会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明专利
    • DE69109220D1
    • 1995-06-01
    • DE69109220
    • 1991-09-20
    • MATSUSHITA ELECTRIC IND CO LTD
    • TAKEUCHI HIROYUKIYAMAMOTO MASAKISATO TAKEOSUGIYAMA YOSHIYUKIAOKI SHINICHIRO
    • G03F9/00H01L21/68H01L21/00
    • A position signal producing apparatus, for an apparatus for project-printing a pattern on a reticle (1) onto a wafer 82) through a project lens system (4) with exposure light (8), for producing a position signal indicative of the position of the wafer is disclosed, wherein two different frequency components (f1, f2) of alignment light (10) whose frequencies are different from that of the exposure light are interfered with each other at a position alignment blank (5) to form interference fringes (19) having a given pitch. The interference fringes are projected onto a diffraction grating (6) through an achromatizing optical system (18) and the project lens system. Diffracted light returning from the diffraction grating (6) is received by a photodetector (24) which produces a light beat signal. A position deviation signal obtained by phase comparison of the light beat signal provides position alignment by controlling relative positions between the position alignment blank (5) and the diffraction grating (6). Two light beams of the two different frequency components split by a polarized beam splitter (12) are equalized in image converting condition, or image aspect, by a mirror (60), so that an accurate mixing of the two frequency components of light beams is performed at the position alignment blank.
    • 4. 发明专利
    • DE69129925T2
    • 1999-03-18
    • DE69129925
    • 1991-05-24
    • MATSUSHITA ELECTRIC IND CO LTD
    • AOKI SHINICHIROSATO TAKEOYAMAMOTO MASAKITAKEUCHI HIROYUKIARAKI NOBUHIROSUGIYAMA YOSHIYUKI
    • G03F9/00H01L21/027H01L21/30
    • A reticle/wafer alignment system provided with a laser beam source for emitting laser beams, a first optical system portion for a reticle/wafer alignment which consists of a first optical sub-system for receiving laser beams from the laser beam source and projecting the received laser beams onto alignment marks formed on a substrate and made up of diffraction gratings and a second optical sub-system for gathering laser beams diffracted by the alignment marks to form an image thereof, a photoelectric detection portion for performing a photoelectric conversion of the gathered laser beams, a position detecting portion for measuring the position of the substrate based on a signal outputted from the photoelectric detection portion, a second optical system portion for an image processing which consists of a third optical sub-system for illuminating the alignment marks and a fourth optical sub-system having a television camera for observing the image of the alignment marks, and an image processing portion for performing an image processing of video signals outputted from the television camera. The first and second optical system portions are made in such a manner to have a common part thereof. Thereby, an entire alignment system can be made to be compact. Consequently, a position measurement accuracy can be improved.
    • 7. 发明专利
    • DE69015717D1
    • 1995-02-16
    • DE69015717
    • 1990-07-13
    • MATSUSHITA ELECTRIC IND CO LTD
    • YAMAMOTO MASAKISATO TAKEOSUGIYAMA YOSHIYUKIAOKI SHINICHIROTAKEUCHI HIROYUKI
    • G03F9/00G01B11/00G03B41/00
    • A position signal producing apparatus, for an apparatus for project-printing a pattern on reticle onto an wafer through a project lens with ultraviolet light, for producing a position signal indicative of position of the wafer, comprises: a laser emitting two different frequency components polarized orthogonally with each other which are splitted by a polarizing beam splitter. The first and second components are reflected by first and second mirrors respectively to produce interference fringes at a given place being on an annular region within a circle defined by field angle of the project lens on the reticle through wave plates for circularly-polarizing. Another interference fringes is formed on a diffraction grating of the wafer in correspondence with the interference fringes through the project lens and a lens for achromatizing the project lens at wavelength of the components. Another interference fringes reflected by the diffraction grating is detected by a photodetector for producing the position signal. The interference fringes may formed on the wafer by another diffraction grating on the reticle illuminated by the first and second components in combination with polarizing elements provided between the reticle and the wafer in replace with the polarizing beam splitter and wave plates.
    • 10. 发明专利
    • DE69129925D1
    • 1998-09-10
    • DE69129925
    • 1991-05-24
    • MATSUSHITA ELECTRIC IND CO LTD
    • AOKI SHINICHIROSATO TAKEOYAMAMOTO MASAKITAKEUCHI HIROYUKIARAKI NOBUHIROSUGIYAMA YOSHIYUKI
    • G03F9/00H01L21/027H01L21/30
    • A reticle/wafer alignment system provided with a laser beam source for emitting laser beams, a first optical system portion for a reticle/wafer alignment which consists of a first optical sub-system for receiving laser beams from the laser beam source and projecting the received laser beams onto alignment marks formed on a substrate and made up of diffraction gratings and a second optical sub-system for gathering laser beams diffracted by the alignment marks to form an image thereof, a photoelectric detection portion for performing a photoelectric conversion of the gathered laser beams, a position detecting portion for measuring the position of the substrate based on a signal outputted from the photoelectric detection portion, a second optical system portion for an image processing which consists of a third optical sub-system for illuminating the alignment marks and a fourth optical sub-system having a television camera for observing the image of the alignment marks, and an image processing portion for performing an image processing of video signals outputted from the television camera. The first and second optical system portions are made in such a manner to have a common part thereof. Thereby, an entire alignment system can be made to be compact. Consequently, a position measurement accuracy can be improved.