a photosensitive resin coating film on a transparent substrate up to a process to leave only a desired color coating film only on an opening in the photosensitive resin film. SOLUTION: A photosensitive resin compsn. soln. is applied on the whole or a part of one surface of a transparent substrate and dried to form a photosensitive resin coating film. Openings corresponding to a desired pattern are formed on the photosensitive resin film to expose a part of the transparent substrate. A desired color coating film is formed on the whole surface or a part of the transparent substrate coated with the photosensitlve resin. By peeling or developing the unnecessary photosensitive resin film and color coating film on the transparent substrate, only a desired color coating film on the openings of the photosensitive resin film can be left. These processes are repeated for required times to obtain a color filter color pattern.