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1. 发明授权

US4367202A Centrifugal counter-flow liquid contactor 失效
标题翻译：离心式逆流液接触器
公开(公告)号：US4367202A
公开(公告)日：1983-01-04
申请号：US252785
申请日：1981-04-10
申请人： Kiyoshi Fujiwara , Masaru Fujimoto , Shoji Nomura , Hiroshi Kanekiyo , Shoji Yoshinaga
发明人： Kiyoshi Fujiwara , Masaru Fujimoto , Shoji Nomura , Hiroshi Kanekiyo , Shoji Yoshinaga
IPC分类号： B01D11/04 , B01J19/00
CPC分类号： B01D11/048
摘要： A centrifugal counter-flow liquid container contactor in which a light liquid and a heavy liquid are introduced into a rotary body fixed to a rotary shaft from the outer peripheral portion and the inner peripheral portion of the rotary body, respectively, so that the light liquid and heavy liquid make counter-flow contact with each other and, after the contact, the light liquid and heavy liquid are discharged from the inner peripheral portion and outer peripheral portion of the rotary body. Disc-shaped partition plates are disposed at both sides of radially extending pipes within the rotary body such as a light liquid introduction pipe, heavy liquid discharging pipe and so forth inserted into the rotary body, so as to separate these radial pipes from the region where the light and heavy liquids are mixed with each other.
摘要翻译：一种离心逆流液体容器接触器，其中轻液体和重液体分别从旋转体的外周部分和内周部分引入固定到旋转轴的旋转体中，使得液体并且重液体彼此反流接触，并且在接触之后，轻液体和重液体从旋转体的内周部分和外周部分排出。盘形隔板设置在旋转体内的径向延伸管的两侧，例如插入旋转体中的轻液导入管，重液体排放管等，以将这些径向管与从轻质和重质液体彼此混合。

2. 发明授权

US4326666A Centrifugal type counterflow contact apparatus 失效
标题翻译：离心式逆流接触装置
公开(公告)号：US4326666A
公开(公告)日：1982-04-27
申请号：US37996
申请日：1979-05-09
申请人： Kiyoshi Fujiwara , Katsuaki Nagatomo , Shoji Yoshinaga , Zensuke Tamura , Fumio Shibata , Hiroshi Kanekiyo
发明人： Kiyoshi Fujiwara , Katsuaki Nagatomo , Shoji Yoshinaga , Zensuke Tamura , Fumio Shibata , Hiroshi Kanekiyo
IPC分类号： B01D11/04 , B01J19/00 , B04B5/06 , B04B15/02
CPC分类号： B01D11/048 , B04B5/06
摘要： A centrifugal type counterflow contact apparatus having a rotary body or drum intergrally mounted on a rotary shaft, and a plurality of ring members disposed within the rotary body such that circumferential slits are defined between the adjacent ring members in the axial direction of the rotary drum. The ring members have a cross sectional configuration inclined with respect to the axis of the rotary body. A light liquid is introduced into the periphery of the rotary body while a heavy liquid is introduced in the center portion of the rotary body. The heavy and light liquids flow countercurrently through the slits between the ring members under the centrifugal force produced by the rotation of the rotary body, whereby extractability can be improved and accumulation of solids entrained in the feed can be avoided.
摘要翻译：一种离心式逆流接触装置，其具有一体地安装在旋转轴上的旋转体或滚筒，以及设置在旋转体内的多个环形构件，使得在相邻的环构件之间沿旋转滚筒的轴向限定周向狭缝。环构件具有相对于旋转体的轴线倾斜的横截面构造。将轻质液体引入旋转体的周边，同时将重质液体引入旋转体的中心部分。重物质和轻质液体通过旋转体旋转产生的离心力下的环形构件之间的狭缝逆流流动，由此提高了萃取性能，并且可以避免夹带在进料中的固体积聚。

3. 发明授权

US07169254B2 Plasma processing system and apparatus and a sample processing method 有权
标题翻译：等离子体处理系统和设备及样品处理方法
公开(公告)号：US07169254B2
公开(公告)日：2007-01-30
申请号：US10732285
申请日：2003-12-11
申请人： Toshio Masuda , Tatehito Usui , Mitsuru Suehiro , Hiroshi Kanekiyo , Hideyuki Yamamoto , Kazue Takahashi , Hiromichi Enami
发明人： Toshio Masuda , Tatehito Usui , Mitsuru Suehiro , Hiroshi Kanekiyo , Hideyuki Yamamoto , Kazue Takahashi , Hiromichi Enami
IPC分类号： H01L21/00 , C23C16/00 , C23C14/00
CPC分类号： H01L21/67069 , G01N21/68 , H01J37/32082 , H01J37/32935 , H01J37/32972
摘要： A plasma processing apparatus having a sample stage disposed inside a vacuum chamber and a plate member disposed opposing to a sample which is placed on the sample stage and supplied with electric power. The sample is processed using a plasma generated between the sample stage and the plate member and a measuring port is disposed at a back side of the plate member. The measuring port includes an optical transmitter which receives light from a surface of the sample, and a seal which vacuum-seals between an atmospheric side and vacuum side of the vacuum chamber.
摘要翻译：一种等离子体处理装置，其具有设置在真空室内的样品台和与放置在样品台上并提供电力的样品相对设置的板构件。使用在样品台和板构件之间产生的等离子体处理样品，并且测量端口设置在板构件的后侧。测量端口包括从样品表面接收光的光发射器，以及在真空室的大气侧和真空侧之间进行真空密封的密封件。

4. 发明授权

US06923885B2 Plasma processing system and apparatus and a sample processing method 有权
标题翻译：等离子体处理系统和设备及样品处理方法
公开(公告)号：US06923885B2
公开(公告)日：2005-08-02
申请号：US10732286
申请日：2003-12-11
申请人： Toshio Masuda , Tatehito Usui , Mitsuru Suehiro , Hiroshi Kanekiyo , Hideyuki Yamamoto , Kazue Takahashi , Hiromichi Enami
发明人： Toshio Masuda , Tatehito Usui , Mitsuru Suehiro , Hiroshi Kanekiyo , Hideyuki Yamamoto , Kazue Takahashi , Hiromichi Enami
IPC分类号： H01L21/3065 , H01J37/32 , H01L21/00 , C23C16/00
CPC分类号： H01L21/67069 , G01N21/68 , H01J37/32082 , H01J37/32935 , H01J37/32972
摘要： A plasma processing apparatus having a sample bench located in a vacuum chamber, a structure disposed at a position opposed to a sample placed on the sample bench and facing a plasma generated in the vacuum chamber, and at least one through-hole disposed in the structure through which a gas flows into the vacuum chamber. An optical transmitter is mounted on a back of the at least one through-hole through which light from the sample passes, which light is detected by way of the optical transmitter.
摘要翻译：一种等离子体处理装置，其具有位于真空室中的样品台，设置在与放置在样品台上的样品相对的位置并且面对在真空室中产生的等离子体的结构，以及设置在该结构中的至少一个通孔气体通过该气体流入真空室。光传输器安装在所述至少一个通孔的背面上，来自所述样品的光通过所述至少一个通孔穿过，所述光通过所述光发射器检测。

5. 发明授权

US06914005B2 Plasma etching method 失效
标题翻译：等离子蚀刻法
公开(公告)号：US06914005B2
公开(公告)日：2005-07-05
申请号：US10085002
申请日：2002-03-01
申请人： Muneo Furuse , Mitsuru Suehiro , Hiroshi Kanekiyo , Kunihiko Koroyasu , Tomoyuki Tamura
发明人： Muneo Furuse , Mitsuru Suehiro , Hiroshi Kanekiyo , Kunihiko Koroyasu , Tomoyuki Tamura
IPC分类号： H01J37/32 , H01L21/302 , H01L21/461
CPC分类号： H01J37/32449 , H01J37/32082
摘要： A plasma etching method and apparatus in which a processing gas is supplied from a shower plate arranged on an electrode opposed to an electrode for generating a plasma or a sample toward the sample center, and the gas is transformed into a plasma thereby to etch the sample. RF power is applied between a sample stage and the electrode to apply the energy to charged particles in the plasma to thereby etch the sample. In the process, apart from the incidence of the charged particles to the sample, the charged particles enter also the shower plate of the electrode by application of the RF power. The charged particles entering the processing gas supply holes of the shower plate are neutralized to prevent abnormal discharge on the shower plate and consequently suppress the generation of foreign matter.
摘要翻译：一种等离子体蚀刻方法和装置，其中处理气体从布置在与用于产生等离子体或样品的电极相对的电极上的淋浴板供给到样品中心，并且将气体转化为等离子体，从而蚀刻样品。在样品台和电极之间施加RF功率以将能量施加到等离子体中的带电粒子上，从而蚀刻样品。在该过程中，除了带电粒子对样品的入射之外，带电粒子通过施加RF功率也进入电极的喷淋板。进入喷淋板的处理气体供给孔的带电粒子被中和，以防止喷淋板上的异常放电，从而抑制异物的产生。

6. 发明授权

US06755932B2 Plasma processing system and apparatus and a sample processing method 有权
标题翻译：等离子体处理系统和设备及样品处理方法
公开(公告)号：US06755932B2
公开(公告)日：2004-06-29
申请号：US09788463
申请日：2001-02-21
申请人： Toshio Masuda , Tatehito Usui , Mitsuru Suehiro , Hiroshi Kanekiyo , Hideyuki Yamamoto , Kazue Takahashi , Hiromichi Enami
发明人： Toshio Masuda , Tatehito Usui , Mitsuru Suehiro , Hiroshi Kanekiyo , Hideyuki Yamamoto , Kazue Takahashi , Hiromichi Enami
IPC分类号： H05H100
CPC分类号： H01L21/67069 , G01N21/68 , H01J37/32082 , H01J37/32935 , H01J37/32972
摘要： The object of the present invention is to provide a plasma processing apparatus wherein plasma is generated in process chamber to treat a sample. Said plasma processing apparatus is further characterized in that multiple closely packed through-holes are formed on the plate installed on the UHF antenna arranged opposite to the sample, an optical transmitter is installed almost in contact with the back of the through-holes, and an optical transmission means is arranged on the other end of said optical transmitter, thereby measuring optical information coming from the sample and plasma through optical transmitter and optical transmission means by means of a measuring instrument. No abnormal discharge or particle contamination occur to through-holes even in long-term discharge process, and no deterioration occurs to the optical performance at the end face of the optical transmitter. Said plasma processing apparatus ensures stable and high precision measurement of the state of the surface of sample and plasma for a long time.
摘要翻译：本发明的目的是提供一种等离子体处理装置，其中在处理室中产生等离子体以处理样品。所述等离子体处理装置的特征还在于，在安装在与样品相对布置的UHF天线上的板上形成多个紧密堆积的通孔，光发射器几乎与通孔背面几乎接触，并且光传输装置设置在所述光发射机的另一端，借助于测量仪器通过光发射机和光传输装置测量来自样本和等离子体的光信息。即使在长期放电过程中也不会对通孔发生异常放电或颗粒污染，并且在光发射机的端面处的光学性能不会劣化。所述等离子体处理装置长时间保证对样品和等离子体表面的状态的稳定和高精度的测量。

7. 发明授权

US07686917B2 Plasma processing system and apparatus and a sample processing method 有权
标题翻译：等离子体处理系统和设备及样品处理方法
公开(公告)号：US07686917B2
公开(公告)日：2010-03-30
申请号：US11780014
申请日：2007-07-19
申请人： Toshio Masuda , Tatehito Usui , Mitsuru Suehiro , Hiroshi Kanekiyo , Hideyuki Yamamoto , Kazue Takahashi , Hiromichi Enami
发明人： Toshio Masuda , Tatehito Usui , Mitsuru Suehiro , Hiroshi Kanekiyo , Hideyuki Yamamoto , Kazue Takahashi , Hiromichi Enami
IPC分类号： H01L21/00 , C23C16/00 , C23C14/00
CPC分类号： H01L21/67069 , G01N21/68 , H01J37/32082 , H01J37/32935 , H01J37/32972
摘要： A plasma processing apparatus includes a vacuum vessel with a sample stage having a mounting surface disposed in a process chamber, and a plate having substantially uniform thickness and electric power applied thereto constituting a ceiling of the chamber. The plate is disposed opposite to and substantially parallel with the sample stage so as to cover the whole area of the stage mounting surface and has a through-hole therein. An optical transmitter with a diameter larger than a diameter of the though-hole is disposed inside of the vacuum vessel and has an end face at a position above and spaced a small distance a back surface of the plate so as to receive light from the chamber via the through-hole. The optical transmitter is independently detachable with respect to the back surface of the plate.
摘要翻译：等离子体处理装置包括具有设置在处理室中的安装表面的样品台的真空容器，以及构成室的天花板的基本均匀的厚度和电功率的板。该板与样品台相对设置并基本上平行，以覆盖舞台安装表面的整个区域并且在其中具有通孔。直径大于通孔直径的光发射器设置在真空容器的内部，并且具有位于板的后表面上方且间隔很小距离的位置处的端面，以便接收来自腔室的光通过通孔。光发射器相对于板的后表面独立地可拆卸。

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